MY184023A - Sputtering target for magnetic recording medium, and magnetic thin film - Google Patents

Sputtering target for magnetic recording medium, and magnetic thin film

Info

Publication number
MY184023A
MY184023A MYPI2018702557A MYPI2018702557A MY184023A MY 184023 A MY184023 A MY 184023A MY PI2018702557 A MYPI2018702557 A MY PI2018702557A MY PI2018702557 A MYPI2018702557 A MY PI2018702557A MY 184023 A MY184023 A MY 184023A
Authority
MY
Malaysia
Prior art keywords
sputtering target
recording medium
magnetic recording
thin film
magnetic
Prior art date
Application number
MYPI2018702557A
Other languages
English (en)
Inventor
Takashi Kosho
Original Assignee
Jx Nippon Mining & Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jx Nippon Mining & Metals Corp filed Critical Jx Nippon Mining & Metals Corp
Publication of MY184023A publication Critical patent/MY184023A/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • G11B5/65—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition
    • G11B5/658—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition containing oxygen, e.g. molecular oxygen or magnetic oxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/16—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing cobalt
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Powder Metallurgy (AREA)
  • Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)
MYPI2018702557A 2016-02-19 2017-01-04 Sputtering target for magnetic recording medium, and magnetic thin film MY184023A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016030488 2016-02-19
PCT/JP2017/000021 WO2017141557A1 (ja) 2016-02-19 2017-01-04 磁気記録媒体用スパッタリングターゲット及び磁性薄膜

Publications (1)

Publication Number Publication Date
MY184023A true MY184023A (en) 2021-03-17

Family

ID=59624963

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2018702557A MY184023A (en) 2016-02-19 2017-01-04 Sputtering target for magnetic recording medium, and magnetic thin film

Country Status (5)

Country Link
JP (2) JP6713489B2 (ja)
CN (1) CN108699678B (ja)
MY (1) MY184023A (ja)
SG (1) SG11201805929XA (ja)
WO (1) WO2017141557A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6971901B2 (ja) * 2018-03-27 2021-11-24 Ｊｘ金属株式会社 スパッタリングターゲット
WO2021014760A1 (ja) * 2019-07-23 2021-01-28 Ｊｘ金属株式会社 非磁性層形成用スパッタリングターゲット部材
JP2021193202A (ja) * 2020-06-08 2021-12-23 三菱マテリアル株式会社 スパッタリングターゲット、スパッタリングターゲットの製造方法、および、光学機能膜

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3522944B2 (ja) * 1996-01-26 2004-04-26 株式会社東芝 磁気記録媒体
JP2001014649A (ja) * 1999-06-28 2001-01-19 Hitachi Ltd 板状体、無機化合物基板、磁気記録媒体及び磁気記憶装置
JP2001250222A (ja) * 2000-03-01 2001-09-14 Hitachi Ltd 磁気記録媒体とその製法およびそれを用いた磁気記録装置
JP2002197633A (ja) * 2000-12-22 2002-07-12 Sony Corp 磁気記録媒体
JP2004206805A (ja) * 2002-12-25 2004-07-22 Fuji Electric Device Technology Co Ltd 磁気記録媒体およびその製造方法
JP4188196B2 (ja) * 2003-10-06 2008-11-26 株式会社東芝 垂直磁気記録媒体、その製造方法、及びこれを用いた磁気記録再生装置
WO2005034095A1 (en) * 2003-10-06 2005-04-14 Kabushiki Kaisha Toshiba Perpendicular magnetic recording medium, manufacturing method therefor, and magnetic read/write apparatus using the same
CN101685776B (zh) * 2008-09-27 2011-10-05 中国科学院半导体研究所 一种改善ZnO薄膜欧姆接触的方法
WO2010074171A1 (ja) * 2008-12-26 2010-07-01 三井金属鉱業株式会社 スパッタリングターゲットおよび膜の形成方法
JP5660710B2 (ja) * 2010-08-03 2015-01-28 昭和電工株式会社 ターゲットの製造方法、磁気記録媒体の製造方法
JP5888664B2 (ja) * 2010-12-20 2016-03-22 Ｊｘ金属株式会社 強磁性材スパッタリングターゲット
US9793099B2 (en) * 2012-03-15 2017-10-17 Jx Nippon Mining & Metals Corporation Magnetic material sputtering target and manufacturing method thereof
JP2016193797A (ja) * 2013-09-13 2016-11-17 旭硝子株式会社 フロートガラス製造装置およびそれを用いたフロートガラス製造方法
JP6005767B2 (ja) * 2014-01-17 2016-10-12 Ｊｘ金属株式会社 磁性記録媒体用スパッタリングターゲット

Also Published As

Publication number Publication date
JPWO2017141557A1 (ja) 2018-10-18
JP6881643B2 (ja) 2021-06-02
WO2017141557A1 (ja) 2017-08-24
JP2020147851A (ja) 2020-09-17
JP6713489B2 (ja) 2020-06-24
SG11201805929XA (en) 2018-08-30
CN108699678B (zh) 2020-12-08
CN108699678A (zh) 2018-10-23

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