MX9206475A - Metodo para recubrir un substrato de metal, para proporcionarle proteccion contra la corrosion - Google Patents

Metodo para recubrir un substrato de metal, para proporcionarle proteccion contra la corrosion

Info

Publication number
MX9206475A
MX9206475A MX9206475A MX9206475A MX9206475A MX 9206475 A MX9206475 A MX 9206475A MX 9206475 A MX9206475 A MX 9206475A MX 9206475 A MX9206475 A MX 9206475A MX 9206475 A MX9206475 A MX 9206475A
Authority
MX
Mexico
Prior art keywords
protection against
against corrosion
coating
metal substrate
provide protection
Prior art date
Application number
MX9206475A
Other languages
English (en)
Inventor
Joseph Albert Antonelli
Tyau-Jeen Lin
Duck Joo Yang
Hirotsugu Yasuda
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Publication of MX9206475A publication Critical patent/MX9206475A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D13/00—Electrophoretic coating characterised by the process
    • C25D13/20—Pretreatment

Abstract

Esta invención se relaciona al uso de la tecnología de plasma a baja temperatura para la protección de metales a la corrosión mejorada significativamente. El proceso con plasma involucra un pretratamiento de la superficie del metal con un plasma de gas para eliminar el oxígeno, seguido por deposición por plasma de una película polimérica delgada sobre la superficie tratada, seguido por la aplicación de una capa galvánica catódica de una pintura de imprimación.
MX9206475A 1991-11-12 1992-11-11 Metodo para recubrir un substrato de metal, para proporcionarle proteccion contra la corrosion MX9206475A (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/789,485 US5182000A (en) 1991-11-12 1991-11-12 Method of coating metal using low temperature plasma and electrodeposition

Publications (1)

Publication Number Publication Date
MX9206475A true MX9206475A (es) 1993-10-01

Family

ID=25147783

Family Applications (1)

Application Number Title Priority Date Filing Date
MX9206475A MX9206475A (es) 1991-11-12 1992-11-11 Metodo para recubrir un substrato de metal, para proporcionarle proteccion contra la corrosion

Country Status (8)

