NO320118B1 - Preparering av forloper-filmer av Cu<N>x</N>In<N>y</N>Ga<N>z</N>Se<N>n</N> hvor 0<=x<=2, 0<=y<=2, 0<=z<=2, 0<=n<=2 ved galvanisk utfelling for a fremstille solceller med hoy virkningsgrad - Google Patents

Preparering av forloper-filmer av Cu<N>x</N>In<N>y</N>Ga<N>z</N>Se<N>n</N> hvor 0<=x<=2, 0<=y<=2, 0<=z<=2, 0<=n<=2 ved galvanisk utfelling for a fremstille solceller med hoy virkningsgrad Download PDF

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Publication number
NO320118B1
NO320118B1 NO19982699A NO982699A NO320118B1 NO 320118 B1 NO320118 B1 NO 320118B1 NO 19982699 A NO19982699 A NO 19982699A NO 982699 A NO982699 A NO 982699A NO 320118 B1 NO320118 B1 NO 320118B1
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Norway
Prior art keywords
volts
galvanic
deposition
galvanic deposition
khz
Prior art date
Application number
NO19982699A
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English (en)
Norwegian (no)
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NO982699L (no
NO982699D0 (no
Inventor
Raghu N Bhattacharya
Miguel A Contreras
James Keane
Andrew L Tennant
John R Tuttle
Kannan Ramanathan
Rommel Noufi
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Davis Joseph & Negley
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Publication of NO982699D0 publication Critical patent/NO982699D0/no
Publication of NO982699L publication Critical patent/NO982699L/no
Publication of NO320118B1 publication Critical patent/NO320118B1/no

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
    • H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type
    • H01L31/0749—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type including a AIBIIICVI compound, e.g. CdS/CulnSe2 [CIS] heterojunction solar cells
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/023—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
    • G03C1/08—Sensitivity-increasing substances
    • G03C1/10—Organic substances
    • G03C1/12—Methine and polymethine dyes
    • G03C1/22—Methine and polymethine dyes with an even number of CH groups
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/02422—Non-crystalline insulating materials, e.g. glass, polymers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02568—Chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02614—Transformation of metal, e.g. oxidation, nitridation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02623—Liquid deposition
    • H01L21/02628—Liquid deposition using solutions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
    • H01L31/0264—Inorganic materials
    • H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
    • H01L31/0322—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312 comprising only AIBIIICVI chalcopyrite compounds, e.g. Cu In Se2, Cu Ga Se2, Cu In Ga Se2
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/541—CuInSe2 material PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S205/00—Electrolysis: processes, compositions used therein, and methods of preparing the compositions
    • Y10S205/915—Electrolytic deposition of semiconductor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/93—Ternary or quaternary semiconductor comprised of elements from three different groups, e.g. I-III-V

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Electromagnetism (AREA)
  • Electrochemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Energy (AREA)
  • Mechanical Engineering (AREA)
  • Photovoltaic Devices (AREA)
  • Physical Vapour Deposition (AREA)
  • Conductive Materials (AREA)
NO19982699A 1995-12-12 1998-06-11 Preparering av forloper-filmer av Cu<N>x</N>In<N>y</N>Ga<N>z</N>Se<N>n</N> hvor 0<=x<=2, 0<=y<=2, 0<=z<=2, 0<=n<=2 ved galvanisk utfelling for a fremstille solceller med hoy virkningsgrad NO320118B1 (no)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/571,150 US5730852A (en) 1995-09-25 1995-12-12 Preparation of cuxinygazsen (X=0-2, Y=0-2, Z=0-2, N=0-3) precursor films by electrodeposition for fabricating high efficiency solar cells
PCT/US1996/019614 WO1997022152A1 (en) 1995-12-12 1996-12-11 PREPARATION OF CuxInyGazSen (x=0-2, y=0-2, z=0-2, n=0-3) PRECURSOR FILMS BY ELECTRODEPOSITION FOR FABRICATING HIGH EFFICIENCY SOLAR CELLS

Publications (3)

Publication Number Publication Date
NO982699D0 NO982699D0 (no) 1998-06-11
NO982699L NO982699L (no) 1998-08-11
NO320118B1 true NO320118B1 (no) 2005-10-31

