KR900010045A - 기본 공구체를 피복하는 방법 및 이 방법에 따라 제조된 공구 - Google Patents
기본 공구체를 피복하는 방법 및 이 방법에 따라 제조된 공구 Download PDFInfo
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- KR900010045A KR900010045A KR1019890018243A KR890018243A KR900010045A KR 900010045 A KR900010045 A KR 900010045A KR 1019890018243 A KR1019890018243 A KR 1019890018243A KR 890018243 A KR890018243 A KR 890018243A KR 900010045 A KR900010045 A KR 900010045A
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- Prior art keywords
- tool
- hard metal
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- 238000000034 method Methods 0.000 title claims abstract 14
- 239000011248 coating agent Substances 0.000 title claims abstract 6
- 238000000576 coating method Methods 0.000 title claims abstract 6
- 239000002344 surface layer Substances 0.000 claims abstract 8
- 239000010410 layer Substances 0.000 claims abstract 7
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- 238000005520 cutting process Methods 0.000 claims description 2
- 238000005229 chemical vapour deposition Methods 0.000 claims 4
- 239000010936 titanium Substances 0.000 claims 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 3
- 238000005255 carburizing Methods 0.000 claims 3
- 150000004767 nitrides Chemical class 0.000 claims 3
- 239000002244 precipitate Substances 0.000 claims 3
- 229910052719 titanium Inorganic materials 0.000 claims 3
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 2
- 239000011230 binding agent Substances 0.000 claims 2
- 239000010941 cobalt Substances 0.000 claims 2
- 229910017052 cobalt Inorganic materials 0.000 claims 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims 2
- 229910052726 zirconium Inorganic materials 0.000 claims 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 1
- 229910000423 chromium oxide Inorganic materials 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 230000000737 periodic effect Effects 0.000 claims 1
- 238000000678 plasma activation Methods 0.000 claims 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims 1
- 229920000728 polyester Polymers 0.000 claims 1
- 238000003860 storage Methods 0.000 claims 1
- 229920003002 synthetic resin Polymers 0.000 claims 1
- 239000000057 synthetic resin Substances 0.000 claims 1
- -1 zirconium carbides Chemical class 0.000 claims 1
- 239000007789 gas Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
- G11B23/20—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture with provision for splicing to provide permanent or temporary connections
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B26—HAND CUTTING TOOLS; CUTTING; SEVERING
- B26D—CUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
- B26D1/00—Cutting through work characterised by the nature or movement of the cutting member or particular materials not otherwise provided for; Apparatus or machines therefor; Cutting members therefor
- B26D1/0006—Cutting members therefor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/36—Carbonitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
- C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B26—HAND CUTTING TOOLS; CUTTING; SEVERING
- B26D—CUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
- B26D1/00—Cutting through work characterised by the nature or movement of the cutting member or particular materials not otherwise provided for; Apparatus or machines therefor; Cutting members therefor
- B26D1/0006—Cutting members therefor
- B26D2001/002—Materials or surface treatments therefor, e.g. composite materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B26—HAND CUTTING TOOLS; CUTTING; SEVERING
- B26D—CUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
- B26D1/00—Cutting through work characterised by the nature or movement of the cutting member or particular materials not otherwise provided for; Apparatus or machines therefor; Cutting members therefor
- B26D1/0006—Cutting members therefor
- B26D2001/0046—Cutting members therefor rotating continuously about an axis perpendicular to the edge
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B26—HAND CUTTING TOOLS; CUTTING; SEVERING
- B26D—CUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
- B26D1/00—Cutting through work characterised by the nature or movement of the cutting member or particular materials not otherwise provided for; Apparatus or machines therefor; Cutting members therefor
- B26D1/0006—Cutting members therefor
- B26D2001/0053—Cutting members therefor having a special cutting edge section or blade section
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B26—HAND CUTTING TOOLS; CUTTING; SEVERING
- B26D—CUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
- B26D1/00—Cutting through work characterised by the nature or movement of the cutting member or particular materials not otherwise provided for; Apparatus or machines therefor; Cutting members therefor
- B26D1/0006—Cutting members therefor
- B26D2001/0066—Cutting members therefor having shearing means, e.g. shearing blades, abutting blades
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Forests & Forestry (AREA)
- Chemical Vapour Deposition (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Pens And Brushes (AREA)
- Physical Vapour Deposition (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
젭도는 티타늄 질화물로 피복된 경질의 환형 금속판의 단면도, 제2도는 샤프트상에 정려된 다수의 환형전단 날들을 토함하는 절단 장치의 사시도, 제3도는 피복될 경질 금속체에서 글로우 방전을 발생시키는 전압선도.