Country Link
US (2) US5182000A (es)
EP (1) EP0619847B1 (es)
JP (1) JP3330143B2 (es)
KR (2) KR940703938A (es)
CA (1) CA2123085A1 (es)
DE (1) DE69210841T2 (es)
MX (1) MX9206475A (es)
WO (1) WO1993010283A1 (es)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5182000A (en) * 1991-11-12 1993-01-26 E. I. Du Pont De Nemours And Company Method of coating metal using low temperature plasma and electrodeposition
FR2707894B1 (fr) * 1993-07-20 1995-10-06 Lorraine Laminage Traitement de surface d'une tôle d'acier revêtue de zinc ou d'alliage de zinc avant sa mise en peinture.
US6255718B1 (en) 1995-02-28 2001-07-03 Chip Express Corporation Laser ablateable material
US5874127A (en) * 1995-08-16 1999-02-23 Ciba Vision Corporation Method and apparatus for gaseous treatment
JP3315302B2 (ja) * 1995-12-18 2002-08-19 株式会社神戸製鋼所 真空アーク蒸着方法
US5827785A (en) * 1996-10-24 1998-10-27 Applied Materials, Inc. Method for improving film stability of fluorosilicate glass films
TW347363B (en) * 1996-11-12 1998-12-11 Bae-Hyeock Chun Method for improving demolding effect of a mold by a low temperature plasma process
KR19990041210A (ko) * 1997-11-21 1999-06-15 박원훈 플라즈마를 이용한 재료표면상의 다양한 특성의 고분자 합성방법
KR19990047370A (ko) * 1997-12-04 1999-07-05 구자홍 표면의 친수성 또는 소수성이 향상된 냉동, 공조용 금속재료 및 그 향상 방법
US6287990B1 (en) 1998-02-11 2001-09-11 Applied Materials, Inc. CVD plasma assisted low dielectric constant films
US6660656B2 (en) 1998-02-11 2003-12-09 Applied Materials Inc. Plasma processes for depositing low dielectric constant films
US6303523B2 (en) 1998-02-11 2001-10-16 Applied Materials, Inc. Plasma processes for depositing low dielectric constant films
US6054379A (en) * 1998-02-11 2000-04-25 Applied Materials, Inc. Method of depositing a low k dielectric with organo silane
US6159871A (en) * 1998-05-29 2000-12-12 Dow Corning Corporation Method for producing hydrogenated silicon oxycarbide films having low dielectric constant
US6667553B2 (en) 1998-05-29 2003-12-23 Dow Corning Corporation H:SiOC coated substrates
US6638451B1 (en) * 1999-08-31 2003-10-28 Novartis Ag Plastic casting molds
DE19953667B4 (de) * 1999-11-08 2009-06-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Schicht mit selektiv funktionalisierter Oberfläche, Verfahren zur Herstellung sowie deren Verwendung
JP4041945B2 (ja) * 2000-05-22 2008-02-06 セイコーエプソン株式会社 ヘッド部材及び撥インク処理方法並びに処理装置
US6881269B2 (en) 2000-08-17 2005-04-19 Novartis Ag Lens plasma coating system
DE10114468B4 (de) * 2001-03-24 2005-04-28 Thyssenkrupp Stahl Ag Verfahren zur Herstellung von beschichteten Formteilen und ihre Verwendung
ATE526135T1 (de) * 2001-03-26 2011-10-15 Novartis Ag Giessform und verfahren zur herstellung von opthalmischen linsen
US6709721B2 (en) 2001-03-28 2004-03-23 Applied Materials Inc. Purge heater design and process development for the improvement of low k film properties
FR2836157B1 (fr) * 2002-02-19 2004-04-09 Usinor Procede de nettoyage de la surface d'un materiau enduit d'une susbstance organique, generateur et dispositif de mise en oeuvre
US20030183245A1 (en) * 2002-04-01 2003-10-02 Min-Shyan Sheu Surface silanization
KR100649772B1 (ko) * 2005-02-23 2006-11-27 주식회사 젠트로 원통소재 표면 처리용 플라즈마 장치 및 플라즈마 처리를통한 피복 강관의 제조방법
DE102006047060A1 (de) * 2006-05-18 2007-11-22 Thyssenkrupp Steel Ag Mit einem Korrosionsschutzsystem versehenes Stahlblech und Verfahren zum Beschichten eines Stahlblechs mit einem solchen Korrosionsschutzsystem
US20090048652A1 (en) * 2007-08-13 2009-02-19 Cardiac Pacemakers, Inc Medical device having plasma polymerized coating and method therefor
KR101352237B1 (ko) * 2008-08-13 2014-01-16 엘지디스플레이 주식회사 유기전계발광표시장치의 제조방법
US20100062176A1 (en) * 2008-09-09 2010-03-11 Sigma Laboratories Of Arizona, Llc Boundary layer disruptive preconditioning in atmospheric-plasma process
US8404352B2 (en) * 2008-10-21 2013-03-26 Equistar Chemicals, Lp Polyolefin-metal laminate
MY157325A (en) 2010-12-01 2016-05-31 Novartis Ag Atmospheric plasma coating for ophthalmic devices
KR101242953B1 (ko) * 2010-12-27 2013-03-12 주식회사 포스코 도금 방법 및 아연 도금 장치
US8268675B2 (en) * 2011-02-11 2012-09-18 Nordson Corporation Passivation layer for semiconductor device packaging
US9358735B2 (en) 2011-11-29 2016-06-07 Novartis Ag Method of treating a lens forming surface of at least one mold half of a mold for molding ophthalmic lenses
US20140262802A1 (en) * 2013-03-15 2014-09-18 Cap Technologies, Llc Metal Deposition Process Using Electroplasma
US20160064405A1 (en) * 2014-08-29 2016-03-03 Kabushiki Kaisha Toshiba Method for forming insulator film on metal film
EP3209808A4 (en) 2014-10-21 2017-10-11 Oreltech Ltd. A method and system for forming a patterned metal film on a substrate
KR101986234B1 (ko) * 2017-07-11 2019-06-05 주식회사 엔트리생활건강 고기능성 항균·탈취 필터 및 그 제조방법
DE102019101061B4 (de) * 2019-01-16 2022-02-17 Infineon Technologies Ag Verfahren zum ausbilden einer kontaktstruktur, verfahren zum ausbilden eines chipgehäuses und chipgehäuse
TWI754601B (zh) * 2021-07-16 2022-02-01 義派克國際有限公司 強化耐磨金屬表面之電漿離化沉積製程及其結構