Family

ID=24282508

Family Applications (2)

Application Number Title Priority Date Filing Date
NO19982699A NO320118B1 (no) 1995-12-12 1998-06-11 Preparering av forloper-filmer av Cu<N>x</N>In<N>y</N>Ga<N>z</N>Se<N>n</N> hvor 0<=x<=2, 0<=y<=2, 0<=z<=2, 0<=n<=2 ved galvanisk utfelling for a fremstille solceller med hoy virkningsgrad
NO20052210A NO20052210D0 (no) 1995-12-12 2005-05-04 Preparering av forloper-filmer av CuxlnyGaZSen(X=0-2, y=0-2, z=0-2, n=0-3ved galvanisk utfelling for a fremstille solceller med hoy virkningsgrad

Family Applications After (1)

Application Number Title Priority Date Filing Date
NO20052210A NO20052210D0 (no) 1995-12-12 2005-05-04 Preparering av forloper-filmer av CuxlnyGaZSen(X=0-2, y=0-2, z=0-2, n=0-3ved galvanisk utfelling for a fremstille solceller med hoy virkningsgrad

Country Status (14)

Country Link
US (3) US5730852A (xx)
EP (1) EP0956600B1 (xx)
JP (1) JP3753739B2 (xx)
KR (1) KR19990071500A (xx)
CN (1) CN1155111C (xx)
AU (1) AU705545B2 (xx)
BR (1) BR9612022A (xx)
CA (1) CA2239786C (xx)
DE (1) DE69621467T2 (xx)
HK (1) HK1023849A1 (xx)
IL (1) IL124750A0 (xx)
NO (2) NO320118B1 (xx)
SA (1) SA98190373B1 (xx)
WO (1) WO1997022152A1 (xx)

