KR940002980A - 반도체 칩 실장방법 및 기판 구조체 - Google Patents
반도체 칩 실장방법 및 기판 구조체 Download PDFInfo
- Publication number
- KR940002980A KR940002980A KR1019920013308A KR920013308A KR940002980A KR 940002980 A KR940002980 A KR 940002980A KR 1019920013308 A KR1019920013308 A KR 1019920013308A KR 920013308 A KR920013308 A KR 920013308A KR 940002980 A KR940002980 A KR 940002980A
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- hole
- chip
- pad
- wiring network
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
- H01L21/486—Via connections through the substrate with or without pins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49827—Via connections through the substrates, e.g. pins going through the substrate, coaxial cables
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/303—Surface mounted components, e.g. affixing before soldering, aligning means, spacing means
- H05K3/305—Affixing by adhesive
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/16235—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the bump connector connecting to a via metallisation of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/291—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29101—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of less than 400°C
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/2919—Material with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
- H01L2224/818—Bonding techniques
- H01L2224/81801—Soldering or alloying
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/831—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector the layer connector being supplied to the parts to be connected in the bonding apparatus
- H01L2224/83101—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector the layer connector being supplied to the parts to be connected in the bonding apparatus as prepeg comprising a layer connector, e.g. provided in an insulating plate member
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8319—Arrangement of the layer connectors prior to mounting
- H01L2224/83194—Lateral distribution of the layer connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/91—Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
- H01L2224/92—Specific sequence of method steps
- H01L2224/9202—Forming additional connectors after the connecting process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L24/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01082—Lead [Pb]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/014—Solder alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/06—Polymers
- H01L2924/0665—Epoxy resin
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/06—Polymers
- H01L2924/078—Adhesive characteristics other than chemical
- H01L2924/07802—Adhesive characteristics other than chemical not being an ohmic electrical conductor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09209—Shape and layout details of conductors
- H05K2201/095—Conductive through-holes or vias
- H05K2201/0959—Plated through-holes or plated blind vias filled with insulating material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/4038—Through-connections; Vertical interconnect access [VIA] connections
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.
- Y10T29/49133—Assembling to base an electrical component, e.g., capacitor, etc. with component orienting
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
- Y10T29/49165—Manufacturing circuit on or in base by forming conductive walled aperture in base
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Wire Bonding (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
연결패드가 형성된 반도체 칩과, 상기 연결캐드와 대응하는 위치에 관통공이 있고 적어도 2층 이상의 절연기판과, 그 사이의 도전 배선망이 있는 다층기판과를 상호 연결함에 있어, 상기 칩 패드 위치에 대응하는 위치에서 홀을 형성하고 있는 필름 타입의 절연접착층을 칩과 기판관에 개재시켜 칩의 패드, 필름의 흘, 기판의 관통공이 서로 일치하도록 정렬시켜 칩과 기판을 부착시키는 단계와, 칩이 부착된 기판의 상면의 반대측 뒷면에서 관통공의 한쪽을 막고 있는 칩의 금속패드와 관통공 내벽 및 기판 뒷면을 도포하도록 도전층을 형성하여 칩의 패드와 기판 내부의 도면 배선망이 상호 연결되도록 하는 단계와, 관통공을 절연물질로 매립하는 단계로 이루어져 칩을 기판에 실장하도록 하는 것을 특징으로 하는 반도체 칩 실장방법에 관한 것.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제2도(a)-(e)는 본 발명에 따른 반도체 칩 실장방식을 설명하는 조립 공정도이다.
Claims (11)
- 연결패드가 형성된 반도체 칩과, 상기 연결패드와 대응하는 위치에 관통공이 있고 이 관통공에 연결된 도전 배선망이 있는 기판을 상호 연결함에 있어, 상기 칩 패드 위치에 대응하는 위치에서 홀을 형성하고 있는 필름 타입의 절연접착층을 칩과 기판간에 개재시켜 칩의 패드, 필름의 홀, 기판의 관통공이 서로 일치하도록 정렬시켜 칩과 기판을 부착시키는 단계와, 칩이 부착된 기판의 상면의 반대측 뒷면에서 관통공의 한쪽을 막고 있는 칩의 금속패드와 관통공 내벽 및 기판 뒷면을 도포하도록 도전층을 형성하여 칩의 패드와기판 내부로 도전 배선망이 상호 연결되도록 하는 단계와, 관통공을 절연물질로 매립하는 단계로 이루어지며 절연기판 뒷면을 폴리슁하여 칩을 기판에 실장하도록 하는 것을 특징으로 하는 반도체 칩 실장방법.
