KR850007614A - 마이크로 웨이브 플라즈마 코팅 및 코팅된 공구 - Google Patents

마이크로 웨이브 플라즈마 코팅 및 코팅된 공구 Download PDF

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KR850007614A
KR850007614A KR1019850002908A KR850002908A KR850007614A KR 850007614 A KR850007614 A KR 850007614A KR 1019850002908 A KR1019850002908 A KR 1019850002908A KR 850002908 A KR850002908 A KR 850002908A KR 850007614 A KR850007614 A KR 850007614A
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tool
component
coating
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제이. 허젠스(외 1) 스테펜
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로렌스지. 노리스
에너지 컨버전 디바이시스, 인코포레이티드
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    • C—CHEMISTRY; METALLURGY
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Abstract

내용 없음

Description

마이크로 웨이브 플라즈마 코팅 및 코팅된 공구
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (33)

  1. 기질; 및 기질상의 코팅은 B, AI, Si, Ge 및 그 혼합물로 구성된 그룹에서 선택한 제일성분 및 C, N, O 및 그들의 혼합물로 구성된 그룹에서 선택한 제이성분의 무질서화된 내화성 조성물로 구성된 것을 특징으로 하는 공구.
  2. 제1항에 있어서, 코팅은 마이크로 웨이브에 의해 여기된 플라즈마로 용착된 것을 특징으로 하는 공구.
  3. 제2항에 있어서, 제일성분은 B이고, 제이성분은 N, C 및 그들의 혼합물로 구성된 그룹에서 선택된 것을 특징으로 하는 공구.
  4. 제3항에 있어서, 제이성분이 N이고, 코팅은 반응성 가스인 B2H6및 N2로 형성된 플라즈마로부터 용착된 것을 특징으로 하는 공구.
  5. 제3항에 있어서, 제이성분이 C이고, 코팅은 반응성가스인 B2H6및 탄화수소로 형성된 플라즈마로부터 용착된 것을 특징으로 하는 공구.
  6. 제2항에 있어서, 제일성분은 Si이고, 제이성분은 N, O 및 C로 구성된 그룹에서 선택된 것을 특징으로 하는 공구.
  7. 제6항에 있어서, 제이성분은 N이고, 코팅은 반응성 가스인 SiH4및 N2로 형성된 플라즈마로부터 용착된 것을 특징으로 하는 공구.
  8. 제6항에 있어서, 제이성분은 N이고, 코팅은 반응성 가스인 SiH4및 NH3로 형성된 플라즈마로부터 용착된 것을 특징으로 하는 공구.
  9. 제6항에 있어서, 제이성분은 O이고, 코팅은 반응성 가스인 SiH4및 O2로 형성된 플라즈마로부터 용착된 것을 특징으로 하는 공구.
  10. 제6항에 있어서, 제이성분은 C이고, 코팅은 반응성 가스인 SiH4및 탄화수소로 형성된 플라즈마로부터 용착된 것을 특징으로 하는 공구.
  11. 제2항에 있어서, 제일성분은 Al이고, 제이성분은 N 및 O로 구성된 그룹에서 선택된 것을 특징으로 하는 공구.
  12. 제11항에 있어서, 제이성분은 N이고, 코팅은 반응성 스퍼터링 및 N2로 구성된 반응성 가스에 의해 용착된 것을 특징으로 하는 공구.
  13. 제11항에 있어서, 제이성분은 O이고, 코팅은 반응성 스퍼터링 및 O2로 구성된 반응성 가스에 의해 용착된 것을 특징으로 하는 공구.
  14. 제2항에 있어서, 제일성분은 Ge이고, 제이성분은 N, C, O 및 B로 구성된 그룹에서 선택된 것을 특징으로 하는 공구.
  15. 제14항에 있어서, 제이성분은 N이고, 코팅은 반응성 가스인 GeH4및 N2로 구성된 플라즈마로부터 용착된 것을 특징으로 하는 공구.
  16. 제14항에 있어서, 제이성분은 C이고, 코팅은 반응성 가스인 GeH4및 탄화수소로 구성된 플라즈마로부터 용착된 것을 특징으로 하는 공구.
