KR930004496A - 선택적 화학증착(cvd) 다이아몬드 증착법 - Google Patents

선택적 화학증착(cvd) 다이아몬드 증착법 Download PDF

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Publication number
KR930004496A
KR930004496A KR1019920014187A KR920014187A KR930004496A KR 930004496 A KR930004496 A KR 930004496A KR 1019920014187 A KR1019920014187 A KR 1019920014187A KR 920014187 A KR920014187 A KR 920014187A KR 930004496 A KR930004496 A KR 930004496A
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KR
South Korea
Prior art keywords
cvd
diamond
coated
substrate
chemical vapor
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Application number
KR1019920014187A
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English (en)
Inventor
도미니크 아이아코반젤로 챨스
Original Assignee
아더 엠. 킹
제네랄 일렉트릭 캄파니
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Application filed by 아더 엠. 킹, 제네랄 일렉트릭 캄파니 filed Critical 아더 엠. 킹
Publication of KR930004496A publication Critical patent/KR930004496A/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B51/00—Tools for drilling machines
    • B23B51/02—Twist drills
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/042—Coating on selected surface areas, e.g. using masks using masks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B2226/00—Materials of tools or workpieces not comprising a metal
    • B23B2226/31—Diamond
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
    • B23B2228/04—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner applied by chemical vapour deposition [CVD]

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

내용 없음.

Description

선택적 화학증착(CVD) 다이아몬드 증착법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (8)

  1. (a) 화학증착(CVD)다이아몬드로 피복시키지 않을 기재 표면의 특정 영역을 CVD다이아몬드 형성을 방지하는 물질의 피막으로 마스킹(masking)시키는 단계, 및 (b) 상기 기재상에서 단자 마스킹되지 않은 영역만을 CVD다이아몬드의 층으로 피복시키기 위하여 상기 기재를 CVD다이아몬드 증착 공정으로 처리하는 단계를 포함하여, 상기 기재의 표면상에 화학증착(CVD) 다이아몬드를 선택적으로 증착시키는 방법.
  2. 제1항에 있어서, 상기 표면을 1차로 CVD다이아몬드 형성을 촉진시키는 물질의 층으로 피복시키고, 이어서 상기 피복된 기재를 상기 단계(a)로 처리하는 방법.
  3. 제1항에 있어서, 상기 단계(a)에서 상기 표면을 Co, Ni,및 Fe중의 한가지 이상으로 마스킹시키는 방법.
  4. 제2항에 있어서, 상기 표면을 1차로 Ti, Cr,Nb, Mo 및 W중의 한가지 이상의 물질층으로 피복시키는 방법.
  5. 제2항에 있어서, 상기 제1피복 표면을 CVD다이아몬드의 층으로 피복시킬 영역에 대해 마스킹 물질(maskant)로 보호하고, 상기 피복된 표면을 상기 단계(a)로 처리하고, 마스킹 물질을 제거한 다음, 피복된 표면에 단계(b)로 처리하는 방법.
  6. 제1항에 있어서, 상기 기재가 트위스트 드릴(twist drill)을 포함하는 방법.
  7. 제6항에 있어서, 상기 트위스트 드릴이 탄화텅스텐(WC)으로부터 제조된 방법.
  8. 제6항에 있어서, 상기 트위스트 드릴이 금속으로부터 제조된 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019920014187A 1991-08-08 1992-08-07 선택적 화학증착(cvd) 다이아몬드 증착법 KR930004496A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US74277391A 1991-08-08 1991-08-08
US742,773 1991-08-08

Publications (1)

Publication Number Publication Date
KR930004496A true KR930004496A (ko) 1993-03-22

Family

ID=24986161

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019920014187A KR930004496A (ko) 1991-08-08 1992-08-07 선택적 화학증착(cvd) 다이아몬드 증착법

Country Status (5)

Country Link
EP (1) EP0528592A1 (ko)
JP (1) JPH05209270A (ko)
KR (1) KR930004496A (ko)
CA (1) CA2072326A1 (ko)
ZA (1) ZA925597B (ko)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0613963A1 (en) * 1993-03-05 1994-09-07 General Electric Company Production of crack-free CVD diamond articles
DE4437053A1 (de) * 1994-10-18 1996-02-08 Widia Gmbh WC-Hartlegierung, Verfahren zu seiner Herstellung und seiner Verwendung
US5653812A (en) * 1995-09-26 1997-08-05 Monsanto Company Method and apparatus for deposition of diamond-like carbon coatings on drills
KR0151165B1 (ko) * 1996-04-12 1998-10-15 문정환 다이아몬드 미세가공 방법
GB0207375D0 (en) 2002-03-28 2002-05-08 Hardide Ltd Cutting tool with hard coating
KR20030081573A (ko) * 2002-04-12 2003-10-22 홍종오 다이아몬드상 카본이 코팅된 스퀴즈 블레이드
JP4846303B2 (ja) * 2005-08-30 2011-12-28 マニー株式会社 歯科用研磨器具
US9446841B2 (en) 2008-12-18 2016-09-20 Textron Innovations Inc. Method and apparatus for improved vibration isolation
EP2204470A1 (en) 2008-12-19 2010-07-07 Sandvik Intellectual Property AB A method of making a coated cutting tool and a coated cutting tool
US9297439B2 (en) 2009-03-12 2016-03-29 Textron Innovations Inc. Method and apparatus for improved vibration isolation
US8882091B2 (en) 2011-11-11 2014-11-11 Textron Innovations Inc. Vibration isolation system
US20170198528A1 (en) * 2014-08-01 2017-07-13 Halliburton Energy Services, Inc. Chemical vapor deposition-modified polycrystalline diamond
JP2023554009A (ja) * 2020-12-14 2023-12-26 エリコン・サーフェス・ソリューションズ・アクチェンゲゼルシャフト，プフェフィコーン ダイヤモンドコーティングの選択的堆積方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2228745B (en) * 1989-01-10 1993-09-08 Kobe Steel Ltd Process for the selective deposition of thin diamond film by gas phase synthesis
US5022801A (en) * 1990-07-18 1991-06-11 The General Electric Company CVD diamond coated twist drills

Also Published As

Publication number Publication date
EP0528592A1 (en) 1993-02-24
JPH05209270A (ja) 1993-08-20
CA2072326A1 (en) 1993-02-09
ZA925597B (en) 1993-04-26

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