KR890004394A - 반도체장치의 제조방법 - Google Patents
반도체장치의 제조방법Info
- Publication number
- KR890004394A KR890004394A KR1019880011034A KR880011034A KR890004394A KR 890004394 A KR890004394 A KR 890004394A KR 1019880011034 A KR1019880011034 A KR 1019880011034A KR 880011034 A KR880011034 A KR 880011034A KR 890004394 A KR890004394 A KR 890004394A
- Authority
- KR
- South Korea
- Prior art keywords
- manufacturing
- semiconductor device
- semiconductor
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62-216667 | 1987-08-31 | ||
JP21666787A JPS6459832A (en) | 1987-08-31 | 1987-08-31 | Manufacture of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
KR890004394A true KR890004394A (ko) | 1989-04-21 |
KR910010219B1 KR910010219B1 (ko) | 1991-12-21 |
Family
ID=16692039
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019880011034A KR910010219B1 (ko) | 1987-08-31 | 1988-08-30 | 반도체장치의 제조방법 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS6459832A (ko) |
KR (1) | KR910010219B1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100309301B1 (ko) * | 1997-09-17 | 2001-11-15 | 가네꼬 히사시 | 노광 패턴 마스크 및 그 제조 방법 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3179520B2 (ja) * | 1991-07-11 | 2001-06-25 | 株式会社日立製作所 | 半導体装置の製造方法 |
JP2742863B2 (ja) * | 1993-06-28 | 1998-04-22 | セイコーエプソン株式会社 | フレキシブル回路基板の製造方法及びマスク |
KR100191126B1 (ko) | 1995-11-28 | 1999-06-15 | 윤덕용 | 비닐4-t-부톡시카르보닐옥시벤잘-비닐 알코올-비닐 아세테이트 공중합체와 비닐 4-t-부톡시카르보닐옥시벤잘-비닐 4-히드록시벤잘-비닐 알코올-비닐 아세테이트 공중합체 및 그들의 제조방법 |
EP1043626A1 (en) * | 1999-04-06 | 2000-10-11 | STMicroelectronics S.r.l. | A method for improving the performance of photolithographic equipment and for increasing the lifetime of the optics thereof |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62281328A (ja) * | 1986-05-30 | 1987-12-07 | Nec Corp | 半導体装置の製造方法 |
-
1987
- 1987-08-31 JP JP21666787A patent/JPS6459832A/ja active Granted
-
1988
- 1988-08-30 KR KR1019880011034A patent/KR910010219B1/ko not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100309301B1 (ko) * | 1997-09-17 | 2001-11-15 | 가네꼬 히사시 | 노광 패턴 마스크 및 그 제조 방법 |
Also Published As
Publication number | Publication date |
---|---|
KR910010219B1 (ko) | 1991-12-21 |
JPS6459832A (en) | 1989-03-07 |
JPH0583176B2 (ko) | 1993-11-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
LAPS | Lapse due to unpaid annual fee |