- 제1항에 있어서, 상기 관통공이 있는 기판은 적어도 2층이상의 절연기판과 그 사이에 도전 배선망이 있는 다층기판인 것을 특징으로 하는 반도체 칩 실장방법.
- 제1항에 있어서, 상기 관통공이 있는 기판은 기판 표면에 상기 관통공이 연결된 도전 배선망이 있는 기판인 것을 특징으로 하는 반도체 칩 실장방법.
- 제1항에 있어서, 상기 도전층은 스퍼터링, 전기도금 또는 증착(evaporation)에 의해 Au 내지는 Ni로 형성됨을 특징으로 하는 반도체 칩 실장방법.
- 제1항에 있어서, 상기 관통공을 매립하고 있는 절연물질은 에폭시 또는 폴리이미드인 것을 특징으로 하는 반도체 칩 실장방법.
- 표면에 연결패드가 있는 반도체층과 상기 패드와 같은 위치에 형성된 관통공과 이 관통공에 연결된 도전 배선망을 포함하는 기판과, 상기 칩의 패드와 기판의 관통공을 일치시키면서 그 사이에 개재된 접착층과, 상기 기판의 관통 내벽과 칩의 패드 표면에 형성되어, 상기 기판 내부의 도전 배선망을 반도체 칩의 패드와 연결하고 있는 도전층과, 관통공을 매립하고 상기 도전층상에 형성된 절연층으로 구성됨을 특징으로 하는 반도체 칩이 결합된 기판 구조체.
- 제4항에 있어서, 상기 관통공 내의 도전층은 Au 또는 Ni로부터 이루어진 것을 특징으로 하는 반도체 칩이 결합된 기판 구조체.
- 제4항에 있어서, 상기 관통공을 매립하고 있는 절연물질은 에폭시 또는 폴리아미드인 것을 특징으로 하는 반도체 칩이 결합된 기판 구조체.
- 제7항에 있어서, 절연기판 뒷면을 폴리슁하여 된 것을 특징으로 하는 기판 구조체.
- 제4항에 있어서, 상기 관통공이 있는 기판은 직어도 2층 이상의 절연기판과 그 사이에 도전 배선망이 있는 다층기판인 것을 특징을 하는 기판 구조체.
- 제4항에 있어서, 상기 관통공이 있는 기판은 기판표면에 상기 관통공이 연결된 도전 배선망이 있는 기판인 것을 특징으로 하는 기판 구조체.※ 참고사항:최초출원 내용에 의하여 공개하는 것임.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019920013308A KR950012658B1 (ko) | 1992-07-24 | 1992-07-24 | 반도체 칩 실장방법 및 기판 구조체 |
JP5180088A JP2592038B2 (ja) | 1992-07-24 | 1993-07-21 | 半導体チップ実装方法および基板構造体 |
US08/095,375 US5407864A (en) | 1992-07-24 | 1993-07-23 | Process for mounting a semiconductor chip and depositing contacts into through holes of a circuit board and of an insulating interposer and onto the chip |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019920013308A KR950012658B1 (ko) | 1992-07-24 | 1992-07-24 | 반도체 칩 실장방법 및 기판 구조체 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR940002980A true KR940002980A (ko) | 1994-02-19 |
KR950012658B1 KR950012658B1 (ko) | 1995-10-19 |
Family
ID=19336962
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019920013308A KR950012658B1 (ko) | 1992-07-24 | 1992-07-24 | 반도체 칩 실장방법 및 기판 구조체 |
Country Status (3)
Country | Link |
---|---|
US (1) | US5407864A (ko) |
JP (1) | JP2592038B2 (ko) |
KR (1) | KR950012658B1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100782483B1 (ko) * | 2006-01-19 | 2007-12-05 | 삼성전자주식회사 | 내부단자 배선을 갖는 패키지 보드 및 이를 채택하는반도체 패키지 |
Families Citing this family (103)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69431023T2 (de) * | 1993-09-01 | 2003-02-06 | Toshiba Kawasaki Kk | Halbleiteraufbau und Verfahren zur Herstellung |
JPH0864938A (ja) * | 1994-08-25 | 1996-03-08 | Sharp Corp | チップ型電子部品の接続方法 |
KR0137826B1 (ko) * | 1994-11-15 | 1998-04-28 | 문정환 | 반도체 디바이스 패키지 방법 및 디바이스 패키지 |
JPH08167630A (ja) * | 1994-12-15 | 1996-06-25 | Hitachi Ltd | チップ接続構造 |
US5766975A (en) * | 1995-01-09 | 1998-06-16 | Integrated Device Technology, Inc. | Packaged integrated circuit having thermal enhancement and reduced footprint size |
JP2763020B2 (ja) * | 1995-04-27 | 1998-06-11 | 日本電気株式会社 | 半導体パッケージ及び半導体装置 |
US5696466A (en) * | 1995-12-08 | 1997-12-09 | The Whitaker Corporation | Heterolithic microwave integrated impedance matching circuitry and method of manufacture |
US5880530A (en) * | 1996-03-29 | 1999-03-09 | Intel Corporation | Multiregion solder interconnection structure |
US5936847A (en) * | 1996-05-02 | 1999-08-10 | Hei, Inc. | Low profile electronic circuit modules |
KR100186309B1 (ko) * | 1996-05-17 | 1999-03-20 | 문정환 | 적층형 버텀 리드 패키지 |
JP3610999B2 (ja) * | 1996-06-07 | 2005-01-19 | 松下電器産業株式会社 | 半導体素子の実装方法 |
DE69738289D1 (de) * | 1996-07-22 | 2007-12-27 | Honda Motor Co Ltd | Verbindung zwischen leiterplatte und steckerelement |
