GB719084A - Electro-forming metal grids - Google Patents

Electro-forming metal grids

Info

Publication number
GB719084A
GB719084A GB2394751A GB2394751A GB719084A GB 719084 A GB719084 A GB 719084A GB 2394751 A GB2394751 A GB 2394751A GB 2394751 A GB2394751 A GB 2394751A GB 719084 A GB719084 A GB 719084A
Authority
GB
United Kingdom
Prior art keywords
light
bichromated
stencil
wavelengths
oct
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2394751A
Inventor
Cecil Allen Parker
Cecil George Hatchard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Research Development Corp UK
Original Assignee
National Research Development Corp UK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Research Development Corp UK filed Critical National Research Development Corp UK
Priority to GB2394751A priority Critical patent/GB719084A/en
Publication of GB719084A publication Critical patent/GB719084A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/08—Perforated or foraminous objects, e.g. sieves
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

719,084. Bichromated resists. NATIONAL RESEARCH DEVELOPMENT CORPORATION. Oct. 14, 1952 [Oct. 15, 1951], No. 23947/51. Class 98(2) An electro-plating stencil resist is prepared from a bichromated glue mixture on a metallic support by exposing it, through a negative pattern, to light of selected wavelengths not readily absorbed by the bichromated glue (e.g. wave-lengths greater than 400 millimicroms), and removal of the unexposed portions by controlled washing alternately with, water and then with a liquid capable of abstracting water, such as an aliphatic alcohol (e.g, ethanol) or a simple ketone. Light of the correct wavelengths may be obtained by passing the light from a mercury vapour lamp through a filter which absorbs light of wavelengths shorter than 400 millimicons. A suitable filter is a 1 per cent solution of sodium nitrite, about 1 cm thick. The bichromated glue mixture preferably contains less than 3 per cent by weight of bichromate, and it is preferred to harden the stencil after controlled washing, with formaldehyde and ethyl alcohol, followed by soaking in bichromate solution, washing again with ethyl alcohol and baking in the usual way. The stencil is then used for electroplating.
GB2394751A 1951-10-15 1951-10-15 Electro-forming metal grids Expired GB719084A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB2394751A GB719084A (en) 1951-10-15 1951-10-15 Electro-forming metal grids

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB2394751A GB719084A (en) 1951-10-15 1951-10-15 Electro-forming metal grids

Publications (1)

Publication Number Publication Date
GB719084A true GB719084A (en) 1954-11-24

Family

ID=10203895

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2394751A Expired GB719084A (en) 1951-10-15 1951-10-15 Electro-forming metal grids

Country Status (1)

Country Link
GB (1) GB719084A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5556735A (en) * 1990-06-27 1996-09-17 Coates Brothers Plc Image-forming process

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5556735A (en) * 1990-06-27 1996-09-17 Coates Brothers Plc Image-forming process
US5750291A (en) * 1990-06-27 1998-05-12 Coates Brothers Plc Image-forming process

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