Claims (18)
- 경질 금속 또는 강인 기본 공구체에 플라즈마 CVD(화학적 증착)에 의해 티타늄 및/또는 지르코늄의 탄화물, 질화물 및/또는 침탄 침질물로 피복하는 방법에 있어서, 캐소드로서 연결되는 기본 공구체에서의 플라즈마 활성화하는 펄스화된 직류 전압에 의해 수행되며, CVD 공정의 관여 가스의 최소 이온화 전위 이상의 크기이지만 펄스화된 직류 전압의 최대치의 50% 이하인 잔여 직류 전압이 펄스 사이에서 유지되는 것을 특징으로하는 기본 공구체 피복 방법.
- 제1항에 있어서, 펄스화된 직류 전압이 200 내지 900 볼트 사이에서 지속되느 것을 특징으로 하는 방법.
- 제1항 또는 제2항에 있어서, 잔여 직류 전압대 최대 펄스화 직류 전압의 비가 0.02 내지 0.5인 것을 특징으로 하는 방법.
- 제1항 내지 제3항에 있어서, 펄스화된 직류 전압의 주기 지속기가 20μsec와 20msec사이에 설정되어 있는 것을 특징으로 하는 방법.
- 제1항 내지 제4항중 어느 한 항에 있어서, 펄스 길이대 펄스 간격의 비가 0.1 내지 0.6인 것을 특징으로 하는 방법.
- 제1항 내지 제5항중 어느 한 항에 있어서, 층성장속도가 0.5 내지 10μm/h인 것을 특징으로 하는 방법.
- 제1항 내지 제6항중 어느 한 항에 있어서, CVD 피복이 400 내지 600℃ 의 온도에서 수행되는 것을 특징으로 하는 방법.
- 기본체 및 플라즈마 활성 CVD에 의해 도포된 티타늄 및/또는 지르코늄 탄화물, 질화물 및/또는 침탄 침질물로 구성된 최소한 한 표면층으로 구성되며, 특히 경질의 금속체 및 최소한 한 표면층을 포함하는 공구에 있어서, 표면층내의 Cl 함량이 4질량% 미만인 것을 특징으로 하는 전기향들중 어느 한 항의 방법으로 제조된 공구.
- 제8항에 있어서, 표면층들이 20μm 이하의 두께를 갖는 것을 특징으로 하는 공구.
- 제8항 또는 9항에 있어서, TiN층, 하나 이상의 Ti(C,N)층 및 TiN층 순서의 다수의 표면층에 의해 특징지워지는 공구.
- 제8항 내지 제10항중 어느 한 항에 있어서, 어떤 층도 두께가 5mm이상이 아닌 것을 특징으로 하는 공구.
- 제8항 내지 제11항중 어느 한 항에 있어서, 기본체가 WC 및 6내지 10질량%의 코발트 인 것이 바람직한 결합체로 구성되는 것을 특징으로 하는 공구.
- 제12항에 있어서, 30질량%까지의 WC가 TiC, TaC 및/또는 NbC로 대체되어 있는 것을 특징으로 하는 공구.
- 철산화물 및/또는 크롬 산화물 층으로 피복되어 오디오 및/또는 비디오 신호의 기억용으로 적합한 폴리에스터같은 합성 수지로 제조된 자기 테이프 절단용의 제8항 내지 제13항중 어느 한 항에 따른 공구에 있어서, 상기 공구는 원형 전단 날 형상을 하고 있으며, 1내지 4μm 두께(d1)를 갖는 티타늄의 탄화물, 질화물 및/또는 침탄 침질물중 최소한 한층이 균일하고 평행하게 피복되어 있는 표면층(12)을 포함하며, 표면층들의 평행 이탈도가 0.003mm미만 및/또는 조도 RZ가 0.08μm 미만인 것을 특징으로 하는 공구.
