NO20064799L - Slitesterkt hardt belegg inneholdende silikonnitrid - Google Patents

Slitesterkt hardt belegg inneholdende silikonnitrid

Info

Publication number
NO20064799L
NO20064799L NO20064799A NO20064799A NO20064799L NO 20064799 L NO20064799 L NO 20064799L NO 20064799 A NO20064799 A NO 20064799A NO 20064799 A NO20064799 A NO 20064799A NO 20064799 L NO20064799 L NO 20064799L
Authority
NO
Norway
Prior art keywords
hard coating
durable hard
coating containing
containing silicone
silicone nitride
Prior art date
Application number
NO20064799A
Other languages
English (en)
Norwegian (no)
Inventor
Martin Engler
Christoph Lesniak
Krishna Uibel
Original Assignee
Esk Ceramics Gmbh & Co Kg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Esk Ceramics Gmbh & Co Kg filed Critical Esk Ceramics Gmbh & Co Kg
Publication of NO20064799L publication Critical patent/NO20064799L/no

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/002—Crucibles or containers for supporting the melt
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10—Crucibles or containers for supporting the melt
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • C30B35/002—Crucibles or containers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Manufacturing & Machinery (AREA)
  • Paints Or Removers (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Ceramic Products (AREA)
  • Laminated Bodies (AREA)
  • Photovoltaic Devices (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemically Coating (AREA)
  • Crucibles And Fluidized-Bed Furnaces (AREA)
NO20064799A 2005-10-21 2006-10-23 Slitesterkt hardt belegg inneholdende silikonnitrid NO20064799L (no)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102005050593A DE102005050593A1 (de) 2005-10-21 2005-10-21 Dauerhafte siliciumnitridhaltige Hartbeschichtung

Publications (1)

Publication Number Publication Date
NO20064799L true NO20064799L (no) 2007-04-23

Family

ID=37460213

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20064799A NO20064799L (no) 2005-10-21 2006-10-23 Slitesterkt hardt belegg inneholdende silikonnitrid

Country Status (8)

Country Link
US (1) US8012252B2 (zh)
EP (1) EP1780307B1 (zh)
JP (1) JP5209195B2 (zh)
KR (1) KR100800053B1 (zh)
CN (1) CN1955228A (zh)
DE (1) DE102005050593A1 (zh)
NO (1) NO20064799L (zh)
TW (1) TWI367240B (zh)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080233403A1 (en) * 2007-02-07 2008-09-25 Timothy Dyer Method of Making Ceramic Reactor Components and Ceramic Reactor Component Made Therefrom
PL1985594T3 (pl) * 2007-04-25 2012-03-30 3M Innovative Properties Co Kształtowy korpus z trwałą, twardą powłoką z azotku krzemu, sposób jego wytwarzania i jego zastosowanie
DE102007029668A1 (de) 2007-06-27 2009-01-08 Epg (Engineered Nanoproducts Germany) Ag Ultraharte Kompositschichten auf Metalloberflächen und Verfahren zu ihrer Herstellung
WO2009012455A1 (en) 2007-07-18 2009-01-22 Oxane Materials, Inc. Proppants with carbide and/or nitride phases
DE102007053284A1 (de) 2007-11-08 2009-05-20 Esk Ceramics Gmbh & Co. Kg Fest haftende siliciumnitridhaltige Trennschicht
DE102008031766A1 (de) 2008-07-04 2009-10-15 Schott Ag Verfahren zur Herstellung eines beschichteten Tiegels aus einem Tiegelgrünkörper oder aus einem zwischengebrannten Tiegelkörper sowie die Verwendung solch eines beschichteten Tiegels
US8859034B2 (en) * 2009-01-28 2014-10-14 Kyocera Corporation Ingot mold for silicon ingot and method for making the same
DE102009023402A1 (de) 2009-05-29 2010-12-02 Esk Ceramics Gmbh & Co. Kg Suspension zur Herstellung einer reibwerterhöhenden Schicht, Formkörper mit einer solchen reibwerterhöhenden Schicht, Verfahren zu dessen Herstellung und dessen Verwendung
EP2543751A3 (en) * 2009-07-16 2013-06-26 MEMC Singapore Pte. Ltd. Coated crucibles and methods for preparing and use thereof
US8445066B2 (en) 2009-12-18 2013-05-21 3M Innovative Properties Company Systems and methods for making monolithic gel bodies
CN101844935A (zh) * 2010-05-31 2010-09-29 江西赛维Ldk太阳能高科技有限公司 一种多晶硅或单晶硅用坩埚涂层及其制备方法
KR101990939B1 (ko) * 2011-02-28 2019-06-19 가부시끼가이샤 다나자와 핫꼬오샤 성형용 금형 및 그 제조 방법, 및 광택도를 합치시키는 방법
DE102011078066A1 (de) 2011-06-24 2012-12-27 Oskar Frech Gmbh + Co. Kg Gießtechnisches Bauteil und Verfahren zum Aufbringen einer Korrosionsschutzschicht
EP2751302B1 (de) * 2011-08-31 2017-05-31 3M Innovative Properties Company Siliziumnitridhaltige trennschicht hoher härte
US8747538B2 (en) 2011-09-20 2014-06-10 Chung-Hou Tony Hsiao Photovoltaic ingot mold release
CN102367572B (zh) * 2011-09-21 2014-01-01 安阳市凤凰光伏科技有限公司 多晶硅铸锭坩埚喷涂免烧结方法
WO2013070642A1 (en) * 2011-11-07 2013-05-16 Graftech International Holdings Inc. Graphite crucible for silicon crystal production and method of ingot removal
CN103506263B (zh) * 2011-12-30 2015-07-29 英利能源（中国）有限公司 多晶硅坩埚喷涂免烘干的方法及氮化硅涂层
CN103774215B (zh) * 2012-10-26 2016-11-02 阿特斯(中国)投资有限公司 硅铸锭用坩埚及其涂层制备方法
US20140158457A1 (en) * 2012-12-12 2014-06-12 GM Global Technology Operations LLC Coulomb frictional damping coated product
DE102013206993B4 (de) 2013-04-18 2014-12-04 Morgan Advanced Materials Haldenwanger GmbH Verfahren zur Beschichtung von Formkörpern aus Quarzgut
CN103320854B (zh) * 2013-06-07 2016-03-02 英利集团有限公司 坩埚用涂层结构、其制备方法及包括其的坩埚
US9957431B2 (en) * 2013-11-11 2018-05-01 Heraeus Quarzglas Gmbh & Co. Kg Composite material, heat-absorbing component, and method for producing the composite material
JP6119565B2 (ja) * 2013-11-11 2017-04-26 信越半導体株式会社 単結晶製造方法
TWI663126B (zh) * 2014-07-09 2019-06-21 法商維蘇威法國公司 包含可磨塗層之輥、其製造方法及其用途
CN104058771A (zh) * 2014-07-18 2014-09-24 徐梅子 一种预热器用耐火浇注料
FR3026414B1 (fr) * 2014-09-26 2019-04-12 Commissariat A L'energie Atomique Et Aux Energies Alternatives Creuset pour la cristallisation de silicium multi-cristallin ou quasi-monocristallin par reprise sur germe
US10280770B2 (en) 2014-10-09 2019-05-07 Rolls-Royce Corporation Coating system including oxide nanoparticles in oxide matrix
US10047614B2 (en) 2014-10-09 2018-08-14 Rolls-Royce Corporation Coating system including alternating layers of amorphous silica and amorphous silicon nitride
CN104801662A (zh) * 2015-05-12 2015-07-29 芜湖市容川机电科技有限公司 一种石墨粉铸造涂料
WO2017025388A1 (en) 2015-08-07 2017-02-16 Vesuvius France Sa Refractory article resistant to non-ferrous metal and production process thereof
CN105983649A (zh) * 2016-01-11 2016-10-05 明光市留香泵业有限公司 一种含陶瓷微粉增强的低残炭高透气消失模铸造用水基涂料及其制备方法
CN106116700A (zh) * 2016-06-30 2016-11-16 山东工业陶瓷研究设计院有限公司 氮化物陶瓷高温耐磨涂层及其制备方法
CN106348788B (zh) * 2016-08-19 2019-11-26 西安华晶电子技术股份有限公司 多晶硅铸锭坩埚底部氮化硼涂层材料及其涂覆方法
CN108275987B (zh) * 2018-02-27 2020-05-19 重庆长江造型材料（集团）股份有限公司 一种表面改性石英砂及其制备方法
CN110803943B (zh) * 2019-11-30 2022-03-08 中材江苏太阳能新材料有限公司 一种低杂质的铸造多晶和铸锭单晶用免喷坩埚及其制备方法
CN112979294B (zh) * 2021-03-17 2022-05-06 中南大学 一种废旧匣钵修复涂料及其使用方法
CN115007796B (zh) * 2022-05-30 2024-07-02 中信戴卡股份有限公司 一种铸造铝合金用升液管涂料及其使用方法

