KR880014131A - 경질투명피막 및 그 형성방법 - Google Patents
경질투명피막 및 그 형성방법 Download PDFInfo
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- KR880014131A KR880014131A KR1019880006206A KR880006206A KR880014131A KR 880014131 A KR880014131 A KR 880014131A KR 1019880006206 A KR1019880006206 A KR 1019880006206A KR 880006206 A KR880006206 A KR 880006206A KR 880014131 A KR880014131 A KR 880014131A
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- South Korea
- Prior art keywords
- oxide
- film
- hard transparent
- transparent film
- ceramic component
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- 238000000034 method Methods 0.000 title claims 6
- 230000015572 biosynthetic process Effects 0.000 title 1
- 239000000395 magnesium oxide Substances 0.000 claims description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 3
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims 6
- 239000000919 ceramic Substances 0.000 claims 6
- 239000000758 substrate Substances 0.000 claims 4
- 229910003437 indium oxide Inorganic materials 0.000 claims 3
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims 3
- 238000007747 plating Methods 0.000 claims 3
- 239000000377 silicon dioxide Substances 0.000 claims 3
- 235000012239 silicon dioxide Nutrition 0.000 claims 3
- 239000004408 titanium dioxide Substances 0.000 claims 3
- 239000011787 zinc oxide Substances 0.000 claims 3
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 claims 2
- PLDDOISOJJCEMH-UHFFFAOYSA-N neodymium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Nd+3].[Nd+3] PLDDOISOJJCEMH-UHFFFAOYSA-N 0.000 claims 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims 2
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims 2
- 229920003002 synthetic resin Polymers 0.000 claims 2
- 239000000057 synthetic resin Substances 0.000 claims 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims 2
- 229910001887 tin oxide Inorganic materials 0.000 claims 2
- PMTRSEDNJGMXLN-UHFFFAOYSA-N titanium zirconium Chemical compound [Ti].[Zr] PMTRSEDNJGMXLN-UHFFFAOYSA-N 0.000 claims 2
- FRWYFWZENXDZMU-UHFFFAOYSA-N 2-iodoquinoline Chemical compound C1=CC=CC2=NC(I)=CC=C21 FRWYFWZENXDZMU-UHFFFAOYSA-N 0.000 claims 1
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims 1
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 claims 1
- 229910052790 beryllium Inorganic materials 0.000 claims 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 claims 1
- LTPBRCUWZOMYOC-UHFFFAOYSA-N beryllium oxide Inorganic materials O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 claims 1
- 229910000416 bismuth oxide Inorganic materials 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 claims 1
- 239000007888 film coating Substances 0.000 claims 1
- 238000009501 film coating Methods 0.000 claims 1
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium oxide Inorganic materials O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 claims 1
- 229910000449 hafnium oxide Inorganic materials 0.000 claims 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims 1
- 238000007733 ion plating Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 claims 1
- PVADDRMAFCOOPC-UHFFFAOYSA-N oxogermanium Chemical compound [Ge]=O PVADDRMAFCOOPC-UHFFFAOYSA-N 0.000 claims 1
- DYIZHKNUQPHNJY-UHFFFAOYSA-N oxorhenium Chemical compound [Re]=O DYIZHKNUQPHNJY-UHFFFAOYSA-N 0.000 claims 1
- 229910003449 rhenium oxide Inorganic materials 0.000 claims 1
- JPJALAQPGMAKDF-UHFFFAOYSA-N selenium dioxide Chemical compound O=[Se]=O JPJALAQPGMAKDF-UHFFFAOYSA-N 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
- 229910052714 tellurium Inorganic materials 0.000 claims 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims 1
- 229910001930 tungsten oxide Inorganic materials 0.000 claims 1
- 229910001935 vanadium oxide Inorganic materials 0.000 claims 1
- 229910001928 zirconium oxide Inorganic materials 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
- C23C14/025—Metallic sublayers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Laminated Bodies (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
도면은 산화마그네슘 함유 알루미늄 피막의 두께와 광흡수 계수를 나타낸 그래프.
Claims (11)
- 표면 피막형 물품은 (a) 기질체와 (b) 기질체의 표면상에 0.5∼8μm 범위의 두께를 지니고 산화알루미늄, 이산화실리콘, 산화게르마늄, 이산화자르코늄, 산화하프늄, 이산화티타늄, 산화아연, 산화인듐, 산화주석, 산화베릴륨, 산화이트륨, 산화바나듐, 산화텡스텐, 산화비스무스, 산화셀레늄, 산화란타늄, 산화네오디뮴, 산화텔레늄, 산화레늄과 지르코늄티타늄 플럼베이트로 구성하는 지로부터 선택된 최소한 하나의 산화물과 균형을 이룬 5ppm~40중량%의 산화마그네슘을 포함하는 세라믹성분을 만들어진 피막을 포함하는 것을 특징으로 하는 경질투명피막.
