ATE409890T1 - Polymerisierbare zusammensetzung und verfahren zur herstellung von lithographischen druckplatten unter verwendung der polymerisierbaren zusammensetzung - Google Patents

Polymerisierbare zusammensetzung und verfahren zur herstellung von lithographischen druckplatten unter verwendung der polymerisierbaren zusammensetzung

Info

Publication number
ATE409890T1
ATE409890T1 AT05004024T AT05004024T ATE409890T1 AT E409890 T1 ATE409890 T1 AT E409890T1 AT 05004024 T AT05004024 T AT 05004024T AT 05004024 T AT05004024 T AT 05004024T AT E409890 T1 ATE409890 T1 AT E409890T1
Authority
AT
Austria
Prior art keywords
polymerizable composition
lithographic printing
printing plates
producing lithographic
light
Prior art date
Application number
AT05004024T
Other languages
English (en)
Inventor
Tomotaka Tsuchimura
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Application granted granted Critical
Publication of ATE409890T1 publication Critical patent/ATE409890T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/14—Production of collotype printing forms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
AT05004024T 2004-02-26 2005-02-24 Polymerisierbare zusammensetzung und verfahren zur herstellung von lithographischen druckplatten unter verwendung der polymerisierbaren zusammensetzung ATE409890T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004051134 2004-02-26
JP2004084973 2004-03-23

Publications (1)

Publication Number Publication Date
ATE409890T1 true ATE409890T1 (de) 2008-10-15

Family

ID=34921646

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05004024T ATE409890T1 (de) 2004-02-26 2005-02-24 Polymerisierbare zusammensetzung und verfahren zur herstellung von lithographischen druckplatten unter verwendung der polymerisierbaren zusammensetzung

Country Status (4)

Country Link
US (1) US7306894B2 (de)
EP (1) EP1589374B1 (de)
AT (1) ATE409890T1 (de)
DE (1) DE602005009990D1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007099053A1 (en) * 2006-02-28 2007-09-07 Agfa Graphics Nv Method for making a lithographic printing plate
JP2007272143A (ja) * 2006-03-31 2007-10-18 Fujifilm Corp 平版印刷版原版およびその積層体
CN101928254B (zh) * 2010-07-09 2012-05-02 南京大学 苯并三唑衍生物及其制法与用途

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4268610A (en) * 1979-11-05 1981-05-19 Hercules Incorporated Photoresist formulations
US4680249A (en) * 1986-05-28 1987-07-14 E. I. Du Pont De Nemours And Company Photopolymerizable composition containing carboxy benzotriazole
DE3717038A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
US5102775A (en) * 1988-09-30 1992-04-07 Kansai Paint Co., Ltd. Visible light sensitive electrodeposition coating composition and image-forming method using the same
JPH03179356A (ja) * 1989-05-18 1991-08-05 Hitachi Chem Co Ltd 感光性樹脂組成物及び感光性樹脂組成物積層体
US5403698A (en) * 1990-10-16 1995-04-04 Hitachi Chemical Company, Ltd. Negative type photosensitive electrodepositing resin composition
CA2061877A1 (en) * 1991-02-28 1992-08-29 Eugene G. Sommerfeld Solvent dispersible interpenetrating polymer networks
US5663212A (en) * 1993-02-05 1997-09-02 Fuji Photo Film Co., Ltd. Light-sensitive resin composition
JPH11160880A (ja) * 1997-11-28 1999-06-18 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた感光性フィルム
US6335144B1 (en) * 1999-04-27 2002-01-01 Fuji Photo Film Co., Ltd. Photopolymerizable composition for short wavelength semiconductor laser exposure
JP2001033961A (ja) * 1999-07-23 2001-02-09 Fuji Photo Film Co Ltd 感光性組成物および平版印刷版の製版方法
JP2002139843A (ja) 2000-11-06 2002-05-17 Mitsubishi Chemicals Corp 光重合性画像形成材料及び画像形成方法
EP1262829A1 (de) * 2001-05-28 2002-12-04 Fuji Photo Film Co., Ltd. Lichtempfindliche Zusammensetzung
JP2002351065A (ja) 2001-05-28 2002-12-04 Fuji Photo Film Co Ltd 感光性組成物
JP2003035953A (ja) * 2001-07-23 2003-02-07 Hitachi Chem Co Ltd 高密度・高解像度用の感光性樹脂組成物及びその用途
JP2003043692A (ja) 2001-08-02 2003-02-13 Fuji Photo Film Co Ltd 光重合性平版印刷版
ATE544095T1 (de) * 2001-08-29 2012-02-15 Fujifilm Corp Verfahren zur herstellung einer druckplatte
JP2003064130A (ja) 2001-08-29 2003-03-05 Fuji Photo Film Co Ltd 光重合性組成物

Also Published As

Publication number Publication date
US20050202341A1 (en) 2005-09-15
EP1589374A2 (de) 2005-10-26
EP1589374A3 (de) 2006-10-11
US7306894B2 (en) 2007-12-11
DE602005009990D1 (de) 2008-11-13
EP1589374B1 (de) 2008-10-01

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Legal Events

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