NL9100997A - Projectiebelichtingsinrichting. - Google Patents

Projectiebelichtingsinrichting. Download PDF

Info

Publication number
NL9100997A
NL9100997A NL9100997A NL9100997A NL9100997A NL 9100997 A NL9100997 A NL 9100997A NL 9100997 A NL9100997 A NL 9100997A NL 9100997 A NL9100997 A NL 9100997A NL 9100997 A NL9100997 A NL 9100997A
Authority
NL
Netherlands
Prior art keywords
exposure
holding
light
optical axis
mask
Prior art date
Application number
NL9100997A
Other languages
English (en)
Dutch (nl)
Original Assignee
Nippon Seiko Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2283620A external-priority patent/JPH04157468A/ja
Priority claimed from JP3126006A external-priority patent/JPH04226463A/ja
Application filed by Nippon Seiko Kk filed Critical Nippon Seiko Kk
Publication of NL9100997A publication Critical patent/NL9100997A/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
NL9100997A 1990-06-08 1991-06-10 Projectiebelichtingsinrichting. NL9100997A (nl)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP15090190 1990-06-08
JP15090190 1990-06-08
JP2283620A JPH04157468A (ja) 1990-10-22 1990-10-22 投影露光装置
JP28362090 1990-10-22
JP3126006A JPH04226463A (ja) 1990-06-08 1991-05-29 投影露光装置
JP12600691 1991-05-29

Publications (1)

Publication Number Publication Date
NL9100997A true NL9100997A (nl) 1992-01-02

Family

ID=27315242

Family Applications (1)

Application Number Title Priority Date Filing Date
NL9100997A NL9100997A (nl) 1990-06-08 1991-06-10 Projectiebelichtingsinrichting.

Country Status (3)

Country Link
US (1) US5204711A (fr)
FR (1) FR2663130B1 (fr)
NL (1) NL9100997A (fr)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5298939A (en) * 1991-11-04 1994-03-29 Swanson Paul A Method and apparatus for transfer of a reticle pattern onto a substrate by scanning
US5774203A (en) * 1994-09-13 1998-06-30 Diehl; John G. Self-contained film exposing/developing machine
JP3506158B2 (ja) * 1995-04-14 2004-03-15 株式会社ニコン 露光装置及び走査型露光装置、並びに走査露光方法
US5883703A (en) * 1996-02-08 1999-03-16 Megapanel Corporation Methods and apparatus for detecting and compensating for focus errors in a photolithography tool
WO1997029403A1 (fr) * 1996-02-08 1997-08-14 Megapanel Corporation Procede et appareil permettant de transferer un diagramme reticule par balayage optique sur un substrat d'une grande surface
US20030179354A1 (en) * 1996-03-22 2003-09-25 Nikon Corporation Mask-holding apparatus for a light exposure apparatus and related scanning-exposure method
JP3283767B2 (ja) * 1996-10-02 2002-05-20 キヤノン株式会社 露光装置およびデバイス製造方法
JPH10229044A (ja) * 1996-12-13 1998-08-25 Nikon Corp 露光装置および該露光装置を用いた半導体デバイスの製造方法
KR100339186B1 (ko) * 1998-09-28 2002-05-31 포만 제프리 엘 기판상에서 패턴을 규정하는 장치 및 방법
CN1309017C (zh) * 1998-11-18 2007-04-04 株式会社尼康 曝光方法和装置
JP3376961B2 (ja) * 1999-06-08 2003-02-17 ウシオ電機株式会社 マスクを移動させて位置合わせを行う露光装置
CN2446537Y (zh) * 2000-10-18 2001-09-05 福建华科光电有限公司 一种光纤准直器结构
JP2002289515A (ja) * 2000-12-28 2002-10-04 Nikon Corp 製品の製造方法、露光装置の製造方法、露光装置、及びデバイス製造方法
JPWO2002103766A1 (ja) * 2001-06-13 2004-10-07 株式会社ニコン 走査露光方法及び走査型露光装置、並びにデバイス製造方法
TW579640B (en) * 2002-10-23 2004-03-11 Veutron Corp Light gathering device of scanner
US6834930B2 (en) * 2003-04-02 2004-12-28 Hewlett-Packard Development Company, L.P. Imaging device including an optical sensor
JP2004354909A (ja) * 2003-05-30 2004-12-16 Orc Mfg Co Ltd 投影露光装置および投影露光方法
JP2005024820A (ja) * 2003-07-01 2005-01-27 Konica Minolta Business Technologies Inc 原稿読取装置及び画像形成装置
US9052615B2 (en) * 2008-08-29 2015-06-09 Gigaphoton Inc. Extreme ultraviolet light source apparatus
JP5474522B2 (ja) * 2009-01-14 2014-04-16 ギガフォトン株式会社 極端紫外光源システム
CN102629078A (zh) * 2011-08-18 2012-08-08 京东方科技集团股份有限公司 曝光工艺及装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3383982A (en) * 1965-04-22 1968-05-21 Moss Mortimer Photoelectric followup system
FR1516152A (fr) * 1967-01-25 1968-03-08 Thomson Houston Comp Francaise Perfectionnements aux bancs photographiques répétiteurs
US3497705A (en) * 1968-02-12 1970-02-24 Itek Corp Mask alignment system using radial patterns and flying spot scanning
FR2178268A5 (fr) * 1972-02-24 1973-11-09 Ofser
US4189230A (en) * 1977-10-26 1980-02-19 Fujitsu Limited Wafer holder with spring-loaded wafer-holding means
DE2905636C2 (de) * 1979-02-14 1985-06-20 Censor Patent- Und Versuchs-Anstalt, Vaduz Verfahren zum Kopieren von Masken auf ein Werkstück
JPS57158633A (en) * 1981-03-25 1982-09-30 Dainippon Screen Mfg Co Ltd Holder of photosensitive material for longitudinal printer
US4662754A (en) * 1985-12-20 1987-05-05 The Perkin-Elmer Corporation Method for facilitating the alignment of a photomask with individual fields on the surfaces of a number of wafers
JPS62152293A (ja) * 1985-12-26 1987-07-07 Matsushita Electric Ind Co Ltd 切り換え信号発生回路
JPS62158824A (ja) * 1985-12-29 1987-07-14 Kobe Steel Ltd 圧延機用ロ−ルの熱処理法
JPS63155637A (ja) * 1986-12-18 1988-06-28 Nitto Electric Ind Co Ltd 半導体ウエハの自動貼付け装置
JPH0648710B2 (ja) * 1987-08-03 1994-06-22 株式会社日立製作所 樹脂封止型半導体装置
JPS6454335A (en) * 1987-08-26 1989-03-01 Shimadzu Corp Concentration signal detector for flameless atomic absorption photometry
JPH0197288A (ja) * 1987-10-06 1989-04-14 Sanko Giken Kk 古紙と結束紐との分別装置
AU586803B3 (en) * 1987-10-06 1989-07-03 Briner Ads Pty. Ltd. Method and apparatus for printing advertising information onto signboards
JP2699433B2 (ja) * 1988-08-12 1998-01-19 株式会社ニコン 投影型露光装置及び投影露光方法
US4924257A (en) * 1988-10-05 1990-05-08 Kantilal Jain Scan and repeat high resolution projection lithography system
DE8913147U1 (fr) * 1989-11-07 1990-02-01 Hans Sixt Gmbh, 6909 Walldorf, De

Also Published As

Publication number Publication date
FR2663130B1 (fr) 1994-12-09
US5204711A (en) 1993-04-20
FR2663130A1 (fr) 1991-12-13

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