KR880014379A - 전압 검지 회로 - Google Patents

전압 검지 회로 Download PDF

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Publication number
KR880014379A
KR880014379A KR1019880005827A KR880005827A KR880014379A KR 880014379 A KR880014379 A KR 880014379A KR 1019880005827 A KR1019880005827 A KR 1019880005827A KR 880005827 A KR880005827 A KR 880005827A KR 880014379 A KR880014379 A KR 880014379A
Authority
KR
South Korea
Prior art keywords
load
detection transistor
detection circuit
gate
gate insulating
Prior art date
Application number
KR1019880005827A
Other languages
English (en)
Other versions
KR920001717B1 (ko
Inventor
야스유끼 오가다
마고또 고지마
히로즈미 미사끼
Original Assignee
다니이 아끼오
마쯔시다덴기산교 가부시기가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 다니이 아끼오, 마쯔시다덴기산교 가부시기가이샤 filed Critical 다니이 아끼오
Publication of KR880014379A publication Critical patent/KR880014379A/ko
Application granted granted Critical
Publication of KR920001717B1 publication Critical patent/KR920001717B1/ko

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R19/00—Arrangements for measuring currents or voltages or for indicating presence or sign thereof
    • G01R19/145—Indicating the presence of current or voltage
    • G01R19/155—Indicating the presence of voltage
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
    • H01L29/42312—Gate electrodes for field effect devices
    • H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
    • H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
    • H01L29/42364—Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the insulating layer, e.g. thickness or uniformity
    • H01L29/42368—Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the insulating layer, e.g. thickness or uniformity the thickness being non-uniform
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R19/00—Arrangements for measuring currents or voltages or for indicating presence or sign thereof
    • G01R19/165—Indicating that current or voltage is either above or below a predetermined value or within or outside a predetermined range of values
    • G01R19/16504—Indicating that current or voltage is either above or below a predetermined value or within or outside a predetermined range of values characterised by the components employed
    • G01R19/16519—Indicating that current or voltage is either above or below a predetermined value or within or outside a predetermined range of values characterised by the components employed using FET's
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
    • H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Measurement Of Current Or Voltage (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Electronic Switches (AREA)

Abstract

내용 없음

Description

전압 검지 회로
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 전압검지회로의 일실시예의 회로도.
제2도는 상기 실시예에 사용하는 후막트랜지스터의 단면도.
제3도는 상기 후막트랜지스터의 온도의 존성을 나타낸 도면.

Claims (4)

  1. 정전압전원과 기준전위의 사이에, 부하와, 게이트 절연막의 일부를 두껍게한 검지용 트랜지스터를 직렬접속하고, 상기 부하의 상기 거지용 트랜지스터의 접속점의 전위를 논리게이트에 인가하고, 상기 검지용 트랜지스터의 게이트에 입력되는 전압이 소정의 값에 도달하였을 때, 상기 접속점의 전위에 의해서 상기 논리게이트의 출력을 반전시키도록 구성한 전압검지회로.
  2. 제1항에 있어서, 검지용트랜지스터가, 반도체기판내에 형성된 소오스, 드레인영역이 되는 확산층과, 이들 확산층간에 있어서의 상기 반도체기판 표면에 형성된 게이트 절연박막과, 이 게이트절연박막의 하부면 중앙부근에 형성된 게이트절연후막과, 상기 게이트절연박막상의 전역에 형성된 게이트전극을 포함하는 것을 특징으로 하는 전압검지회로.
  3. 제1항 또는 제2항에 있어서, 부하로부터 검지용트랜지스터에, 이 검지용트랜지스터의 온도의 존성이 최소가 되도록 전류를 공급하는 것을 특징으로 하는 전압검지회로.
  4. 제1항, 제2항 또는 제3항에 있어서, 검지용트랜지스터와 병렬로 제2의 부하를, 접속한 것을 특징으로 하는 전압검지회로.
    ※ 참고사항：최초출원 내용에 의하여 공개하는 것임.
KR1019880005827A 1987-05-20 1988-05-18 전압검지회로 KR920001717B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP87-122932 1987-05-20
JP62122932A JPH0740050B2 (ja) 1987-05-20 1987-05-20 電圧検知回路
JP62-122932 1987-05-20

Publications (2)

Publication Number Publication Date
KR880014379A true KR880014379A (ko) 1988-12-23
KR920001717B1 KR920001717B1 (ko) 1992-02-24

Family

ID=14848178

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019880005827A KR920001717B1 (ko) 1987-05-20 1988-05-18 전압검지회로

Country Status (4)

Country Link
US (1) US4825018A (ko)
EP (1) EP0292270A3 (ko)
JP (1) JPH0740050B2 (ko)
KR (1) KR920001717B1 (ko)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0777079B2 (ja) * 1987-07-31 1995-08-16 株式会社東芝 不揮発性半導体記憶装置
JPS6455857A (en) * 1987-08-26 1989-03-02 Nec Corp Semiconductor integrated device
JP2557271B2 (ja) * 1990-04-06 1996-11-27 三菱電機株式会社 内部降圧電源電圧を有する半導体装置における基板電圧発生回路
US5118968A (en) * 1990-09-12 1992-06-02 Micron Technology, Inc. Special mode activation circuit for selectively activating a special mode circuit of a semiconductor integrated circuit device
US5103160A (en) * 1991-04-25 1992-04-07 Hughes Aircraft Company Shunt regulator with tunnel oxide reference
JP3217498B2 (ja) * 1992-10-29 2001-10-09 富士通株式会社 半導体集積回路装置
US5424663A (en) * 1993-04-22 1995-06-13 North American Philips Corporation Integrated high voltage differential sensor using the inverse gain of high voltage transistors
FR2706620B1 (fr) * 1993-06-11 1995-07-21 Sgs Thomson Microelectronics Circuit intégré comportant un circuit de détection du niveau d'une tension de service.
KR950012079A (ko) * 1993-10-29 1995-05-16 발도르프, 옴케 집적 비교기 회로
US5412336A (en) * 1993-11-10 1995-05-02 Motorola, Inc. Self-biasing boot-strapped cascode amplifier
US5889392A (en) * 1997-03-06 1999-03-30 Maxim Integrated Products, Inc. Switch-mode regulators and methods providing transient response speed-up
JP3457209B2 (ja) * 1999-03-23 2003-10-14 富士通株式会社 電圧検出回路
JP5723628B2 (ja) * 2011-02-18 2015-05-27 ルネサスエレクトロニクス株式会社 電圧検出回路

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2230125A1 (en) * 1973-05-16 1974-12-13 Thomson Csf Intergrated FET voltage converter with FET in series with resistor - to give constant difference between input and output voltages
JPS5120871A (ja) * 1975-01-31 1976-02-19 Fuosukaraa Ltd Keiryosochi
JPS5291472A (en) * 1976-01-28 1977-08-01 Seiko Instr & Electronics Ltd Voltage detection circuit
JPS55149871A (en) * 1978-07-31 1980-11-21 Fujitsu Ltd Line voltage detector
JPS57207367A (en) * 1981-06-15 1982-12-20 Nec Corp Metal oxide semiconductor type semiconductor device
US4663584B1 (en) * 1985-06-10 1996-05-21 Toshiba Kk Intermediate potential generation circuit
JPS6269719A (ja) * 1985-09-24 1987-03-31 Toshiba Corp レベル変換論理回路
US4706011A (en) * 1986-07-07 1987-11-10 Texas Instruments Incorporated High voltage pulse detector with controllable current consumption
JP2566931B2 (ja) * 1986-11-17 1996-12-25 日本電気株式会社 レベル比較器

Also Published As

Publication number Publication date
US4825018A (en) 1989-04-25
JPS63286776A (ja) 1988-11-24
JPH0740050B2 (ja) 1995-05-01
KR920001717B1 (ko) 1992-02-24
EP0292270A3 (en) 1990-10-17
EP0292270A2 (en) 1988-11-23

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