KR930701771A - 상 형성 방법 - Google Patents
상 형성 방법Info
- Publication number
- KR930701771A KR930701771A KR1019920703347A KR920703347A KR930701771A KR 930701771 A KR930701771 A KR 930701771A KR 1019920703347 A KR1019920703347 A KR 1019920703347A KR 920703347 A KR920703347 A KR 920703347A KR 930701771 A KR930701771 A KR 930701771A
- Authority
- KR
- South Korea
- Prior art keywords
- layer
- iii
- substrate
- forming
- phase
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract 3
- 230000015572 biosynthetic process Effects 0.000 title 1
- 230000005855 radiation Effects 0.000 claims abstract 4
- 239000000758 substrate Substances 0.000 claims abstract 4
- 238000001035 drying Methods 0.000 claims abstract 2
- 239000000839 emulsion Substances 0.000 claims abstract 2
- 239000000463 material Substances 0.000 claims abstract 2
- 238000005406 washing Methods 0.000 claims abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract 2
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
- G03F7/0215—Natural gums; Proteins, e.g. gelatins; Macromolecular carbohydrates, e.g. cellulose; Polyvinyl alcohol and derivatives thereof, e.g. polyvinylacetals
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
- H05K2203/0786—Using an aqueous solution, e.g. for cleaning or during drilling of holes
- H05K2203/0793—Aqueous alkaline solution, e.g. for cleaning or etching
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3452—Solder masks
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Ultra Sonic Daignosis Equipment (AREA)
- Diaphragms For Electromechanical Transducers (AREA)
- Magnetic Resonance Imaging Apparatus (AREA)
- Materials For Photolithography (AREA)
Abstract
본 발명은 하기 단계(ⅰ) 내지 (ⅳ)를 포함하는 기판에 패턴화된 상을 형성시키는 방법에 관한 것이다 : (ⅰ) 상기 기판에 광경화성 물질의 수성 유탁액의 층을 형성시키는 단계; (ⅱ) 거의 무수 상태이며, 끈적이지 않는 상태로 상기 층을 건조시키는 단계; (ⅲ) 상기 층을 상에 따라 방사에 노출시켜 방사에 노출된 층의 부분을 경화시키는 단계; 및 (ⅳ) 상기 층의 노출되지 않은 부분(경화되지 않은 부분)을 물로 세척하여 제거하는 단계.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (2)
- 하기 단계 (ⅰ) 내지 (ⅳ)를 포함하는 기판에 패턴화된 상을 형성시키는 방법 : (ⅰ) 상기 기판에 광경화성 물질의 수성 유탁액의 층을 형성시키는 단계; (ⅱ) 거의 무수 상태이며, 끈적이지 않는 상태로 상기 층을 건조시키는 단계; (ⅲ) 상기 층을 상에 따라 방사에 노출시켜 방사(radiation)에 노출된 층의 부분을 경화시키는 단계; 및 (ⅳ) 상기 층의 노출되지 않은 부분(경화되지 않은 부분)을 물로 세척하여 제거하는 단계.
- ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB909014325A GB9014325D0 (en) | 1990-06-27 | 1990-06-27 | Image-forming process |
GB9014325.6 | 1990-06-27 | ||
GB919106561A GB9106561D0 (en) | 1991-03-27 | 1991-03-27 | Image-forming process |
GB9106561.5 | 1991-03-27 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR930701771A true KR930701771A (ko) | 1993-06-12 |
KR100187942B1 KR100187942B1 (ko) | 1999-06-01 |
Family
ID=26297254
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019920703347A KR100187942B1 (ko) | 1990-06-27 | 1991-06-27 | 영상 형성 방법 |
Country Status (7)
Country | Link |
---|---|
US (2) | US5556735A (ko) |
EP (1) | EP0536272B1 (ko) |
JP (1) | JP3071462B2 (ko) |
KR (1) | KR100187942B1 (ko) |
AT (1) | ATE185000T1 (ko) |
DE (1) | DE69131647T2 (ko) |
WO (1) | WO1992000552A1 (ko) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2269385A (en) * | 1992-07-14 | 1994-02-09 | Coates Brothers Plc | Coating compositions |
JP2718901B2 (ja) * | 1994-10-31 | 1998-02-25 | ローム株式会社 | 半導体装置の製造方法 |
US5512607A (en) * | 1995-06-06 | 1996-04-30 | W. R. Grace & Co.-Conn. | Unsaturated epoxy ester with quaternary ammonium and phosphate groups |
WO1996041240A1 (en) * | 1995-06-07 | 1996-12-19 | W.R. Grace & Co.-Conn. | Water photoresist emulsions and methods of preparation thereof |
DE69703505T2 (de) * | 1996-02-26 | 2001-06-13 | Agfa Gevaert Nv | Bildaufzeichnungselement, das eine Zweiphasenbeschichtung mit einer dispergierten hydrophoben photopolymerisierbaren Phase enthält |
JP3771714B2 (ja) * | 1998-05-12 | 2006-04-26 | 互応化学工業株式会社 | 感光性樹脂組成物及びプリント配線板製造用フォトソルダーレジストインク |
ATE528973T1 (de) * | 1998-12-22 | 2011-10-15 | Huntsman Adv Mat Switzerland | Herstellung von photoresistbeschichtungen |
US6555592B2 (en) * | 2001-02-27 | 2003-04-29 | Advance Materials Corporation | Photothermosetting composition comprising acrylated epoxy resin |
KR100407292B1 (ko) * | 2001-05-11 | 2003-11-28 | 박영곤 | 피가공물체 표면처리방법 |
BRPI0411101A (pt) | 2003-06-12 | 2006-07-18 | Valspar Sourcing Inc | composição de revestimento, método de revestimento, revestimento, e, método de preparação de uma composição de revestimento |
WO2005017617A1 (en) | 2003-07-17 | 2005-02-24 | Honeywell International Inc. | Planarization films for advanced microelectronic applications and devices and methods of production thereof |
US20080223530A1 (en) * | 2007-03-13 | 2008-09-18 | Vincent Grosso | Shade cover attachment for blind |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB665649A (en) * | 1949-04-01 | 1952-01-30 | Autotype Company Ltd | Improvements in photographic films and processes for producing stencils therewith |
GB719084A (en) * | 1951-10-15 | 1954-11-24 | Nat Res Dev | Electro-forming metal grids |
AU4509872A (en) * | 1971-08-02 | 1974-01-31 | Rca Corp | Making a viewing screen for an apertured-mask cathode-ray tube |
JPS5220225B2 (ko) * | 1973-07-25 | 1977-06-02 | ||
US4154614A (en) * | 1975-07-02 | 1979-05-15 | Nippon Paint Co., Ltd. | Photosensitive diazo composition with graft copolymer for use in printing screen |
US4186069A (en) * | 1978-01-30 | 1980-01-29 | Richardson Graphics Company | Photopolymerizable latex systems |
EP0030213A1 (de) * | 1979-11-29 | 1981-06-10 | Ciba-Geigy Ag | Durch Licht vernetzbare Schicht auf Druckformen und Verfahren zur Herstellung von Offset-Druckplatten |
EP0083835A3 (en) * | 1982-01-12 | 1984-03-07 | Autotype International Limited | Stabilization of diazo-resin sensitisers |
US4592816A (en) * | 1984-09-26 | 1986-06-03 | Rohm And Haas Company | Electrophoretic deposition process |
GB2202858A (en) * | 1987-03-26 | 1988-10-05 | Sericol Group Ltd | Photopolymerisable compositions for producing screen printing stencils |
GB2213487B (en) * | 1987-12-08 | 1992-01-08 | Kansai Paint Co Ltd | Method of forming a cured coating film |
GB8804044D0 (en) * | 1988-02-22 | 1988-03-23 | Coates Brothers Plc | Coating compositions |
-
1991
- 1991-06-27 WO PCT/GB1991/001046 patent/WO1992000552A1/en active IP Right Grant
- 1991-06-27 KR KR1019920703347A patent/KR100187942B1/ko not_active IP Right Cessation
- 1991-06-27 JP JP3511671A patent/JP3071462B2/ja not_active Expired - Fee Related
- 1991-06-27 DE DE69131647T patent/DE69131647T2/de not_active Expired - Fee Related
- 1991-06-27 EP EP91912586A patent/EP0536272B1/en not_active Expired - Lifetime
- 1991-06-27 AT AT91912586T patent/ATE185000T1/de not_active IP Right Cessation
-
1994
- 1994-11-30 US US08/351,137 patent/US5556735A/en not_active Expired - Fee Related
-
1996
- 1996-06-13 US US08/662,309 patent/US5750291A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE69131647T2 (de) | 2000-05-18 |
US5556735A (en) | 1996-09-17 |
US5750291A (en) | 1998-05-12 |
JP3071462B2 (ja) | 2000-07-31 |
DE69131647D1 (de) | 1999-10-28 |
KR100187942B1 (ko) | 1999-06-01 |
EP0536272A1 (en) | 1993-04-14 |
JPH05509175A (ja) | 1993-12-16 |
ATE185000T1 (de) | 1999-10-15 |
EP0536272B1 (en) | 1999-09-22 |
WO1992000552A1 (en) | 1992-01-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20061226 Year of fee payment: 9 |
|
LAPS | Lapse due to unpaid annual fee |