DE69210841T2 - Verfahren zur metallbeschichtung unter verwendung von niedrigtemperaturplasma und elektrotauchlackierung - Google Patents
Verfahren zur metallbeschichtung unter verwendung von niedrigtemperaturplasma und elektrotauchlackierungInfo
- Publication number
- DE69210841T2 DE69210841T2 DE69210841T DE69210841T DE69210841T2 DE 69210841 T2 DE69210841 T2 DE 69210841T2 DE 69210841 T DE69210841 T DE 69210841T DE 69210841 T DE69210841 T DE 69210841T DE 69210841 T2 DE69210841 T2 DE 69210841T2
- Authority
- DE
- Germany
- Prior art keywords
- plating
- electro
- low
- metal coating
- temperature plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D13/00—Electrophoretic coating characterised by the process
- C25D13/20—Pretreatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/789,485 US5182000A (en) | 1991-11-12 | 1991-11-12 | Method of coating metal using low temperature plasma and electrodeposition |
PCT/US1992/009666 WO1993010283A1 (en) | 1991-11-12 | 1992-11-12 | Method of coating metal using low temperature plasma and electrodeposition |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69210841D1 DE69210841D1 (de) | 1996-06-20 |
DE69210841T2 true DE69210841T2 (de) | 1996-10-10 |
Family
ID=25147783
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69210841T Expired - Fee Related DE69210841T2 (de) | 1991-11-12 | 1992-11-12 | Verfahren zur metallbeschichtung unter verwendung von niedrigtemperaturplasma und elektrotauchlackierung |
Country Status (8)
Country | Link |
---|---|
US (2) | US5182000A (de) |
EP (1) | EP0619847B1 (de) |
JP (1) | JP3330143B2 (de) |
KR (2) | KR940703938A (de) |
CA (1) | CA2123085A1 (de) |
DE (1) | DE69210841T2 (de) |
MX (1) | MX9206475A (de) |
WO (1) | WO1993010283A1 (de) |
Families Citing this family (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5182000A (en) * | 1991-11-12 | 1993-01-26 | E. I. Du Pont De Nemours And Company | Method of coating metal using low temperature plasma and electrodeposition |
FR2707894B1 (fr) * | 1993-07-20 | 1995-10-06 | Lorraine Laminage | Traitement de surface d'une tôle d'acier revêtue de zinc ou d'alliage de zinc avant sa mise en peinture. |
US6255718B1 (en) | 1995-02-28 | 2001-07-03 | Chip Express Corporation | Laser ablateable material |
US5874127A (en) * | 1995-08-16 | 1999-02-23 | Ciba Vision Corporation | Method and apparatus for gaseous treatment |
JP3315302B2 (ja) * | 1995-12-18 | 2002-08-19 | 株式会社神戸製鋼所 | 真空アーク蒸着方法 |
US5827785A (en) * | 1996-10-24 | 1998-10-27 | Applied Materials, Inc. | Method for improving film stability of fluorosilicate glass films |
TW347363B (en) * | 1996-11-12 | 1998-12-11 | Bae-Hyeock Chun | Method for improving demolding effect of a mold by a low temperature plasma process |
KR19990041210A (ko) * | 1997-11-21 | 1999-06-15 | 박원훈 | 플라즈마를 이용한 재료표면상의 다양한 특성의 고분자 합성방법 |
KR19990047370A (ko) * | 1997-12-04 | 1999-07-05 | 구자홍 | 표면의 친수성 또는 소수성이 향상된 냉동, 공조용 금속재료 및 그 향상 방법 |
US6303523B2 (en) | 1998-02-11 | 2001-10-16 | Applied Materials, Inc. | Plasma processes for depositing low dielectric constant films |
US6660656B2 (en) | 1998-02-11 | 2003-12-09 | Applied Materials Inc. | Plasma processes for depositing low dielectric constant films |
US6287990B1 (en) | 1998-02-11 | 2001-09-11 | Applied Materials, Inc. | CVD plasma assisted low dielectric constant films |
US6054379A (en) * | 1998-02-11 | 2000-04-25 | Applied Materials, Inc. | Method of depositing a low k dielectric with organo silane |
US6667553B2 (en) | 1998-05-29 | 2003-12-23 | Dow Corning Corporation | H:SiOC coated substrates |
US6159871A (en) * | 1998-05-29 | 2000-12-12 | Dow Corning Corporation | Method for producing hydrogenated silicon oxycarbide films having low dielectric constant |
