ES2072885T3 - Procedimiento para el recubrimiento del cuerpo de base de una herramienta fabricada siguiendo dicho procedimiento. - Google Patents

Procedimiento para el recubrimiento del cuerpo de base de una herramienta fabricada siguiendo dicho procedimiento.

Info

Publication number
ES2072885T3
ES2072885T3 ES89121871T ES89121871T ES2072885T3 ES 2072885 T3 ES2072885 T3 ES 2072885T3 ES 89121871 T ES89121871 T ES 89121871T ES 89121871 T ES89121871 T ES 89121871T ES 2072885 T3 ES2072885 T3 ES 2072885T3
Authority
ES
Spain
Prior art keywords
procedure
coating
following
voltage
base body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES89121871T
Other languages
English (en)
Inventor
Den Berg Hendrikus Dr Rer Van
Udo Dr Rer Nat Dipl-Phys Konig
Ralf Dipl-Phys Tabersky
Josef Dipl-Ing Blum
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Widia GmbH
Original Assignee
Krupp Widia GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=27198631&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ES2072885(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Krupp Widia GmbH filed Critical Krupp Widia GmbH
Application granted granted Critical
Publication of ES2072885T3 publication Critical patent/ES2072885T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
    • G11B23/20—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture with provision for splicing to provide permanent or temporary connections
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B26—HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26D—CUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
    • B26D1/00—Cutting through work characterised by the nature or movement of the cutting member or particular materials not otherwise provided for; Apparatus or machines therefor; Cutting members therefor
    • B26D1/0006—Cutting members therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/36—Carbonitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B26—HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26D—CUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
    • B26D1/00—Cutting through work characterised by the nature or movement of the cutting member or particular materials not otherwise provided for; Apparatus or machines therefor; Cutting members therefor
    • B26D1/0006—Cutting members therefor
    • B26D2001/002—Materials or surface treatments therefor, e.g. composite materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B26—HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26D—CUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
    • B26D1/00—Cutting through work characterised by the nature or movement of the cutting member or particular materials not otherwise provided for; Apparatus or machines therefor; Cutting members therefor
    • B26D1/0006—Cutting members therefor
    • B26D2001/0046—Cutting members therefor rotating continuously about an axis perpendicular to the edge
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B26—HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26D—CUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
    • B26D1/00—Cutting through work characterised by the nature or movement of the cutting member or particular materials not otherwise provided for; Apparatus or machines therefor; Cutting members therefor
    • B26D1/0006—Cutting members therefor
    • B26D2001/0053—Cutting members therefor having a special cutting edge section or blade section
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B26—HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26D—CUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
    • B26D1/00—Cutting through work characterised by the nature or movement of the cutting member or particular materials not otherwise provided for; Apparatus or machines therefor; Cutting members therefor
    • B26D1/0006—Cutting members therefor
    • B26D2001/0066—Cutting members therefor having shearing means, e.g. shearing blades, abutting blades

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Forests & Forestry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Physical Vapour Deposition (AREA)
  • Pens And Brushes (AREA)

Abstract

PARA REDUCIR LA ELEVADA TEMPERATURA DE RECUBRIMIENTO ASI COMO PARA MEJORAR LA ADHERENCIA DE LA CAPA SUPERFICIAL SE PROPONE EL EMPLEAR UN PROCESO CUD ACTIVADOR DE PLASMA CON UNA TENSION CONTINUA Y UNA MAGNITUD DE TENSION RESTO QUE PERMANECE EN LAS PAUSAS DE PULSACION, QUE ES IGUAL O MAYOR QUE EL PEQUEÑO POTENCIAL DE IONIZACION DE LOS GASES QUE PARTICIPAN EN LOS PROCESOS CUD Y SUPONE UN 50% DEL MAXIMO VALOR DE LA TENSION CONTINUA PULSADA. EL GROSOR DE LA CAPA DEBE SER COMO MAXIMO DE 20 A 30 NM. LA TEMPERATURA DEL CUERPO PRINCIPAL DURANTE EL RECUBRIMIENTO PERMANECE ENTRE 400 Y 800 C.
ES89121871T 1988-12-10 1989-11-27 Procedimiento para el recubrimiento del cuerpo de base de una herramienta fabricada siguiendo dicho procedimiento. Expired - Lifetime ES2072885T3 (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE3841731A DE3841731C1 (en) 1988-12-10 1988-12-10 Process for coating a tool base, and tool produced by this process
DE8909928U DE8909928U1 (de) 1988-12-10 1989-08-21 Kreisschermesser
DE8910041U DE8910041U1 (de) 1988-12-10 1989-08-22 Kreisschermesser

