MX2007009542A - Complejos org??nicos de plata, sus m??todos de preparaci??n y m??todos para la formacion de capas delgadas. - Google Patents

Complejos org??nicos de plata, sus m??todos de preparaci??n y m??todos para la formacion de capas delgadas.

Info

Publication number
MX2007009542A
MX2007009542A MX2007009542A MX2007009542A MX2007009542A MX 2007009542 A MX2007009542 A MX 2007009542A MX 2007009542 A MX2007009542 A MX 2007009542A MX 2007009542 A MX2007009542 A MX 2007009542A MX 2007009542 A MX2007009542 A MX 2007009542A
Authority
MX
Mexico
Prior art keywords
methods
organic silver
thin layers
forming thin
silver complexes
Prior art date
Application number
MX2007009542A
Other languages
English (en)
Spanish (es)
Inventor
Kwang-Choon Chung
Jun-Nam Cho
Gong-Myoung-Seon
Yi-Sup Han
Jeong-Bin Park
Dong Hun Nam
Seong-Youn Uhm
Young-Kwan Seo
Original Assignee
Inktec Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inktec Co Ltd filed Critical Inktec Co Ltd
Priority claimed from PCT/KR2006/000451 external-priority patent/WO2006083153A1/en
Publication of MX2007009542A publication Critical patent/MX2007009542A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C211/00—Compounds containing amino groups bound to a carbon skeleton
    • C07C211/65—Metal complexes of amines
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F1/00—Compounds containing elements of Groups 1 or 11 of the Periodic Table
    • C07F1/10—Silver compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F1/00—Compounds containing elements of Groups 1 or 11 of the Periodic Table
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
    • C07C271/02—Carbamic acids; Salts of carbamic acids
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F1/00—Compounds containing elements of Groups 1 or 11 of the Periodic Table
    • C07F1/005—Compounds containing elements of Groups 1 or 11 of the Periodic Table without C-Metal linkages
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/52—Electrically conductive inks
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/24—Electrically-conducting paints
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/46—Electroplating: Baths therefor from solutions of silver
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/105—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Thermal Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Electrochemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Catalysts (AREA)
MX2007009542A 2005-02-07 2006-02-07 Complejos org??nicos de plata, sus m??todos de preparaci??n y m??todos para la formacion de capas delgadas. MX2007009542A (es)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR20050011478 2005-02-07
KR20050011631 2005-02-11
KR1020060011083A KR100727466B1 (ko) 2005-02-07 2006-02-06 유기 은 착체 화합물, 이의 제조방법 및 이를 이용한박막형성방법
PCT/KR2006/000451 WO2006083153A1 (en) 2005-02-07 2006-02-07 Organic silver complexes, their preparation methods and their methods for forming thin layers

Publications (1)

Publication Number Publication Date
MX2007009542A true MX2007009542A (es) 2007-11-06

Family

ID=37571520

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2007009542A MX2007009542A (es) 2005-02-07 2006-02-07 Complejos org??nicos de plata, sus m??todos de preparaci??n y m??todos para la formacion de capas delgadas.

Country Status (13)

Country Link
US (4) US8226755B2 (enExample)
EP (1) EP2995620B1 (enExample)
JP (2) JP5001860B2 (enExample)
KR (4) KR100727466B1 (enExample)
CN (1) CN102702237B (enExample)
BR (1) BRPI0606147B1 (enExample)
CA (1) CA2817918C (enExample)
IL (1) IL185049A (enExample)
MX (1) MX2007009542A (enExample)
NZ (1) NZ560417A (enExample)
RU (1) RU2386635C2 (enExample)
TW (1) TWI326680B (enExample)
ZA (1) ZA200707504B (enExample)

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Also Published As

Publication number Publication date
JP5001860B2 (ja) 2012-08-15
CN102702237B (zh) 2015-09-16
US20160194339A1 (en) 2016-07-07
US8679242B2 (en) 2014-03-25
IL185049A (en) 2013-02-28
KR100727459B1 (ko) 2007-06-13
ZA200707504B (en) 2008-12-31
RU2386635C2 (ru) 2010-04-20
KR20070050905A (ko) 2007-05-16
IL185049A0 (en) 2007-12-03
US8226755B2 (en) 2012-07-24
KR20070052257A (ko) 2007-05-21
BRPI0606147B1 (pt) 2015-09-08
US20140179944A1 (en) 2014-06-26
US20090120800A1 (en) 2009-05-14
JP2011148795A (ja) 2011-08-04
US9914743B2 (en) 2018-03-13
KR101093188B1 (ko) 2011-12-13
RU2007133499A (ru) 2009-03-20
EP2995620B1 (en) 2018-09-19
JP5638965B2 (ja) 2014-12-10
CN102702237A (zh) 2012-10-03
KR20070052258A (ko) 2007-05-21
JP2008530001A (ja) 2008-08-07
KR100727466B1 (ko) 2007-06-13
US20130022761A1 (en) 2013-01-24
CA2817918C (en) 2017-06-20
CA2817918A1 (en) 2006-08-10
TW200633976A (en) 2006-10-01
BRPI0606147A2 (pt) 2009-06-02
TWI326680B (en) 2010-07-01
EP2995620A1 (en) 2016-03-16
KR101093186B1 (ko) 2011-12-13
KR20060090180A (ko) 2006-08-10
NZ560417A (en) 2010-06-25

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