NL9100997A - Projectiebelichtingsinrichting. - Google Patents
Projectiebelichtingsinrichting. Download PDFInfo
- Publication number
- NL9100997A NL9100997A NL9100997A NL9100997A NL9100997A NL 9100997 A NL9100997 A NL 9100997A NL 9100997 A NL9100997 A NL 9100997A NL 9100997 A NL9100997 A NL 9100997A NL 9100997 A NL9100997 A NL 9100997A
- Authority
- NL
- Netherlands
- Prior art keywords
- exposure
- holding
- light
- optical axis
- mask
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70975—Assembly, maintenance, transport or storage of apparatus
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15090190 | 1990-06-08 | ||
JP15090190 | 1990-06-08 | ||
JP2283620A JPH04157468A (ja) | 1990-10-22 | 1990-10-22 | 投影露光装置 |
JP28362090 | 1990-10-22 | ||
JP12600691 | 1991-05-29 | ||
JP3126006A JPH04226463A (ja) | 1990-06-08 | 1991-05-29 | 投影露光装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL9100997A true NL9100997A (nl) | 1992-01-02 |
Family
ID=27315242
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL9100997A NL9100997A (nl) | 1990-06-08 | 1991-06-10 | Projectiebelichtingsinrichting. |
Country Status (3)
Country | Link |
---|---|
US (1) | US5204711A (fr) |
FR (1) | FR2663130B1 (fr) |
NL (1) | NL9100997A (fr) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5298939A (en) * | 1991-11-04 | 1994-03-29 | Swanson Paul A | Method and apparatus for transfer of a reticle pattern onto a substrate by scanning |
US5774203A (en) * | 1994-09-13 | 1998-06-30 | Diehl; John G. | Self-contained film exposing/developing machine |
JP3506158B2 (ja) * | 1995-04-14 | 2004-03-15 | 株式会社ニコン | 露光装置及び走査型露光装置、並びに走査露光方法 |
WO1997029403A1 (fr) * | 1996-02-08 | 1997-08-14 | Megapanel Corporation | Procede et appareil permettant de transferer un diagramme reticule par balayage optique sur un substrat d'une grande surface |
US5883703A (en) * | 1996-02-08 | 1999-03-16 | Megapanel Corporation | Methods and apparatus for detecting and compensating for focus errors in a photolithography tool |
US20030179354A1 (en) * | 1996-03-22 | 2003-09-25 | Nikon Corporation | Mask-holding apparatus for a light exposure apparatus and related scanning-exposure method |
JP3283767B2 (ja) * | 1996-10-02 | 2002-05-20 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
JPH10229044A (ja) * | 1996-12-13 | 1998-08-25 | Nikon Corp | 露光装置および該露光装置を用いた半導体デバイスの製造方法 |
KR100339186B1 (ko) * | 1998-09-28 | 2002-05-31 | 포만 제프리 엘 | 기판상에서 패턴을 규정하는 장치 및 방법 |
KR20010089453A (ko) * | 1998-11-18 | 2001-10-06 | 시마무라 테루오 | 노광방법 및 장치 |
JP3376961B2 (ja) * | 1999-06-08 | 2003-02-17 | ウシオ電機株式会社 | マスクを移動させて位置合わせを行う露光装置 |
CN2446537Y (zh) * | 2000-10-18 | 2001-09-05 | 福建华科光电有限公司 | 一种光纤准直器结构 |
JP2002289515A (ja) * | 2000-12-28 | 2002-10-04 | Nikon Corp | 製品の製造方法、露光装置の製造方法、露光装置、及びデバイス製造方法 |
JPWO2002103766A1 (ja) * | 2001-06-13 | 2004-10-07 | 株式会社ニコン | 走査露光方法及び走査型露光装置、並びにデバイス製造方法 |
TW579640B (en) * | 2002-10-23 | 2004-03-11 | Veutron Corp | Light gathering device of scanner |
US6834930B2 (en) * | 2003-04-02 | 2004-12-28 | Hewlett-Packard Development Company, L.P. | Imaging device including an optical sensor |
