NL6706961A - - Google Patents
Info
- Publication number
- NL6706961A NL6706961A NL6706961A NL6706961A NL6706961A NL 6706961 A NL6706961 A NL 6706961A NL 6706961 A NL6706961 A NL 6706961A NL 6706961 A NL6706961 A NL 6706961A NL 6706961 A NL6706961 A NL 6706961A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK0059398 | 1966-05-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL6706961A true NL6706961A (xx) | 1967-12-01 |
Family
ID=7229130
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL6706961A NL6706961A (xx) | 1966-05-31 | 1967-05-19 |
Country Status (8)
| Country | Link |
|---|---|
| AT (1) | AT278055B (xx) |
| BE (1) | BE699162A (xx) |
| CH (1) | CH499798A (xx) |
| DE (1) | DE1522499A1 (xx) |
| DK (1) | DK118003B (xx) |
| ES (1) | ES341185A1 (xx) |
| GB (1) | GB1169426A (xx) |
| NL (1) | NL6706961A (xx) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3613632A1 (de) * | 1986-04-23 | 1987-10-29 | Hoechst Ag | Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial |
| US20080268374A1 (en) * | 2004-07-14 | 2008-10-30 | Fujifilm Corporation | Photosensitive Composition, Pattern Forming Material, Photosensitive Laminate, Pattern Forming Apparatus, and Pattern Forming Process |
-
1966
- 1966-05-31 DE DE19661522499 patent/DE1522499A1/de active Pending
-
1967
- 1967-05-19 NL NL6706961A patent/NL6706961A/xx unknown
- 1967-05-26 CH CH749967A patent/CH499798A/de not_active IP Right Cessation
- 1967-05-29 AT AT499167A patent/AT278055B/de not_active IP Right Cessation
- 1967-05-29 BE BE699162D patent/BE699162A/xx unknown
- 1967-05-30 DK DK279667A patent/DK118003B/da unknown
- 1967-05-30 GB GB2485367A patent/GB1169426A/en not_active Expired
- 1967-05-30 ES ES341185A patent/ES341185A1/es not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| CH499798A (de) | 1970-11-30 |
| AT278055B (de) | 1970-01-26 |
| ES341185A1 (es) | 1968-06-16 |
| BE699162A (xx) | 1967-11-29 |
| GB1169426A (en) | 1969-11-05 |
| DK118003B (da) | 1970-06-22 |
| DE1522499A1 (de) | 1969-09-11 |