- 제14항에 있어서, 표면층(d1)이 2 내지 3μ 두께인 것을 특징으로 하는 공구.
- 제14항 또는 제15항에 있어서, 경질 금속체(11)가 0.4 내지 0.8mm, 바람직하기로는 0.5mm 내지 0.6mm인 것을 특징으로하는 공구.
- 제14항 내지 제16항중 어느 한 항에 있어서, 경질 금속체(11)가 80 내지 150mm 질량%, 바람직하기로는 100내지 125mm의 외경(D) 및/또는 50 내지 80mm, 바람직하기로는 60 내지 70mm 직경(d)의 중심 구멍을 갖는 것을 특징으로하는 공구.
- 제14항 내지 제17항중 어느 한 항에 있어서, 경질 금속체(11)가 6 내지 25 질량%, 바람직하기로는 9내지 15질량%의 코발트를 결합제로서 포함하는 WC로 구성되어 있는 것을 특징으로 하는 공구.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3841731A DE3841731C1 (en) | 1988-12-10 | 1988-12-10 | Process for coating a tool base, and tool produced by this process |
DEP3841731.6 | 1988-12-10 | ||
DEG8909928.1 | 1989-08-21 | ||
DE8909928U DE8909928U1 (de) | 1988-12-10 | 1989-08-21 | Kreisschermesser |
DEG8910041.7 | 1989-08-22 | ||
DE8910041U DE8910041U1 (de) | 1988-12-10 | 1989-08-22 | Kreisschermesser |
Publications (2)
Publication Number | Publication Date |
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KR900010045A true KR900010045A (ko) | 1990-07-06 |
KR0154327B1 KR0154327B1 (ko) | 1998-11-16 |
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ID=27198631
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019890018243A KR0154327B1 (ko) | 1988-12-10 | 1989-12-09 | 공구기재를 피복하는 방법 및 그 방법에 의하여 제조된 공구 |
Country Status (7)
Country | Link |
---|---|
US (1) | US5093151A (ko) |
EP (1) | EP0373412B1 (ko) |
JP (1) | JPH03130364A (ko) |
KR (1) | KR0154327B1 (ko) |
AT (1) | ATE122734T1 (ko) |
DE (4) | DE3841731C1 (ko) |
ES (1) | ES2072885T3 (ko) |
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KR930011413B1 (ko) * | 1990-09-25 | 1993-12-06 | 가부시키가이샤 한도오따이 에네루기 겐큐쇼 | 펄스형 전자파를 사용한 플라즈마 cvd 법 |
DE4126852A1 (de) * | 1991-08-14 | 1993-02-18 | Krupp Widia Gmbh | Werkzeug mit verschleissfester diamantschneide, verfahren zu dessen herstellung sowie dessen verwendung |
JPH07109034B2 (ja) * | 1991-04-08 | 1995-11-22 | ワイケイケイ株式会社 | 硬質多層膜形成体およびその製造方法 |
US5665431A (en) * | 1991-09-03 | 1997-09-09 | Valenite Inc. | Titanium carbonitride coated stratified substrate and cutting inserts made from the same |
DE4140158A1 (de) * | 1991-12-05 | 1993-06-09 | Krupp Widia Gmbh, 4300 Essen, De | Verfahren und vorrichtung zur hartstoffbeschichtung von substratkoerpern |
US5290610A (en) * | 1992-02-13 | 1994-03-01 | Motorola, Inc. | Forming a diamond material layer on an electron emitter using hydrocarbon reactant gases ionized by emitted electrons |
US6056999A (en) * | 1992-02-18 | 2000-05-02 | Valenite Inc. | Titanium carbonitride coated cemented carbide and cutting inserts made from the same |
DE4239234A1 (de) * | 1992-11-21 | 1994-06-09 | Krupp Widia Gmbh | Werkzeug und Verfahren zur Beschichtung eines Werkzeuggrundkörpers |
US5915162A (en) * | 1993-05-31 | 1999-06-22 | Sumitomo Electric Industries, Ltd. | Coated cutting tool and a process for the production of the same |
JPH09501612A (ja) * | 1994-04-08 | 1997-02-18 | マーク エー. レイ, | 選択的プラズマ成長 |
US6413628B1 (en) | 1994-05-12 | 2002-07-02 | Valenite Inc. | Titanium carbonitride coated cemented carbide and cutting inserts made from the same |