JP2004354909A (ja) * | 2003-05-30 | 2004-12-16 | Orc Mfg Co Ltd | 投影露光装置および投影露光方法 |
JP2005024820A (ja) * | 2003-07-01 | 2005-01-27 | Konica Minolta Business Technologies Inc | 原稿読取装置及び画像形成装置 |
US9052615B2 (en) * | 2008-08-29 | 2015-06-09 | Gigaphoton Inc. | Extreme ultraviolet light source apparatus |
JP5474522B2 (ja) * | 2009-01-14 | 2014-04-16 | ギガフォトン株式会社 | 極端紫外光源システム |
CN102629078A (zh) * | 2011-08-18 | 2012-08-08 | 京东方科技集团股份有限公司 | 曝光工艺及装置 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3383982A (en) * | 1965-04-22 | 1968-05-21 | Moss Mortimer | Photoelectric followup system |
FR1516152A (fr) * | 1967-01-25 | 1968-03-08 | Thomson Houston Comp Francaise | Perfectionnements aux bancs photographiques répétiteurs |
US3497705A (en) * | 1968-02-12 | 1970-02-24 | Itek Corp | Mask alignment system using radial patterns and flying spot scanning |
FR2178268A5 (fr) * | 1972-02-24 | 1973-11-09 | Ofser | |
US4189230A (en) * | 1977-10-26 | 1980-02-19 | Fujitsu Limited | Wafer holder with spring-loaded wafer-holding means |
DE2905636C2 (de) * | 1979-02-14 | 1985-06-20 | Censor Patent- Und Versuchs-Anstalt, Vaduz | Verfahren zum Kopieren von Masken auf ein Werkstück |
JPS57158633A (en) * | 1981-03-25 | 1982-09-30 | Dainippon Screen Mfg Co Ltd | Holder of photosensitive material for longitudinal printer |
US4662754A (en) * | 1985-12-20 | 1987-05-05 | The Perkin-Elmer Corporation | Method for facilitating the alignment of a photomask with individual fields on the surfaces of a number of wafers |
JPS62152293A (ja) * | 1985-12-26 | 1987-07-07 | Matsushita Electric Ind Co Ltd | 切り換え信号発生回路 |
JPS62158824A (ja) * | 1985-12-29 | 1987-07-14 | Kobe Steel Ltd | 圧延機用ロ−ルの熱処理法 |
JPS63155637A (ja) * | 1986-12-18 | 1988-06-28 | Nitto Electric Ind Co Ltd | 半導体ウエハの自動貼付け装置 |
JPH0648710B2 (ja) * | 1987-08-03 | 1994-06-22 | 株式会社日立製作所 | 樹脂封止型半導体装置 |
JPS6454335A (en) * | 1987-08-26 | 1989-03-01 | Shimadzu Corp | Concentration signal detector for flameless atomic absorption photometry |
JPH0197288A (ja) * | 1987-10-06 | 1989-04-14 | Sanko Giken Kk | 古紙と結束紐との分別装置 |
AU586803B3 (en) * | 1987-10-06 | 1989-07-03 | Briner Ads Pty. Ltd. | Method and apparatus for printing advertising information onto signboards |
JP2699433B2 (ja) * | 1988-08-12 | 1998-01-19 | 株式会社ニコン | 投影型露光装置及び投影露光方法 |
US4924257A (en) * | 1988-10-05 | 1990-05-08 | Kantilal Jain | Scan and repeat high resolution projection lithography system |
DE8913147U1 (de) * | 1989-11-07 | 1990-02-01 | Hans Sixt GmbH, 6909 Walldorf | Beleuchtungseinrichtung für Umbruchkameras zur Direktbeleuchtung von Druckplatten unter Verwendung von Durchsichtsvorlagen |
-
1991
- 1991-06-07 FR FR9106965A patent/FR2663130B1/fr not_active Expired - Fee Related
- 1991-06-07 US US07/712,100 patent/US5204711A/en not_active Expired - Fee Related
- 1991-06-10 NL NL9100997A patent/NL9100997A/nl not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
FR2663130A1 (fr) | 1991-12-13 |
FR2663130B1 (fr) | 1994-12-09 |
US5204711A (en) | 1993-04-20 |
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