JPS5559459A - Resist developing solution and developing method - Google Patents

Resist developing solution and developing method

Info

Publication number
JPS5559459A
JPS5559459A JP13393278A JP13393278A JPS5559459A JP S5559459 A JPS5559459 A JP S5559459A JP 13393278 A JP13393278 A JP 13393278A JP 13393278 A JP13393278 A JP 13393278A JP S5559459 A JPS5559459 A JP S5559459A
Authority
JP
Japan
Prior art keywords
developing solution
developing
ethyl alcohol
resist
poly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13393278A
Other languages
Japanese (ja)
Inventor
Hideo Saeki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP13393278A priority Critical patent/JPS5559459A/en
Publication of JPS5559459A publication Critical patent/JPS5559459A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To effectively remove the unexposed areas of poly-i-propyl-methacrylate type resist after imagewise exposure without scratching them using a developing solution consisting mainly of ethyl alcohol. CONSTITUTION:A solvent mixture of ethyl alcohol and an organic solvent (a low viscosity fluid having a boiling point within room temperature and 150 deg.C, and compatibility with ethyl alcohol, such as methyl alcohol, n-pentane, ethyl ether, or cyclohexane) is used for the developing solution of a poly-i-propylmethacrylate type resist.
JP13393278A 1978-10-30 1978-10-30 Resist developing solution and developing method Pending JPS5559459A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13393278A JPS5559459A (en) 1978-10-30 1978-10-30 Resist developing solution and developing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13393278A JPS5559459A (en) 1978-10-30 1978-10-30 Resist developing solution and developing method

Publications (1)

Publication Number Publication Date
JPS5559459A true JPS5559459A (en) 1980-05-02

Family

ID=15116436

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13393278A Pending JPS5559459A (en) 1978-10-30 1978-10-30 Resist developing solution and developing method

Country Status (1)

Country Link
JP (1) JPS5559459A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59176743A (en) * 1983-03-26 1984-10-06 Daikin Ind Ltd Developing solution
JPS6055630A (en) * 1983-09-06 1985-03-30 Oki Electric Ind Co Ltd Method for forming resist pattern
WO2017057253A1 (en) * 2015-09-30 2017-04-06 富士フイルム株式会社 Treatment liquid and pattern formation method
WO2017057225A1 (en) * 2015-09-30 2017-04-06 富士フイルム株式会社 Processing solution and pattern forming method

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59176743A (en) * 1983-03-26 1984-10-06 Daikin Ind Ltd Developing solution
JPH0332784B2 (en) * 1983-03-26 1991-05-14 Daikin Kogyo Kk
JPS6055630A (en) * 1983-09-06 1985-03-30 Oki Electric Ind Co Ltd Method for forming resist pattern
JPH0335654B2 (en) * 1983-09-06 1991-05-29 Oki Electric Ind Co Ltd
WO2017057253A1 (en) * 2015-09-30 2017-04-06 富士フイルム株式会社 Treatment liquid and pattern formation method
WO2017057225A1 (en) * 2015-09-30 2017-04-06 富士フイルム株式会社 Processing solution and pattern forming method
CN108139691A (en) * 2015-09-30 2018-06-08 富士胶片株式会社 Treatment fluid and pattern formation method
JPWO2017057253A1 (en) * 2015-09-30 2018-06-28 富士フイルム株式会社 Treatment liquid and pattern forming method
JPWO2017057225A1 (en) * 2015-09-30 2018-06-28 富士フイルム株式会社 Treatment liquid and pattern forming method
US10962884B2 (en) 2015-09-30 2021-03-30 Fujifilm Corporation Treatment liquid and pattern forming method
US11042094B2 (en) 2015-09-30 2021-06-22 Fujifilm Corporation Treatment liquid and pattern forming method

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