US5909011A (en) * | 1996-08-01 | 1999-06-01 | International Business Machines Corporation | Method and apparatus for modifying circuit having ball grid array interconnections |
US5910687A (en) * | 1997-01-24 | 1999-06-08 | Chipscale, Inc. | Wafer fabrication of die-bottom contacts for electronic devices |
US5904496A (en) | 1997-01-24 | 1999-05-18 | Chipscale, Inc. | Wafer fabrication of inside-wrapped contacts for electronic devices |
US6406939B1 (en) | 1998-05-02 | 2002-06-18 | Charles W. C. Lin | Flip chip assembly with via interconnection |
SG75841A1 (en) | 1998-05-02 | 2000-10-24 | Eriston Invest Pte Ltd | Flip chip assembly with via interconnection |
US5981311A (en) * | 1998-06-25 | 1999-11-09 | Lsi Logic Corporation | Process for using a removeable plating bus layer for high density substrates |
JP3201353B2 (ja) * | 1998-08-04 | 2001-08-20 | 日本電気株式会社 | 半導体装置とその製造方法 |
US6239485B1 (en) | 1998-11-13 | 2001-05-29 | Fujitsu Limited | Reduced cross-talk noise high density signal interposer with power and ground wrap |
TW444236B (en) | 1998-12-17 | 2001-07-01 | Charles Wen Chyang Lin | Bumpless flip chip assembly with strips and via-fill |
SG78324A1 (en) | 1998-12-17 | 2001-02-20 | Eriston Technologies Pte Ltd | Bumpless flip chip assembly with strips-in-via and plating |
TW396462B (en) * | 1998-12-17 | 2000-07-01 | Eriston Technologies Pte Ltd | Bumpless flip chip assembly with solder via |
US6926796B1 (en) * | 1999-01-29 | 2005-08-09 | Matsushita Electric Industrial Co., Ltd. | Electronic parts mounting method and device therefor |
DE19909505C2 (de) * | 1999-03-04 | 2001-11-15 | Daimler Chrysler Ag | Verfahren zur Herstellung von Schaltungsanordnungen |
US6675469B1 (en) | 1999-08-11 | 2004-01-13 | Tessera, Inc. | Vapor phase connection techniques |
JP3973340B2 (ja) * | 1999-10-05 | 2007-09-12 | Necエレクトロニクス株式会社 | 半導体装置、配線基板、及び、それらの製造方法 |
US6294425B1 (en) | 1999-10-14 | 2001-09-25 | Samsung Electronics Co., Ltd. | Methods of forming integrated circuit capacitors by electroplating electrodes from seed layers |
US6388335B1 (en) * | 1999-12-14 | 2002-05-14 | Atmel Corporation | Integrated circuit package formed at a wafer level |
US6198170B1 (en) * | 1999-12-16 | 2001-03-06 | Conexant Systems, Inc. | Bonding pad and support structure and method for their fabrication |
US6551861B1 (en) | 2000-08-22 | 2003-04-22 | Charles W. C. Lin | Method of making a semiconductor chip assembly by joining the chip to a support circuit with an adhesive |
US6660626B1 (en) | 2000-08-22 | 2003-12-09 | Charles W. C. Lin | Semiconductor chip assembly with simultaneously electrolessly plated contact terminal and connection joint |
US6562709B1 (en) | 2000-08-22 | 2003-05-13 | Charles W. C. Lin | Semiconductor chip assembly with simultaneously electroplated contact terminal and connection joint |
US6402970B1 (en) | 2000-08-22 | 2002-06-11 | Charles W. C. Lin | Method of making a support circuit for a semiconductor chip assembly |
US6436734B1 (en) | 2000-08-22 | 2002-08-20 | Charles W. C. Lin | Method of making a support circuit for a semiconductor chip assembly |
US6350633B1 (en) | 2000-08-22 | 2002-02-26 | Charles W. C. Lin | Semiconductor chip assembly with simultaneously electroplated contact terminal and connection joint |
US6562657B1 (en) | 2000-08-22 | 2003-05-13 | Charles W. C. Lin | Semiconductor chip assembly with simultaneously electrolessly plated contact terminal and connection joint |
