NL9100407A - Optisch lithografische inrichting met een krachtgecompenseerd machinegestel. - Google Patents

Optisch lithografische inrichting met een krachtgecompenseerd machinegestel. Download PDF

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Publication number
NL9100407A
NL9100407A NL9100407A NL9100407A NL9100407A NL 9100407 A NL9100407 A NL 9100407A NL 9100407 A NL9100407 A NL 9100407A NL 9100407 A NL9100407 A NL 9100407A NL 9100407 A NL9100407 A NL 9100407A
Authority
NL
Netherlands
Prior art keywords
force
machine frame
optical lithographic
optical
magnitude
Prior art date
Application number
NL9100407A
Other languages
English (en)
Dutch (nl)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Priority to NL9100407A priority Critical patent/NL9100407A/nl
Priority to US07/784,286 priority patent/US5172160A/en
Priority to DE69221915T priority patent/DE69221915T2/de
Priority to EP92200576A priority patent/EP0502578B1/en
Priority to JP08168792A priority patent/JP3524107B2/ja
Priority to KR1019920003523A priority patent/KR100249379B1/ko
Publication of NL9100407A publication Critical patent/NL9100407A/nl
Priority to JP2001383399A priority patent/JP3491204B2/ja
Priority to JP2003427623A priority patent/JP3889395B2/ja

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Linear Motors (AREA)
  • Vibration Prevention Devices (AREA)
  • Transmission Devices (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
NL9100407A 1991-03-07 1991-03-07 Optisch lithografische inrichting met een krachtgecompenseerd machinegestel. NL9100407A (nl)

Priority Applications (8)

Application Number Priority Date Filing Date Title
NL9100407A NL9100407A (nl) 1991-03-07 1991-03-07 Optisch lithografische inrichting met een krachtgecompenseerd machinegestel.
US07/784,286 US5172160A (en) 1991-03-07 1991-10-29 Optical lithographic device having a machine frame with force compensation
DE69221915T DE69221915T2 (de) 1991-03-07 1992-02-28 Opto-lithographische Vorrichtung mit kraftkompensiertem Maschinengestell
EP92200576A EP0502578B1 (en) 1991-03-07 1992-02-28 Optical lithographic device having a machine frame with force compensation
JP08168792A JP3524107B2 (ja) 1991-03-07 1992-03-03 力が補償されるマシンフレームを有する光リソグラフ装置
KR1019920003523A KR100249379B1 (ko) 1991-03-07 1992-03-04 광 석판 장치
JP2001383399A JP3491204B2 (ja) 1991-03-07 2001-12-17 力が補償されるマシンフレームを有する光リソグラフ装置
JP2003427623A JP3889395B2 (ja) 1991-03-07 2003-12-24 力が補償されるマシンフレームを有する光リソグラフ装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL9100407 1991-03-07
NL9100407A NL9100407A (nl) 1991-03-07 1991-03-07 Optisch lithografische inrichting met een krachtgecompenseerd machinegestel.

Publications (1)

Publication Number Publication Date
NL9100407A true NL9100407A (nl) 1992-10-01

Family

ID=19858984

Family Applications (1)

Application Number Title Priority Date Filing Date
NL9100407A NL9100407A (nl) 1991-03-07 1991-03-07 Optisch lithografische inrichting met een krachtgecompenseerd machinegestel.

Country Status (6)

Country Link
US (1) US5172160A (ko)
EP (1) EP0502578B1 (ko)
JP (3) JP3524107B2 (ko)
KR (1) KR100249379B1 (ko)
DE (1) DE69221915T2 (ko)
NL (1) NL9100407A (ko)

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Also Published As

Publication number Publication date
JP2002319535A (ja) 2002-10-31
JPH05121294A (ja) 1993-05-18
JP3889395B2 (ja) 2007-03-07
JP2004140401A (ja) 2004-05-13
EP0502578B1 (en) 1997-09-03
JP3524107B2 (ja) 2004-05-10
KR100249379B1 (ko) 2000-06-01
JP3491204B2 (ja) 2004-01-26
KR920018868A (ko) 1992-10-22
DE69221915T2 (de) 1998-03-05
US5172160A (en) 1992-12-15
DE69221915D1 (de) 1997-10-09
EP0502578A1 (en) 1992-09-09

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