Families Citing this family (156)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE508676C2 (sv) * 1994-10-21 1998-10-26 Nordic Solar Energy Ab Förfarande för framställning av tunnfilmssolceller
US5918111A (en) * 1995-03-15 1999-06-29 Matsushita Electric Industrial Co., Ltd. Method and apparatus for manufacturing chalcopyrite semiconductor thin films
US5730852A (en) * 1995-09-25 1998-03-24 Davis, Joseph & Negley Preparation of cuxinygazsen (X=0-2, Y=0-2, Z=0-2, N=0-3) precursor films by electrodeposition for fabricating high efficiency solar cells
EP0977911A4 (en) * 1997-04-21 2002-05-22 Davis Joseph & Negley PREPARATION OF LAYERS OF A PRECURSOR CONSISTING OF COPPER-INDIUM-GALLIUM DISELENIURE BY ELECTRODEPOSITION FOR MANUFACTURING HIGH-EFFICIENCY PHOTOPILES
US6258620B1 (en) * 1997-10-15 2001-07-10 University Of South Florida Method of manufacturing CIGS photovoltaic devices
CN1087872C (zh) * 1998-01-16 2002-07-17 中国地质大学（北京） 制备CuInSe2半导体薄膜的溶胶－凝胶－Se化工艺
US6127202A (en) * 1998-07-02 2000-10-03 International Solar Electronic Technology, Inc. Oxide-based method of making compound semiconductor films and making related electronic devices
JP2000091601A (ja) * 1998-09-07 2000-03-31 Honda Motor Co Ltd 太陽電池
JP2000091603A (ja) * 1998-09-07 2000-03-31 Honda Motor Co Ltd 太陽電池
US6323417B1 (en) 1998-09-29 2001-11-27 Lockheed Martin Corporation Method of making I-III-VI semiconductor materials for use in photovoltaic cells
JP3089407B2 (ja) * 1998-10-09 2000-09-18 工業技術院長 太陽電池薄膜の作製方法
US6409907B1 (en) * 1999-02-11 2002-06-25 Lucent Technologies Inc. Electrochemical process for fabricating article exhibiting substantial three-dimensional order and resultant article
WO2001037324A1 (en) 1999-11-16 2001-05-25 Midwest Research Institute A NOVEL PROCESSING APPROACH TOWARDS THE FORMATION OF THIN-FILM Cu(In,Ga)Se¿2?
US6562204B1 (en) 2000-02-29 2003-05-13 Novellus Systems, Inc. Apparatus for potential controlled electroplating of fine patterns on semiconductor wafers
US7211175B1 (en) 2000-02-29 2007-05-01 Novellus Systems, Inc. Method and apparatus for potential controlled electroplating of fine patterns on semiconductor wafers
US20020189665A1 (en) * 2000-04-10 2002-12-19 Davis, Joseph & Negley Preparation of CIGS-based solar cells using a buffered electrodeposition bath
DE20021644U1 (de) * 2000-12-20 2002-05-02 Alanod Al Veredlung Gmbh Solarkollektorelement
FR2820241B1 (fr) * 2001-01-31 2003-09-19 Saint Gobain Substrat transparent muni d'une electrode
US20040131792A1 (en) * 2001-03-22 2004-07-08 Bhattacharya Raghu N. Electroless deposition of cu-in-ga-se film
US6537846B2 (en) 2001-03-30 2003-03-25 Hewlett-Packard Development Company, L.P. Substrate bonding using a selenidation reaction
US7053294B2 (en) * 2001-07-13 2006-05-30 Midwest Research Institute Thin-film solar cell fabricated on a flexible metallic substrate
US6881647B2 (en) 2001-09-20 2005-04-19 Heliovolt Corporation Synthesis of layers, coatings or films using templates
EP1476906A2 (en) * 2001-09-20 2004-11-17 Heliovolt Corporation Apparatus for the synthesis of layers, coatings or films
US6787012B2 (en) 2001-09-20 2004-09-07 Helio Volt Corp Apparatus for the synthesis of layers, coatings or films
US6736986B2 (en) 2001-09-20 2004-05-18 Heliovolt Corporation Chemical synthesis of layers, coatings or films using surfactants
US6559372B2 (en) * 2001-09-20 2003-05-06 Heliovolt Corporation Photovoltaic devices and compositions for use therein
US6500733B1 (en) 2001-09-20 2002-12-31 Heliovolt Corporation Synthesis of layers, coatings or films using precursor layer exerted pressure containment
US7371467B2 (en) 2002-01-08 2008-05-13 Applied Materials, Inc. Process chamber component having electroplated yttrium containing coating
AU2003243467A1 (en) * 2002-06-11 2003-12-22 The State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of Oregon St Polycrystalline thin-film solar cells