US6403460B1 (en) | 2000-08-22 | 2002-06-11 | Charles W. C. Lin | Method of making a semiconductor chip assembly |
US6350386B1 (en) * | 2000-09-20 | 2002-02-26 | Charles W. C. Lin | Method of making a support circuit with a tapered through-hole for a semiconductor chip assembly |
US6350632B1 (en) | 2000-09-20 | 2002-02-26 | Charles W. C. Lin | Semiconductor chip assembly with ball bond connection joint |
US6511865B1 (en) | 2000-09-20 | 2003-01-28 | Charles W. C. Lin | Method for forming a ball bond connection joint on a conductive trace and conductive pad in a semiconductor chip assembly |
US6448108B1 (en) | 2000-10-02 | 2002-09-10 | Charles W. C. Lin | Method of making a semiconductor chip assembly with a conductive trace subtractively formed before and after chip attachment |
US6544813B1 (en) | 2000-10-02 | 2003-04-08 | Charles W. C. Lin | Method of making a semiconductor chip assembly with a conductive trace subtractively formed before and after chip attachment |
US7129575B1 (en) | 2000-10-13 | 2006-10-31 | Bridge Semiconductor Corporation | Semiconductor chip assembly with bumped metal pillar |
US6908788B1 (en) | 2000-10-13 | 2005-06-21 | Bridge Semiconductor Corporation | Method of connecting a conductive trace to a semiconductor chip using a metal base |
US7009297B1 (en) | 2000-10-13 | 2006-03-07 | Bridge Semiconductor Corporation | Semiconductor chip assembly with embedded metal particle |
US6492252B1 (en) | 2000-10-13 | 2002-12-10 | Bridge Semiconductor Corporation | Method of connecting a bumped conductive trace to a semiconductor chip |
US6699780B1 (en) | 2000-10-13 | 2004-03-02 | Bridge Semiconductor Corporation | Method of connecting a conductive trace to a semiconductor chip using plasma undercut etching |
US6548393B1 (en) | 2000-10-13 | 2003-04-15 | Charles W. C. Lin | Semiconductor chip assembly with hardened connection joint |
US6949408B1 (en) | 2000-10-13 | 2005-09-27 | Bridge Semiconductor Corporation | Method of connecting a conductive trace and an insulative base to a semiconductor chip using multiple etch steps |
US6440835B1 (en) | 2000-10-13 | 2002-08-27 | Charles W. C. Lin | Method of connecting a conductive trace to a semiconductor chip |
US6984576B1 (en) | 2000-10-13 | 2006-01-10 | Bridge Semiconductor Corporation | Method of connecting an additively and subtractively formed conductive trace and an insulative base to a semiconductor chip |
US6576493B1 (en) | 2000-10-13 | 2003-06-10 | Bridge Semiconductor Corporation | Method of connecting a conductive trace and an insulative base to a semiconductor chip using multiple etch steps |
US6537851B1 (en) * | 2000-10-13 | 2003-03-25 | Bridge Semiconductor Corporation | Method of connecting a bumped compliant conductive trace to a semiconductor chip |
US7264991B1 (en) | 2000-10-13 | 2007-09-04 | Bridge Semiconductor Corporation | Method of connecting a conductive trace to a semiconductor chip using conductive adhesive |
US6576539B1 (en) | 2000-10-13 | 2003-06-10 | Charles W.C. Lin | Semiconductor chip assembly with interlocked conductive trace |
US7094676B1 (en) | 2000-10-13 | 2006-08-22 | Bridge Semiconductor Corporation | Semiconductor chip assembly with embedded metal pillar |
US7075186B1 (en) | 2000-10-13 | 2006-07-11 | Bridge Semiconductor Corporation | Semiconductor chip assembly with interlocked contact terminal |
US7190080B1 (en) | 2000-10-13 | 2007-03-13 | Bridge Semiconductor Corporation | Semiconductor chip assembly with embedded metal pillar |
US6667229B1 (en) | 2000-10-13 | 2003-12-23 | Bridge Semiconductor Corporation | Method of connecting a bumped compliant conductive trace and an insulative base to a semiconductor chip |
US6876072B1 (en) | 2000-10-13 | 2005-04-05 | Bridge Semiconductor Corporation | Semiconductor chip assembly with chip in substrate cavity |
US6740576B1 (en) | 2000-10-13 | 2004-05-25 | Bridge Semiconductor Corporation | Method of making a contact terminal with a plated metal peripheral sidewall portion for a semiconductor chip assembly |
US7414319B2 (en) * | 2000-10-13 | 2008-08-19 | Bridge Semiconductor Corporation | Semiconductor chip assembly with metal containment wall and solder terminal |
US7262082B1 (en) | 2000-10-13 | 2007-08-28 | Bridge Semiconductor Corporation | Method of making a three-dimensional stacked semiconductor package with a metal pillar and a conductive interconnect in an encapsulant aperture |
US7132741B1 (en) | 2000-10-13 | 2006-11-07 | Bridge Semiconductor Corporation | Semiconductor chip assembly with carved bumped terminal |
US7129113B1 (en) | 2000-10-13 | 2006-10-31 | Bridge Semiconductor Corporation | Method of making a three-dimensional stacked semiconductor package with a metal pillar in an encapsulant aperture |
US7319265B1 (en) | 2000-10-13 | 2008-01-15 | Bridge Semiconductor Corporation | Semiconductor chip assembly with precision-formed metal pillar |
US7071089B1 (en) | 2000-10-13 | 2006-07-04 | Bridge Semiconductor Corporation | Method of making a semiconductor chip assembly with a carved bumped terminal |
US6872591B1 (en) | 2000-10-13 | 2005-03-29 | Bridge Semiconductor Corporation | Method of making a semiconductor chip assembly with a conductive trace and a substrate |
US6673710B1 (en) | 2000-10-13 | 2004-01-06 | Bridge Semiconductor Corporation | Method of connecting a conductive trace and an insulative base to a semiconductor chip |
US6580165B1 (en) * | 2000-11-16 | 2003-06-17 | Fairchild Semiconductor Corporation | Flip chip with solder pre-plated leadframe including locating holes |
US6444489B1 (en) | 2000-12-15 | 2002-09-03 | Charles W. C. Lin | Semiconductor chip assembly with bumped molded substrate |
DE10101359A1 (de) * | 2001-01-13 | 2002-07-25 | Conti Temic Microelectronic | Verfahren zur Herstellung einer elektronischen Baugruppe |
US6653170B1 (en) | 2001-02-06 | 2003-11-25 | Charles W. C. Lin | Semiconductor chip assembly with elongated wire ball bonded to chip and electrolessly plated to support circuit |
JP3888854B2 (ja) * | 2001-02-16 | 2007-03-07 | シャープ株式会社 | 半導体集積回路の製造方法 |
TWI292836B (ko) * | 2001-10-31 | 2008-01-21 | Chi Mei Optoelectronics Corp | |
TWI290365B (en) * | 2002-10-15 | 2007-11-21 | United Test Ct Inc | Stacked flip-chip package |
US6815266B2 (en) * | 2002-12-30 | 2004-11-09 | Bae Systems Information And Electronic Systems Integration, Inc. | Method for manufacturing sidewall contacts for a chalcogenide memory device |
FI20031341A (fi) | 2003-09-18 | 2005-03-19 | Imbera Electronics Oy | Menetelmä elektroniikkamoduulin valmistamiseksi |
US7993983B1 (en) | 2003-11-17 | 2011-08-09 | Bridge Semiconductor Corporation | Method of making a semiconductor chip assembly with chip and encapsulant grinding |