US6638451B1 (en) * | 1999-08-31 | 2003-10-28 | Novartis Ag | Plastic casting molds |
DE19953667B4 (de) * | 1999-11-08 | 2009-06-04 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Schicht mit selektiv funktionalisierter Oberfläche, Verfahren zur Herstellung sowie deren Verwendung |
US6923525B2 (en) * | 2000-05-22 | 2005-08-02 | Seiko Epson Corporation | Head member ink repellence treating method and treating device |
US6881269B2 (en) | 2000-08-17 | 2005-04-19 | Novartis Ag | Lens plasma coating system |
DE10114468B4 (de) * | 2001-03-24 | 2005-04-28 | Thyssenkrupp Stahl Ag | Verfahren zur Herstellung von beschichteten Formteilen und ihre Verwendung |
JP2002355830A (ja) * | 2001-03-26 | 2002-12-10 | Novartis Ag | 眼科用レンズの製造のための型及び方法 |
US6709721B2 (en) | 2001-03-28 | 2004-03-23 | Applied Materials Inc. | Purge heater design and process development for the improvement of low k film properties |
FR2836157B1 (fr) * | 2002-02-19 | 2004-04-09 | Usinor | Procede de nettoyage de la surface d'un materiau enduit d'une susbstance organique, generateur et dispositif de mise en oeuvre |
US20030183245A1 (en) * | 2002-04-01 | 2003-10-02 | Min-Shyan Sheu | Surface silanization |
KR100649772B1 (ko) * | 2005-02-23 | 2006-11-27 | 주식회사 젠트로 | 원통소재 표면 처리용 플라즈마 장치 및 플라즈마 처리를통한 피복 강관의 제조방법 |
DE102006047060A1 (de) * | 2006-05-18 | 2007-11-22 | Thyssenkrupp Steel Ag | Mit einem Korrosionsschutzsystem versehenes Stahlblech und Verfahren zum Beschichten eines Stahlblechs mit einem solchen Korrosionsschutzsystem |
US20090048652A1 (en) * | 2007-08-13 | 2009-02-19 | Cardiac Pacemakers, Inc | Medical device having plasma polymerized coating and method therefor |
KR101352237B1 (ko) * | 2008-08-13 | 2014-01-16 | 엘지디스플레이 주식회사 | 유기전계발광표시장치의 제조방법 |
US20100062176A1 (en) * | 2008-09-09 | 2010-03-11 | Sigma Laboratories Of Arizona, Llc | Boundary layer disruptive preconditioning in atmospheric-plasma process |
US8404352B2 (en) * | 2008-10-21 | 2013-03-26 | Equistar Chemicals, Lp | Polyolefin-metal laminate |
EP2646228B1 (de) | 2010-12-01 | 2014-09-17 | Novartis AG | Verfahren zur Herstellung von opthalmischen Linsen |
KR101242953B1 (ko) * | 2010-12-27 | 2013-03-12 | 주식회사 포스코 | 도금 방법 및 아연 도금 장치 |
US8268675B2 (en) * | 2011-02-11 | 2012-09-18 | Nordson Corporation | Passivation layer for semiconductor device packaging |
CN103958167B (zh) | 2011-11-29 | 2017-03-08 | 诺华股份有限公司 | 用于模制眼用透镜的模具的至少一个半模的透镜成形表面的处理方法 |
WO2014145671A1 (en) * | 2013-03-15 | 2014-09-18 | Cap Technologies, Llc | Metal deposition process using electroplasma |
US20160064405A1 (en) * | 2014-08-29 | 2016-03-03 | Kabushiki Kaisha Toshiba | Method for forming insulator film on metal film |
KR102571836B1 (ko) * | 2014-10-21 | 2023-08-28 | 오렐테크 엘티디. | 패터닝된 금속 박막을 기판 상에 형성하기 위한 잉크 조성물 |
KR101986234B1 (ko) * | 2017-07-11 | 2019-06-05 | 주식회사 엔트리생활건강 | 고기능성 항균·탈취 필터 및 그 제조방법 |
DE102019101061B4 (de) * | 2019-01-16 | 2022-02-17 | Infineon Technologies Ag | Verfahren zum ausbilden einer kontaktstruktur, verfahren zum ausbilden eines chipgehäuses und chipgehäuse |
TWI754601B (zh) * | 2021-07-16 | 2022-02-01 | 義派克國際有限公司 | 強化耐磨金屬表面之電漿離化沉積製程及其結構 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4588641A (en) * | 1983-11-22 | 1986-05-13 | Olin Corporation | Three-step plasma treatment of copper foils to enhance their laminate adhesion |
IT1204006B (it) * | 1987-05-05 | 1989-02-23 | Eniricerche Spa | Procedimento per la preparazione di film poliolefinici metallizzabili |
US4980196A (en) * | 1990-02-14 | 1990-12-25 | E. I. Du Pont De Nemours And Company | Method of coating steel substrate using low temperature plasma processes and priming |