DE4442370A1 (de) * | 1994-11-29 | 1996-05-30 | Widia Gmbh | Verfahren zur Abscheidung metallischer Schichten auf Substratkörpern und Verbundkörper aus einem Substratkörper und mindestens einer Oberflächenschicht |
DE19513614C1 (de) * | 1995-04-10 | 1996-10-02 | Fraunhofer Ges Forschung | Verfahren zur Abscheidung von Kohlenstoffschichten, Kohlenstoffschichten auf Substraten und deren Verwendung |
DE19543748A1 (de) * | 1995-11-24 | 1997-05-28 | Widia Gmbh | Schneidwerkzeug, Verfahren zur Beschichtung eines Schneidwerkzeuges und Verwendung des Schneidwerkzeuges |
US5750247A (en) * | 1996-03-15 | 1998-05-12 | Kennametal, Inc. | Coated cutting tool having an outer layer of TiC |
AUPN960696A0 (en) | 1996-05-02 | 1996-05-23 | Commonwealth Scientific And Industrial Research Organisation | Surface modification of polymers |
DE59709265D1 (de) * | 1996-11-07 | 2003-03-13 | Koenig & Bauer Ag | Falzapparat mit einem Schneidmesser für eine Rollenrotationsdruckmaschine |
JP2001515791A (ja) * | 1997-09-10 | 2001-09-25 | ヴェファ・ヴェルクツォイクファブリック・ジンゲン・ゲー・エム・ベー・ハー | 押出し金型とその製造法 |
SE517046C2 (sv) * | 1997-11-26 | 2002-04-09 | Sandvik Ab | Plasmaaktiverad CVD-metod för beläggning av skärverktyg med finkornig aluminiumoxid |
CA2237264A1 (en) * | 1998-05-08 | 1999-11-08 | Northern Telecom Limited | Receiver based congestion control |
US6566272B2 (en) | 1999-07-23 | 2003-05-20 | Applied Materials Inc. | Method for providing pulsed plasma during a portion of a semiconductor wafer process |
DE10016958A1 (de) * | 2000-04-06 | 2001-10-18 | Widia Gmbh | Verfahren zur Herstellung von Multilagenschichten auf Substratkörpern und Verbundwerkstoff, bestehend aus einem beschichteten Substratkörper |
US6327884B1 (en) * | 2000-09-29 | 2001-12-11 | Wilson Tool International, Inc. | Press brake tooling with hardened surfaces |
DE10120046B4 (de) * | 2001-04-24 | 2009-10-29 | Widia Gmbh | Schneideinsatz zur Bearbeitung von schwer zerspanbaren Metalllegierungswerkstücken und Verfahren zu dessen Herstellung |
US6960263B2 (en) * | 2002-04-25 | 2005-11-01 | Applied Materials, Inc. | Shadow frame with cross beam for semiconductor equipment |
US7303789B2 (en) * | 2003-02-17 | 2007-12-04 | Ngk Insulators, Ltd. | Methods for producing thin films on substrates by plasma CVD |
DE10316303A1 (de) * | 2003-04-08 | 2004-10-21 | Cfs Germany Gmbh | Messerkopf für Fleischkutter |
DE10322871A1 (de) * | 2003-05-21 | 2004-12-16 | Kennametal Widia Gmbh & Co.Kg | Sinterkörper und Verfahren zu seiner Herstellung |
US7501161B2 (en) * | 2004-06-01 | 2009-03-10 | Applied Materials, Inc. | Methods and apparatus for reducing arcing during plasma processing |
US7685907B2 (en) * | 2004-08-13 | 2010-03-30 | Vip Tooling, Inc. | Method for manufacturing extrusion die tools |
US20100199738A1 (en) * | 2004-08-13 | 2010-08-12 | Vip Tooling, Inc., (An Indiana Corporation) | Modular extrusion die tools |
JP6315699B2 (ja) * | 2014-03-17 | 2018-04-25 | 東京エレクトロン株式会社 | 炭窒化チタン膜を形成する方法 |
US10597781B2 (en) | 2016-03-02 | 2020-03-24 | Pusan National University Industry-University Cooperation Foundation | Method for forming coating film having high heat resistance, high hardness and abrasion resistance, coating film having high heat resistance, high hardness and abrasion resistance, and cutting tool comprising same |
