MX2017003532A - Combado de sensor de imagen usando tension. - Google Patents

Combado de sensor de imagen usando tension.

Info

Publication number
MX2017003532A
MX2017003532A MX2017003532A MX2017003532A MX2017003532A MX 2017003532 A MX2017003532 A MX 2017003532A MX 2017003532 A MX2017003532 A MX 2017003532A MX 2017003532 A MX2017003532 A MX 2017003532A MX 2017003532 A MX2017003532 A MX 2017003532A
Authority
MX
Mexico
Prior art keywords
sensor chip
imaging sensor
image sensor
bending
tension
Prior art date
Application number
MX2017003532A
Other languages
English (en)
Inventor
K Guenter Brian
Original Assignee
Microsoft Technology Licensing Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Microsoft Technology Licensing Llc filed Critical Microsoft Technology Licensing Llc
Publication of MX2017003532A publication Critical patent/MX2017003532A/es

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14603Special geometry or disposition of pixel-elements, address-lines or gate-electrodes
    • H01L27/14607Geometry of the photosensitive area
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14618Containers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14625Optical elements or arrangements associated with the device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14683Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14683Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
    • H01L27/14698Post-treatment for the devices, e.g. annealing, impurity-gettering, shor-circuit elimination, recrystallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14643Photodiode arrays; MOS imagers

Landscapes

  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
  • Light Receiving Elements (AREA)
  • Force Measurement Appropriate To Specific Purposes (AREA)
  • Facsimile Heads (AREA)
  • Wire Bonding (AREA)

Abstract

Las técnicas para la fabricación de un chip sensor de imagen, que tiene una superficie curva, incluyen colocar un sustrato de combado sobre una primera superficie de un chip sensor de imagen. La primera superficie del chip sensor de imagen incluye los sensores de luz para generar las señales eléctricas en respuesta a la recepción de luz. La fabricación también incluye combar el sustrato de combado con el fin de impartir las fuerzas en el chip sensor de imagen para producir un chip sensor de imagen curvado. Una segunda superficie del chip sensor de imagen curvado puede adherirse a un sustrato posterior. La segunda superficie está opuesta a la primera superficie. El sustrato de combado puede retirarse de la primera superficie del chip sensor de imagen.
MX2017003532A 2014-09-19 2015-09-10 Combado de sensor de imagen usando tension. MX2017003532A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/491,928 US10373995B2 (en) 2014-09-19 2014-09-19 Image sensor bending using tension
PCT/US2015/049276 WO2016044039A1 (en) 2014-09-19 2015-09-10 Image sensor bending using tension

Publications (1)

Publication Number Publication Date
MX2017003532A true MX2017003532A (es) 2017-06-21

Family

ID=54199295

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2017003532A MX2017003532A (es) 2014-09-19 2015-09-10 Combado de sensor de imagen usando tension.

Country Status (11)

Country Link
US (1) US10373995B2 (es)
EP (1) EP3195591B1 (es)
JP (1) JP6726662B2 (es)
KR (1) KR102466067B1 (es)
CN (1) CN106716639B (es)
AU (1) AU2015318205B2 (es)
BR (1) BR112017003625B1 (es)
CA (1) CA2959749C (es)
MX (1) MX2017003532A (es)
RU (1) RU2700283C2 (es)
WO (1) WO2016044039A1 (es)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9570488B2 (en) 2014-09-19 2017-02-14 Microsoft Technology Licensing, Llc Image sensor bending by induced substrate swelling
US10373995B2 (en) 2014-09-19 2019-08-06 Microsoft Technology Licensing, Llc Image sensor bending using tension
CN104486555B (zh) * 2014-10-28 2019-02-12 北京智谷睿拓技术服务有限公司 图像采集控制方法和装置
US11128786B2 (en) * 2014-11-21 2021-09-21 Apple Inc. Bending a circuit-bearing die
JP6463159B2 (ja) * 2015-02-05 2019-01-30 キヤノン株式会社 撮像装置およびその制御方法、プログラム、並びに記憶媒体
US10304900B2 (en) 2015-04-02 2019-05-28 Microsoft Technology Licensing, Llc Bending semiconductor chip in molds having radially varying curvature
US9870927B2 (en) 2015-04-02 2018-01-16 Microsoft Technology Licensing, Llc Free-edge semiconductor chip bending
US9893058B2 (en) * 2015-09-17 2018-02-13 Semiconductor Components Industries, Llc Method of manufacturing a semiconductor device having reduced on-state resistance and structure
CN108603800B (zh) * 2016-02-15 2020-08-11 京瓷株式会社 压力传感器
US10062727B2 (en) 2016-09-09 2018-08-28 Microsoft Technology Licensing, Llc Strain relieving die for curved image sensors
FR3061990B1 (fr) 2017-01-18 2019-04-19 Commissariat A L'energie Atomique Et Aux Energies Alternatives Procede de realisation collective de circuits electroniques courbes
EP3422394B1 (en) * 2017-06-29 2021-09-01 Infineon Technologies AG Method for processing a semiconductor substrate
KR102468262B1 (ko) * 2017-06-30 2022-11-18 에스케이하이닉스 주식회사 커브드 이미지 센서
EP3435558B1 (en) * 2017-07-24 2021-02-17 Deutsche Telekom AG Local communication network, transceiver node, and method
CN107300756B (zh) * 2017-08-23 2019-12-10 浙江舜宇光学有限公司 摄像镜头
WO2019037466A1 (zh) 2017-08-23 2019-02-28 浙江舜宇光学有限公司 摄像镜头
KR102336174B1 (ko) 2017-08-29 2021-12-07 삼성전자주식회사 전방위 이미지 센서 및 그 제조 방법
FR3073322B1 (fr) * 2017-11-07 2021-12-03 Commissariat Energie Atomique Procede de realisation d'au moins un circuit electronique courbe
CN107959781B (zh) * 2017-12-11 2020-07-31 信利光电股份有限公司 一种摄像模组及其调整控制方法
US11848349B1 (en) * 2018-06-21 2023-12-19 Hrl Laboratories, Llc Curved semiconductor and method of forming the same
CN113132585B (zh) * 2020-01-10 2022-09-09 宁波舜宇光电信息有限公司 感光芯片组件、移动终端、摄像模组及其制备方法
US11862653B2 (en) * 2020-04-02 2024-01-02 Hrl Laboratories, Llc Curved imaging sensor package with architected substrate
CN111491085B (zh) * 2020-04-21 2021-11-05 Oppo广东移动通信有限公司 图像传感器、摄像装置及电子设备
CN113726985B (zh) * 2020-05-21 2022-09-06 宁波舜宇光电信息有限公司 感光芯片组件、摄像模组及终端设备
CN112532942B (zh) * 2020-11-30 2021-08-10 黑龙江合师惠教育科技有限公司 一种图像传感器装置及其制造方法、摄像头以及教育行为分析监控设备

Family Cites Families (72)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0576144B1 (en) 1992-05-22 1998-08-05 Matsushita Electronics Corporation Solid state image sensor and manufacturing method thereof
US5349443A (en) 1992-11-25 1994-09-20 Polaroid Corporation Flexible transducers for photon tunneling microscopes and methods for making and using same
JP2899600B2 (ja) 1994-01-25 1999-06-02 キヤノン販売 株式会社 成膜方法
JP2809215B2 (ja) * 1996-09-26 1998-10-08 日本電気株式会社 固体撮像カメラ
JPH1174164A (ja) 1997-08-27 1999-03-16 Canon Inc 基板処理装置、基板支持装置及び基板処理方法並びに基板の製造方法
US6255025B1 (en) 1998-07-13 2001-07-03 Fuji Xerox Co., Ltd. Filter and process for producing same
US6312959B1 (en) 1999-03-30 2001-11-06 U.T. Battelle, Llc Method using photo-induced and thermal bending of MEMS sensors
US6706448B1 (en) 1999-08-30 2004-03-16 Georgia Tech Research Corp. Method and apparatus for lithiating alloys
JP4604307B2 (ja) 2000-01-27 2011-01-05 ソニー株式会社 撮像装置とその製造方法及びカメラシステム
DE10004891C2 (de) 2000-02-04 2002-10-31 Astrium Gmbh Fokalfläche und Detektor für optoelektronische Bildaufnahmesysteme, Herstellungsverfahren und optoelektronisches Bildaufnahmesystem
US9314339B2 (en) 2000-03-27 2016-04-19 Formae, Inc. Implants for replacing cartilage, with negatively-charged hydrogel surfaces and flexible matrix reinforcement
TWI313059B (es) 2000-12-08 2009-08-01 Sony Corporatio
DE10122324A1 (de) * 2001-05-08 2002-11-14 Philips Corp Intellectual Pty Flexible integrierte monolithische Schaltung
US6791072B1 (en) 2002-05-22 2004-09-14 National Semiconductor Corporation Method and apparatus for forming curved image sensor module
US6881491B2 (en) 2003-05-16 2005-04-19 Alcoa Inc. Protective fluoride coatings for aluminum alloy articles
JP2005278133A (ja) 2003-07-03 2005-10-06 Fuji Photo Film Co Ltd 固体撮像装置および光学機器
JP2005045151A (ja) * 2003-07-25 2005-02-17 Mitsubishi Electric Corp 撮像装置ならびにその製造方法および製造装置
US20050035514A1 (en) 2003-08-11 2005-02-17 Supercritical Systems, Inc. Vacuum chuck apparatus and method for holding a wafer during high pressure processing
JP2005191218A (ja) * 2003-12-25 2005-07-14 Mitsubishi Electric Corp 固体撮像装置の製造方法
US7476955B2 (en) * 2004-01-06 2009-01-13 Micron Technology, Inc. Die package having an adhesive flow restriction area
US7397066B2 (en) 2004-08-19 2008-07-08 Micron Technology, Inc. Microelectronic imagers with curved image sensors and methods for manufacturing microelectronic imagers
US7432596B1 (en) 2004-10-12 2008-10-07 Energy Innovations, Inc. Apparatus and method for bonding silicon wafer to conductive substrate
US7190039B2 (en) 2005-02-18 2007-03-13 Micron Technology, Inc. Microelectronic imagers with shaped image sensors and methods for manufacturing microelectronic imagers
US7683303B2 (en) 2006-01-17 2010-03-23 Sri International Nanoscale volumetric imaging device having at least one microscale device for electrically coupling at least one addressable array to a data processing means
JP2007234900A (ja) * 2006-03-01 2007-09-13 Sanyo Electric Co Ltd 半導体装置及び半導体装置の製造方法
US7507944B1 (en) 2006-06-27 2009-03-24 Cypress Semiconductor Corporation Non-planar packaging of image sensor
JP2008092532A (ja) 2006-10-05 2008-04-17 Matsushita Electric Ind Co Ltd 撮像装置とその製造方法および携帯電話装置
JP2010506409A (ja) * 2006-10-10 2010-02-25 ティーアイアール テクノロジー エルピー 局所的可撓性を備える回路基板
US7733397B2 (en) 2006-12-22 2010-06-08 Palo Alto Research Center Incorporated Sensor surface with 3D curvature formed by electronics on a continuous 2D flexible substrate
US7742090B2 (en) 2006-12-22 2010-06-22 Palo Alto Research Center Incorporated Flexible segmented image sensor
JP2009049499A (ja) 2007-08-14 2009-03-05 Fujifilm Corp 半導体チップの実装方法及び半導体装置
KR101378418B1 (ko) 2007-11-01 2014-03-27 삼성전자주식회사 이미지센서 모듈 및 그 제조방법
US8077235B2 (en) 2008-01-22 2011-12-13 Palo Alto Research Center Incorporated Addressing of a three-dimensional, curved sensor or display back plane
US8097926B2 (en) 2008-10-07 2012-01-17 Mc10, Inc. Systems, methods, and devices having stretchable integrated circuitry for sensing and delivering therapy
US8372726B2 (en) * 2008-10-07 2013-02-12 Mc10, Inc. Methods and applications of non-planar imaging arrays
US9119533B2 (en) 2008-10-07 2015-09-01 Mc10, Inc. Systems, methods, and devices having stretchable integrated circuitry for sensing and delivering therapy
KR101567067B1 (ko) 2008-12-02 2015-11-06 엘지이노텍 주식회사 카메라모듈
JP5045952B2 (ja) * 2009-02-12 2012-10-10 セイコーエプソン株式会社 光デバイス、光モジュール及び電子機器
US8248499B2 (en) 2009-02-23 2012-08-21 Gary Edwin Sutton Curvilinear sensor system
US8654215B2 (en) 2009-02-23 2014-02-18 Gary Edwin Sutton Mobile communicator with curved sensor camera
US8836805B2 (en) 2012-07-17 2014-09-16 Gary Edwin Sutton Curved sensor system
US20120159996A1 (en) 2010-12-28 2012-06-28 Gary Edwin Sutton Curved sensor formed from silicon fibers
WO2010098136A1 (ja) 2009-02-27 2010-09-02 Hoya株式会社 レンズ用鋳型の製造方法および眼鏡レンズの製造方法
GB0915473D0 (en) 2009-09-07 2009-10-07 St Microelectronics Res & Dev Improvements in or relating to CMOS sensors
WO2011059766A1 (en) 2009-10-29 2011-05-19 The Board Of Trustees Of The Leland Stanford Junior University Devices, systems and methods for advanced rechargeable batteries
EP2388987A1 (en) 2010-05-19 2011-11-23 Thomson Licensing Camera with volumetric sensor chip
JP5724322B2 (ja) * 2010-11-24 2015-05-27 ソニー株式会社 固体撮像装置の製造方法
US9442285B2 (en) 2011-01-14 2016-09-13 The Board Of Trustees Of The University Of Illinois Optical component array having adjustable curvature
WO2012103073A2 (en) 2011-01-24 2012-08-02 President And Fellows Of Harvard College Non-differential elastomer curvature sensor
US8878116B2 (en) * 2011-02-28 2014-11-04 Sony Corporation Method of manufacturing solid-state imaging element, solid-state imaging element and electronic apparatus
JP5720304B2 (ja) 2011-02-28 2015-05-20 ソニー株式会社 固体撮像装置及び電子機器
KR101861765B1 (ko) * 2011-03-03 2018-05-29 삼성전자주식회사 마이크로 렌즈를 포함하는 깊이 픽셀 및 상기 깊이 픽셀을 포함하는 깊이 센서
CN202549843U (zh) 2011-04-26 2012-11-21 格科微电子(上海)有限公司 凹面cmos图像传感器、凹面cmos图像传感元件及摄像头
US8613135B2 (en) * 2011-05-06 2013-12-24 National Tsing Hua University Method for non-planar chip assembly
AU2011367826B2 (en) * 2011-05-06 2015-12-17 Iridium Medical Technology Co., Ltd. Non-planar chip assembly
JP2012249003A (ja) 2011-05-26 2012-12-13 Toshiba Corp 固体撮像装置、固体撮像装置の製造方法およびカメラモジュール
CA2869699A1 (en) 2012-04-04 2013-10-10 Scribble Technologies Inc. System and method for generating digital content
FR2989519A1 (fr) 2012-04-13 2013-10-18 St Microelectronics Crolles 2 Procede de fabrication d'un capteur d'image a surface courbe.
FR2989518A1 (fr) 2012-04-13 2013-10-18 St Microelectronics Crolles 2 Procede de fabrication d'un capteur d'image a surface courbe
US10334181B2 (en) 2012-08-20 2019-06-25 Microsoft Technology Licensing, Llc Dynamically curved sensor for optical zoom lens
US20140063794A1 (en) * 2012-09-05 2014-03-06 Foshan Innovative Lighting Co., Ltd. Curved printed circuit boards, light modules, and methods for curving a printed circuit board
JP6135109B2 (ja) * 2012-12-07 2017-05-31 ソニー株式会社 固体撮像素子および固体撮像素子の製造方法ならびに電子機器
JP2015053322A (ja) * 2013-09-05 2015-03-19 富士電機株式会社 半導体装置の製造方法
JP2015070159A (ja) * 2013-09-30 2015-04-13 ソニー株式会社 固体撮像素子およびその製造方法、並びに電子機器
KR101557942B1 (ko) * 2014-01-08 2015-10-12 주식회사 루멘스 발광 소자 패키지 및 발광 소자 패키지의 제조 방법
US9551856B2 (en) 2014-05-19 2017-01-24 Google Inc. MEMS-released curved image sensor
US10373995B2 (en) 2014-09-19 2019-08-06 Microsoft Technology Licensing, Llc Image sensor bending using tension
US9570488B2 (en) 2014-09-19 2017-02-14 Microsoft Technology Licensing, Llc Image sensor bending by induced substrate swelling
US9349763B1 (en) 2015-02-10 2016-05-24 Omnivision Technologies, Inc. Curved image sensor systems and methods for manufacturing the same
US9998643B2 (en) 2015-03-24 2018-06-12 Semiconductor Components Industries, Llc Methods of forming curved image sensors
US9870927B2 (en) 2015-04-02 2018-01-16 Microsoft Technology Licensing, Llc Free-edge semiconductor chip bending
US10062727B2 (en) 2016-09-09 2018-08-28 Microsoft Technology Licensing, Llc Strain relieving die for curved image sensors

Also Published As

Publication number Publication date
US10373995B2 (en) 2019-08-06
WO2016044039A1 (en) 2016-03-24
EP3195591A1 (en) 2017-07-26
CA2959749C (en) 2023-01-24
JP2017531320A (ja) 2017-10-19
CA2959749A1 (en) 2016-03-24
JP6726662B2 (ja) 2020-07-22
KR20170056690A (ko) 2017-05-23
BR112017003625A2 (pt) 2017-12-05
CN106716639B (zh) 2020-02-28
US20160086994A1 (en) 2016-03-24
AU2015318205A1 (en) 2017-03-16
RU2017108537A (ru) 2018-09-17
KR102466067B1 (ko) 2022-11-10
EP3195591B1 (en) 2020-01-08
AU2015318205B2 (en) 2019-04-11
RU2700283C2 (ru) 2019-09-16
BR112017003625B1 (pt) 2023-11-14
RU2017108537A3 (es) 2019-03-19
CN106716639A (zh) 2017-05-24

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