KR900013563A - 전자비임 여기(勵起) 이온 원(源) - Google Patents

전자비임 여기(勵起) 이온 원(源) Download PDF

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Publication number
KR900013563A
KR900013563A KR1019900001933A KR900001933A KR900013563A KR 900013563 A KR900013563 A KR 900013563A KR 1019900001933 A KR1019900001933 A KR 1019900001933A KR 900001933 A KR900001933 A KR 900001933A KR 900013563 A KR900013563 A KR 900013563A
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KR
South Korea
Prior art keywords
ion
electron
electron beam
extracting
generating chamber
Prior art date
Application number
KR1019900001933A
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English (en)
Other versions
KR0158875B1 (ko
Inventor
나오끼 다까야마
고오헤이 가와무라
아키라 고시이시
Original Assignee
고다까 토시오
도오교오 에레구토론 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP1039016A external-priority patent/JP2889925B2/ja
Priority claimed from JP1039017A external-priority patent/JP2869557B2/ja
Application filed by 고다까 토시오, 도오교오 에레구토론 가부시끼가이샤 filed Critical 고다까 토시오
Publication of KR900013563A publication Critical patent/KR900013563A/ko
Application granted granted Critical
Publication of KR0158875B1 publication Critical patent/KR0158875B1/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/20—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

내용 없음

Description

전자비임 여기(勵起) 이온 원(源)
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는, 본 발명의 전자비임 여기이온원의 1실시예의 구성을 나타낸 절결 사시도,
제2도는, 제1도의 이온 생성실의 횡단면도,
제4도는, 전자의 흐름 및 를라즈마의 상태를 설명하기 위한 도면이다.

Claims (2)

  1. 이온생성실(10)내로 도입한 원료가스에 전자를 조사하여 이온을 발생시키고, 이 이온을 상기 이온생성실(10)에 형성한 이온 인출용 슬릿트(12)으로부터 인출하도록 구성된 전자비임 여기이온원에 있어서, 상기 이온인출에 따른 방전이, 주로 상기 이온인출용 슬릿트(12) 근방에 발생하도록 구성한 것을 특징으로 하는 전자비임 여기이온원.
  2. 전자를 인출하기 위한 제1의 플라즈마를 발생시키는 전자발생실(1)과, 이 전자발생실(1)에 형성된 전자인출구멍(5)에 대향하도록 형성되어 이 전자인출구멍(5)로부터 상기 전자를 인출하기 위한 다공전극(8)과, 이 다공전극(8)에 연이어 형성되고, 소정의 원료가스에 상기 전자를 조사하여 제2의 플라즈마를 발생시켜 이온을 생성하는 이온생성실(10)을 구비한 전자 비임여기 이온원에 있어서, 상기 제2의 플라즈마의 지름은, 상기 전자인출구멍(5)의 지름의 1 내지 6배의 범위로 되도록 구성한 것을 특징으로 하는 전자비임 여기이온원.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019900001933A 1989-02-16 1990-02-16 전자비임 여기(勵起) 이온 원(源) KR0158875B1 (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP1039016A JP2889925B2 (ja) 1989-02-16 1989-02-16 電子ビーム励起イオン源およびイオン引き出し方法
JP39016 1989-02-16
JP1039017A JP2869557B2 (ja) 1989-02-16 1989-02-16 電子ビーム励起イオン源
JP1-39017 1989-02-16
JP39017 1989-02-16
JP1-39016 1989-02-16

Publications (2)

Publication Number Publication Date
KR900013563A true KR900013563A (ko) 1990-09-06
KR0158875B1 KR0158875B1 (ko) 1998-12-01

Family

ID=26378325

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900001933A KR0158875B1 (ko) 1989-02-16 1990-02-16 전자비임 여기(勵起) 이온 원(源)

Country Status (3)

Country Link
US (1) US5089747A (ko)
KR (1) KR0158875B1 (ko)
GB (1) GB2230644B (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100642353B1 (ko) * 2000-02-25 2006-11-03 닛신 이온기기 가부시기가이샤 이온 소스 및 그 동작방법

Families Citing this family (12)

* Cited by examiner, † Cited by third party
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US5252892A (en) * 1989-02-16 1993-10-12 Tokyo Electron Limited Plasma processing apparatus
JPH05144397A (ja) * 1991-11-20 1993-06-11 Mitsubishi Electric Corp イオン源
JPH06176724A (ja) * 1992-01-23 1994-06-24 Tokyo Electron Ltd イオン源装置
US5306921A (en) * 1992-03-02 1994-04-26 Tokyo Electron Limited Ion implantation system using optimum magnetic field for concentrating ions
CH687111A5 (de) * 1992-05-26 1996-09-13 Balzers Hochvakuum Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfuer sowie Anwendung des Verfahrens.
US5578831A (en) * 1995-03-23 1996-11-26 Associated Universities, Inc. Method and apparatus for charged particle propagation
US6403029B1 (en) * 2000-01-12 2002-06-11 The Trustees Of Princeton University System and method of applying energetic ions for sterilization
USH2212H1 (en) * 2003-09-26 2008-04-01 The United States Of America As Represented By The Secretary Of The Navy Method and apparatus for producing an ion-ion plasma continuous in time
CN1964620B (zh) * 2003-12-12 2010-07-21 山米奎普公司 对从固体升华的蒸气流的控制
US20080223409A1 (en) * 2003-12-12 2008-09-18 Horsky Thomas N Method and apparatus for extending equipment uptime in ion implantation
US20080073559A1 (en) * 2003-12-12 2008-03-27 Horsky Thomas N Controlling the flow of vapors sublimated from solids
WO2009039382A1 (en) * 2007-09-21 2009-03-26 Semequip. Inc. Method for extending equipment uptime in ion implantation

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Publication number Priority date Publication date Assignee Title
US3178604A (en) * 1962-04-10 1965-04-13 Radiation Dynamics Positive ion source
US3448315A (en) * 1966-10-11 1969-06-03 Itt Ion gun improvements for operation in the micron pressure range and utilizing a diffuse discharge
DE2361955A1 (de) * 1973-12-13 1975-06-19 Uranit Gmbh Quadrupol-massenspektrometer
US3924134A (en) * 1974-11-29 1975-12-02 Ibm Double chamber ion source
US4166952A (en) * 1978-02-24 1979-09-04 E. I. Du Pont De Nemours And Company Method and apparatus for the elemental analysis of solids
JPS5852297B2 (ja) * 1979-06-04 1983-11-21 株式会社日立製作所 マイクロ波イオン源
FR2550681B1 (fr) * 1983-08-12 1985-12-06 Centre Nat Rech Scient Source d'ions a au moins deux chambres d'ionisation, en particulier pour la formation de faisceaux d'ions chimiquement reactifs
DE3584105D1 (de) * 1984-03-16 1991-10-24 Hitachi Ltd Ionenquelle.
JPS61121967A (ja) * 1984-11-19 1986-06-09 Matsushita Electric Ind Co Ltd サ−マルヘツド
JPS61290629A (ja) * 1985-06-18 1986-12-20 Rikagaku Kenkyusho 電子ビ−ム励起イオン源
US4691109A (en) * 1986-01-28 1987-09-01 Rca Corporation Apparatus and method for producing ions
US4841197A (en) * 1986-05-28 1989-06-20 Nihon Shinku Gijutsu Kabushiki Kaisha Double-chamber ion source

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100642353B1 (ko) * 2000-02-25 2006-11-03 닛신 이온기기 가부시기가이샤 이온 소스 및 그 동작방법

Also Published As

Publication number Publication date
GB2230644A (en) 1990-10-24
GB9003454D0 (en) 1990-04-11
GB2230644B (en) 1994-03-23
US5089747A (en) 1992-02-18
KR0158875B1 (ko) 1998-12-01

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