EP1556902A4 (en) 2002-09-30 2009-07-29 Miasole MANUFACTURING DEVICE AND METHOD FOR PRODUCING THIN FILM SOLAR CELLS IN A LARGE SCALE
US20050072461A1 (en) * 2003-05-27 2005-04-07 Frank Kuchinski Pinhole porosity free insulating films on flexible metallic substrates for thin film applications
KR100495924B1 (ko) * 2003-07-26 2005-06-16 (주)인솔라텍 태양전지 흡수층의 제조 방법
PT1548845E (pt) * 2003-12-22 2007-03-30 Scheuten Glasgroep B V Processo para tratar partículas de pó
US7663057B2 (en) * 2004-02-19 2010-02-16 Nanosolar, Inc. Solution-based fabrication of photovoltaic cell
US8309163B2 (en) * 2004-02-19 2012-11-13 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer by use of chalcogen-containing vapor and inter-metallic material
US20060060237A1 (en) * 2004-09-18 2006-03-23 Nanosolar, Inc. Formation of solar cells on foil substrates
US8372734B2 (en) * 2004-02-19 2013-02-12 Nanosolar, Inc High-throughput printing of semiconductor precursor layer from chalcogenide nanoflake particles
US20070163641A1 (en) * 2004-02-19 2007-07-19 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer from inter-metallic nanoflake particles
US7605328B2 (en) * 2004-02-19 2009-10-20 Nanosolar, Inc. Photovoltaic thin-film cell produced from metallic blend using high-temperature printing
US20070163642A1 (en) * 2004-02-19 2007-07-19 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer from inter-metallic microflake articles
US20070169809A1 (en) * 2004-02-19 2007-07-26 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer by use of low-melting chalcogenides
US7604843B1 (en) 2005-03-16 2009-10-20 Nanosolar, Inc. Metallic dispersion
US8623448B2 (en) * 2004-02-19 2014-01-07 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer from chalcogenide microflake particles
US7306823B2 (en) * 2004-09-18 2007-12-11 Nanosolar, Inc. Coated nanoparticles and quantum dots for solution-based fabrication of photovoltaic cells
US7700464B2 (en) * 2004-02-19 2010-04-20 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer from nanoflake particles
US8846141B1 (en) 2004-02-19 2014-09-30 Aeris Capital Sustainable Ip Ltd. High-throughput printing of semiconductor precursor layer from microflake particles
US8329501B1 (en) 2004-02-19 2012-12-11 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer from inter-metallic microflake particles
US20070163639A1 (en) * 2004-02-19 2007-07-19 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer from microflake particles
US7736940B2 (en) * 2004-03-15 2010-06-15 Solopower, Inc. Technique and apparatus for depositing layers of semiconductors for solar cell and module fabrication
JP5259178B2 (ja) * 2004-03-15 2013-08-07 ソロパワー、インコーポレイテッド 太陽電池製造のための半導体の薄層を堆積する方法および装置
WO2005105944A1 (en) * 2004-04-02 2005-11-10 Midwest Research Institute ZnS/Zn(O, OH)S-BASED BUFFER LAYER DEPOSITION FOR SOLAR CELLS
CH697007A5 (fr) * 2004-05-03 2008-03-14 Solaronix Sa Procédé pour produire un composé chalcopyrite en couche mince.
US8541048B1 (en) 2004-09-18 2013-09-24 Nanosolar, Inc. Formation of photovoltaic absorber layers on foil substrates
US7732229B2 (en) * 2004-09-18 2010-06-08 Nanosolar, Inc. Formation of solar cells with conductive barrier layers and foil substrates
US7838868B2 (en) * 2005-01-20 2010-11-23 Nanosolar, Inc. Optoelectronic architecture having compound conducting substrate
US20090032108A1 (en) * 2007-03-30 2009-02-05 Craig Leidholm Formation of photovoltaic absorber layers on foil substrates
US8927315B1 (en) 2005-01-20 2015-01-06 Aeris Capital Sustainable Ip Ltd. High-throughput assembly of series interconnected solar cells
US7582506B2 (en) * 2005-03-15 2009-09-01 Solopower, Inc. Precursor containing copper indium and gallium for selenide (sulfide) compound formation
FR2886460B1 (fr) * 2005-05-25 2007-08-24 Electricite De France Sulfurisation et selenisation de couches de cigs electrodepose par recuit thermique
CN101263588B (zh) * 2005-06-24 2013-03-20 科纳卡技术股份有限公司 制备电极的方法
KR20080050388A (ko) * 2005-07-12 2008-06-05 코나르카 테크놀로지, 인코포레이티드 광전지의 전달 방법
WO2007011742A2 (en) * 2005-07-14 2007-01-25 Konarka Technologies, Inc. Cigs photovoltaic cells
KR100850000B1 (ko) * 2005-09-06 2008-08-01 주식회사 엘지화학 태양전지 흡수층의 제조방법
US20070151862A1 (en) * 2005-10-03 2007-07-05 Dobson Kevin D Post deposition treatments of electrodeposited cuinse2-based thin films
WO2007041650A1 (en) * 2005-10-03 2007-04-12 Davis, Joseph And Negley Single bath electrodeposited cu(in,ga)se2 thin films useful as photovoltaic devices
US20070079866A1 (en) * 2005-10-07 2007-04-12 Applied Materials, Inc. System and method for making an improved thin film solar cell interconnect
US20070093006A1 (en) * 2005-10-24 2007-04-26 Basol Bulent M Technique For Preparing Precursor Films And Compound Layers For Thin Film Solar Cell Fabrication And Apparatus Corresponding Thereto
US7713773B2 (en) * 2005-11-02 2010-05-11 Solopower, Inc. Contact layers for thin film solar cells employing group IBIIIAVIA compound absorbers
US7442413B2 (en) * 2005-11-18 2008-10-28 Daystar Technologies, Inc. Methods and apparatus for treating a work piece with a vaporous element
WO2007070880A1 (en) * 2005-12-15 2007-06-21 University Of Delaware Post-deposition treatments of electrodeposited cu(in-ga)se2-based thin films
CN101346823B (zh) * 2005-12-21 2010-06-23 壳牌可再生能源有限公司 制备薄膜光伏器件的方法和薄膜光伏器件
US7507321B2 (en) * 2006-01-06 2009-03-24 Solopower, Inc. Efficient gallium thin film electroplating methods and chemistries
US7767904B2 (en) 2006-01-12 2010-08-03 Heliovolt Corporation Compositions including controlled segregated phase domain structures
US20070160763A1 (en) * 2006-01-12 2007-07-12 Stanbery Billy J Methods of making controlled segregated phase domain structures
US8084685B2 (en) * 2006-01-12 2011-12-27 Heliovolt Corporation Apparatus for making controlled segregated phase domain structures
CN100465351C (zh) * 2006-03-02 2009-03-04 桂林工学院 一种太阳能电池薄膜材料的电化学沉积制备工艺
US20070215197A1 (en) * 2006-03-18 2007-09-20 Benyamin Buller Elongated photovoltaic cells in casings
CN101454486B (zh) * 2006-04-04 2013-03-13 索罗能源公司 用于卷绕处理光电薄膜的组分控制
US20070227633A1 (en) * 2006-04-04 2007-10-04 Basol Bulent M Composition control for roll-to-roll processed photovoltaic films
BRPI0710139A2 (pt) 2006-04-14 2011-08-23 Silica Tech Llc Aparelho para deposição de plasma para fazer células solares, e, método para formar uma camada de células solares
WO2007134843A2 (en) * 2006-05-24 2007-11-29 Atotech Deutschland Gmbh Metal plating composition and method for the deposition of copper-zinc-tin suitable for manufacturing thin film solar cell
US20080023059A1 (en) * 2006-07-25 2008-01-31 Basol Bulent M Tandem solar cell structures and methods of manufacturing same
JP5246839B2 (ja) * 2006-08-24 2013-07-24 独立行政法人産業技術総合研究所 半導体薄膜の製造方法、半導体薄膜の製造装置、光電変換素子の製造方法及び光電変換素子
US8334450B2 (en) * 2006-09-04 2012-12-18 Micallef Joseph A Seebeck solar cell
US8066865B2 (en) * 2008-05-19 2011-11-29 Solopower, Inc. Electroplating methods and chemistries for deposition of group IIIA-group via thin films
US7892413B2 (en) * 2006-09-27 2011-02-22 Solopower, Inc. Electroplating methods and chemistries for deposition of copper-indium-gallium containing thin films
US20080175993A1 (en) * 2006-10-13 2008-07-24 Jalal Ashjaee Reel-to-reel reaction of a precursor film to form solar cell absorber
US20100139557A1 (en) * 2006-10-13 2010-06-10 Solopower, Inc. Reactor to form solar cell absorbers in roll-to-roll fashion
US20090183675A1 (en) * 2006-10-13 2009-07-23 Mustafa Pinarbasi Reactor to form solar cell absorbers
US20090050208A1 (en) * 2006-10-19 2009-02-26 Basol Bulent M Method and structures for controlling the group iiia material profile through a group ibiiiavia compound layer
US20080169025A1 (en) * 2006-12-08 2008-07-17 Basol Bulent M Doping techniques for group ibiiiavia compound layers
DE102007003554A1 (de) * 2007-01-24 2008-07-31 Bayer Materialscience Ag Verfahren zur Leistungsverbesserung von Nickelelektroden
US8034317B2 (en) 2007-06-18 2011-10-11 Heliovolt Corporation Assemblies of anisotropic nanoparticles
US20090013292A1 (en) * 2007-07-03 2009-01-08 Mentor Graphics Corporation Context dependent timing analysis and prediction
WO2009059128A2 (en) 2007-11-02 2009-05-07 Wakonda Technologies, Inc. Crystalline-thin-film photovoltaic structures and methods for forming the same
JP4620105B2 (ja) * 2007-11-30 2011-01-26 昭和シェル石油株式会社 Ｃｉｓ系薄膜太陽電池の光吸収層の製造方法
US8425753B2 (en) * 2008-05-19 2013-04-23 Solopower, Inc. Electroplating methods and chemistries for deposition of copper-indium-gallium containing thin films
US20100140098A1 (en) * 2008-05-15 2010-06-10 Solopower, Inc. Selenium containing electrodeposition solution and methods
US8409418B2 (en) * 2009-02-06 2013-04-02 Solopower, Inc. Enhanced plating chemistries and methods for preparation of group IBIIIAVIA thin film solar cell absorbers
US20120003786A1 (en) * 2007-12-07 2012-01-05 Serdar Aksu Electroplating methods and chemistries for cigs precursor stacks with conductive selenide bottom layer
JPWO2009081807A1 (ja) * 2007-12-21 2011-05-06 関西ペイント株式会社 表面処理された金属基材の製造方法及び該製造方法により得られた表面処理された金属基材、並びに金属基材処理方法及び該方法によって処理された金属基材
CN101471394A (zh) * 2007-12-29 2009-07-01 中国科学院上海硅酸盐研究所 铜铟镓硫硒薄膜太阳电池光吸收层的制备方法
US20090235987A1 (en) * 2008-03-24 2009-09-24 Epv Solar, Inc. Chemical Treatments to Enhance Photovoltaic Performance of CIGS
US20090272422A1 (en) * 2008-04-27 2009-11-05 Delin Li Solar Cell Design and Methods of Manufacture
US20090283411A1 (en) * 2008-05-15 2009-11-19 Serdar Aksu Selenium electroplating chemistries and methods
US20100226629A1 (en) * 2008-07-21 2010-09-09 Solopower, Inc. Roll-to-roll processing and tools for thin film solar cell manufacturing
US20100059385A1 (en) * 2008-09-06 2010-03-11 Delin Li Methods for fabricating thin film solar cells
KR101069109B1 (ko) * 2008-10-28 2011-09-30 재단법인대구경북과학기술원 박막 태양 전지 및 이의 제조 방법
CN101740660B (zh) * 2008-11-17 2011-08-17 北京华仁合创太阳能科技有限责任公司 铜铟镓硒太阳能电池、其吸收层薄膜及该薄膜的制备方法、设备
CN101771099B (zh) * 2008-12-30 2011-08-17 中国电子科技集团公司第十八研究所 一种铜铟镓硒半导体薄膜的制备方法
CN101475315B (zh) * 2009-02-03 2011-08-17 泉州创辉光伏太阳能有限公司 黄铜矿类铜铟镓的硒化物或硫化物半导体薄膜材料的制备方法
WO2010090740A1 (en) * 2009-02-04 2010-08-12 Heliovolt Corporation Method of forming an indium-containing transparent conductive oxide film, metal targets used in the method and photovoltaic devices utilizing said films
US20100213073A1 (en) * 2009-02-23 2010-08-26 International Business Machines Corporation Bath for electroplating a i-iii-vi compound, use thereof and structures containing same
DE102009013904A1 (de) * 2009-03-19 2010-09-23 Clariant International Limited Solarzellen mit einer Verkapselungsschicht auf Basis von Polysilazan
US9062369B2 (en) * 2009-03-25 2015-06-23 Veeco Instruments, Inc. Deposition of high vapor pressure materials
TW201042065A (en) * 2009-05-22 2010-12-01 Ind Tech Res Inst Methods for fabricating copper indium gallium diselenide (CIGS) compound thin films
US8247243B2 (en) * 2009-05-22 2012-08-21 Nanosolar, Inc. Solar cell interconnection
AU2010254119A1 (en) 2009-05-26 2012-01-12 Purdue Research Foundation Thin films for photovoltaic cells
KR20100130008A (ko) * 2009-06-02 2010-12-10 삼성전자주식회사 태양 전지 구조체
US20100310770A1 (en) * 2009-06-05 2010-12-09 Baosheng Sang Process for synthesizing a thin film or composition layer via non-contact pressure containment
CA2768616A1 (en) * 2009-08-04 2011-02-10 Precursor Energetics, Inc. Polymeric precursors for caigas aluminum-containing photovoltaics
WO2011017237A2 (en) * 2009-08-04 2011-02-10 Precursor Energetics, Inc. Polymeric precursors for caigs and aigs silver-containing photovoltaics
US8585936B2 (en) * 2009-08-04 2013-11-19 Precursor Energetics, Inc. Methods for photovoltaic absorbers with controlled group 11 stoichiometry
CN102471359A (zh) * 2009-08-04 2012-05-23 普瑞凯瑟安质提克斯公司 用于cis及cigs光伏装置的聚合前体
TW201106488A (en) * 2009-08-11 2011-02-16 Jenn Feng New Energy Co Ltd A non-vacuum coating method for absorption layer of solar cell
US9263610B2 (en) 2009-09-08 2016-02-16 Chengdu Ark Eternity Photovoltaic Technology Company Limited Electrochemical method of producing copper indium gallium diselenide (CIGS) solar cells
US8256621B2 (en) * 2009-09-11 2012-09-04 Pro-Pak Industries, Inc. Load tray and method for unitizing a palletized load
US20110226323A1 (en) * 2009-09-14 2011-09-22 E.I. Du Pont De Nemours And Company Use of thermally stable, flexible inorganic substrate for photovoltaics
WO2011084171A1 (en) * 2009-12-17 2011-07-14 Precursor Energetics, Inc. Molecular precursors for optoelectronics
WO2011075561A1 (en) * 2009-12-18 2011-06-23 Solopower, Inc. Plating chemistries of group ib /iiia / via thin film solar absorbers
CN201635286U (zh) * 2009-12-24 2010-11-17 四会市维力有限公司 搪瓷太阳能建筑墙板
US8021641B2 (en) * 2010-02-04 2011-09-20 Alliance For Sustainable Energy, Llc Methods of making copper selenium precursor compositions with a targeted copper selenide content and precursor compositions and thin films resulting therefrom
KR101114685B1 (ko) 2010-02-08 2012-04-17 영남대학교 산학협력단 연속흐름반응법을 이용한 화합물 태양전지용 ＣｕＩｎＳ２ 박막의 제조방법
FR2957365B1 (fr) * 2010-03-11 2012-04-27 Electricite De France Procede de preparation d'une couche mince d'absorbeur pour cellules photovoltaiques
TWI411121B (zh) * 2010-03-11 2013-10-01 Ind Tech Res Inst 光吸收層之製造方法及應用其之太陽能電池結構
WO2011146115A1 (en) 2010-05-21 2011-11-24 Heliovolt Corporation Liquid precursor for deposition of copper selenide and method of preparing the same
US8304272B2 (en) 2010-07-02 2012-11-06 International Business Machines Corporation Germanium photodetector
WO2012023973A2 (en) 2010-08-16 2012-02-23 Heliovolt Corporation Liquid precursor for deposition of indium selenide and method of preparing the same
US20120055612A1 (en) * 2010-09-02 2012-03-08 International Business Machines Corporation Electrodeposition methods of gallium and gallium alloy films and related photovoltaic structures
US8545689B2 (en) 2010-09-02 2013-10-01 International Business Machines Corporation Gallium electrodeposition processes and chemistries
KR20130143031A (ko) 2010-09-15 2013-12-30 프리커서 에너제틱스, 인코퍼레이티드. 광기전체를 위한 어닐링 방법
US8563354B1 (en) 2010-10-05 2013-10-22 University Of South Florida Advanced 2-step, solid source deposition approach to the manufacture of CIGS solar modules
JP2012079997A (ja) * 2010-10-05 2012-04-19 Kobe Steel Ltd 化合物半導体薄膜太陽電池用光吸収層の製造方法、およびＩｎ−Ｃｕ合金スパッタリングターゲット
WO2012173676A1 (en) * 2011-06-17 2012-12-20 Precursor Energetics, Inc. Solution-based processes for solar cells
CN102268702A (zh) * 2011-07-07 2011-12-07 中南大学 铜铟镓硒薄膜的光电化学沉积制备法
GB2493022B (en) 2011-07-21 2014-04-23 Ilika Technologies Ltd Vapour deposition process for the preparation of a phosphate compound
GB2493020B (en) * 2011-07-21 2014-04-23 Ilika Technologies Ltd Vapour deposition process for the preparation of a chemical compound
US8466001B1 (en) * 2011-12-20 2013-06-18 Intermolecular, Inc. Low-cost solution approach to deposit selenium and sulfur for Cu(In,Ga)(Se,S)2 formation
US9018032B2 (en) * 2012-04-13 2015-04-28 Tsmc Solar Ltd. CIGS solar cell structure and method for fabricating the same
US9105797B2 (en) 2012-05-31 2015-08-11 Alliance For Sustainable Energy, Llc Liquid precursor inks for deposition of In—Se, Ga—Se and In—Ga—Se
GB201400276D0 (en) 2014-01-08 2014-02-26 Ilika Technologies Ltd Vapour deposition method for fabricating lithium-containing thin film layered structures
GB201400274D0 (en) 2014-01-08 2014-02-26 Ilika Technologies Ltd Vapour deposition method for preparing amorphous lithium-containing compounds
GB201400277D0 (en) * 2014-01-08 2014-02-26 Ilika Technologies Ltd Vapour deposition method for preparing crystalline lithium-containing compounds
WO2017091269A2 (en) * 2015-08-31 2017-06-01 The Board Of Regents Of The University Of Oklahoma Semiconductor devices having matrix-embedded nano-structured materials
KR102435872B1 (ko) 2016-06-15 2022-08-23 이리카 테크놀로지스 리미티드 전해질 및 전극 보호층으로서의 리튬 보로실리케이트 유리
GB201814039D0 (en) 2018-08-29 2018-10-10 Ilika Tech Ltd Method