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4588641A (en) * 1983-11-22 1986-05-13 Olin Corporation Three-step plasma treatment of copper foils to enhance their laminate adhesion
IT1204006B (it) * 1987-05-05 1989-02-23 Eniricerche Spa Procedimento per la preparazione di film poliolefinici metallizzabili
US4980196A (en) * 1990-02-14 1990-12-25 E. I. Du Pont De Nemours And Company Method of coating steel substrate using low temperature plasma processes and priming
US5182000A (en) * 1991-11-12 1993-01-26 E. I. Du Pont De Nemours And Company Method of coating metal using low temperature plasma and electrodeposition

Also Published As

Publication number Publication date
US5312529A (en) 1994-05-17
EP0619847B1 (en) 1996-05-15
DE69210841D1 (de) 1996-06-20
KR940703938A (ko) 1994-12-12
CA2123085A1 (en) 1993-05-27
JPH07504943A (ja) 1995-06-01
KR960011247B1 (ko) 1996-08-21
US5182000A (en) 1993-01-26
EP0619847A1 (en) 1994-10-19
DE69210841T2 (de) 1996-10-10
JP3330143B2 (ja) 2002-09-30
WO1993010283A1 (en) 1993-05-27

Similar Documents

Publication Publication Date Title
MX9206475A (es) Metodo para recubrir un substrato de metal, para proporcionarle proteccion contra la corrosion
ES2098275T3 (es) Procedimiento de revestimiento de un sustrato de acero utilizando tecnologia de plasma a baja temperatura y una imprimacion.
NL194551C (nl) Werkwijze voor het thermochemisch behandelen van materiaaloppervlakken; aldus behandelde vormstukken.
ES2186915T3 (es) Procedimiento que sirve para depositar oxido de estaño y oxido de titanio sobre una plancha de vidrio y vidrio revestido por medio de este procedimiento.
AU2003238006A1 (en) Thermal sprayed yttria-containing coating for plasma reactor
GB2391237A (en) Corrosion inhibitor composition applicable for aluminium and steel protection and procedure
JPS57500292A (es)
ES2056053T3 (es) Metodo de aplicacion de un revestimiento de fosfato de zinc y de niquel.
BR0208966A (pt) processo de deposição de vapor quìmico para aplicar um revestimento de óxido metálico dopado com antimÈnio a uma superfìcie sobre um substrato de vidro quente, processo de deposição de vapor quìmico para aplicar um revestimento de óxido de estanho dopado com antimÈnio a uma superfìcie sobre um substrato de vidro quente
ES2072885T3 (es) Procedimiento para el recubrimiento del cuerpo de base de una herramienta fabricada siguiendo dicho procedimiento.
ZA971532B (en) Composition and method for treatment of phosphated metal surfaces.
ATE449044T1 (de) Schmutzbeständige beschichtung für glasoberflächen
MY138638A (en) Coatings for the inhibition of undesirable oxidation in an electrochemical cell
ES2082637T3 (es) Procedimiento para la electrooxidacion de metanol a formaldehido y metilal.
ES2079855T3 (es) Tratamiento de un revestimiento autodepositado con una solucion alcalina que contiene aniones de acidos organicos multifuncionales.
GB0205959D0 (en) Apparatus and method for applying diamond-like carbon coatings
MX170165B (es) Metodo para revestir ceramica sobre metales
ATE373117T1 (de) Beschichtung metallischer oberflächen mit wassersoffperoxid und nitro-guanidin enthaltenden phosphatierungslösungen
BR8704790A (pt) Processo para a formacao de uma camada de protecao
ES2073917T3 (es) Tratamiento de un revestimiento autodepositado con una solucion alcalina que contiene iones organofosfonato.
ES540769A0 (es) Procedimiento para la fosfatacion de superficies metalicas atemperatura de tratamiento baja
ES542119A0 (es) Procedimiento para el tratamiento de superficies de aluminioo de aleaciones de aluminio
NZ508750A (en) A method of coating a surface by exposing the surface to a plasma containing organic monomers
ES8601820A1 (es) Un metodo para recubrir un substrato con una pelicula por pulverizacion electronica catodica
AR001268A1 (es) Procedimiento para formar un recubrimiento protector adherente solido sobre superficies metalicas.

Legal Events

Date Code Title Description
FG Grant or registration
MM Annulment or lapse due to non-payment of fees