WO2020068576A1 (en) * | 2018-09-28 | 2020-04-02 | Corning Incorporated | Methods for sub-austenite transformation temperture deposition of inorganic particles and articles produced by the same |
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DE601847C (de) * | 1933-04-01 | 1934-08-25 | Siemens Schuckertwerke Akt Ges | Verfahren zum Einbringen eines Stoffes in ein Metall |
DE3027688C2 (de) * | 1980-07-22 | 1982-04-01 | Fried. Krupp Gmbh, 4300 Essen | Verfahren zur Herstellung eines verschleißfesten Verbundwerkstoffes |
US4500563A (en) * | 1982-12-15 | 1985-02-19 | Pacific Western Systems, Inc. | Independently variably controlled pulsed R.F. plasma chemical vapor processing |
US4748451A (en) * | 1983-09-06 | 1988-05-31 | Edwards Ivan J | Adjustable bracket mount |
FR2559033B1 (fr) * | 1984-02-07 | 1987-03-27 | Roquette Freres | Creme glacee sans sucre et son procede de preparation |
DE3507158A1 (de) * | 1985-03-01 | 1986-09-04 | Rudolf Dipl.-Wirtsch.-Ing. 3548 Arolsen Wilke | Plattenhalter |
JPS61221369A (ja) * | 1985-03-27 | 1986-10-01 | Sumitomo Electric Ind Ltd | 被覆超硬合金部材 |
US4675206A (en) * | 1985-04-19 | 1987-06-23 | Sumitomo Electric Industries, Ltd. | Process for the production of a surface-coated article |
DE8514257U1 (de) * | 1985-05-14 | 1985-07-11 | Wilhelm Bilstein Spezialfabrik für Rundmesser und Plattenventile, 5063 Overath | Messer für Rollenschneidmaschine |
DE3544975C1 (de) * | 1985-12-19 | 1992-09-24 | Krupp Gmbh | Verfahren zur Herstellung eines beschichteten Formkoerpers |
GB8620346D0 (en) * | 1986-08-21 | 1986-10-01 | Special Research Systems Ltd | Chemical vapour deposition of films |
JPS63210099A (ja) * | 1987-02-26 | 1988-08-31 | Nissin Electric Co Ltd | ダイヤモンド膜の作製方法 |
-
1988
- 1988-12-10 DE DE3841731A patent/DE3841731C1/de not_active Expired - Lifetime
-
1989
- 1989-08-21 DE DE8909928U patent/DE8909928U1/de not_active Expired
- 1989-08-22 DE DE8910041U patent/DE8910041U1/de not_active Expired
- 1989-11-27 EP EP89121871A patent/EP0373412B1/de not_active Expired - Lifetime
- 1989-11-27 DE DE58909237T patent/DE58909237D1/de not_active Expired - Lifetime
- 1989-11-27 ES ES89121871T patent/ES2072885T3/es not_active Expired - Lifetime
- 1989-11-27 AT AT89121871T patent/ATE122734T1/de not_active IP Right Cessation
- 1989-12-09 KR KR1019890018243A patent/KR0154327B1/ko not_active IP Right Cessation
- 1989-12-11 US US07/448,337 patent/US5093151A/en not_active Expired - Lifetime
- 1989-12-11 JP JP1319071A patent/JPH03130364A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
DE3841731C1 (en) | 1990-04-12 |
JPH03130364A (ja) | 1991-06-04 |
DE58909237D1 (de) | 1995-06-22 |
ATE122734T1 (de) | 1995-06-15 |
DE8909928U1 (de) | 1989-10-05 |
DE8910041U1 (de) | 1989-10-12 |
EP0373412B1 (de) | 1995-05-17 |
KR0154327B1 (ko) | 1998-11-16 |
ES2072885T3 (es) | 1995-08-01 |
EP0373412A1 (de) | 1990-06-20 |
US5093151A (en) | 1992-03-03 |
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