Publications (1)

Publication Number Publication Date
ES2072885T3 true ES2072885T3 (es) 1995-08-01

Family

ID=27198631

Family Applications (1)

Application Number Title Priority Date Filing Date
ES89121871T Expired - Lifetime ES2072885T3 (es) 1988-12-10 1989-11-27 Procedimiento para el recubrimiento del cuerpo de base de una herramienta fabricada siguiendo dicho procedimiento.

Country Status (7)

Country Link
US (1) US5093151A (es)
EP (1) EP0373412B1 (es)
JP (1) JPH03130364A (es)
KR (1) KR0154327B1 (es)
AT (1) ATE122734T1 (es)
DE (4) DE3841731C1 (es)
ES (1) ES2072885T3 (es)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR930011413B1 (ko) * 1990-09-25 1993-12-06 가부시키가이샤 한도오따이 에네루기 겐큐쇼 펄스형 전자파를 사용한 플라즈마 cvd 법
DE4126852A1 (de) * 1991-08-14 1993-02-18 Krupp Widia Gmbh Werkzeug mit verschleissfester diamantschneide, verfahren zu dessen herstellung sowie dessen verwendung
JPH07109034B2 (ja) * 1991-04-08 1995-11-22 ワイケイケイ株式会社 硬質多層膜形成体およびその製造方法
US5665431A (en) * 1991-09-03 1997-09-09 Valenite Inc. Titanium carbonitride coated stratified substrate and cutting inserts made from the same
DE4140158A1 (de) * 1991-12-05 1993-06-09 Krupp Widia Gmbh, 4300 Essen, De Verfahren und vorrichtung zur hartstoffbeschichtung von substratkoerpern
US5290610A (en) * 1992-02-13 1994-03-01 Motorola, Inc. Forming a diamond material layer on an electron emitter using hydrocarbon reactant gases ionized by emitted electrons
US6056999A (en) * 1992-02-18 2000-05-02 Valenite Inc. Titanium carbonitride coated cemented carbide and cutting inserts made from the same
DE4239234A1 (de) * 1992-11-21 1994-06-09 Krupp Widia Gmbh Werkzeug und Verfahren zur Beschichtung eines Werkzeuggrundkörpers
DE69431032T2 (de) * 1993-05-31 2003-01-30 Sumitomo Electric Industries Beschichtetes schneidwerkzeug und verfahren zu dessen herstellung
WO1995027570A1 (en) * 1994-04-08 1995-10-19 Ray Mark A Selective plasma deposition
US6413628B1 (en) 1994-05-12 2002-07-02 Valenite Inc. Titanium carbonitride coated cemented carbide and cutting inserts made from the same
DE4442370A1 (de) * 1994-11-29 1996-05-30 Widia Gmbh Verfahren zur Abscheidung metallischer Schichten auf Substratkörpern und Verbundkörper aus einem Substratkörper und mindestens einer Oberflächenschicht
DE19513614C1 (de) * 1995-04-10 1996-10-02 Fraunhofer Ges Forschung Verfahren zur Abscheidung von Kohlenstoffschichten, Kohlenstoffschichten auf Substraten und deren Verwendung
DE19543748A1 (de) * 1995-11-24 1997-05-28 Widia Gmbh Schneidwerkzeug, Verfahren zur Beschichtung eines Schneidwerkzeuges und Verwendung des Schneidwerkzeuges
US5750247A (en) * 1996-03-15 1998-05-12 Kennametal, Inc. Coated cutting tool having an outer layer of TiC
AUPN960696A0 (en) 1996-05-02 1996-05-23 Commonwealth Scientific And Industrial Research Organisation Surface modification of polymers
DE19748110C2 (de) * 1996-11-07 2000-07-13 Koenig & Bauer Ag Schneidmesser
ATE228039T1 (de) * 1997-09-10 2002-12-15 Wefa Singen Gmbh Strangpresswerkzeug sowie verfahren zu dessen herstellung
SE517046C2 (sv) * 1997-11-26 2002-04-09 Sandvik Ab Plasmaaktiverad CVD-metod för beläggning av skärverktyg med finkornig aluminiumoxid
CA2237264A1 (en) * 1998-05-08 1999-11-08 Northern Telecom Limited Receiver based congestion control
US6566272B2 (en) 1999-07-23 2003-05-20 Applied Materials Inc. Method for providing pulsed plasma during a portion of a semiconductor wafer process
DE10016958A1 (de) * 2000-04-06 2001-10-18 Widia Gmbh Verfahren zur Herstellung von Multilagenschichten auf Substratkörpern und Verbundwerkstoff, bestehend aus einem beschichteten Substratkörper
US6327884B1 (en) * 2000-09-29 2001-12-11 Wilson Tool International, Inc. Press brake tooling with hardened surfaces
DE10120046B4 (de) * 2001-04-24 2009-10-29 Widia Gmbh Schneideinsatz zur Bearbeitung von schwer zerspanbaren Metalllegierungswerkstücken und Verfahren zu dessen Herstellung
US6960263B2 (en) * 2002-04-25 2005-11-01 Applied Materials, Inc. Shadow frame with cross beam for semiconductor equipment
US7303789B2 (en) * 2003-02-17 2007-12-04 Ngk Insulators, Ltd. Methods for producing thin films on substrates by plasma CVD
DE20320843U1 (de) * 2003-04-08 2005-03-24 Cfs Germany Gmbh Messerkopf für Fleischkutter
DE10322871A1 (de) * 2003-05-21 2004-12-16 Kennametal Widia Gmbh & Co.Kg Sinterkörper und Verfahren zu seiner Herstellung
US7501161B2 (en) * 2004-06-01 2009-03-10 Applied Materials, Inc. Methods and apparatus for reducing arcing during plasma processing
US20100199738A1 (en) * 2004-08-13 2010-08-12 Vip Tooling, Inc., (An Indiana Corporation) Modular extrusion die tools
US7685907B2 (en) * 2004-08-13 2010-03-30 Vip Tooling, Inc. Method for manufacturing extrusion die tools
JP6315699B2 (ja) * 2014-03-17 2018-04-25 東京エレクトロン株式会社 炭窒化チタン膜を形成する方法
US10597781B2 (en) 2016-03-02 2020-03-24 Pusan National University Industry-University Cooperation Foundation Method for forming coating film having high heat resistance, high hardness and abrasion resistance, coating film having high heat resistance, high hardness and abrasion resistance, and cutting tool comprising same
JP7285318B2 (ja) * 2018-09-28 2023-06-01 コーニング インコーポレイテッド オーステナイト変態温度未満での無機粒子の堆積のための方法、及びこの方法によって製造される物品