US7538415B1 (en) | 2003-11-20 | 2009-05-26 | Bridge Semiconductor Corporation | Semiconductor chip assembly with bumped terminal, filler and insulative base |
US7425759B1 (en) | 2003-11-20 | 2008-09-16 | Bridge Semiconductor Corporation | Semiconductor chip assembly with bumped terminal and filler |
FI117814B (fi) * | 2004-06-15 | 2007-02-28 | Imbera Electronics Oy | Menetelmä elektroniikkamoduulin valmistamiseksi |
US7632747B2 (en) | 2004-08-19 | 2009-12-15 | Micron Technology, Inc. | Conductive structures for microfeature devices and methods for fabricating microfeature devices |
US7446419B1 (en) | 2004-11-10 | 2008-11-04 | Bridge Semiconductor Corporation | Semiconductor chip assembly with welded metal pillar of stacked metal balls |
US7268421B1 (en) | 2004-11-10 | 2007-09-11 | Bridge Semiconductor Corporation | Semiconductor chip assembly with welded metal pillar that includes enlarged ball bond |
US7750483B1 (en) | 2004-11-10 | 2010-07-06 | Bridge Semiconductor Corporation | Semiconductor chip assembly with welded metal pillar and enlarged plated contact terminal |
FI122128B (fi) * | 2005-06-16 | 2011-08-31 | Imbera Electronics Oy | Menetelmä piirilevyrakenteen valmistamiseksi |
US8225499B2 (en) * | 2005-06-16 | 2012-07-24 | Imbera Electronics Oy | Method for manufacturing a circuit board structure, and a circuit board structure |
FI119714B (fi) | 2005-06-16 | 2009-02-13 | Imbera Electronics Oy | Piirilevyrakenne ja menetelmä piirilevyrakenteen valmistamiseksi |
DE102006042774A1 (de) * | 2006-09-12 | 2008-03-27 | Qimonda Ag | Verfahren zur Herstellung einer elektrischen Ankontaktierung |
US7811863B1 (en) | 2006-10-26 | 2010-10-12 | Bridge Semiconductor Corporation | Method of making a semiconductor chip assembly with metal pillar and encapsulant grinding and heat sink attachment |
US7494843B1 (en) | 2006-12-26 | 2009-02-24 | Bridge Semiconductor Corporation | Method of making a semiconductor chip assembly with thermal conductor and encapsulant grinding |
US8994547B2 (en) * | 2009-08-21 | 2015-03-31 | Commscope, Inc. Of North Carolina | Systems for automatically tracking patching connections to network devices using a separate control channel and related patching equipment and methods |
US9538262B2 (en) * | 2009-08-21 | 2017-01-03 | Commscope, Inc. Of North Carolina | Systems, equipment and methods for automatically tracking cable connections and for identifying work area devices and related methods of operating communications networks |
EP2514282B1 (de) | 2009-12-17 | 2017-09-20 | Conti Temic microelectronic GmbH | Leiterplatte mit mehreren übereinander angeordneten leiterplattenlagen mit einer bare-die-montage für den einsatz als getriebesteuerung |
KR101510625B1 (ko) * | 2013-10-24 | 2015-04-10 | 주식회사 플렉스컴 | 임베디드 연성회로기판의 제조방법 |
US9999136B2 (en) | 2014-12-15 | 2018-06-12 | Ge Embedded Electronics Oy | Method for fabrication of an electronic module and electronic module |
KR101602725B1 (ko) * | 2015-03-23 | 2016-03-11 | 주식회사 플렉스컴 | 에이씨에프를 이용한 임베디드 연성회로기판의 제조방법 |
KR101602318B1 (ko) * | 2015-09-24 | 2016-03-10 | 주식회사 플렉스컴 | 에이씨에프를 이용한 임베디드 연성회로기판의 제조방법 |
WO2018098648A1 (zh) * | 2016-11-30 | 2018-06-07 | 深圳修远电子科技有限公司 | 集成电路封装方法以及集成封装电路 |
CN110024107B (zh) * | 2016-11-30 | 2023-11-10 | 深圳修远电子科技有限公司 | 集成电路封装方法以及集成封装电路 |
AT520301B1 (de) * | 2017-10-12 | 2019-03-15 | Zkw Group Gmbh | Verfahren zum erzeugen einer leiterplatte mit thermischen durchkontaktierungen, sowie leiterplatte |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4754371A (en) * | 1984-04-27 | 1988-06-28 | Nec Corporation | Large scale integrated circuit package |
US4918811A (en) * | 1986-09-26 | 1990-04-24 | General Electric Company | Multichip integrated circuit packaging method |
JPS6393124A (ja) * | 1986-10-07 | 1988-04-23 | Sharp Corp | Lsiチツプの接続方式 |
US4879258A (en) * | 1988-08-31 | 1989-11-07 | Texas Instruments Incorporated | Integrated circuit planarization by mechanical polishing |
JP2805245B2 (ja) * | 1989-08-28 | 1998-09-30 | エルエスアイ ロジック コーポレーション | フリップチップ構造 |
US5157589A (en) * | 1990-07-02 | 1992-10-20 | General Electric Company | Mutliple lamination high density interconnect process and structure employing thermoplastic adhesives having sequentially decreasing TG 's |
US5171712A (en) * | 1991-12-20 | 1992-12-15 | Vlsi Technology, Inc. | Method of constructing termination electrodes on yielded semiconductor die by visibly aligning the die pads through a transparent substrate |
-
1992
- 1992-07-24 KR KR1019920013308A patent/KR950012658B1/ko not_active IP Right Cessation
-
1993
- 1993-07-21 JP JP5180088A patent/JP2592038B2/ja not_active Expired - Fee Related
- 1993-07-23 US US08/095,375 patent/US5407864A/en not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100782483B1 (ko) * | 2006-01-19 | 2007-12-05 | 삼성전자주식회사 | 내부단자 배선을 갖는 패키지 보드 및 이를 채택하는반도체 패키지 |
USRE46666E1 (en) | 2006-01-19 | 2018-01-09 | Samsung Electronics Co., Ltd. | Package board having internal terminal interconnection and semiconductor package employing the same |
Also Published As
Publication number | Publication date |
---|---|
KR950012658B1 (ko) | 1995-10-19 |
US5407864A (en) | 1995-04-18 |
JP2592038B2 (ja) | 1997-03-19 |
JPH06168980A (ja) | 1994-06-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR940002980A (ko) | 반도체 칩 실장방법 및 기판 구조체 | |
US5715144A (en) | Multi-layer, multi-chip pyramid and circuit board structure | |
US5907903A (en) | Multi-layer-multi-chip pyramid and circuit board structure and method of forming same | |
US6399892B1 (en) | CTE compensated chip interposer | |
US4987100A (en) | Flexible carrier for an electronic device | |
US5770476A (en) | Passive interposer including at least one passive electronic component | |
US5556807A (en) | Advance multilayer molded plastic package using mesic technology | |
US6166333A (en) | Bumps with plural under-bump dielectric layers | |
EP0585376A1 (en) | Integrated circuit chip carrier | |
KR960042902A (ko) | 솔더 볼 장착홈을 갖는 인쇄 회로 기판과 이를 사용한 볼 그리드 어레이 패키지 | |
KR970060458A (ko) | 회로기판형성용다층필름 및 이를 사용한 다층회로기판 및 반도체장치용패키지 | |
US5093761A (en) | Circuit board device | |
KR920000208A (ko) | 실장기판 | |
EP0139431A2 (en) | Method of mounting a carrier for a microelectronic silicon chip | |
KR900019545A (ko) | 표면장착용 배선기판의 제조방법 | |
JP3158073B2 (ja) | 電子素子のパッケージ方法および電子素子パッケージ | |
KR940001773A (ko) | 다층 인쇄배선판 및 그 제조방법 | |
KR960035986A (ko) | 반도체장치용 패키지 및 그 제조방법 및 반도체장치 | |
KR20010062723A (ko) | 프린트기판 및 그 전기부품설치방법 | |
JPH09246684A (ja) | Bga実装構造 | |
JPH0671144B2 (ja) | 多層高密度実装モジュール | |
JPS63261736A (ja) | プリント配線板 | |
KR970030747A (ko) | 반도체 패키지의 제조방법 및 그 구조 | |
JPH07263869A (ja) | 電子部品搭載用基板及びその製造方法 | |
JP2571960B2 (ja) | 両面可撓性回路基板及びその製造法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20081001 Year of fee payment: 14 |
|
LAPS | Lapse due to unpaid annual fee |