DE3877256D1 - Beschichteter gegenstand und verfahren zu seiner herstellung. - Google Patents

Beschichteter gegenstand und verfahren zu seiner herstellung.

Info

Publication number
DE3877256D1
DE3877256D1 DE8888304774T DE3877256T DE3877256D1 DE 3877256 D1 DE3877256 D1 DE 3877256D1 DE 8888304774 T DE8888304774 T DE 8888304774T DE 3877256 T DE3877256 T DE 3877256T DE 3877256 D1 DE3877256 D1 DE 3877256D1
Authority
DE
Germany
Prior art keywords
production
coated object
coated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8888304774T
Other languages
English (en)
Other versions
DE3877256T2 (de
Inventor
Toshihiro Takao
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orient Watch Co Ltd
Original Assignee
Orient Watch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orient Watch Co Ltd filed Critical Orient Watch Co Ltd
Application granted granted Critical
Publication of DE3877256D1 publication Critical patent/DE3877256D1/de
Publication of DE3877256T2 publication Critical patent/DE3877256T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C23C14/025—Metallic sublayers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal
DE19883877256 1987-05-29 1988-05-26 Beschichteter gegenstand und verfahren zu seiner herstellung. Expired - Fee Related DE3877256T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13177287 1987-05-29

Publications (2)

Publication Number Publication Date
DE3877256D1 true DE3877256D1 (de) 1993-02-18
DE3877256T2 DE3877256T2 (de) 1993-06-24

Family

ID=15065796

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19883877256 Expired - Fee Related DE3877256T2 (de) 1987-05-29 1988-05-26 Beschichteter gegenstand und verfahren zu seiner herstellung.

Country Status (5)

Country Link
US (1) US4906524A (de)
EP (1) EP0293198B1 (de)
KR (1) KR910003740B1 (de)
DE (1) DE3877256T2 (de)
ES (1) ES2037828T3 (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0459482A3 (en) * 1990-05-30 1992-04-15 Nippon Steel Corporation Process for forming thin film having excellent insulating property and metallic substrate coated with insulating material formed by said process
AU8473591A (en) * 1990-10-19 1992-04-30 British Petroleum Company Plc, The Deposition process
GB9022836D0 (en) * 1990-10-19 1990-12-05 British Petroleum Co Plc Membranes
US6087013A (en) * 1993-07-14 2000-07-11 Harsco Technologies Corporation Glass coated high strength steel
JP3557868B2 (ja) * 1997-01-14 2004-08-25 セイコーエプソン株式会社 装飾品の表面処理方法、装飾品および電子機器
US6800326B1 (en) * 1997-01-14 2004-10-05 Seiko Epson Corporation Method of treating a surface of a surface of a substrate containing titanium for an ornament
CA2281265C (en) * 1998-09-22 2003-12-16 Toyota Jidosha Kabushiki Kaisha Method for manufacturing a nonlinear optical thin film
DE19956328A1 (de) * 1999-11-23 2001-06-13 Menia Design Gmbh Brille
US8067067B2 (en) 2002-02-14 2011-11-29 Applied Materials, Inc. Clean, dense yttrium oxide coating protecting semiconductor processing apparatus
US7479304B2 (en) 2002-02-14 2009-01-20 Applied Materials, Inc. Gas distribution plate fabricated from a solid yttrium oxide-comprising substrate
US6776873B1 (en) * 2002-02-14 2004-08-17 Jennifer Y Sun Yttrium oxide based surface coating for semiconductor IC processing vacuum chambers
DE20215854U1 (de) * 2002-10-10 2002-12-19 Sueddeutsche Aluminium Manufak Kraftfahrzeug-Anbauteil
SE528890C2 (sv) * 2005-02-17 2007-03-06 Sandvik Intellectual Property Metallsubstrat, artikel och förfarande
SE0500605L (sv) * 2005-03-11 2006-09-12 Sandvik Intellectual Property Metallprodukt, produktionsmetod och användning därav
US20080014420A1 (en) * 2006-07-11 2008-01-17 Ion Technology (Hong Kong) Limited Surface treatment for titanium or titanium-alloys
US10622194B2 (en) 2007-04-27 2020-04-14 Applied Materials, Inc. Bulk sintered solid solution ceramic which exhibits fracture toughness and halogen plasma resistance
US10242888B2 (en) 2007-04-27 2019-03-26 Applied Materials, Inc. Semiconductor processing apparatus with a ceramic-comprising surface which exhibits fracture toughness and halogen plasma resistance
US7947377B2 (en) * 2007-06-20 2011-05-24 Dai Nippon Printing Co., Ltd. Powder mixture to be made into evaporation source material for use in ion plating, evaporation source material for use in ion plating and method of producing the same, and gas barrier sheet and method of producing the same
US8367227B2 (en) 2007-08-02 2013-02-05 Applied Materials, Inc. Plasma-resistant ceramics with controlled electrical resistivity
KR100910364B1 (ko) 2007-11-23 2009-08-04 (주)하나실업 은제품과 은도금 제품의 표면변색 방지를 위한 세라믹 피막형성방법
US8632864B2 (en) 2009-08-24 2014-01-21 Lacks Industries, Inc. Decorative surface finish and method of forming same
US20170009334A1 (en) * 2015-07-09 2017-01-12 Rubicon Technology, Inc. Hard aluminum oxide coating for various applications
US11572626B2 (en) 2019-09-20 2023-02-07 Raytheon Technologies Corporation Turbine engine shaft coating
KR102549737B1 (ko) * 2021-08-04 2023-06-29 포항공과대학교 산학협력단 산소환원촉매를 이용한 금속기재 표면의 내부식성 강화 방법
CN117088686B (zh) * 2023-10-19 2024-01-02 沈阳恒泰鑫源精铸耐材有限公司 一种改性氧化锆涂层及其制备方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3026210A (en) * 1961-01-03 1962-03-20 Gen Electric Transparent alumina and method of preparation
JPS56112473A (en) * 1980-02-08 1981-09-04 Dairiyuu Denshi Sangyo Kk Metallic film for decoration of stainless steel
JPS56163266A (en) * 1980-05-15 1981-12-15 Kawaguchiko Seimitsu Kk Manufacture of dial plate for timepiece
US4517217A (en) * 1980-09-09 1985-05-14 Westinghouse Electric Corp. Protective coating means for articles such as gold-plated jewelry and wristwatch components
US4335190A (en) * 1981-01-28 1982-06-15 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Thermal barrier coating system having improved adhesion
GB2123316B (en) * 1982-07-14 1985-10-23 Atomic Energy Authority Uk Substrates for electronic devices
US4689270A (en) * 1984-07-20 1987-08-25 W. C. Heraeus Gmbh Composite substrate for printed circuits and printed circuit-substrate combination
US4689271A (en) * 1984-08-11 1987-08-25 Bayer Aktiengesellschaft Coating for metallic substrates
EP0178648B1 (de) * 1984-10-17 1989-07-19 Mitsubishi Rayon Co., Ltd. Zusammensetzung einer Unterschicht und geformte Gegenstände entsprechend der Zusammensetzung
JPH0769531B2 (ja) * 1985-01-16 1995-07-31 トヨタ自動車株式会社 絶縁保護膜を有する透明導電膜の製造方法
JPH0799739B2 (ja) * 1985-02-20 1995-10-25 三菱電機株式会社 金属薄膜の形成方法
US4659629A (en) * 1985-11-25 1987-04-21 The Dow Chemical Company Formation of a protective outer layer on magnesium alloys containing aluminum

Also Published As

Publication number Publication date
KR880014131A (ko) 1988-12-23
DE3877256T2 (de) 1993-06-24
EP0293198A2 (de) 1988-11-30
EP0293198B1 (de) 1993-01-07
US4906524A (en) 1990-03-06
EP0293198A3 (en) 1989-08-23
KR910003740B1 (ko) 1991-06-10
ES2037828T3 (es) 1993-07-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee