KR890016422A - 개시제로서 이온성 염료화합물을 함유하는 감광물질 - Google Patents
개시제로서 이온성 염료화합물을 함유하는 감광물질 Download PDFInfo
- Publication number
- KR890016422A KR890016422A KR1019890004875A KR890004875A KR890016422A KR 890016422 A KR890016422 A KR 890016422A KR 1019890004875 A KR1019890004875 A KR 1019890004875A KR 890004875 A KR890004875 A KR 890004875A KR 890016422 A KR890016422 A KR 890016422A
- Authority
- KR
- South Korea
- Prior art keywords
- composition
- photoinitiator
- dye
- photopolymerizable
- light
- Prior art date
Links
- 150000001875 compounds Chemical class 0.000 title claims 12
- 239000000463 material Substances 0.000 title claims 9
- 239000003999 initiator Substances 0.000 title claims 3
- 239000000203 mixture Substances 0.000 claims 24
- 238000000034 method Methods 0.000 claims 20
- 150000003254 radicals Chemical class 0.000 claims 10
- 239000000178 monomer Substances 0.000 claims 7
- 125000002091 cationic group Chemical group 0.000 claims 6
- 238000010526 radical polymerization reaction Methods 0.000 claims 6
- 239000000853 adhesive Substances 0.000 claims 5
- 230000001070 adhesive effect Effects 0.000 claims 5
- 230000005855 radiation Effects 0.000 claims 5
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 4
- 239000011230 binding agent Substances 0.000 claims 4
- 238000004132 cross linking Methods 0.000 claims 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 4
- 238000000576 coating method Methods 0.000 claims 3
- 239000000975 dye Substances 0.000 claims 3
- 239000003973 paint Substances 0.000 claims 3
- 238000007342 radical addition reaction Methods 0.000 claims 3
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 claims 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical group C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 claims 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 claims 2
- 238000006243 chemical reaction Methods 0.000 claims 2
- 239000003795 chemical substances by application Substances 0.000 claims 2
- 239000011248 coating agent Substances 0.000 claims 2
- 239000002131 composite material Substances 0.000 claims 2
- 239000011521 glass Substances 0.000 claims 2
- QUAMTGJKVDWJEQ-UHFFFAOYSA-N octabenzone Chemical compound OC1=CC(OCCCCCCCC)=CC=C1C(=O)C1=CC=CC=C1 QUAMTGJKVDWJEQ-UHFFFAOYSA-N 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 2
- 230000035945 sensitivity Effects 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- ARVUDIQYNJVQIW-UHFFFAOYSA-N (4-dodecoxy-2-hydroxyphenyl)-phenylmethanone Chemical compound OC1=CC(OCCCCCCCCCCCC)=CC=C1C(=O)C1=CC=CC=C1 ARVUDIQYNJVQIW-UHFFFAOYSA-N 0.000 claims 1
- HGWZSJBCZYDDHY-UHFFFAOYSA-N 1-prop-2-enoyloxydecyl prop-2-enoate Chemical compound CCCCCCCCCC(OC(=O)C=C)OC(=O)C=C HGWZSJBCZYDDHY-UHFFFAOYSA-N 0.000 claims 1
- MEZZCSHVIGVWFI-UHFFFAOYSA-N 2,2'-Dihydroxy-4-methoxybenzophenone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1O MEZZCSHVIGVWFI-UHFFFAOYSA-N 0.000 claims 1
- IYAZLDLPUNDVAG-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-4-(2,4,4-trimethylpentan-2-yl)phenol Chemical compound CC(C)(C)CC(C)(C)C1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 IYAZLDLPUNDVAG-UHFFFAOYSA-N 0.000 claims 1
- HWSSEYVMGDIFMH-UHFFFAOYSA-N 2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOC(=O)C(C)=C HWSSEYVMGDIFMH-UHFFFAOYSA-N 0.000 claims 1
- BCHZICNRHXRCHY-UHFFFAOYSA-N 2h-oxazine Chemical compound N1OC=CC=C1 BCHZICNRHXRCHY-UHFFFAOYSA-N 0.000 claims 1
- AGIJRRREJXSQJR-UHFFFAOYSA-N 2h-thiazine Chemical compound N1SC=CC=C1 AGIJRRREJXSQJR-UHFFFAOYSA-N 0.000 claims 1
- UWSMKYBKUPAEJQ-UHFFFAOYSA-N 5-Chloro-2-(3,5-di-tert-butyl-2-hydroxyphenyl)-2H-benzotriazole Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC(N2N=C3C=C(Cl)C=CC3=N2)=C1O UWSMKYBKUPAEJQ-UHFFFAOYSA-N 0.000 claims 1
- GJCOSYZMQJWQCA-UHFFFAOYSA-N 9H-xanthene Chemical compound C1=CC=C2CC3=CC=CC=C3OC2=C1 GJCOSYZMQJWQCA-UHFFFAOYSA-N 0.000 claims 1
- AMFGWXWBFGVCKG-UHFFFAOYSA-N Panavia opaque Chemical compound C1=CC(OCC(O)COC(=O)C(=C)C)=CC=C1C(C)(C)C1=CC=C(OCC(O)COC(=O)C(C)=C)C=C1 AMFGWXWBFGVCKG-UHFFFAOYSA-N 0.000 claims 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- 239000000999 acridine dye Substances 0.000 claims 1
- PEJLNXHANOHNSU-UHFFFAOYSA-N acridine-3,6-diamine;10-methylacridin-10-ium-3,6-diamine;chloride Chemical group [Cl-].C1=CC(N)=CC2=NC3=CC(N)=CC=C3C=C21.C1=C(N)C=C2[N+](C)=C(C=C(N)C=C3)C3=CC2=C1 PEJLNXHANOHNSU-UHFFFAOYSA-N 0.000 claims 1
- ZRBGYWKZMWPOEK-UHFFFAOYSA-N butanoic acid;prop-2-enoic acid Chemical compound OC(=O)C=C.CCCC(O)=O ZRBGYWKZMWPOEK-UHFFFAOYSA-N 0.000 claims 1
- 239000001913 cellulose Substances 0.000 claims 1
- 229920002678 cellulose Polymers 0.000 claims 1
- CMDKPGRTAQVGFQ-RMKNXTFCSA-N cinoxate Chemical compound CCOCCOC(=O)\C=C\C1=CC=C(OC)C=C1 CMDKPGRTAQVGFQ-RMKNXTFCSA-N 0.000 claims 1
- MCPKSFINULVDNX-UHFFFAOYSA-N drometrizole Chemical compound CC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 MCPKSFINULVDNX-UHFFFAOYSA-N 0.000 claims 1
- 239000000945 filler Substances 0.000 claims 1
- 238000001093 holography Methods 0.000 claims 1
- 239000003906 humectant Substances 0.000 claims 1
- LPAGFVYQRIESJQ-UHFFFAOYSA-N indoline Chemical compound C1=CC=C2NCCC2=C1 LPAGFVYQRIESJQ-UHFFFAOYSA-N 0.000 claims 1
- 230000000977 initiatory effect Effects 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- QDLAGTHXVHQKRE-UHFFFAOYSA-N lichenxanthone Natural products COC1=CC(O)=C2C(=O)C3=C(C)C=C(OC)C=C3OC2=C1 QDLAGTHXVHQKRE-UHFFFAOYSA-N 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 claims 1
- 238000000465 moulding Methods 0.000 claims 1
- 239000000049 pigment Substances 0.000 claims 1
- 239000004033 plastic Substances 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K6/00—Preparations for dentistry
- A61K6/30—Compositions for temporarily or permanently fixing teeth or palates, e.g. primers for dental adhesives
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K6/00—Preparations for dentistry
- A61K6/60—Preparations for dentistry comprising organic or organo-metallic additives
- A61K6/62—Photochemical radical initiators
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K6/00—Preparations for dentistry
- A61K6/80—Preparations for artificial teeth, for filling teeth or for capping teeth
- A61K6/884—Preparations for artificial teeth, for filling teeth or for capping teeth comprising natural or synthetic resins
- A61K6/887—Compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61C—DENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
- A61C13/00—Dental prostheses; Making same
- A61C13/0003—Making bridge-work, inlays, implants or the like
- A61C13/0006—Production methods
- A61C13/0013—Production methods using stereolithographic techniques
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61C—DENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
- A61C19/00—Dental auxiliary appliances
- A61C19/003—Apparatus for curing resins by radiation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/128—Radiation-activated cross-linking agent containing
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (38)
- 유리 라디칼 부가중합 가능하거나 가교결합가능한 화합물 및 이온성 염료-반응성 반대이온 화합물(여기에서, 이온성 염료-반응성 반대이온 화합물은 화학광선 (actinic radiation)을 흡수할 수 있고 중합가능하거나 가교결합가능한 화합물의 유리 라디칼 중합반응 또는 가교결합 반응을 개시하는 유리 라디칼을 제공할 수 있으며, 이온성 염료는 메틴, 폴리메틸, 틀리아릴메탄, 인돌린, 티아진, 잔텐, 옥사진, 아크리딘 및 옥소놀 염료중에서 선택된다)을 함유하는 광경화성 조성물.
- 제 1 항에 있어서, 이온성 염료가 아크리딘 염료인 조성물.
- 제 2 항에 있어서, 염료가 아크리플라빈인 조성물.
- 광중합가능한 아크릴레이트계 접착물질 ; 및 화학광선을 흡수할 수 있고 광중합가능한 아크릴레이트계 접착물질의 유리 라디칼 중합반응을 개시하는 유리 라디칼을 제공할 수 있는 이온성 염료-반대이온 화합물을 포함하는 광개시제(photoinitiator)를 함유하는 중합가능한 조성물을 포함하는 치과용 종성물(dental composition).
- 제 4 항에 있어서, 광개시제가 양이온성 염료-보레이트 음이온 복합체인 조성물.
- 제 4 항에 있어서, 불활성 치과용 충진물을 추가로 함유하는 조성물.
- 제 4 항에 있어서, 광중합가능한 아클릴레이트계 접착물질이 2,2-비스[4-(2-히드록시-3-메트아크릴옥시프로폭시)페닐]프로판을 기본으로 하는 조성물.
- 제 6 항에 있어서, 조성물이 안료, 유백제, 광택제 또는 핸들링제(handling agent)를 추가로 함유하는 조성물.
- 치료하려는 치아표면을 세척하고 ; 화학광선을 흡수할 수 있고 아크릴레이트계 접착물질 유리 라디칼 중합반응을 개시하는 유리 라디칼을 제공할 수 있는 이온성 염료-반대이온 화합물을 함유하는 광개시제, 및 아크릴레이트계 접착물질을 함유하는 치아표면에 광중합가능한 조성물을 도포하고 ; 치아표면을 화학광선에 노출시켜 광중합반응을 개시하고 ; 접착물질을 경화시키는 단계를 포함하는 치아의 치료방법.
- 제 9 항에 있어서, 광개시제가 양이온성 염료-보레이트 음이온 복합체인 방법.
- 제 9 항에 있어서, 화학광선이 가시광(visible light)인 방법.
- 제11항에 있어서, 가시광을 광대역(broad band) 가시광원, 또는 레이저로부터 제공하는 방법.
- 제 9 항에 있어서, 노출단계전에 치아표면을 산으로 부식시키고 ; 치아표면에 결합제를 피복시키는 단계를 추가로 포함하는 방법.
- 제 9 항에 있어서, 노출단계전에 광중합가능한 조성물에 불활성 치과용 복원물질(restoration material)을 도포하고 성형시키는 단계를 추가로 포함하는 방법.
- 광중합 가능한 단량체, 결합제, 및 이온성 염료-반응성 반대이온 화합물을 함유하는 개시제를 함유하는 조성물을 기질표면에 도포하고 ; 레이저로부터 방사된 방사광(radiant light)으로 기질표면을 조사함으로써 영상을 형성시키고 ; 영상을 고정시키는 단계를 포함하여, 광중합체 홀로그래피(holography)에 의해 홀로그램을 제조하는 방법.
- 제15항에 있어서, 영상을 형성시킨 후, 고정단계가 표면전체를 화학광선에 노출시키는 단계를 포함하는 방법.
- 제16항에 있어서, 개시제가 양이온성 염료-보레이트 음이온 복합체인 방법.
- 제17항에 있어서, 방사광이 적색광 또는 녹색광인 방법.
- 제17항에 있어서, 광중합가능한 단량체를 트리에틸렌글리콜 디아크릴레이트, 트리에틸렌글리콜 디메트 아크릴레이트, 디에틸렌글리콜 디아클릴레이트, 데칸디올 디아크릴레이트, 및 트리메틸올프로판 트리아크릴레이트중에서 선택하는 방법.
- 제17항에 있어서, 결합제가 셀룰로오즈 아크릴레이트 부티레이트 결합제인 방법.
- 제17항에 있어서, 조성물이 자동산화제 (autooxidant)를 추가로 함유하는 방법.
- 제21항에 있어서, 자동산화제가 N,N-디메틸-2,6-디아소프로필아닐린인 방법.
- 유리 라디칼 부가중합가능하거나 가교결합가능한 화합물 ; 화학광선을 흡수할 수 있고, 중합가능하거나 가교결합가능한 화합물의 유리 라디칼 중합반응 또는 가교 결합을 개새하는 유리 라디칼을 제공할 수 있는 이온성 염료-반응성 반대이온 화합물을 함유하는 광개시제 ; 및 자외선 보호-화합물을 함유하는 광중합가능한조성물.
- 제23항에 있어서, 광개시제가 양이온성 염료-보레이트 음이온 화합물을 함유하는 조성물.
- 제24항에 있어서, 자와선 보호-화합물을 2-(3',5'-디-3급-부틸-2'-히드록시페닐)-5-클로로벤조트리아졸, 2-(3'-3급-부틸-5'-메틸-2'-히드록시페닐)-5-클로로벤조트리아졸, 2-(2'-히드록시-5'-메틸페닐)벤조트라아졸, 2-(2-히드록시-5-3급-옥틸페닐)벤조트리아졸, 2-히드록시-4-n-옥톡시벤조페논, 2,2'-디하이드록시-4-메톡시벤조페논, 2-히드록시-4-메톡시벤조페논, 4-도데실옥시-2-히드록시벤조페논, 및 2-에톡시에틸 p-메톡시신나메이트중에서 선택하는 조성물.
- 제24항에 있어서, 광개시제가 적색광에 대하여 예민한 조성물.
- 제24항에 있어서, 광개시제가 녹색광에 대하여 예민한 조성물.
- 제24항에 있어서, 조성물을 가옥용 페인트, 자동차용 페인트, 차체 및 부속품, 도로표지, 유리창, 초-대기압 도포용으로 사용된 플래스틱 배관 또는 중합체 부품에 사용하는 조성물.
- 콤퓨터 ; 콤퓨터 모니터 ; 가시광을 방사할 수 있는 하나 이상의 레이저 ; 가시영역에서 화학광선을 흡수할 수 있고 중합가능하거나 가교결합가능한 단량체의 유리 라디칼 중합반응 또는 가교결합을 개시하는 유리 라디칼을 제공할 수 있으며, 이온성 염료-반대이온 화합물을 함유하는 광개시제, 및 유리 라디칼 부가광중합가능하거나 가교결합가능한 단량체를 함유하며, 하나 이상의 레이저와 광학적으로 접촉하는 하나 이상의 용액 ; 각각의 피스톤이 이의 상부표면에 하나의 베이스를 가지며, 하나 이상의 용액에서 상향 및 하향운동할 수 있는 하나 이상의 피스톤 ; 및 하나 이상의 레이저에 의한 가시광의 방사, 및 하나 이상의 피스톤의 상향 및 하향운동을 제어하기 위한 제어장치를 포함하는 입체적 모델을 제공하기 위한 시스템.
- 제29항에 있어서, 광개시제가 양이온성 염료-보레이트 음이온 화합물인 시스템.
- 제30항에 있어서, 복합용액 및 복합레이저를 이용하고, 각각의 용액이 조사중에 작용하는 레이저에 의해 방사된 빛의 파장에 상응하는 민감도를 갖는 광개시제를 함유하는 시스템.
- (a) 콤퓨터 및 모니터로부터 2차원적 모델 또는 인공적인 입체적 모델을 형성시키고 ; (b) 가시영역에서 화학광선을 방사시킬 수 있는 레이저를 제공하고 ; (c) 가시영역에서 화학광선을 흡수할 수 있고, 중합가능하거나 가교결합가능한 단량체의 유리 라디칼 중합반응 또는 가교결합을 개시하는 유리 라디칼을 제공할 수 있으며 이온성염료-반대이온 화합물을 함유하는 광개시제, 및 유리 라디칼 부가광중합가능하거나 가교결합가능한 단량체 용액을 함유하며, 또한 레이저와 광학적으로 접촉하는 베이스를 피스토의 상부표면에 가지며 상향 및 하향운동할 수 있는 피스톤을 함유하는 베스(bath)를 제공하고 ; (d) 2차원적 영상 또는 인공적인 입체적 영상을 콤퓨터로 투사하고 ; (e) 선택적으로 레이저를 작용시키고 레이저에 의해 방사된 가시광에 베스를 노출시켜 광중합가능하거나 가교결합가능한 단량페를 중합시키거나 가교결합시키고, 선택적으로 피스톤을 상향 또는 하향운동시킴으로써, 투사된 영상을 베스로 전사시키고 ; (f) 베스내에서 모델을 형성하는 단계를 포함하여, 입체적 모델을 형성하는 방법.
- 제32항에 있어서, 광개시제가 양이온성 염료-보레이트 음이온 화합물인 방법.
- 제33항에 있어서, 상이한 감광성 광개시제를 함유하는 하나 이상의 추가의 베스, 및 광개시제의 민감도에 상응하는 빛을 방사시켜 다색 모델을 제공할 수 있는 하나 이상의 레이저를 사용하는 추가의 단계(b) 내지 (f)를 반복하는 방법.
- 제33항에 있어서, 전사단계가, 2차원적 영상 또는 인공적인 입체적 영상의 모든 라인이 전사될 때까지 2차원적 영상 또는 인공적인 입체적 영상 각각의 라인을 모니터로부터 베스까지 전사시킴을 포함하는 방법.
- 유리 라디칼 중합가능한 물질, 및 이온성 염료-반대이온 복합체를 함유하는 감광성 조성물을 광개시제로서 수중(under water)에서 표면에 도포함을 포함하여, 수중표면을 보호하고/하거나 보수하는 방법.
- 제36항에 있어서, 유리 라디칼 중합가능한 물질이 필수적으로 수불용성인 방법.
- 제37항에 있어서, 조성물이 습윤제를 추가로 포함하여, 수중표면을 습윤시키고 물을 배수시킬 수 있는 조성물의 능력을 증진시키는 방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US180915 | 1988-04-13 | ||
US07/180,915 US4977511A (en) | 1985-11-20 | 1988-04-13 | Photosensitive materials containing ionic dye compound as initiators |
Publications (1)
Publication Number | Publication Date |
---|---|
KR890016422A true KR890016422A (ko) | 1989-11-29 |
Family
ID=22662184
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019890004875A KR890016422A (ko) | 1988-04-13 | 1989-04-13 | 개시제로서 이온성 염료화합물을 함유하는 감광물질 |
Country Status (5)
Country | Link |
---|---|
US (1) | US4977511A (ko) |
EP (1) | EP0339841B1 (ko) |
JP (3) | JPH0211607A (ko) |
KR (1) | KR890016422A (ko) |
DE (1) | DE68923318T2 (ko) |
Families Citing this family (81)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5216616A (en) * | 1989-06-26 | 1993-06-01 | Masters William E | System and method for computer automated manufacture with reduced object shape distortion |
KR910003446A (ko) * | 1989-07-07 | 1991-02-27 | 데이비드 엘. 산테즈 | 염료-할로페닐 보레이트 광개시제 |
DE3939998A1 (de) * | 1989-12-02 | 1991-06-06 | Ivoclar Ag | Verfahren zur optischen unterscheidung eines dentalwerkstoffes sowie dentalwerkstoff dafuer |
JP2677457B2 (ja) * | 1991-01-22 | 1997-11-17 | 日本ペイント株式会社 | 光重合性組成物 |
US5230986A (en) * | 1991-02-01 | 1993-07-27 | Stereographics Limited Partnership | Photosensitive compositions containing benzospiropyrans and uses thereof |
FR2678748B1 (fr) * | 1991-07-05 | 1997-05-16 | Centre Nat Etd Spatiales | Compositions photopolymerisables, sensibles dans le rouge, utiles pour l'enregistrement d'hologrammes de phase. |
ES2060537B1 (es) * | 1992-12-22 | 1995-06-16 | Univ Alicante | Composiciones fotopolimerizables sensibles a la luz visible y materiales de registro obtenidos a partir de las mismas. |
JP2558431B2 (ja) * | 1993-01-15 | 1996-11-27 | ストラタシイス,インコーポレイテッド | 3次元構造体を製造するシステムを作動する方法及び3次元構造体製造装置 |
US5775870A (en) * | 1995-08-03 | 1998-07-07 | Hogan; Sherman David | Vehicle side tilting apparatus |
AU710052B2 (en) * | 1995-09-09 | 1999-09-09 | Avecia Limited | Process for producing polymeric layers having selectively coloured regions |
TW466256B (en) | 1995-11-24 | 2001-12-01 | Ciba Sc Holding Ag | Borate photoinitiator compounds and compositions comprising the same |
DE69629178T2 (de) * | 1995-12-22 | 2004-05-27 | Tokuyama Corp., Tokuyama | Dentale haftmittelzusammensetzung und polymerisationskatalysator |
JPH09274315A (ja) * | 1996-04-09 | 1997-10-21 | Brother Ind Ltd | 感光記録媒体 |
US5922783A (en) | 1997-02-27 | 1999-07-13 | Loctite Corporation | Radiation-curable, cyanoacrylate-containing compositions |
JPH11202484A (ja) * | 1998-01-16 | 1999-07-30 | Brother Ind Ltd | 画像形成媒体 |
AU756080B2 (en) | 1998-06-04 | 2003-01-02 | New York University | Endovascular thin film devices and methods for treating and preventing stroke |
US7343960B1 (en) | 1998-11-20 | 2008-03-18 | Rolls-Royce Corporation | Method and apparatus for production of a cast component |
US6932145B2 (en) | 1998-11-20 | 2005-08-23 | Rolls-Royce Corporation | Method and apparatus for production of a cast component |
US6988891B2 (en) | 1999-09-24 | 2006-01-24 | Cao Group, Inc. | Curing light |
US7066732B2 (en) | 1999-09-24 | 2006-06-27 | Cao Group, Inc. | Method for curing light-curable materials |
US6780010B2 (en) | 1999-09-24 | 2004-08-24 | Cao Group, Inc. | Curing light |
US6979193B2 (en) | 1999-09-24 | 2005-12-27 | Cao Group, Inc. | Curing light |
US6969253B2 (en) | 1999-09-24 | 2005-11-29 | Cao Group, Inc. | Light for use in activating light-activated materials, the light having at least one light emitting semiconductor chip, the chip being attached to a primary heat sink that is attached to a secondary heat sink using heat conductive and electrically insulative adhesive |
US6824294B2 (en) | 1999-09-24 | 2004-11-30 | Cao Group, Inc. | Light for use in activating light-activated materials, the light having a plurality of chips mounted in a gross well of a heat sink, and a dome covering the chips |
US6755649B2 (en) | 1999-09-24 | 2004-06-29 | Cao Group, Inc. | Curing light |
US6926524B2 (en) | 1999-09-24 | 2005-08-09 | Cao Group, Inc. | Curing light |
US6981867B2 (en) | 1999-09-24 | 2006-01-03 | Cao Group, Inc. | Curing light |
US6971875B2 (en) | 1999-09-24 | 2005-12-06 | Cao Group, Inc. | Dental curing light |
US6971876B2 (en) | 1999-09-24 | 2005-12-06 | Cao Group, Inc. | Curing light |
US7294364B2 (en) | 1999-09-24 | 2007-11-13 | Cao Group, Inc. | Method for curing composite materials |
US6988890B2 (en) | 1999-09-24 | 2006-01-24 | Cao Group, Inc. | Curing light |
US6932600B2 (en) | 1999-09-24 | 2005-08-23 | Cao Group, Inc. | Curing light |
US7077648B2 (en) | 1999-09-24 | 2006-07-18 | Cao Group, Inc. | Curing light |
US6910886B2 (en) | 1999-09-24 | 2005-06-28 | Cao Group, Inc. | Curing light |
US6719558B2 (en) | 1999-09-24 | 2004-04-13 | Densen Cao | Curing light |
US6974319B2 (en) | 1999-09-24 | 2005-12-13 | Cao Group, Inc. | Curing light |
US6755648B2 (en) | 1999-09-24 | 2004-06-29 | Cao Group, Inc. | Curing light |
US6929472B2 (en) | 1999-09-24 | 2005-08-16 | Cao Group, Inc. | Curing light |
US6719559B2 (en) | 1999-09-24 | 2004-04-13 | Densen Cao | Curing light |
US7108504B2 (en) | 2001-07-10 | 2006-09-19 | Cao Group, Inc. | Light for use in activating light-activated materials, the light having insulators and an air jacket |
US6799967B2 (en) | 2001-07-10 | 2004-10-05 | Cao Group, Inc. | Light for use in activating light-activated materials, the light having a plurality of light emitting single chip arrays |
JP2004287138A (ja) * | 2003-03-24 | 2004-10-14 | Konica Minolta Holdings Inc | ホログラフィック記録用組成物、ホログラフィック記録メディア及びその記録方法 |
JP2005309359A (ja) * | 2004-03-25 | 2005-11-04 | Fuji Photo Film Co Ltd | ホログラム記録材料、ホログラム記録方法、光記録媒体、3次元ディスプレイホログラムおよびホログラフィック光学素子。 |
JP4649158B2 (ja) * | 2004-09-30 | 2011-03-09 | 富士フイルム株式会社 | ホログラム記録方法 |
CA2804682C (en) * | 2005-02-08 | 2014-12-16 | Dentsply International Inc. | A self-cure activator for avoiding dilution of dental adhesives and for facilitating polymerization |
JP2006235386A (ja) * | 2005-02-25 | 2006-09-07 | Fuji Photo Film Co Ltd | ホログラム記録材料およびこれを用いた光記録媒体 |
CN100363419C (zh) * | 2005-07-06 | 2008-01-23 | 李岩青 | 辐射能固化有机无机纳米杂化复合材料及产品的合成方法 |
DE102007001862A1 (de) | 2007-01-12 | 2008-07-17 | Clariant International Ltd. | Flammwidrige Harzformulierung und ihre Verwendung |
US20110123929A1 (en) | 2007-01-23 | 2011-05-26 | Fujifilm Corporation | Oxime compound, photosensitive composition, color filter, production method for the color filter, and liquid crystal display element |
JP5535063B2 (ja) | 2007-05-11 | 2014-07-02 | ビーエーエスエフ ソシエタス・ヨーロピア | オキシムエステル光重合開始剤 |
WO2008138732A1 (en) | 2007-05-11 | 2008-11-20 | Basf Se | Oxime ester photoinitiators |
US8052829B2 (en) * | 2007-10-26 | 2011-11-08 | Dymax Corporation | Photopolymerizable compositions containing an oxonol dye |
JP5250371B2 (ja) | 2008-10-01 | 2013-07-31 | 株式会社松風 | 混合可能で色調再現が自在にできる歯科用着色材組成物とそのセットおよび方法 |
KR101712683B1 (ko) | 2009-03-23 | 2017-03-06 | 바스프 에스이 | 포토레지스트 조성물 |
ES2621939T3 (es) | 2009-03-24 | 2017-07-05 | Igm Malta Limited | Nuevos fotoiniciadores oligofuncionales |
EP2459519B1 (en) | 2009-07-30 | 2017-11-29 | Basf Se | Macrophotoinitiators |
EP2467755B1 (en) | 2009-08-21 | 2016-10-12 | Basf Se | Method for a sub microscopic and optically variable image carrying device |
US9051397B2 (en) | 2010-10-05 | 2015-06-09 | Basf Se | Oxime ester |
KR101831912B1 (ko) | 2010-10-05 | 2018-02-26 | 바스프 에스이 | 벤조카르바졸 화합물의 옥심 에스테르 유도체 및 광중합성 조성물에서의 광개시제로서의 그의 용도 |
CN103443072B (zh) | 2011-01-28 | 2016-05-18 | 巴斯夫欧洲公司 | 包含肟磺酸酯作为热固化剂的可聚合组合物 |
US9078815B2 (en) | 2011-07-13 | 2015-07-14 | Dentsply International Inc. | Self-cure activator |
KR102006041B1 (ko) | 2011-12-07 | 2019-07-31 | 바스프 에스이 | 옥심 에스테르 광개시제 |
CN105198793B (zh) | 2012-05-09 | 2019-08-13 | 巴斯夫欧洲公司 | 肟酯光敏引发剂 |
EP2909165B1 (en) | 2012-10-19 | 2018-05-30 | IGM Group B.V. | Hybrid photoinitiators |
BR112015010983B8 (pt) * | 2012-11-14 | 2021-04-13 | Dentsply Int Inc | método para produzir uma prótese dentária tridimensional por uma impressora 3d baseada em um método dlp (processador de luz digital) ou estereolitografia |
CN105051087A (zh) | 2012-12-18 | 2015-11-11 | 巴斯夫欧洲公司 | 基于萘二酰亚胺-亚乙烯基-低聚噻吩-亚乙烯基聚合物的半导体材料 |
CN114181249A (zh) | 2012-12-19 | 2022-03-15 | Igm集团公司 | 双酰基次膦酸的衍生物、其制备及其作为光敏引发剂的用途 |
US9796740B2 (en) | 2013-07-08 | 2017-10-24 | Basf Se | Liquid bisacylphosphine oxide photoinitiator |
JP6469669B2 (ja) | 2013-07-08 | 2019-02-13 | ビーエーエスエフ ソシエタス・ヨーロピアBasf Se | オキシムエステル光開始剤 |
JP6530410B2 (ja) | 2013-09-10 | 2019-06-12 | ビーエーエスエフ ソシエタス・ヨーロピアBasf Se | オキシムエステル光開始剤 |
ITMI20132131A1 (it) * | 2013-12-19 | 2015-06-20 | Heraeus Kulzer Gmbh | Procedimento di stratificazione sopra un'interfaccia sagomata per la realizzazione di sovrastrutture di tipo migliorato per protesi e sovrastruttura per protesi dentale realizzata con questo procedimento |
US10487050B2 (en) | 2014-08-29 | 2019-11-26 | Basf Se | Oxime sulfonate derivatives |
JP6449445B2 (ja) | 2014-09-04 | 2019-01-09 | アイ ジー エム マルタ リミテッド | 多環式光開始剤 |
EP3271155B1 (en) * | 2015-03-19 | 2020-09-30 | Dow Global Technologies LLC | Method of additive manufacturing using photoregulated radical polymerization |
US9868871B2 (en) * | 2015-06-10 | 2018-01-16 | Full Spectrum Laser | Water-washable resin formulations for use with 3D printing systems and methods |
WO2017079502A1 (en) * | 2015-11-05 | 2017-05-11 | Carbon, Inc. | Silicone dual cure resins for additive manufacturing |
ES2831086T3 (es) | 2016-09-02 | 2021-06-07 | Igm Group B V | Glioxilatos policíclicos como fotoiniciadores |
CN110868959A (zh) | 2017-02-22 | 2020-03-06 | 英特尔梅迪股份有限公司 | 利用泛音特征、吸收染料和材料特性加热牙科材料 |
US20220121113A1 (en) | 2019-01-23 | 2022-04-21 | Basf Se | Oxime ester photoinitiators having a special aroyl chromophore |
CN115210219A (zh) | 2020-03-04 | 2022-10-18 | 巴斯夫欧洲公司 | 肟酯光引发剂 |
US20210284572A1 (en) * | 2020-03-13 | 2021-09-16 | Corning Incorporated | Low temperature laser bleaching of polychromatic glass ceramics |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3495987A (en) * | 1965-09-03 | 1970-02-17 | Du Pont | Photopolymerizable products |
JPS509178B1 (ko) * | 1970-12-28 | 1975-04-10 | ||
US4307182A (en) * | 1980-05-23 | 1981-12-22 | Minnesota Mining And Manufacturing Company | Imaging systems with tetra(aliphatic) borate salts |
US4399209A (en) * | 1981-11-12 | 1983-08-16 | The Mead Corporation | Transfer imaging system |
US4440846A (en) * | 1981-11-12 | 1984-04-03 | Mead Corporation | Photocopy sheet employing encapsulated radiation sensitive composition and imaging process |
US4447521A (en) * | 1982-10-25 | 1984-05-08 | Minnesota Mining And Manufacturing Company | Fixing of tetra(hydrocarbyl)borate salt imaging systems |
US4450227A (en) * | 1982-10-25 | 1984-05-22 | Minnesota Mining And Manufacturing Company | Dispersed imaging systems with tetra (hydrocarbyl) borate salts |
US4434891A (en) * | 1983-03-18 | 1984-03-06 | M.U. Engineering & Mfg., Inc. | Disc package |
