MY145601A - Silicon carbide polishing method utilizing water-soluble oxidizers - Google Patents

Silicon carbide polishing method utilizing water-soluble oxidizers

Info

Publication number
MY145601A
MY145601A MYPI20090855A MYPI20090855A MY145601A MY 145601 A MY145601 A MY 145601A MY PI20090855 A MYPI20090855 A MY PI20090855A MY PI20090855 A MYPI20090855 A MY PI20090855A MY 145601 A MY145601 A MY 145601A
Authority
MY
Malaysia
Prior art keywords
silicon carbide
polishing method
method utilizing
utilizing water
soluble oxidizers
Prior art date
Application number
MYPI20090855A
Other languages
English (en)
Inventor
Desai Mukesh
Moeggenborg Kevin
Carter Phillip
Original Assignee
Cabot Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Microelectronics Corp filed Critical Cabot Microelectronics Corp
Publication of MY145601A publication Critical patent/MY145601A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02002—Preparing wafers
    • H01L21/02005—Preparing bulk and homogeneous wafers
    • H01L21/02008—Multistep processes
    • H01L21/0201—Specific process step
    • H01L21/02024—Mirror polishing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/83—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge
    • H10D62/832—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge being Group IV materials comprising two or more elements, e.g. SiGe
    • H10D62/8325—Silicon carbide

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
MYPI20090855A 2006-09-05 2007-09-04 Silicon carbide polishing method utilizing water-soluble oxidizers MY145601A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/515,546 US7678700B2 (en) 2006-09-05 2006-09-05 Silicon carbide polishing method utilizing water-soluble oxidizers

Publications (1)

Publication Number Publication Date
MY145601A true MY145601A (en) 2012-03-15

Family

ID=39152226

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20090855A MY145601A (en) 2006-09-05 2007-09-04 Silicon carbide polishing method utilizing water-soluble oxidizers

Country Status (8)

Country Link
US (2) US7678700B2 (enExample)
JP (1) JP5385141B2 (enExample)
KR (1) KR101371870B1 (enExample)
CN (1) CN101512732B (enExample)
MY (1) MY145601A (enExample)
SG (1) SG174764A1 (enExample)
TW (1) TWI378142B (enExample)
WO (1) WO2008030420A1 (enExample)

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TWI698509B (zh) * 2017-10-18 2020-07-11 環球晶圓股份有限公司 碳化矽晶片的製造方法
CN108949036B (zh) * 2018-09-06 2021-01-05 北京保利世达科技有限公司 一种抛光液及对碳化硅晶体的抛光方法
WO2021084706A1 (ja) * 2019-10-31 2021-05-06 昭和電工マテリアルズ株式会社 研磨液、研磨方法及び半導体部品の製造方法
CN110922896A (zh) * 2019-11-18 2020-03-27 宁波日晟新材料有限公司 一种高效环保碳化硅抛光液及其制备方法和应用
CN111518478B (zh) * 2020-06-15 2022-04-05 宁波日晟新材料有限公司 一种碳化硅抛光液及其应用
CN112920717A (zh) * 2021-02-23 2021-06-08 中山荣拓智能装备有限公司 一种碳化硅单晶抛光液及其使用方法
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Also Published As

Publication number Publication date
US20080153293A1 (en) 2008-06-26
WO2008030420A1 (en) 2008-03-13
US7678700B2 (en) 2010-03-16
KR20090051263A (ko) 2009-05-21
CN101512732B (zh) 2011-05-18
TW200821375A (en) 2008-05-16
CN101512732A (zh) 2009-08-19
KR101371870B1 (ko) 2014-03-07
SG174764A1 (en) 2011-10-28
US20080057713A1 (en) 2008-03-06
TWI378142B (en) 2012-12-01
JP5385141B2 (ja) 2014-01-08
JP2010503232A (ja) 2010-01-28

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