NL1007599A1 - Nieuw amide- of imide-bevattend copolymeer, de bereiding daarvan en een fotoresist die het omvat. - Google Patents
Nieuw amide- of imide-bevattend copolymeer, de bereiding daarvan en een fotoresist die het omvat.Info
- Publication number
- NL1007599A1 NL1007599A1 NL1007599A NL1007599A NL1007599A1 NL 1007599 A1 NL1007599 A1 NL 1007599A1 NL 1007599 A NL1007599 A NL 1007599A NL 1007599 A NL1007599 A NL 1007599A NL 1007599 A1 NL1007599 A1 NL 1007599A1
- Authority
- NL
- Netherlands
- Prior art keywords
- imide
- photoresist
- preparation
- containing copolymer
- novel amide
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
- C08F232/08—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
- C08F232/02—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having no condensed rings
- C08F232/04—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having no condensed rings having one carbon-to-carbon double bond
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960080265A KR100220953B1 (ko) | 1996-12-31 | 1996-12-31 | 아미드 또는 이미드를 도입한 ArF 감광막 수지 |
KR19960080265 | 1996-12-31 |
Publications (2)
Publication Number | Publication Date |
---|---|
NL1007599A1 true NL1007599A1 (nl) | 1998-07-01 |
NL1007599C2 NL1007599C2 (nl) | 1998-11-17 |
Family
ID=19493516
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL1007599A NL1007599C2 (nl) | 1996-12-31 | 1997-11-21 | Nieuw amide- of imide-bevattend copolymeer, de bereiding daarvan en een fotoresist die het omvat. |
Country Status (9)
Country | Link |
---|---|
US (1) | US6316565B1 (nl) |
JP (1) | JP3107770B2 (nl) |
KR (1) | KR100220953B1 (nl) |
CN (1) | CN1088070C (nl) |
DE (1) | DE19753276B4 (nl) |
FR (1) | FR2757867B1 (nl) |
GB (1) | GB2320717B (nl) |
NL (1) | NL1007599C2 (nl) |
TW (1) | TW460750B (nl) |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100265597B1 (ko) * | 1996-12-30 | 2000-09-15 | 김영환 | Arf 감광막 수지 및 그 제조방법 |
US6808859B1 (en) * | 1996-12-31 | 2004-10-26 | Hyundai Electronics Industries Co., Ltd. | ArF photoresist copolymers |
KR100225956B1 (ko) * | 1997-01-10 | 1999-10-15 | 김영환 | 아민을 도입한 에이알에프 감광막 수지 |
KR100321080B1 (ko) | 1997-12-29 | 2002-11-22 | 주식회사 하이닉스반도체 | 공중합체수지와이의제조방법및이수지를이용한포토레지스트 |
KR100520148B1 (ko) * | 1997-12-31 | 2006-05-12 | 주식회사 하이닉스반도체 | 신규한바이시클로알켄유도체와이를이용한포토레지스트중합체및이중합체를함유한포토레지스트조성물 |
KR19990081722A (ko) | 1998-04-30 | 1999-11-15 | 김영환 | 카르복실기 함유 지환족 유도체 및 그의 제조방법 |
KR100376984B1 (ko) * | 1998-04-30 | 2003-07-16 | 주식회사 하이닉스반도체 | 포토레지스트중합체및이를이용한미세패턴의형성방법 |
KR100376983B1 (ko) * | 1998-04-30 | 2003-08-02 | 주식회사 하이닉스반도체 | 포토레지스트중합체및이를이용한미세패턴의형성방법 |
KR100403325B1 (ko) | 1998-07-27 | 2004-03-24 | 주식회사 하이닉스반도체 | 포토레지스트중합체및이를이용한포토레지스트조성물 |
KR20000015014A (ko) | 1998-08-26 | 2000-03-15 | 김영환 | 신규의 포토레지스트용 단량체, 중합체 및 이를 이용한 포토레지스트 조성물 |
JP3587743B2 (ja) | 1998-08-26 | 2004-11-10 | 株式会社ハイニックスセミコンダクター | フォトレジスト単量体とその製造方法、フォトレジスト共重合体とその製造方法、フォトレジスト組成物、フォトレジストパターン形成方法、および、半導体素子。 |
US6569971B2 (en) | 1998-08-27 | 2003-05-27 | Hyundai Electronics Industries Co., Ltd. | Polymers for photoresist and photoresist compositions using the same |