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DE3027688C2 (de) * 1980-07-22 1982-04-01 Fried. Krupp Gmbh, 4300 Essen Verfahren zur Herstellung eines verschleißfesten Verbundwerkstoffes
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FR2559033B1 (fr) * 1984-02-07 1987-03-27 Roquette Freres Creme glacee sans sucre et son procede de preparation
DE3507158A1 (de) * 1985-03-01 1986-09-04 Rudolf Dipl.-Wirtsch.-Ing. 3548 Arolsen Wilke Plattenhalter
JPS61221369A (ja) * 1985-03-27 1986-10-01 Sumitomo Electric Ind Ltd 被覆超硬合金部材
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DE8514257U1 (de) * 1985-05-14 1985-07-11 Wilhelm Bilstein Spezialfabrik für Rundmesser und Plattenventile, 5063 Overath Messer für Rollenschneidmaschine
DE3544975C1 (de) * 1985-12-19 1992-09-24 Krupp Gmbh Verfahren zur Herstellung eines beschichteten Formkoerpers
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JPS63210099A (ja) * 1987-02-26 1988-08-31 Nissin Electric Co Ltd ダイヤモンド膜の作製方法

Also Published As

Publication number Publication date
KR900010045A (ko) 1990-07-06
EP0373412B1 (de) 1995-05-17
US5093151A (en) 1992-03-03
ATE122734T1 (de) 1995-06-15
DE3841731C1 (en) 1990-04-12
DE8910041U1 (de) 1989-10-12
JPH03130364A (ja) 1991-06-04
KR0154327B1 (ko) 1998-11-16
DE8909928U1 (de) 1989-10-05
EP0373412A1 (de) 1990-06-20
DE58909237D1 (de) 1995-06-22

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