MX165458B - Procedimiento electroforetico de deposito - Google Patents

Procedimiento electroforetico de deposito

Info

Publication number
MX165458B
MX165458B MX000032A MX3285A MX165458B MX 165458 B MX165458 B MX 165458B MX 000032 A MX000032 A MX 000032A MX 3285 A MX3285 A MX 3285A MX 165458 B MX165458 B MX 165458B
Authority
MX
Mexico
Prior art keywords
film
polymer
aqueous solution
image
deposit procedure
Prior art date
Application number
MX000032A
Other languages
English (en)
Inventor
William David Emmons
Mark Robert Winkle
Original Assignee
Rohm & Haas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=67809744&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=MX165458(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Rohm & Haas filed Critical Rohm & Haas
Publication of MX165458B publication Critical patent/MX165458B/es

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/164—Coating processes; Apparatus therefor using electric, electrostatic or magnetic means; powder coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/138—Corona discharge process

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Chemically Coating (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

La presente invención se refiere a un procedimiento para formar una imagen de polímero negativa sobre una superficie conductiva, que comprende: a) depositar electroforéticamente una película uniforme sobre la superficie, desde una composición fotosensitiva de polímero que comprende una solución o emulsión acuosa de al menos un polímero libre de insaturación etilénica y que tiene grupos portadores cargados, un fotoiniciador y un monómero de entrecruzamiento: b) exponer porciones de la película a una fuente de radiación actínica y c) revelar la película sin exponer, usando una solución acuosa para formar una imagen negativa de polímero entrelazado sobre la superficie, está imagen siendo resistente a las soluciones de grabado químico o de chapeado.
MX000032A 1984-09-26 1985-10-01 Procedimiento electroforetico de deposito MX165458B (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/654,821 US4592816A (en) 1984-09-26 1984-09-26 Electrophoretic deposition process
CN198686100150A CN86100150A (zh) 1984-09-26 1986-01-11 感光聚合物组合物及其电泳沉积工艺过程

Publications (1)

Publication Number Publication Date
MX165458B true MX165458B (es) 1992-11-11

Family

ID=67809744

Family Applications (1)

Application Number Title Priority Date Filing Date
MX000032A MX165458B (es) 1984-09-26 1985-10-01 Procedimiento electroforetico de deposito

Country Status (19)

Country Link
US (1) US4592816A (es)
EP (1) EP0176356B1 (es)
JP (1) JPH081519B2 (es)
KR (1) KR920005775B1 (es)
CN (2) CN1058431A (es)
AU (1) AU586189B2 (es)
BR (1) BR8504640A (es)
CA (1) CA1257803A (es)
DE (1) DE3566047D1 (es)
DK (1) DK168802B1 (es)
FI (1) FI80350C (es)
HK (1) HK58289A (es)
IE (1) IE58622B1 (es)
IL (1) IL76491A (es)
MX (1) MX165458B (es)
NO (1) NO168857C (es)
PH (1) PH22139A (es)
SG (1) SG8489G (es)
ZA (1) ZA857435B (es)

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Also Published As

Publication number Publication date
NO168857C (no) 1992-04-08
DK434885D0 (da) 1985-09-25
EP0176356B1 (en) 1988-11-02
CN86100150A (zh) 1987-07-22
IL76491A (en) 1989-07-31
DK168802B1 (da) 1994-06-13
SG8489G (en) 1989-07-14
HK58289A (en) 1989-07-28
AU586189B2 (en) 1989-07-06
IE58622B1 (en) 1993-10-20
JPS6180240A (ja) 1986-04-23
FI853691L (fi) 1986-03-27
KR860002735A (ko) 1986-04-28
AU4786285A (en) 1986-04-10
ZA857435B (en) 1987-11-25
NO168857B (no) 1991-12-30
CA1257803A (en) 1989-07-25
EP0176356A3 (en) 1986-08-20
FI80350B (fi) 1990-01-31
DE3566047D1 (en) 1988-12-08
CN1058431A (zh) 1992-02-05
BR8504640A (pt) 1986-07-15
US4592816A (en) 1986-06-03
NO853738L (no) 1986-04-01
FI80350C (fi) 1990-05-10
EP0176356A2 (en) 1986-04-02
KR920005775B1 (ko) 1992-07-18
JPH081519B2 (ja) 1996-01-10
PH22139A (en) 1988-06-01
IE852343L (en) 1986-03-26
FI853691A0 (fi) 1985-09-25
DK434885A (da) 1986-03-27
IL76491A0 (en) 1986-01-31

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