- 제1항에 있어서 피막은 산화알루미늄, 이산화실리콘, 이산화티타늄, 산화지르코늄, 산화아연, 산화인듐, 산화주석, 삼화베릴륨, 산화이트륨과 지르코늄티타늄 플럼베이트를 구성하는 기로부터 선택된 최소한 하나의 산화물과 균형을 이룬 산화마그네슘의 5ppm~40중량%를 함유하는 세라믹 성분으로 만들어진 피막인 것을 특징으로 하는 경질투명피막.
- 제1항에 있어서, 피막은 거조 도금공정에 의해 형성되는 것을 특징으로 경질투명피막.
- 제3항에 있어서, 건조 도금공정은 이온도금 공정인 것을 특징으로 하는 경질투명피막.
- 제3항에 있어서, 건조도금 공정은 스퍼터링공정인 것을 특징으로 하는 경질투명막피막.
- 제1항에 있어서, 파막은 다음의 (c) 기질표면과 세라믹 성분의 피막사이에 초벌층을 포함하는 것을 특징으로 하는 경질투명피막.
- 제6항에 있어서, 초벌층은 금속, 합성수지, 이산화티타늄, 이산화실리콘, 산화인듐과 산화아연을 구성하는 기로부터 선택된 물질로 만들어진 것을 툭징으로 하는 경질투명피막.
- 제6항에 있어서, 초벌층은 5~200㎜ 범위의 두께를 지니는 것으로 하는 경질투명피막.
- 제1항에 있어서, 피막은 (d)세라믹 성분의 피막상에 꼭대기 피막을 형성하는 것을 특징으로 하는 경질투명피막.
- 제9항에 있어서, 꼭대기 피막은 합성수지인 것을 특징으로 하는 경질투명피막.
- 제1항에 있어서, 피막은 (c)기질표면과 세라믹 성분의 피막사이에 초벌층과 (d)세라믹 성분의 피막상이 꼭대기 피막을 포함하는 것을 특징으로 하는 경질투명피막.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62-131772 | 1987-05-29 | ||
| JP13177287 | 1987-05-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR880014131A true KR880014131A (ko) | 1988-12-23 |
| KR910003740B1 KR910003740B1 (ko) | 1991-06-10 |
Family
ID=15065796
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019880006206A KR910003740B1 (ko) | 1987-05-29 | 1988-05-26 | 표면피복성형체 및 그 제조방법 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4906524A (ko) |
| EP (1) | EP0293198B1 (ko) |
| KR (1) | KR910003740B1 (ko) |
| DE (1) | DE3877256T2 (ko) |
| ES (1) | ES2037828T3 (ko) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
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| EP0459482A3 (en) * | 1990-05-30 | 1992-04-15 | Nippon Steel Corporation | Process for forming thin film having excellent insulating property and metallic substrate coated with insulating material formed by said process |
| AU8473591A (en) * | 1990-10-19 | 1992-04-30 | British Petroleum Company Plc, The | Deposition process |
| GB9022836D0 (en) * | 1990-10-19 | 1990-12-05 | British Petroleum Co Plc | Membranes |
| US6087013A (en) * | 1993-07-14 | 2000-07-11 | Harsco Technologies Corporation | Glass coated high strength steel |
| JP3557868B2 (ja) * | 1997-01-14 | 2004-08-25 | セイコーエプソン株式会社 | 装飾品の表面処理方法、装飾品および電子機器 |
| US6800326B1 (en) * | 1997-01-14 | 2004-10-05 | Seiko Epson Corporation | Method of treating a surface of a surface of a substrate containing titanium for an ornament |
| CA2281265C (en) * | 1998-09-22 | 2003-12-16 | Toyota Jidosha Kabushiki Kaisha | Method for manufacturing a nonlinear optical thin film |
| DE19956328A1 (de) * | 1999-11-23 | 2001-06-13 | Menia Design Gmbh | Brille |
| US6776873B1 (en) * | 2002-02-14 | 2004-08-17 | Jennifer Y Sun | Yttrium oxide based surface coating for semiconductor IC processing vacuum chambers |
| US7479304B2 (en) | 2002-02-14 | 2009-01-20 | Applied Materials, Inc. | Gas distribution plate fabricated from a solid yttrium oxide-comprising substrate |
| US8067067B2 (en) | 2002-02-14 | 2011-11-29 | Applied Materials, Inc. | Clean, dense yttrium oxide coating protecting semiconductor processing apparatus |
| DE20215854U1 (de) * | 2002-10-10 | 2002-12-19 | Sueddeutsche Aluminium Manufak | Kraftfahrzeug-Anbauteil |
| SE528890C2 (sv) * | 2005-02-17 | 2007-03-06 | Sandvik Intellectual Property | Metallsubstrat, artikel och förfarande |
| SE0500605L (sv) * | 2005-03-11 | 2006-09-12 | Sandvik Intellectual Property | Metallprodukt, produktionsmetod och användning därav |
| US20080014420A1 (en) * | 2006-07-11 | 2008-01-17 | Ion Technology (Hong Kong) Limited | Surface treatment for titanium or titanium-alloys |
| US10242888B2 (en) | 2007-04-27 | 2019-03-26 | Applied Materials, Inc. | Semiconductor processing apparatus with a ceramic-comprising surface which exhibits fracture toughness and halogen plasma resistance |
| US10622194B2 (en) | 2007-04-27 | 2020-04-14 | Applied Materials, Inc. | Bulk sintered solid solution ceramic which exhibits fracture toughness and halogen plasma resistance |
| US7947377B2 (en) * | 2007-06-20 | 2011-05-24 | Dai Nippon Printing Co., Ltd. | Powder mixture to be made into evaporation source material for use in ion plating, evaporation source material for use in ion plating and method of producing the same, and gas barrier sheet and method of producing the same |
| US8367227B2 (en) | 2007-08-02 | 2013-02-05 | Applied Materials, Inc. | Plasma-resistant ceramics with controlled electrical resistivity |
| KR100910364B1 (ko) | 2007-11-23 | 2009-08-04 | (주)하나실업 | 은제품과 은도금 제품의 표면변색 방지를 위한 세라믹 피막형성방법 |
| US8632864B2 (en) | 2009-08-24 | 2014-01-21 | Lacks Industries, Inc. | Decorative surface finish and method of forming same |
| US20170009334A1 (en) * | 2015-07-09 | 2017-01-12 | Rubicon Technology, Inc. | Hard aluminum oxide coating for various applications |
| US11572626B2 (en) | 2019-09-20 | 2023-02-07 | Raytheon Technologies Corporation | Turbine engine shaft coating |
| KR102549737B1 (ko) * | 2021-08-04 | 2023-06-29 | 포항공과대학교 산학협력단 | 산소환원촉매를 이용한 금속기재 표면의 내부식성 강화 방법 |
| CN117088686B (zh) * | 2023-10-19 | 2024-01-02 | 沈阳恒泰鑫源精铸耐材有限公司 | 一种改性氧化锆涂层及其制备方法 |
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|---|---|---|---|---|
| US3026210A (en) * | 1961-01-03 | 1962-03-20 | Gen Electric | Transparent alumina and method of preparation |
| JPS56112473A (en) * | 1980-02-08 | 1981-09-04 | Dairiyuu Denshi Sangyo Kk | Metallic film for decoration of stainless steel |
| JPS56163266A (en) * | 1980-05-15 | 1981-12-15 | Kawaguchiko Seimitsu Kk | Manufacture of dial plate for timepiece |
| US4517217A (en) * | 1980-09-09 | 1985-05-14 | Westinghouse Electric Corp. | Protective coating means for articles such as gold-plated jewelry and wristwatch components |
| US4335190A (en) * | 1981-01-28 | 1982-06-15 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Thermal barrier coating system having improved adhesion |
| GB2123316B (en) * | 1982-07-14 | 1985-10-23 | Atomic Energy Authority Uk | Substrates for electronic devices |
| US4689270A (en) * | 1984-07-20 | 1987-08-25 | W. C. Heraeus Gmbh | Composite substrate for printed circuits and printed circuit-substrate combination |
| US4689271A (en) * | 1984-08-11 | 1987-08-25 | Bayer Aktiengesellschaft | Coating for metallic substrates |
| DE3571651D1 (en) * | 1984-10-17 | 1989-08-24 | Mitsubishi Rayon Co | Undercoat composition and composite molded articles produced usin said compositon |
| JPH0769531B2 (ja) * | 1985-01-16 | 1995-07-31 | トヨタ自動車株式会社 | 絶縁保護膜を有する透明導電膜の製造方法 |
| JPH0799739B2 (ja) * | 1985-02-20 | 1995-10-25 | 三菱電機株式会社 | 金属薄膜の形成方法 |
| US4659629A (en) * | 1985-11-25 | 1987-04-21 | The Dow Chemical Company | Formation of a protective outer layer on magnesium alloys containing aluminum |
-
1988
- 1988-05-23 US US07/197,405 patent/US4906524A/en not_active Expired - Fee Related
- 1988-05-26 KR KR1019880006206A patent/KR910003740B1/ko not_active IP Right Cessation
- 1988-05-26 EP EP19880304774 patent/EP0293198B1/en not_active Expired - Lifetime
- 1988-05-26 ES ES88304774T patent/ES2037828T3/es not_active Expired - Lifetime
- 1988-05-26 DE DE19883877256 patent/DE3877256T2/de not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| DE3877256D1 (de) | 1993-02-18 |
| KR910003740B1 (ko) | 1991-06-10 |
| EP0293198A3 (en) | 1989-08-23 |
| ES2037828T3 (es) | 1993-07-01 |
| US4906524A (en) | 1990-03-06 |
| EP0293198B1 (en) | 1993-01-07 |
| EP0293198A2 (en) | 1988-11-30 |
| DE3877256T2 (de) | 1993-06-24 |
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