JPS5678837A - Hardening method of resist film - Google Patents

Hardening method of resist film

Info

Publication number
JPS5678837A
JPS5678837A JP15601479A JP15601479A JPS5678837A JP S5678837 A JPS5678837 A JP S5678837A JP 15601479 A JP15601479 A JP 15601479A JP 15601479 A JP15601479 A JP 15601479A JP S5678837 A JPS5678837 A JP S5678837A
Authority
JP
Japan
Prior art keywords
resist film
photo
polyvinyl alcohol
less
crosslinked
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15601479A
Other languages
Japanese (ja)
Other versions
JPS608496B2 (en
Inventor
Hirofumi Mori
Hitoshi Hori
Susumu Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Priority to JP15601479A priority Critical patent/JPS608496B2/en
Publication of JPS5678837A publication Critical patent/JPS5678837A/en
Publication of JPS608496B2 publication Critical patent/JPS608496B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To prevent swelling or flaking in etching a resist film, by immersing a photo-crosslinked polyvinyl alcohol resist film in an 8 or less C aldehyde solution containing an acid catalyst. CONSTITUTION:A polyvinyl alcohol resist film with a photosensitive agent added is exposed and developed to give a photo-crosslinked film, which is converted into acetal at 20-50 deg.C for 5-30min in an 8 or less C saturated or unsaturated aldehyde solution in presence of an acid catalyst such as sulfuric acid. When an unsaturated aldehyde such as crotonaldehyde is used, hardening degree is raised by heating it further to 150-250 deg.C for several minutes-1hour, thus permitting the resist film obtained not to require chromic acid anhydride, and a environmental pollution problem to be prevented.
JP15601479A 1979-11-30 1979-11-30 Hardening treatment method for resist film Expired JPS608496B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15601479A JPS608496B2 (en) 1979-11-30 1979-11-30 Hardening treatment method for resist film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15601479A JPS608496B2 (en) 1979-11-30 1979-11-30 Hardening treatment method for resist film

Publications (2)

Publication Number Publication Date
JPS5678837A true JPS5678837A (en) 1981-06-29
JPS608496B2 JPS608496B2 (en) 1985-03-04

Family

ID=15618425

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15601479A Expired JPS608496B2 (en) 1979-11-30 1979-11-30 Hardening treatment method for resist film

Country Status (1)

Country Link
JP (1) JPS608496B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4844828A (en) * 1985-09-27 1989-07-04 Kao Corporation Detergent dispenser pouch made of cold water-soluble PVA containing acetalized units
JPH06202340A (en) * 1991-10-15 1994-07-22 Tadao Yomo Photographic pattern for textile printing
JPH06275514A (en) * 1993-01-22 1994-09-30 Soltec:Kk Resist pattern forming method
EP0908786A3 (en) * 1997-10-03 2000-06-28 Eaton Corporation Process for reducing shrinkage of features formed in a photoresist by treatment with an amine, an amide or an aldehyde
WO2022269297A1 (en) * 2021-06-22 2022-12-29 Lajter Peter Tamas Biodegradable shaped articles

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4844828A (en) * 1985-09-27 1989-07-04 Kao Corporation Detergent dispenser pouch made of cold water-soluble PVA containing acetalized units
JPH06202340A (en) * 1991-10-15 1994-07-22 Tadao Yomo Photographic pattern for textile printing
JPH06275514A (en) * 1993-01-22 1994-09-30 Soltec:Kk Resist pattern forming method
EP0908786A3 (en) * 1997-10-03 2000-06-28 Eaton Corporation Process for reducing shrinkage of features formed in a photoresist by treatment with an amine, an amide or an aldehyde
WO2022269297A1 (en) * 2021-06-22 2022-12-29 Lajter Peter Tamas Biodegradable shaped articles

Also Published As

Publication number Publication date
JPS608496B2 (en) 1985-03-04

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