US4608330A (en) * | 1983-09-19 | 1986-08-26 | The Mead Corporation | Method for producing microcapsules and photosensitive microcapsules produced thereby |
US4576891A (en) * | 1984-06-15 | 1986-03-18 | The Mead Corporation | Photosensitive microcapsules useful in polychromatic imaging having radiation absorber |
US4587194A (en) * | 1984-11-20 | 1986-05-06 | The Mead Corporation | Photosensitive material employing microcapsules having different photographic speeds |
US4772541A (en) * | 1985-11-20 | 1988-09-20 | The Mead Corporation | Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same |
DE3677527D1 (de) * | 1985-11-20 | 1991-03-21 | Mead Corp | Ionische farbstoffe als initiatoren enthaltende fotosensitive materialien. |
US4895880A (en) * | 1986-05-06 | 1990-01-23 | The Mead Corporation | Photocurable compositions containing photobleachable ionic dye complexes |
GB8806527D0 (en) * | 1988-03-18 | 1988-04-20 | Ward Blenkinsop & Co Ltd | Benzophenone derivatives |
-
1988
- 1988-04-13 US US07/180,915 patent/US4977511A/en not_active Expired - Lifetime
-
1989
- 1989-04-13 EP EP89303687A patent/EP0339841B1/en not_active Expired - Lifetime
- 1989-04-13 DE DE68923318T patent/DE68923318T2/de not_active Expired - Fee Related
- 1989-04-13 KR KR1019890004875A patent/KR890016422A/ko not_active Application Discontinuation
- 1989-04-13 JP JP1094281A patent/JPH0211607A/ja active Pending
-
1998
- 1998-02-19 JP JP10037851A patent/JPH10265317A/ja active Pending
-
1999
- 1999-04-15 JP JP11108496A patent/JP2000003123A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JPH10265317A (ja) | 1998-10-06 |
EP0339841A3 (en) | 1990-04-11 |
DE68923318T2 (de) | 1996-02-08 |
US4977511A (en) | 1990-12-11 |
JPH0211607A (ja) | 1990-01-16 |
JP2000003123A (ja) | 2000-01-07 |
EP0339841A2 (en) | 1989-11-02 |
EP0339841B1 (en) | 1995-07-05 |
DE68923318D1 (de) | 1995-08-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR890016422A (ko) | 개시제로서 이온성 염료화합물을 함유하는 감광물질 | |
US4895880A (en) | Photocurable compositions containing photobleachable ionic dye complexes | |
US5151520A (en) | Cationic dye-triarylmonoalkylorate anion complexes | |
CA2028537C (en) | Process for adjusting the sensitivity to radiation of photopolymerizable compositions | |
DE2327513C3 (de) | Lichtempfindliches gegebenenfalls auf einen Schichtträger aufgebrachtes Gemisch | |
JP3421788B2 (ja) | 三次元物体の製造方法 | |
US6200646B1 (en) | Method for forming polymeric patterns, relief images and colored polymeric bodies using digital light processing technology | |
JP2988756B2 (ja) | 光重合開始剤およびこれを含有する光重合性組成物 | |
JP3882147B2 (ja) | 選択的に彩色された領域を有するポリマー層を製造する方法 | |
KR870005270A (ko) | 개시제로서 이온성 염료 화합물을 함유하는 감광성 재료 | |
TWI633400B (zh) | 製造浮凸圖像印刷元件之方法 | |
US4937159A (en) | Photosensitive materials and compositions containing ionic dye compounds as initiators and thiols as autooxidizers | |
JP2000275859A (ja) | 光硬化性組成物 | |
DE69731198D1 (de) | Verfahren zum härten von kationisch photohärtbaren zusammensetzungen | |
KR910018851A (ko) | 광중합성 기록 물질의 상 조사에 의한 인쇄 조판 또는 감광성 내식막의 제조방법. | |
US5230986A (en) | Photosensitive compositions containing benzospiropyrans and uses thereof | |
Schmitz et al. | NIR light for initiation of Photopolymerization | |
US5035621A (en) | Method of dental treatment | |
JPH04113362A (ja) | 光重合性組成物 | |
JP2023546499A (ja) | 内部性質変動を伴う物体の3dプリントのための断層撮影液槽光重合法 | |
JP3470607B2 (ja) | レンズシートへの高密着性遮光パターンの形成方法 | |
DE4135996A1 (de) | Photopolymerisierbare zusammensetzung | |
JPH0222691A (ja) | 水性、被膜形成性、光重合性組成物、感光性部材及び画像担持層 | |
ATE409890T1 (de) | Polymerisierbare zusammensetzung und verfahren zur herstellung von lithographischen druckplatten unter verwendung der polymerisierbaren zusammensetzung | |
JPH11116611A (ja) | 光重合性組成物 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |