ES341185A1 - Photosensitive Materials and Offset Printing Formes Produced Therewith. - Google Patents

Photosensitive Materials and Offset Printing Formes Produced Therewith.

Info

Publication number
ES341185A1
ES341185A1 ES341185A ES341185A ES341185A1 ES 341185 A1 ES341185 A1 ES 341185A1 ES 341185 A ES341185 A ES 341185A ES 341185 A ES341185 A ES 341185A ES 341185 A1 ES341185 A1 ES 341185A1
Authority
ES
Spain
Prior art keywords
bromine
iodine
chlorine
aralkyl
aryl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES341185A
Other languages
Spanish (es)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Publication of ES341185A1 publication Critical patent/ES341185A1/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)

Abstract

Light-sensitive material is made by coating a support with a layer of water-insoluble polymer which is hydrophilic and then treating the layer with a solution of a halogenated hydrocarbon of formula: - wherein X is chlorine, bromine or iodine and R, R 1 , and R 2 are chlorine, bromine, iodine, hydrogen or alkyl (which may be substituted by chlorine, bromine or iodine) aryl, aralkyl, alkenyl or heterocyclic or SO 2 R 3 where R 3 is alkyl, aryl or aralkyl. The solution may also contain a sensitizer such as an acridone an anthraquinone, benzophenone or a mercapto compound, a condensation product of m-cresol formaldehyde resin and chloroacetic acid and ethanol is the preferred solvent. The polymer may be polyvinyl alcohol or a cellulose ether cross-linked with dimethyl urea, cellulose acetate which has been surface saponified or regenerated cellulose. The material may be imagewise exposed and the exposed areas inked up to produce a planographic printing plate.
ES341185A 1966-05-31 1967-05-30 Photosensitive Materials and Offset Printing Formes Produced Therewith. Expired ES341185A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK0059398 1966-05-31

Publications (1)

Publication Number Publication Date
ES341185A1 true ES341185A1 (en) 1968-06-16

Family

ID=7229130

Family Applications (1)

Application Number Title Priority Date Filing Date
ES341185A Expired ES341185A1 (en) 1966-05-31 1967-05-30 Photosensitive Materials and Offset Printing Formes Produced Therewith.

Country Status (8)

Country Link
AT (1) AT278055B (en)
BE (1) BE699162A (en)
CH (1) CH499798A (en)
DE (1) DE1522499A1 (en)
DK (1) DK118003B (en)
ES (1) ES341185A1 (en)
GB (1) GB1169426A (en)
NL (1) NL6706961A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3613632A1 (en) * 1986-04-23 1987-10-29 Hoechst Ag PHOTOPOLYMERIZABLE MIXTURE AND CONTAINING PHOTOPOLYMERIZABLE RECORDING MATERIAL
WO2006006671A1 (en) * 2004-07-14 2006-01-19 Fujifilm Corporation Photosensitive composition, pattern forming material, photosensitive laminate, pattern forming apparatus and method of pattern formation

Also Published As

Publication number Publication date
AT278055B (en) 1970-01-26
DK118003B (en) 1970-06-22
GB1169426A (en) 1969-11-05
NL6706961A (en) 1967-12-01
DE1522499A1 (en) 1969-09-11
CH499798A (en) 1970-11-30
BE699162A (en) 1967-11-29

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