MY194478A - Copper foil, printed wiring board using same, method for fabricating electronic device, and method for fabricating printed wiring board - Google Patents
Copper foil, printed wiring board using same, method for fabricating electronic device, and method for fabricating printed wiring boardInfo
- Publication number
- MY194478A MY194478A MYPI2018001779A MYPI2018001779A MY194478A MY 194478 A MY194478 A MY 194478A MY PI2018001779 A MYPI2018001779 A MY PI2018001779A MY PI2018001779 A MYPI2018001779 A MY PI2018001779A MY 194478 A MY194478 A MY 194478A
- Authority
- MY
- Malaysia
- Prior art keywords
- wiring board
- printed wiring
- fabricating
- copper foil
- same
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/12—Electroforming by electrophoresis
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
- C25D7/0692—Regulating the thickness of the coating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/04—Wires; Strips; Foils
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/10—Moulds; Masks; Masterforms
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/12—Electroforming by electrophoresis
- C25D1/14—Electroforming by electrophoresis of inorganic material
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/58—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/022—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Laminated Bodies (AREA)
- Electroplating Methods And Accessories (AREA)
- Metal Rolling (AREA)
Abstract
.Provided is a copper foil, and a laminate using the same, which has good s adhesion with a resin and excellent resin transparency after removal of the copper foil by etching. The copper foil has a 60? gloss in an MD of 501 to 800%. (Figure 1e)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012122448 | 2012-05-11 | ||
JP2013003867 | 2013-01-11 | ||
JP2013008519A JP5475897B1 (en) | 2012-05-11 | 2013-01-21 | Surface-treated copper foil and laminate using the same, copper foil, printed wiring board, electronic device, and method for manufacturing printed wiring board |
Publications (1)
Publication Number | Publication Date |
---|---|
MY194478A true MY194478A (en) | 2022-11-30 |
Family
ID=49550688
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI2018001779A MY194478A (en) | 2012-05-11 | 2013-04-30 | Copper foil, printed wiring board using same, method for fabricating electronic device, and method for fabricating printed wiring board |
MYPI2014703339A MY171074A (en) | 2012-05-11 | 2013-04-30 | Surface-treated copper foil and laminate using same, copper foil, printed wiring board, electronic device, and process for producing printed wiring board |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI2014703339A MY171074A (en) | 2012-05-11 | 2013-04-30 | Surface-treated copper foil and laminate using same, copper foil, printed wiring board, electronic device, and process for producing printed wiring board |
Country Status (7)
Country | Link |
---|---|
JP (1) | JP5475897B1 (en) |
KR (2) | KR101822325B1 (en) |
CN (2) | CN107022774A (en) |
MY (2) | MY194478A (en) |
PH (1) | PH12014502509B1 (en) |
TW (1) | TWI479036B (en) |
WO (1) | WO2013168646A1 (en) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5822669B2 (en) | 2011-02-18 | 2015-11-24 | Jx日鉱日石金属株式会社 | Copper foil for producing graphene and method for producing graphene using the same |
JP5850720B2 (en) | 2011-06-02 | 2016-02-03 | Jx日鉱日石金属株式会社 | Copper foil for producing graphene and method for producing graphene |
JP5959510B2 (en) | 2011-06-02 | 2016-08-02 | Jx金属株式会社 | Copper foil for producing graphene and method for producing graphene |
JP5721609B2 (en) | 2011-11-15 | 2015-05-20 | Jx日鉱日石金属株式会社 | Copper foil for producing graphene and method for producing graphene |
JP5885790B2 (en) * | 2013-08-20 | 2016-03-15 | Jx金属株式会社 | Surface treated copper foil and laminated board using the same, copper foil with carrier, printed wiring board, electronic device, method for manufacturing electronic device, and method for manufacturing printed wiring board |
JP5710737B1 (en) * | 2013-11-29 | 2015-04-30 | Jx日鉱日石金属株式会社 | Surface-treated copper foil, laminated board, printed wiring board, printed circuit board, and electronic equipment |
JP5756547B1 (en) * | 2014-04-28 | 2015-07-29 | 株式会社Shカッパープロダクツ | Surface-treated copper foil and laminate |
JP6078024B2 (en) | 2014-06-13 | 2017-02-08 | Jx金属株式会社 | Rolled copper foil for producing a two-dimensional hexagonal lattice compound and a method for producing a two-dimensional hexagonal lattice compound |
TWI676405B (en) * | 2016-07-26 | 2019-11-01 | 日商Jx金屬股份有限公司 | Printed wiring boards, electronic equipment, ducts and metal materials |
KR102274906B1 (en) * | 2016-09-12 | 2021-07-09 | 후루카와 덴키 고교 가부시키가이샤 | Copper foil and copper clad laminate having the same |
CN108697006B (en) * | 2017-03-31 | 2021-07-16 | Jx金属株式会社 | Surface-treated copper foil, copper foil with carrier, laminate, method for manufacturing printed wiring board, and method for manufacturing electronic device |
KR102349377B1 (en) * | 2019-12-19 | 2022-01-12 | 일진머티리얼즈 주식회사 | Surface-treated copper foil, preparing method thereof, copper foil laminate including the same, and printed wiring board including the same |
CN112566373B (en) * | 2020-11-13 | 2022-11-04 | 广东工业大学 | Coarsening method based on tin template |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2849059B2 (en) | 1995-09-28 | 1999-01-20 | 日鉱グールド・フォイル株式会社 | Processing method of copper foil for printed circuit |
US6984456B2 (en) * | 2002-05-13 | 2006-01-10 | Mitsui Mining & Smelting Co., Ltd. | Flexible printed wiring board for chip-on flexibles |
JP2004098659A (en) | 2002-07-19 | 2004-04-02 | Ube Ind Ltd | Copper-clad laminate and its manufacturing process |
CN100515167C (en) * | 2004-02-17 | 2009-07-15 | 日矿金属株式会社 | Copper foil having blackened surface or layer |
JP2005344174A (en) * | 2004-06-03 | 2005-12-15 | Mitsui Mining & Smelting Co Ltd | Surface-treated copper foil, flexible copper-clad laminate manufactured using the same, and film carrier tape |
CN101851769B (en) * | 2005-03-31 | 2012-07-04 | 三井金属矿业株式会社 | Electrolytic copper foil and method for producing same, surface-treated electrolytic copper foil, copper-clad laminate, and printed wiring board |
KR20070044774A (en) * | 2005-10-25 | 2007-04-30 | 미쓰이 긴조꾸 고교 가부시키가이샤 | Two-layer flexible printed wiring board and method for manufacturing the same |
CN101297067A (en) * | 2005-10-31 | 2008-10-29 | 三井金属矿业株式会社 | Method for producing electrolytic copper foil, electrolytic copper foil obtained by the production method, surface-treated copper foil obtained using the electrolytic copper foil, and copper-clad laminate obtained using the electrolytic copper foil or the surface-treated copper foil |
TW200738913A (en) * | 2006-03-10 | 2007-10-16 | Mitsui Mining & Smelting Co | Surface treated elctrolytic copper foil and process for producing the same |
JP2007332458A (en) | 2006-05-18 | 2007-12-27 | Sony Corp | Vapor deposition apparatus, and vapor deposition source, and display device manufacturing method |
JP2007332418A (en) * | 2006-06-15 | 2007-12-27 | Fukuda Metal Foil & Powder Co Ltd | Surface treated copper foil |
JP4240506B2 (en) * | 2006-09-05 | 2009-03-18 | 三井金属鉱業株式会社 | Manufacturing method of film carrier tape for mounting electronic components |
JP5129642B2 (en) * | 2007-04-19 | 2013-01-30 | 三井金属鉱業株式会社 | Surface treated copper foil, copper clad laminate obtained using the surface treated copper foil, and printed wiring board obtained using the copper clad laminate |
EP2351876A1 (en) * | 2008-11-25 | 2011-08-03 | JX Nippon Mining & Metals Corporation | Copper foil for printed circuit |
WO2011077764A1 (en) * | 2009-12-22 | 2011-06-30 | Jx日鉱日石金属株式会社 | Method for producing laminate, and laminate |
JP5242710B2 (en) * | 2010-01-22 | 2013-07-24 | 古河電気工業株式会社 | Roughening copper foil, copper clad laminate and printed wiring board |
JP5411192B2 (en) * | 2011-03-25 | 2014-02-12 | Jx日鉱日石金属株式会社 | Rolled copper foil and method for producing the same |
JP5261595B1 (en) * | 2012-06-29 | 2013-08-14 | Jx日鉱日石金属株式会社 | Rolled copper foil, method for producing the same, and laminate |
-
2013
- 2013-01-21 JP JP2013008519A patent/JP5475897B1/en active Active
- 2013-04-29 TW TW102115229A patent/TWI479036B/en active
- 2013-04-30 KR KR1020167030318A patent/KR101822325B1/en active IP Right Grant
- 2013-04-30 MY MYPI2018001779A patent/MY194478A/en unknown
- 2013-04-30 MY MYPI2014703339A patent/MY171074A/en unknown
- 2013-04-30 KR KR1020147034840A patent/KR101704892B1/en active IP Right Grant
- 2013-04-30 CN CN201710102484.4A patent/CN107022774A/en active Pending
- 2013-04-30 CN CN201380024196.1A patent/CN104271813B/en active Active
- 2013-04-30 WO PCT/JP2013/062658 patent/WO2013168646A1/en active Application Filing
-
2014
- 2014-11-10 PH PH12014502509A patent/PH12014502509B1/en unknown
Also Published As
Publication number | Publication date |
---|---|
KR20150008482A (en) | 2015-01-22 |
PH12014502509A1 (en) | 2014-12-22 |
KR101822325B1 (en) | 2018-01-25 |
KR20160128467A (en) | 2016-11-07 |
KR101704892B1 (en) | 2017-02-08 |
JP5475897B1 (en) | 2014-04-16 |
CN104271813B (en) | 2018-08-28 |
JP2014148691A (en) | 2014-08-21 |
CN104271813A (en) | 2015-01-07 |
CN107022774A (en) | 2017-08-08 |
TW201402840A (en) | 2014-01-16 |
MY171074A (en) | 2019-09-24 |
WO2013168646A1 (en) | 2013-11-14 |
TWI479036B (en) | 2015-04-01 |
PH12014502509B1 (en) | 2014-12-22 |
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