KR970069878A - 실린화 실리카 - Google Patents

실린화 실리카 Download PDF

Info

Publication number
KR970069878A
KR970069878A KR1019970015688A KR19970015688A KR970069878A KR 970069878 A KR970069878 A KR 970069878A KR 1019970015688 A KR1019970015688 A KR 1019970015688A KR 19970015688 A KR19970015688 A KR 19970015688A KR 970069878 A KR970069878 A KR 970069878A
Authority
KR
South Korea
Prior art keywords
silica
silanized silica
silanized
polymer
low
Prior art date
Application number
KR1019970015688A
Other languages
English (en)
Other versions
KR100260325B1 (ko
Inventor
베르너 하르트만
쥐르겐 마이어
하우케 야곱젠
토마스 헤니그
헤닝 카르베
우베 샤크텔리
Original Assignee
메르크 볼프강, 베버 볼프강
데구사 악티엔게젤샤프트
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 메르크 볼프강, 베버 볼프강, 데구사 악티엔게젤샤프트 filed Critical 메르크 볼프강, 베버 볼프강
Publication of KR970069878A publication Critical patent/KR970069878A/ko
Application granted granted Critical
Publication of KR100260325B1 publication Critical patent/KR100260325B1/ko

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • C08K3/36Silica
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28Compounds of silicon
    • C09C1/30Silicic acid
    • C09C1/3081Treatment with organo-silicon compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/42Gloss-reducing agents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09GPOLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00Polishing compositions
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/10Materials in mouldable or extrudable form for sealing or packing joints or covers
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/64Nanometer sized, i.e. from 1-100 nanometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/10Solid density
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/11Powder tap density
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/12Surface area
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/19Oil-absorption capacity, e.g. DBP values
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/22Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/80Compositional purity
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/80Compositional purity
    • C01P2006/82Compositional purity water content
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/90Other properties not specified above
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2200/00Chemical nature of materials in mouldable or extrudable form for sealing or packing joints or covers
    • C09K2200/02Inorganic compounds
    • C09K2200/0243Silica-rich compounds, e.g. silicates, cement, glass
    • C09K2200/0247Silica

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Composite Materials (AREA)
  • Silicon Compounds (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
  • Paints Or Removers (AREA)

Abstract

하기 물리-화학적 성질 :
비표면적 ㎡/g 80-400
일차 입자 크기 ㎚ 7-40
탭 밀도 g/l 50-300
pH 수치 3-10
탄소 함량 % 0.1-15
DBP 수 % 〈200
을 갖는 실리카는, 집중 혼합하에 경우에 따라 우선적으로 물 또는 묽은 산과 함께, 및 이어서 표면-변형제 또는 몇몇 표면-변형제 또는 몇몇 표면-변형제의 혼합물과 함께 실리카를 분무하고, 혼합하여 단련시키고, 다음으로 분쇄/압축 및 파쇄하므로써 생성된다.

Description

실란화 실리카
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (10)

  1. 하기 물리-화학적 성질을 갖는 실란화 실리카 :
    비표면적 ㎡/g 80-400
    일차 입자 크기 ㎚ 7-40
    탭 밀도 g/l 50-300
    pH 수치 3-10
    탄소 함량 % 0.1-15
    DBP 수 % 〈200
  2. 실리카를 집중 혼합하에 혼합 용기내에, 경우에 따라 우선적으로 물 또는 묽은 산과 함께, 및 이어서 표면-변형제 도는 몇몇 변형제의 혼합물과 함께 분무하고, 15 내지 30분간 혼합하고, 100~400℃의 온도에서 1~6시간 동안 단련시켜 소수성, 실란화 실리카를 생성하는 것을 특징으로 하는, 제1항에 따른 실란화 실리카의 생성 방법.
  3. 제2항에 있어서, 다음으로 기계적 작용에 의해서 상기 실리카를 분쇄하거나 또는 압착시키는 것을 더 포함하는 방법.
  4. 제3항에 있어서, 상기 실리카를 분쇄하는 것을 더 포함하는 방법.
  5. 제2항에 있어서, 상기 표면 변형제가 헥사메틸디실라잔인 방법.
  6. 중합체 및 제1항에 따른 실란화 실리카를 함유하는 중합체 조성물.
  7. 제6항에 있어서, 낮은 점성도 및 낮은 유동점을 갖는 중합체 조성물.
  8. 중합체 조성물에 제1항의 실란화 실리카를 첨가하는 것을 특징으로 하는, 낮은 유동점을 갖는 낮은-점성도 중합체 시스템의 생성 방법.
  9. 제1항의 실란화 실리카를 첨가하는 것을 특징으로 하는 페인트 또는 필름의 성질 변형 방법.
  10. 액체 중합체 시스템 및 제1항의 실란화 실리카를 함유하는 피복 조성물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019970015688A 1996-04-26 1997-04-25 실란화 실리카 KR100260325B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19616781.7 1996-04-26
DE19616781A DE19616781A1 (de) 1996-04-26 1996-04-26 Silanisierte Kieselsäure

Publications (2)

Publication Number Publication Date
KR970069878A true KR970069878A (ko) 1997-11-07
KR100260325B1 KR100260325B1 (ko) 2000-07-01

Family

ID=7792574

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019970015688A KR100260325B1 (ko) 1996-04-26 1997-04-25 실란화 실리카

Country Status (6)

Country Link
EP (1) EP0808880B1 (ko)
JP (1) JP3553315B2 (ko)
KR (1) KR100260325B1 (ko)
CN (1) CN1083397C (ko)
CA (1) CA2203726C (ko)
DE (2) DE19616781A1 (ko)

Families Citing this family (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR960016029B1 (ko) * 1990-03-22 1996-11-25 화낙 가부시끼가이샤 금형 자동교환식 사출성형기
DE19800022A1 (de) * 1998-01-02 1999-07-08 Huels Silicone Gmbh Verfahren zur Herstellung von Siliconpolymer-Feststoff-Mischungen für fließfähige RTV2-Silicon-Massen mit niedriger Fließgrenze
DE19929845A1 (de) 1999-06-29 2001-01-11 Degussa Oberflächenmodifiziertes Titandioxid
GB2357497A (en) 1999-12-22 2001-06-27 Degussa Hydrophobic silica
EP1199336B1 (de) 2000-10-21 2014-01-15 Evonik Degussa GmbH Funktionalisierte, strukturmodifizierte Kieselsäuren
ES2359228T3 (es) 2000-10-21 2011-05-19 Evonik Degussa Gmbh Sistemas de barnices curables por radiación.
EP1199335B1 (de) * 2000-10-21 2010-12-22 Evonik Degussa GmbH Funktionalisierte Kieselsäuren
DE10105750A1 (de) * 2001-02-08 2002-10-10 Degussa Fällungskieselsäuren mit enger Partikelgrößenverteilung
DE10138492A1 (de) * 2001-08-04 2003-02-13 Degussa Hydrophobe, nicht getemperte Fällungskieselsäure mit hohem Weißgrad
DE10138490A1 (de) 2001-08-04 2003-02-13 Degussa Hydrophobe Fällungskieselsäure mit hohem Weißgrad und extrem niedriger Feuchtigkeitsaufnahme
DE10138491A1 (de) 2001-08-04 2003-02-13 Degussa Verfahren zur Herstellung einer hydrophoben Fällungskieselsäure mit hohem Weißgrad und extrem niedriger Feuchtigkeitsaufnahme
DE10145162A1 (de) * 2001-09-13 2003-04-10 Wacker Chemie Gmbh Kieselsäure mit geringem Gehalt an Kieselsäure-Silanolgruppen
JP3965497B2 (ja) * 2001-12-28 2007-08-29 日本アエロジル株式会社 低増粘性フュームドシリカおよびそのスラリー
ES2250534T3 (es) * 2002-03-30 2006-04-16 Degussa Ag Acidos silicicos de precipitacion con una distribucion estrecha del tamaño de particula.
DE10239423A1 (de) * 2002-08-28 2004-03-11 Degussa Ag Kieselsäure
DE10239424A1 (de) * 2002-08-28 2004-03-11 Degussa Ag Kieselsäuren
DE10250712A1 (de) 2002-10-31 2004-05-19 Degussa Ag Pulverförmige Stoffe
DE10258858A1 (de) * 2002-12-17 2004-08-05 Degussa Ag Pyrogen hergestelltes Siliciumdioxid
EP1431245A1 (de) * 2002-12-17 2004-06-23 Degussa-Hüls Aktiengesellschaft Oberflächenmodifizierte, aerogelartige, strukturierte Kieselsäure
JP4860928B2 (ja) * 2002-12-18 2012-01-25 エボニック デグサ ゲーエムベーハー 構造的に変性されたシリカ
CN1320045C (zh) * 2002-12-18 2007-06-06 德古萨公司 结构-涂覆的二氧化硅和其制备方法、涂料体系及其用途以及塑料体
JP2006515556A (ja) 2002-12-18 2006-06-01 デグサ アクチエンゲゼルシャフト 表面改質された、エアロゲル型ストラクチャードシリカ
DE10337198A1 (de) * 2003-08-13 2005-03-17 Degussa Ag Träger auf Basis von Granulaten, die aus pyrogen hergestelltem Siliciumdioxiden hergestellt sind
DE102004010755A1 (de) * 2004-03-05 2005-09-22 Degussa Ag Silikonkautschuk
DE102004010756A1 (de) * 2004-03-05 2005-09-22 Degussa Ag Silanisierte Kieselsäuren
ATE406405T1 (de) * 2005-06-25 2008-09-15 Evonik Degussa Gmbh Thermoplastische matrix enthaltend silanisierte pyrogene kieselsäure
WO2007019229A1 (en) * 2005-08-05 2007-02-15 3M Innovative Properties Company Compositions exhibiting improved flowability
US8435474B2 (en) * 2006-09-15 2013-05-07 Cabot Corporation Surface-treated metal oxide particles
US8202502B2 (en) 2006-09-15 2012-06-19 Cabot Corporation Method of preparing hydrophobic silica
US20080070146A1 (en) * 2006-09-15 2008-03-20 Cabot Corporation Hydrophobic-treated metal oxide
US8455165B2 (en) 2006-09-15 2013-06-04 Cabot Corporation Cyclic-treated metal oxide
DE102006048509A1 (de) * 2006-10-13 2008-04-17 Evonik Degussa Gmbh Oberflächenmodifizierte, strukturmodifizierte pyrogen hergestellte Kieselsäuren
DE102007024365A1 (de) * 2007-05-22 2008-11-27 Evonik Degussa Gmbh Pyrogen hergestellte silanisierte und vermahlene Kieselsäure
DE102007025685A1 (de) 2007-06-01 2008-12-04 Evonik Degussa Gmbh RTV-Zweikomponenten-Silikonkautschuk
DE102007026214A1 (de) 2007-06-05 2008-12-11 Evonik Degussa Gmbh Flammruß
DE102007035952A1 (de) * 2007-07-30 2009-04-09 Evonik Degussa Gmbh Oberflächenmodifizierte, pyrogen hergestellte Kieselsäuren
EP2070992A1 (de) * 2007-12-11 2009-06-17 Evonik Degussa GmbH Lacksysteme
DE102008001433A1 (de) * 2008-04-28 2009-10-29 Evonik Degussa Gmbh Hydrophobiertes Silicium-Eisen-Mischoxid
DE102008001437A1 (de) * 2008-04-28 2009-10-29 Evonik Degussa Gmbh Oberflächenmodifizierte, superparamagnetische oxidische Partikel
DE602008006681D1 (de) * 2008-05-15 2011-06-16 Evonik Degussa Gmbh Elektronische Verpackung
DE102008001808A1 (de) 2008-05-15 2009-11-19 Evonik Degussa Gmbh Beschichtungszusammensetzung
DE102008001855A1 (de) 2008-05-19 2009-11-26 Evonik Degussa Gmbh Zweikomponenten-Zusammensetzung zur Herstellung von flexiblen Polyurethan-Gelcoats
EP2123712A1 (en) 2008-05-19 2009-11-25 Evonik Degussa GmbH Epoxy resin composition and electronic part
EP2145929B1 (de) 2008-07-18 2020-06-24 Evonik Operations GmbH Verfahren zur Herstellung redispergierbarer, oberflächenmodifizierter Siliciumdioxidpartikel
ES2644759T3 (es) 2008-07-18 2017-11-30 Evonik Degussa Gmbh Dispersión de partículas de dióxido de silicio hidrofobizadas y granulado de la misma
CN102391296B (zh) * 2011-07-13 2014-05-14 山东旭业新材料股份有限公司 疏水性硅烷分散剂的制备方法
DE102013224206A1 (de) 2013-11-27 2015-05-28 Wacker Chemie Ag Oberflächenmodifizierte partikuläre Metalloxide
JP7055294B2 (ja) * 2018-04-02 2022-04-18 株式会社トラディショナルインテリジェンス コーティング部材およびシリカ質コーティング層の形成方法
CN109320998B (zh) * 2018-10-10 2021-02-23 江苏联瑞新材料股份有限公司 一种亚微米硅微粉表面改性的方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL41404A (en) * 1972-02-17 1975-12-31 Cabot Corp Water-repellent coating compositions
DE2403783C2 (de) * 1974-01-26 1982-10-21 Bayer Ag, 5090 Leverkusen Verfahren zur Herstellung hydrophobierter pyrogener Kieselsäure
US4208316A (en) * 1978-06-29 1980-06-17 Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler Hydrophobic precipitated silicic acid and compositions containing same
EP0466958B1 (de) * 1990-07-19 1992-06-03 Degussa Aktiengesellschaft Oberflächenmodifizierte Siliciumdioxide

Also Published As

Publication number Publication date
CN1083397C (zh) 2002-04-24
CA2203726A1 (en) 1997-10-26
JP3553315B2 (ja) 2004-08-11
KR100260325B1 (ko) 2000-07-01
JPH1087317A (ja) 1998-04-07
CN1167729A (zh) 1997-12-17
EP0808880A2 (de) 1997-11-26
EP0808880B1 (de) 2003-01-08
CA2203726C (en) 2001-08-07
DE59709069D1 (de) 2003-02-13
EP0808880A3 (de) 1999-10-27
DE19616781A1 (de) 1997-11-06

Similar Documents

Publication Publication Date Title
KR970069878A (ko) 실린화 실리카
KR950704193A (ko) 침강 실리카(precipitated silica)
TR199900182T1 (xx) Elastomer g��lendirici dolgu maddesi olarak kullan�lan ��km�� silisyum dioksit.
ATE478835T1 (de) Feststoffhaltige, wasserquellende und -saugende, anionische polymere mit schwammstruktur sowie deren herstellung und verwendung
ATE282006T1 (de) Verfahren zur herstellung von hydrophober kolloidaler kieselsäure
EP2199308A4 (en) SOURCE-BASED NETWORKED HYALURONIC ACID POWDER AND METHOD OF MANUFACTURING THEREOF
KR970074886A (ko) 실리카-세륨옥시드 복합입자, 그의 제조방법 및 그를 배합한 수지 조성물 및 화장 조성물
KR930701145A (ko) 박편(薄片) 형상 미분말 및 그 제조방법 및 화장료(化粧料)
BR9712885A (pt) Processo de neutralização para a fabricação de grânulos de aglomerado de detergente
GB1525943A (en) Antifoam compositions and process for the preparation and use thereof
TW349075B (en) Process entailing sol-gel production of silica glass
JPS6430637A (en) Emulsion composition
EP1640414A4 (en) SILICATE COMPOSITION AND PRODUCTION METHOD THEREFOR
EP1544257A3 (en) Process for producing inorganic oxide organosol
KR850001684A (ko) 치마조성물 및 그의 제조방법
CN106496794A (zh) 具有净化车内空气功能的负离子塑料内饰件的制备方法
Krysztafkiewicz et al. Amorphous magnesium silicate—synthesis, physicochemical properties and surface morphology
EP0215575B1 (en) Preparation of organoclays and use thereof for increasing the viscosity of alcoholic media
CN110894384A (zh) 一种安全释放负离子的水性涂料
US2174177A (en) Processes of producing an adsorbent agent
US5738718A (en) Zinc oxide-containing spherical silica and process for its production
JP2011506657A (ja) 被覆系
JPS591571A (ja) 微粒子炭酸カルシウム顔料の製法
JPH051208B2 (ko)
CN114436270B (zh) 双球状二氧化硅及其制备方法与应用

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
AMND Amendment
E902 Notification of reason for refusal
AMND Amendment
E601 Decision to refuse application
J201 Request for trial against refusal decision
B701 Decision to grant
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20120402

Year of fee payment: 13

FPAY Annual fee payment

Payment date: 20130328

Year of fee payment: 14

FPAY Annual fee payment

Payment date: 20160324

Year of fee payment: 17

FPAY Annual fee payment

Payment date: 20170323

Year of fee payment: 18

EXPY Expiration of term