  17. 제14항에 있어서, 제이성분은 C이고, 코팅은 반응성 가스인 GeH4및 O2로 구성된 플라즈마로부터 용착된 것을 특징으로 하는 공구.
  18. 제14항에 있어서, 제이성분은 B이고, 코팅은 반응성 가스인 GeH4및 B2H6로 구성된 플라즈마로부터 용착된 것을 특징으로 하는 공구.
  19. 제2항에 있어서, 코팅은 약 5×10-3μ에서 약 1000μ두께를 가진 공구.
  20. 제1항에 있어서, 공구코팅은 반응성가스 주입기관 및 자전관 마이크로 웨이브 에너지 여기 기관을 가진 진공챔버에 기질을 놓고, 진공 챔버안의 전체 기압을 10-5토르 이하로 유지시키며, 한성분은 B2H6, SiH4, GeH4및 그들의 혼합물로 구성된 그룹에서 선택된 것이고 제이성분은 N2, O2, 탄화수소 및 그들의 혼합물로 구성된 그룹에서 선택된 것인 두성분의 반응성 가스를 진공챔버에 주입시키고, 반응성 가스의 플라즈마를 형성하여 기질상에 경질코팅을 용착시키는 방법으로 형성된 것을 특징으로 하는 공구.
  21. 제20항에 있어서, 제일반응성 가스는 B2H6이고, 제이반응성 가스는 N2, 탄화수소 및 그들의 혼합물로 구성된 그룹에서 선택된 것을 특징으로 하는 코팅된 공구.
  22. 제20항에 있어서, 제일반응성 가스는 SiH4이고 제이가스는 N2, O2, 탄화수소 및 그들의 혼합물로 구성된 그룹에서 선택된 것을 특징으로 하는 코팅된 공구.
  23. 제20항에 있어서, 제일반응성 가스는 GeH4이고, 제이반응성 가스는 N2, O2탄화수소 및 그들의 혼합물로 구성된 그룹에서 선택된 것을 특징으로 하는 코팅된 공구.
  24. 제20항에 있어서, 진공 챔버안의 초기진공은 10-5토르보다 작게한 후, 가스를 고압으로 진공챔버로 주입하되 10-1토르보다는 작게하는 방법으로 구성된 것을 특징으로 하는 코팅된 공구.
  25. 제24항에 있어서, 불활성 가스를 진공챔버에 주입한 후, 반응성 가스를 진공챔버에 주입하는 방법으로 구성된 것을 특징으로 하는 코팅된 공구.
  26. 제20항에 있어서, 기질상에 부착층을 형성한 후 부착층 위에 경질코팅을 형성하는 것을 특징으로 하는 코팅된 공구.
  27. 제26항에 있어서, 부착층은 원자 고이동성 성분 및 전이금속 성분으로 구성된 것을 특징으로 하는 코팅된 공구.
  28. 제27항에 있어서, 원자의 고이동도 성분은 O, N, C, B 및 그들의 혼합물로 구성된 그룹에서 선택된 것을 특징으로 하는 코팅된 공구.
  29. 제27항에 있어서, 전이금속 성분은 타이타늄, 바나듐, C 및 그들의 조합물로 구성된 그룹에서 선택된 것을 특징으로 하는 코팅공구.
  30. 제26항에 있어서, 반응성 스퍼터링에 의해서 부착층을 형성하는 것을 특징으로 하는 코팅된 공구.
  31. 제20항에 있어서, 경질코팅층상에 변형력 완화층을 형성한 후, 변형력 완화층위에 다른 경질 코팅층을 형성하는 것을 특징으로 하는 코팅된 공구.
  32. 제31항에 있어서, 변형력 완화층은 니오븀, 지르코늄 및 그들의 혼합물의 붕화물, 탄화물, 질화물 및 산화물로 구성된 그륨에서 선택된 조성물로 형성된 것을 특징으로 하는 코팅된 공구.
  33. 제32항에 있어서, 변형력 완화층은 반응성 스퍼터링에 의해 형성된 것을 특징으로 하는 코팅된 공구.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019850002908A 1984-04-30 1985-04-30 마이크로 웨이브 플라즈마 코팅 및 코팅된 공구 KR850007614A (ko)

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DE4034842A1 (de) * 1990-11-02 1992-05-07 Thyssen Edelstahlwerke Ag Verfahren zur plasmachemischen reinigung fuer eine anschliessende pvd oder pecvd beschichtung
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US4239536A (en) * 1977-09-09 1980-12-16 Sumitomo Electric Industries, Ltd. Surface-coated sintered hard body
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