KR100400293B1 (ko) * | 1998-11-27 | 2004-03-22 | 주식회사 하이닉스반도체 | 포토레지스트단량체,그의중합체및이를이용한포토레지스트조성물 |
KR20000056355A (ko) * | 1999-02-19 | 2000-09-15 | 김영환 | 고농도의 아민 존재하에서 우수한 특성을 갖는 포토레지스트 조성물 |
KR100445920B1 (ko) * | 1999-03-11 | 2004-08-25 | 인터내셔널 비지네스 머신즈 코포레이션 | 환형 올레핀 중합체 및 첨가제를 갖는 포토레지스트 조성물 |
KR100647379B1 (ko) * | 1999-07-30 | 2006-11-17 | 주식회사 하이닉스반도체 | 신규의 포토레지스트용 단량체, 그의 공중합체 및 이를 이용한포토레지스트 조성물 |
KR100647380B1 (ko) * | 1999-07-30 | 2006-11-17 | 주식회사 하이닉스반도체 | 신규의 포토레지스트용 단량체, 그의 공중합체 및 이를 이용한포토레지스트 조성물 |
KR100504290B1 (ko) * | 2001-01-12 | 2005-07-27 | 삼성전자주식회사 | 포토레지스트용 옥소옥사알카노노르보넨 함유 공중합체 및그를 포함하는 포토레지스트 조성물 |
US6849376B2 (en) * | 2001-02-25 | 2005-02-01 | Shipley Company, L.L.C. | Polymers and photoresist compositions comprising same |
US6858371B2 (en) * | 2001-04-13 | 2005-02-22 | Hynix Semiconductor Inc. | Maleimide-photoresist monomers containing halogen, polymers thereof and photoresist compositions comprising the same |
KR100451643B1 (ko) * | 2001-04-21 | 2004-10-08 | 삼성전자주식회사 | 아세탈기를 포함하는 포토레지스트용 노르보넨 공중합체,그의 제조방법 및 그를 포함하는 포토레지스트 조성물 |
KR100557556B1 (ko) | 2001-10-25 | 2006-03-03 | 주식회사 하이닉스반도체 | 산 확산 방지용 포토레지스트 첨가제 및 이를 함유하는포토레지스트 조성물 |
JP2006096965A (ja) | 2004-02-20 | 2006-04-13 | Tokyo Ohka Kogyo Co Ltd | 高分子化合物、該高分子化合物を含有するフォトレジスト組成物、およびレジストパターン形成方法 |
US6969570B1 (en) * | 2004-10-26 | 2005-11-29 | Kodak Polychrome Graphics, Llc | Solvent resistant imageable element |
JP4724843B2 (ja) * | 2005-07-08 | 2011-07-13 | 東ソー株式会社 | マレイミド系重合体 |
KR100731327B1 (ko) | 2005-12-22 | 2007-06-25 | 주식회사 삼양이엠에스 | 음성 포토레지스트 조성물 |
US7928111B2 (en) | 2007-06-08 | 2011-04-19 | Senomyx, Inc. | Compounds including substituted thienopyrimidinone derivatives as ligands for modulating chemosensory receptors |
US9603848B2 (en) | 2007-06-08 | 2017-03-28 | Senomyx, Inc. | Modulation of chemosensory receptors and ligands associated therewith |
KR101577159B1 (ko) | 2008-07-31 | 2015-12-11 | 세노믹스, 인코포레이티드 | 단맛 향상제의 제조 방법 및 중간체 |
CA2879554A1 (en) | 2012-08-06 | 2014-02-13 | Senomyx, Inc. | Substituted 4-amino-1h-2,1,3-benzothiadiazine 2,2-dioxide compounds and their use as sweet flavor modifiers |
JO3155B1 (ar) | 2013-02-19 | 2017-09-20 | Senomyx Inc | معدِّل نكهة حلوة |
JP6558479B2 (ja) * | 2018-07-18 | 2019-08-14 | 住友ベークライト株式会社 | ポリマー、および感光性樹脂組成物 |
SG11202100846YA (en) | 2018-08-07 | 2021-02-25 | Firmenich Incorporated | 5-substituted 4-amino-1h-benzo[c][1,2,6]thiadiazine 2,2-dioxides and formulations and uses thereof |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE128164C (nl) | ||||
US3370047A (en) | 1964-09-03 | 1968-02-20 | Union Carbide Corp | Pour point depressants and lubricating compositions thereof |
JPS5818369B2 (ja) | 1973-09-05 | 1983-04-12 | ジェイエスアール株式会社 | ノルボルネンカルボンサンアミドオヨビ / マタハイミドルイノ ( キヨウ ) ジユウゴウタイノセイゾウホウホウ |
US4106943A (en) | 1973-09-27 | 1978-08-15 | Japan Synthetic Rubber Co., Ltd. | Photosensitive cross-linkable azide containing polymeric composition |
JPH0717740B2 (ja) * | 1986-10-01 | 1995-03-01 | 帝人株式会社 | 架橋重合体成型物の製造方法 |
US5212043A (en) * | 1988-02-17 | 1993-05-18 | Tosho Corporation | Photoresist composition comprising a non-aromatic resin having no aromatic structures derived from units of an aliphatic cyclic hydrocarbon and units of maleic anhydride and/or maleimide and a photosensitive agent |
JPH0791342B2 (ja) * | 1988-06-17 | 1995-10-04 | 三菱化学ビーエーエスエフ株式会社 | 共重合体水性分散体の製造法 |
EP0387193A1 (de) * | 1989-03-07 | 1990-09-12 | Ciba-Geigy Ag | Substituierte ungesättigte bireaktive bicyclische Imide und deren Verwendung |
US5278214A (en) | 1990-06-06 | 1994-01-11 | Mitsui Petrochemical Industries, Ltd. | Polyolefin resin composition |
JP3000745B2 (ja) | 1991-09-19 | 2000-01-17 | 富士通株式会社 | レジスト組成物とレジストパターンの形成方法 |
JPH05297591A (ja) | 1992-04-20 | 1993-11-12 | Fujitsu Ltd | ポジ型放射線レジストとレジストパターンの形成方法 |
JP2829462B2 (ja) * | 1992-09-16 | 1998-11-25 | ハウス食品株式会社 | ドウミキサー |
FR2699540B1 (fr) * | 1992-12-23 | 1995-02-24 | Atochem Elf Sa | Polymère thermoplastique transparent ayant une température de transition vitreuse élevée et une stabilité thermique améliorée. |
JP3804138B2 (ja) | 1996-02-09 | 2006-08-02 | Jsr株式会社 | ArFエキシマレーザー照射用感放射線性樹脂組成物 |
JP3962432B2 (ja) | 1996-03-07 | 2007-08-22 | 住友ベークライト株式会社 | 酸不安定ペンダント基を持つ多環式ポリマーからなるフォトレジスト組成物 |
KR100211548B1 (ko) | 1996-12-20 | 1999-08-02 | 김영환 | 원자외선용 감광막 공중합체 및 그 제조방법 |
-
1996
- 1996-12-31 KR KR1019960080265A patent/KR100220953B1/ko not_active IP Right Cessation
-
1997
- 1997-06-05 TW TW086107738A patent/TW460750B/zh not_active IP Right Cessation
- 1997-06-06 GB GB9711806A patent/GB2320717B/en not_active Expired - Fee Related
- 1997-07-07 JP JP09181334A patent/JP3107770B2/ja not_active Expired - Fee Related
- 1997-07-18 US US08/896,768 patent/US6316565B1/en not_active Expired - Fee Related
- 1997-10-30 FR FR9713653A patent/FR2757867B1/fr not_active Expired - Fee Related
- 1997-11-21 NL NL1007599A patent/NL1007599C2/nl not_active IP Right Cessation
- 1997-12-01 DE DE19753276A patent/DE19753276B4/de not_active Expired - Fee Related
- 1997-12-29 CN CN97126349A patent/CN1088070C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
FR2757867A1 (fr) | 1998-07-03 |
DE19753276B4 (de) | 2005-11-17 |
KR100220953B1 (ko) | 1999-10-01 |
GB2320717A (en) | 1998-07-01 |
DE19753276A1 (de) | 1998-07-02 |
NL1007599C2 (nl) | 1998-11-17 |
GB2320717B (en) | 2000-09-13 |
KR19980060897A (ko) | 1998-10-07 |
FR2757867B1 (fr) | 2003-04-11 |
CN1088070C (zh) | 2002-07-24 |
US6316565B1 (en) | 2001-11-13 |
JPH10198035A (ja) | 1998-07-31 |
CN1187496A (zh) | 1998-07-15 |
GB9711806D0 (en) | 1997-08-06 |
TW460750B (en) | 2001-10-21 |
JP3107770B2 (ja) | 2000-11-13 |
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Legal Events
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AD1A | A request for search or an international type search has been filed | ||
RD2N | Patents in respect of which a decision has been taken or a report has been made (novelty report) |
Free format text: 980917;980917 |
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PD2B | A search report has been drawn up | ||
V1 | Lapsed because of non-payment of the annual fee |
Effective date: 20140601 |