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4028096A (en) * 1976-05-13 1977-06-07 The United States Of America As Represented By The United States Energy Research And Development Administration Method of melting metals to reduce contamination from crucibles
US4548381A (en) * 1984-09-05 1985-10-22 Solarex Corporation Castable receiver
US4921731A (en) * 1986-02-25 1990-05-01 University Of Florida Deposition of ceramic coatings using sol-gel processing with application of a thermal gradient
JP3066812B2 (ja) * 1991-10-09 2000-07-17 黒崎播磨株式会社 ２層以上のコーティングを有する低融点金属の鋳造用器具
US5431869A (en) * 1993-01-12 1995-07-11 Council Of Scientific & Industrial Research Process for the preparation of polycrystalline silicon ingot
JPH0769744A (ja) * 1993-06-28 1995-03-14 Hitachi Metals Ltd 耐火性被覆材およびアルミニウム溶湯用部材
EP0963464B1 (de) * 1997-02-06 2001-07-18 Deutsche Solar GmbH Mit siliciumschutzschichten versehene schmelztiegel, ein verfahren zum aufbringen der siliciumschutzschicht und deren verwendung
DE19711550C2 (de) * 1997-03-20 2000-06-21 Bayer Ag Verfahren zur Herstellung von im wesentlichen Randzonen-freien Formteilen aus multikristallinem Silicium und die Verwendung dieser Formteile
EP0949358B1 (en) * 1998-02-26 2003-11-12 Mitsubishi Materials Corporation Mold for producing silicon ingot and method for fabricating the same
DE59905850D1 (de) * 1998-05-05 2003-07-10 Didier Werke Ag Keramischer verbundkörper
JP2001080967A (ja) 1999-09-06 2001-03-27 Sumitomo Electric Ind Ltd Ｓｉ３Ｎ４セラミックスとその製造用Ｓｉ基組成物及びこれらの製造方法
EP1138732B1 (en) * 2000-03-31 2005-08-31 JSR Corporation Coating composition and cured product
US6491971B2 (en) * 2000-11-15 2002-12-10 G.T. Equipment Technologies, Inc Release coating system for crucibles
WO2002040732A1 (en) * 2000-11-15 2002-05-23 G.T. Equipment Technologies Inc. A protective layer for quartz crucibles used for silicon crystallization
DE10200648A1 (de) * 2002-01-10 2003-07-24 Inst Neue Mat Gemein Gmbh Verfahren zur Herstellung Optischer Elemente mit Gradientenstruktur
DE10217151A1 (de) * 2002-04-17 2003-10-30 Clariant Gmbh Nanoimprint-Resist
IL166447A0 (en) * 2002-07-24 2006-01-15 Excera Materials Group Inc Improved ceramic/metal material and method for making same
US20040102308A1 (en) * 2002-11-06 2004-05-27 Simpson Robert E. Crucible material and crucible
UA81278C2 (en) * 2002-12-06 2007-12-25 Vessel for holding a silicon and method for its making
KR100505003B1 (ko) * 2002-12-27 2005-08-01 김광호 티아이 에이엘 에스아이 엔계 경질코팅막의 증착방법
DE10304849A1 (de) * 2003-02-06 2004-08-19 Institut für Neue Materialien gemeinnützige Gesellschaft mit beschränkter Haftung Chemomechanische Herstellung von Funktionskolloiden
US20040211496A1 (en) * 2003-04-25 2004-10-28 Crystal Systems, Inc. Reusable crucible for silicon ingot growth
DE10326815A1 (de) * 2003-06-13 2004-12-30 Institut für Neue Materialien Gemeinnützige GmbH Antiadhäsive Hochtemperaturschichten
DE10326769B3 (de) * 2003-06-13 2004-11-11 Esk Ceramics Gmbh & Co. Kg Dauerhafte BN-Formtrennschichten für das Druckgießen von Nichteisenmetallen
JP4497943B2 (ja) * 2004-01-29 2010-07-07 京セラ株式会社 シリコン鋳造用鋳型とそれを用いたシリコン鋳造装置
UA87842C2 (uk) * 2004-04-29 2009-08-25 Везувіус Крусібл Компані Кристалізатор для кристалізації кремнію та спосіб його виготовлення
TWI400369B (zh) * 2005-10-06 2013-07-01 Vesuvius Crucible Co 用於矽結晶的坩堝及其製造方法
DE102006013746A1 (de) 2006-03-24 2007-09-27 Esk Ceramics Gmbh & Co. Kg Gesinterter verschleißbeständiger Werkstoff, sinterfähige Pulvermischung, Verfahren zur Herstellung des Werkstoffs und dessen Verwendung
DE102006013729A1 (de) 2006-03-24 2007-10-04 Esk Ceramics Gmbh & Co. Kg Gesinterter Werkstoff, sinterfähige Pulvermischung, Verfahren zur Herstellung des Werkstoffs und dessen Verwendung
DE102006041047A1 (de) 2006-09-01 2008-03-20 Esk Ceramics Gmbh & Co. Kg Schlichte zur Herstellung einer BN-haltigen Beschichtung, Verfahren zu deren Herstellung, beschichteter Körper, dessen Herstellung und dessen Verwendung
DE102007053284A1 (de) 2007-11-08 2009-05-20 Esk Ceramics Gmbh & Co. Kg Fest haftende siliciumnitridhaltige Trennschicht

Also Published As

Publication number Publication date
DE102005050593A1 (de) 2007-04-26
JP5209195B2 (ja) 2013-06-12
JP2007146132A (ja) 2007-06-14
TW200716717A (en) 2007-05-01
KR100800053B1 (ko) 2008-01-31
CN1955228A (zh) 2007-05-02
US8012252B2 (en) 2011-09-06
US20070089642A1 (en) 2007-04-26
EP1780307A3 (de) 2008-12-03
KR20070043681A (ko) 2007-04-25
EP1780307B1 (de) 2015-01-14
TWI367240B (en) 2012-07-01
EP1780307A2 (de) 2007-05-02

Similar Documents

Publication Publication Date Title
NO20064799L (no) Slitesterkt hardt belegg inneholdende silikonnitrid
WO2006073435A3 (en) Multi-layered superhard nanocomposite coatings
WO2007149545A3 (en) Metal binary and ternary compounds produced by cathodic arc deposition
MY144460A (en) Polishing composition for glass substrate
ATE531830T1 (de) Gleitlagerverbundwerkstoff, verwendung und herstellungsverfahren
ATE537129T1 (de) Max-phase-pulver und herstellungsverfahren dafür
MX2009002530A (es) Complejos de polielectrolitos para aplicaciones de petroleo y de gas.
MY158808A (en) Firmly adhering silicon nitride-containing release layer
TW200617197A (en) Deposition of ruthenium and/or ruthenium oxide films
EP2052407A4 (en) METHOD AND DEVICES FOR FORMING NANOSTRUCTURE MONOSLAYS AND EQUIPMENT WITH SUCH MONOSLAYS
ATE541955T1 (de) Rohmaterialzusammensetzung für thermisches spritzen
WO2005078026A8 (en) Anticorrosion coating composition in aqueous dispersion comprising an organic titanate and/or zirconate
SG137838A1 (en) Erosion barrier for thermal barrier coatings
WO2009115192A3 (en) Ni-p layer system and process for its preparation
ATE483766T1 (de) Druckverfahren zur herstellung teilchenförmiger produkte
DE602007009043D1 (de) M und verfahren zu seiner herstellung
ATE539180T1 (de) Sioc:h-beschichtete substrate und herstellungsverfahren dafür
TW200720327A (en) Composition for chemical vapor deposition film-formation and method for production of low dielectric constant film
ATE523572T1 (de) Fluorchemische urethanverbindungen und damit hergestellte wässrige zusammensetzung
TW200730652A (en) Silicon body formation method and device thereof
JP2017042903A5 (ja) 表面被覆切削工具の製造方法
TW200632950A (en) Method to form a thin film resistor
TW200728357A (en) Polycarbosilane, manufacture method of the same, silicon dioxide based composition for coatings and silicon dioxide film
ZA200800674B (en) Firing support for ceramics and method for obtaining same
TW200617198A (en) Copper(Ⅱ) complexes for deposition of copper films by atomic layer deposition

Legal Events

Date Code Title Description
FC2A Withdrawal, rejection or dismissal of laid open patent application