DK434885D0 - Fotosensible polymersammensaetninger, fremgangsmaade til elektroforetisk aflejring af disse og deres anvendelse til dannelse af film paa substrater - Google Patents
Fotosensible polymersammensaetninger, fremgangsmaade til elektroforetisk aflejring af disse og deres anvendelse til dannelse af film paa substraterInfo
- Publication number
- DK434885D0 DK434885D0 DK434885A DK434885A DK434885D0 DK 434885 D0 DK434885 D0 DK 434885D0 DK 434885 A DK434885 A DK 434885A DK 434885 A DK434885 A DK 434885A DK 434885 D0 DK434885 D0 DK 434885D0
- Authority
- DK
- Denmark
- Prior art keywords
- photosensible
- movies
- electrophoretic
- disposal
- substrates
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/164—Coating processes; Apparatus therefor using electric, electrostatic or magnetic means; powder coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/138—Corona discharge process
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Paints Or Removers (AREA)
- Chemically Coating (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/654,821 US4592816A (en) | 1984-09-26 | 1984-09-26 | Electrophoretic deposition process |
US65482184 | 1984-09-26 | ||
CN198686100150A CN86100150A (zh) | 1984-09-26 | 1986-01-11 | 感光聚合物组合物及其电泳沉积工艺过程 |
Publications (3)
Publication Number | Publication Date |
---|---|
DK434885D0 true DK434885D0 (da) | 1985-09-25 |
DK434885A DK434885A (da) | 1986-03-27 |
DK168802B1 DK168802B1 (da) | 1994-06-13 |
Family
ID=67809744
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DK434885A DK168802B1 (da) | 1984-09-26 | 1985-09-25 | Negativt virkende fotoresist, der kan aflejres elektroforetisk og fremkaldes med vandigt medium, fremgangsmåde til dannelse af et negativt polymerbillede på en ledende overflade af et substrat under anvendelse af fotoresisten samt fotoresistens anvendelse til dannelse af film på substrater |
Country Status (19)
Country | Link |
---|---|
US (1) | US4592816A (da) |
EP (1) | EP0176356B1 (da) |
JP (1) | JPH081519B2 (da) |
KR (1) | KR920005775B1 (da) |
CN (2) | CN86100150A (da) |
AU (1) | AU586189B2 (da) |
BR (1) | BR8504640A (da) |
CA (1) | CA1257803A (da) |
DE (1) | DE3566047D1 (da) |
DK (1) | DK168802B1 (da) |
FI (1) | FI80350C (da) |
HK (1) | HK58289A (da) |
IE (1) | IE58622B1 (da) |
IL (1) | IL76491A (da) |
MX (1) | MX165458B (da) |
NO (1) | NO168857C (da) |
PH (1) | PH22139A (da) |
SG (1) | SG8489G (da) |
ZA (1) | ZA857435B (da) |
Families Citing this family (87)
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US4343885A (en) | 1978-05-09 | 1982-08-10 | Dynachem Corporation | Phototropic photosensitive compositions containing fluoran colorformer |
JPS5527647A (en) | 1978-08-17 | 1980-02-27 | Nippon Telegraph & Telephone | Paint for forming insulating film of conductive printed circuit board and method of forming insulating film |
JPS55148491A (en) | 1979-05-09 | 1980-11-19 | Meidensha Electric Mfg Co Ltd | Method of fabricating printed circuit board |
US4338235A (en) | 1979-12-21 | 1982-07-06 | E. I. Du Pont De Nemours And Company | Electrocoating composition with polyhydroxyamine and acrylic or methacrylic polymers |
DE3005034A1 (de) * | 1980-02-11 | 1981-08-20 | Basf Ag, 6700 Ludwigshafen | Verfahren zur herstellung von ueberzuegen |
US4378264A (en) | 1980-05-27 | 1983-03-29 | E. I. Du Pont De Nemours And Company | Integrated laminating process |
US4382135A (en) | 1981-04-01 | 1983-05-03 | Diamond Shamrock Corporation | Radiation-hardenable diluents |
DE3131448A1 (de) * | 1981-08-07 | 1983-02-24 | Basf Ag, 6700 Ludwigshafen | Fuer die herstellung von photoresistschichten geeignete photopolymerisierbare aufzeichnungsmasse |
CA1182469A (en) | 1981-12-11 | 1985-02-12 | William D. Emmons | Esters of michael addition homopolymers of acrylic acid |
US4414311A (en) | 1982-03-18 | 1983-11-08 | American Hoechst Corporation | Cathodic deposition of light sensitive components |
-
1984
- 1984-09-26 US US06/654,821 patent/US4592816A/en not_active Expired - Lifetime
-
1985
- 1985-09-12 CA CA000490519A patent/CA1257803A/en not_active Expired
- 1985-09-16 PH PH32784A patent/PH22139A/en unknown
- 1985-09-17 JP JP60205180A patent/JPH081519B2/ja not_active Expired - Lifetime
- 1985-09-23 BR BR8504640A patent/BR8504640A/pt not_active IP Right Cessation
- 1985-09-23 IE IE234385A patent/IE58622B1/en not_active IP Right Cessation
- 1985-09-24 NO NO853738A patent/NO168857C/no not_active IP Right Cessation
- 1985-09-24 IL IL76491A patent/IL76491A/xx not_active IP Right Cessation
- 1985-09-25 DK DK434885A patent/DK168802B1/da not_active IP Right Cessation
- 1985-09-25 EP EP85306800A patent/EP0176356B1/en not_active Expired
- 1985-09-25 FI FI853691A patent/FI80350C/fi not_active IP Right Cessation
- 1985-09-25 DE DE8585306800T patent/DE3566047D1/de not_active Expired
- 1985-09-25 AU AU47862/85A patent/AU586189B2/en not_active Ceased
- 1985-09-25 KR KR1019850007029A patent/KR920005775B1/ko not_active IP Right Cessation
- 1985-09-26 ZA ZA857435A patent/ZA857435B/xx unknown
- 1985-10-01 MX MX000032A patent/MX165458B/es unknown
-
1986
- 1986-01-11 CN CN198686100150A patent/CN86100150A/zh active Pending
- 1986-01-11 CN CN91108683A patent/CN1058431A/zh not_active Withdrawn
-
1989
- 1989-02-14 SG SG84/89A patent/SG8489G/en unknown
- 1989-07-20 HK HK582/89A patent/HK58289A/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN1058431A (zh) | 1992-02-05 |
BR8504640A (pt) | 1986-07-15 |
JPS6180240A (ja) | 1986-04-23 |
NO853738L (no) | 1986-04-01 |
IE852343L (en) | 1986-03-26 |
EP0176356A2 (en) | 1986-04-02 |
EP0176356B1 (en) | 1988-11-02 |
HK58289A (en) | 1989-07-28 |
NO168857B (no) | 1991-12-30 |
MX165458B (es) | 1992-11-11 |
IE58622B1 (en) | 1993-10-20 |
IL76491A (en) | 1989-07-31 |
NO168857C (no) | 1992-04-08 |
KR920005775B1 (ko) | 1992-07-18 |
AU4786285A (en) | 1986-04-10 |
DK434885A (da) | 1986-03-27 |
FI80350C (fi) | 1990-05-10 |
DK168802B1 (da) | 1994-06-13 |
EP0176356A3 (en) | 1986-08-20 |
CA1257803A (en) | 1989-07-25 |
FI853691A0 (fi) | 1985-09-25 |
AU586189B2 (en) | 1989-07-06 |
SG8489G (en) | 1989-07-14 |
JPH081519B2 (ja) | 1996-01-10 |
CN86100150A (zh) | 1987-07-22 |
IL76491A0 (en) | 1986-01-31 |
DE3566047D1 (en) | 1988-12-08 |
ZA857435B (en) | 1987-11-25 |
FI853691L (fi) | 1986-03-27 |
KR860002735A (ko) | 1986-04-28 |
FI80350B (fi) | 1990-01-31 |
US4592816A (en) | 1986-06-03 |
PH22139A (en) | 1988-06-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B1 | Patent granted (law 1993) | ||
PBP | Patent lapsed |