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3530053A (en) * 1968-01-11 1970-09-22 Bell Telephone Labor Inc Method of preparing a cadmium sulfide thin film from an aqueous solution
US3978510A (en) * 1974-07-29 1976-08-31 Bell Telephone Laboratories, Incorporated Heterojunction photovoltaic devices employing i-iii-vi compounds
US4256544A (en) * 1980-04-04 1981-03-17 Bell Telephone Laboratories, Incorporated Method of making metal-chalcogenide photosensitive devices
US4335266A (en) * 1980-12-31 1982-06-15 The Boeing Company Methods for forming thin-film heterojunction solar cells from I-III-VI.sub.2
US4392451A (en) * 1980-12-31 1983-07-12 The Boeing Company Apparatus for forming thin-film heterojunction solar cells employing materials selected from the class of I-III-VI2 chalcopyrite compounds
US4376016A (en) * 1981-11-16 1983-03-08 Tdc Technology Development Corporation Baths for electrodeposition of metal chalconide films
US4581108A (en) * 1984-01-06 1986-04-08 Atlantic Richfield Company Process of forming a compound semiconductive material
US4611091A (en) * 1984-12-06 1986-09-09 Atlantic Richfield Company CuInSe2 thin film solar cell with thin CdS and transparent window layer
US4798660A (en) * 1985-07-16 1989-01-17 Atlantic Richfield Company Method for forming Cu In Se2 films
US5045409A (en) * 1987-11-27 1991-09-03 Atlantic Richfield Company Process for making thin film solar cell
US5221660A (en) * 1987-12-25 1993-06-22 Sumitomo Electric Industries, Ltd. Semiconductor substrate having a superconducting thin film
US4915745A (en) * 1988-09-22 1990-04-10 Atlantic Richfield Company Thin film solar cell and method of making
US5112410A (en) * 1989-06-27 1992-05-12 The Boeing Company Cadmium zinc sulfide by solution growth
US5441897A (en) * 1993-04-12 1995-08-15 Midwest Research Institute Method of fabricating high-efficiency Cu(In,Ga)(SeS)2 thin films for solar cells
US5436204A (en) * 1993-04-12 1995-07-25 Midwest Research Institute Recrystallization method to selenization of thin-film Cu(In,Ga)Se2 for semiconductor device applications
US5356839A (en) * 1993-04-12 1994-10-18 Midwest Research Institute Enhanced quality thin film Cu(In,Ga)Se2 for semiconductor device applications by vapor-phase recrystallization
US5730852A (en) * 1995-09-25 1998-03-24 Davis, Joseph & Negley Preparation of cuxinygazsen (X=0-2, Y=0-2, Z=0-2, N=0-3) precursor films by electrodeposition for fabricating high efficiency solar cells

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