US5182000A (en) * | 1991-11-12 | 1993-01-26 | E. I. Du Pont De Nemours And Company | Method of coating metal using low temperature plasma and electrodeposition |
-
1991
- 1991-11-12 US US07/789,485 patent/US5182000A/en not_active Expired - Lifetime
-
1992
- 1992-10-29 US US07/968,512 patent/US5312529A/en not_active Expired - Lifetime
- 1992-11-11 MX MX9206475A patent/MX9206475A/es not_active IP Right Cessation
- 1992-11-12 CA CA002123085A patent/CA2123085A1/en not_active Abandoned
- 1992-11-12 EP EP92924387A patent/EP0619847B1/de not_active Expired - Lifetime
- 1992-11-12 WO PCT/US1992/009666 patent/WO1993010283A1/en active IP Right Grant
- 1992-11-12 DE DE69210841T patent/DE69210841T2/de not_active Expired - Fee Related
- 1992-11-12 KR KR1019940701574A patent/KR940703938A/ko not_active IP Right Cessation
- 1992-11-12 KR KR1019940701574A patent/KR960011247B1/ko active
- 1992-11-12 JP JP50936793A patent/JP3330143B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
WO1993010283A1 (en) | 1993-05-27 |
JP3330143B2 (ja) | 2002-09-30 |
CA2123085A1 (en) | 1993-05-27 |
US5182000A (en) | 1993-01-26 |
US5312529A (en) | 1994-05-17 |
EP0619847A1 (de) | 1994-10-19 |
KR940703938A (ko) | 1994-12-12 |
JPH07504943A (ja) | 1995-06-01 |
EP0619847B1 (de) | 1996-05-15 |
DE69210841D1 (de) | 1996-06-20 |
KR960011247B1 (ko) | 1996-08-21 |
MX9206475A (es) | 1993-10-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69210841T2 (de) | Verfahren zur metallbeschichtung unter verwendung von niedrigtemperaturplasma und elektrotauchlackierung | |
DE3777374D1 (de) | Verfahren und vorrichtung zur elektrotauchlackierung. | |
DE69400594T2 (de) | Verfahren zur Rückgewinnung und Auffrischung von Verzinnungsbädern | |
DE69219484D1 (de) | Verfahren und vorrichtung zur elektrolytischen beschichtung mit kupfer | |
DE69636451D1 (de) | Verfahren zur korrosionsinhibierung unter verwendung von n-halo-azolen | |
DE69625229D1 (de) | Verfahren zur gestaltung, qualitätskontrolle und verwaltung von ermüdungsbegrenzten metallwerkstücken | |
DE3854527T2 (de) | Vorrichtung und verfahren zur beschichtung von fixierungselementen. | |
DE19781971T1 (de) | Verfahren zur Beschichtung von Oberflächen von Metall-Implantaten | |
DE69010836T2 (de) | Elektrotauchlackierung-Überzugszusammensetzung und Verfahren. | |
DE69423602T2 (de) | Elektroplattierungsbad zum Aufbringen einer Zinn-Zink Legierung und Verfahren zur Elektroplattierung unter Verwendung desselben | |
DE59305994D1 (de) | Verfahren zur durchführung von stabilen niederdruck-glimmprozessen | |
DE59608859D1 (de) | Vorrichtung und verfahren zum beschichten von metallbahnen | |
DE58903968D1 (de) | Verfahren und vorrichtung zur kunststoffbeschichtung von strangprofilen. | |
DE69419970D1 (de) | Verfahren und Vorrichtung zur Elektroplattierung | |
DE69321686T2 (de) | Verfahren zur Feststellung von Bestandteilen in Plattierungsbädern | |
DE3684760D1 (de) | Verfahren zur elektrotauchlackierung und beschichteter artikel. | |
DE69323615D1 (de) | Verfahren zur kontrolle von baumwuchs | |
DE69128544D1 (de) | Verfahren und vorrichtung zur sputtenbeschichtung mit rotierender magnetischer kathode | |
DE69305329D1 (de) | Zusammensetzung und verfahren zur reinigung von zinnplattierten teilen | |
DE69326009D1 (de) | Verfahren zur Lotbeschichtung und Lötpaste dafür | |
DE59708316D1 (de) | Verfahren zur beschichtung von metallbändern | |
DE59402538D1 (de) | Verfahren und vorrichtung zur elektrolytischen oberflächenbeschichtung von werkstücken | |
DE69231293D1 (de) | Verfahren und vorrichtung zur plasmabeschichtung | |
ATA89188A (de) | Verfahren zur herstellung von kathodisch abscheidbaren elektrotauchlacken | |
DE69731855D1 (de) | Verfahren und Vorrichtung zur Tauchbeschichtung |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |