KR860003666A - 반도체 집적회로장치 및 그 제조방법 - Google Patents
반도체 집적회로장치 및 그 제조방법 Download PDFInfo
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- KR860003666A KR860003666A KR1019850008056A KR850008056A KR860003666A KR 860003666 A KR860003666 A KR 860003666A KR 1019850008056 A KR1019850008056 A KR 1019850008056A KR 850008056 A KR850008056 A KR 850008056A KR 860003666 A KR860003666 A KR 860003666A
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- 238000004519 manufacturing process Methods 0.000 title claims description 3
- 239000004065 semiconductor Substances 0.000 title claims 40
- 239000000758 substrate Substances 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims 31
- 238000000034 method Methods 0.000 claims 8
- 238000002955 isolation Methods 0.000 claims 5
- 238000005530 etching Methods 0.000 claims 1
- 238000000926 separation method Methods 0.000 claims 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 7
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Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 내지 3도는 본 발명의 실시예에 따른 여러 제조 단계에서 GaAs IC장치의 개략 부분 단면도.
* 도면의 주요부분에 대한 부호의 설명
1 : 반절연GaAs기판 2 : n+형 GaAs층
3 : n형 GaAs층 4 : p+형 GaAs층
5 : n형 A1GaAs층 6 : n+형 GaAs층
7 : 홈 8 : 능동영역
9 : GaAs층
Claims (17)
- 발절연 화합물 반도체표면 영역을 갖춘 화합물 반도체 기판 ; 상기 표면 영역위에 형성되는 능동소자 적층판 ; 상기 적층판을 통하여 상기 표면 영역으로 뻗어 있는 반절연 화합물 반도체로 구성되는, 능동소자 상호간을 분리시키기 위한 분리영역 ; 및 각각 상기 적층판의 분리된 영역에 의해 둘러쌓이는 능동소자로 이루어지는 것을 특징으로 하는 반도체 집적회로 장치.
- 제1항에 있어서, 상기 기판의 화합물 반도체는 III-V족 화합물 반도체인 것을 특징으로 하는 반도체 집적회로 장치.
- 3. 제2항에 있어서, 상기 화합물 반도체는 GaxIn1-xAsxP1-x, GaxAl1-xAsyP1-y, GaxIn1-xAsxSb1-x, InxGayAl1-x-yP,InxAl1-xPxP1-x, InxAl1-xPxSb1-x, 및 GaxAl1-xPxSb1-x(여기서 0≤x≤1이고, 0≤y≤1)로 구성되는 그룹으로부터 선택된 재료인 것을 특징으로 하는 반도체 집적회로 장치.
- 제1항에 있어서, 상기 표면 영역의 화합물 반도체는 III-V족 화합물 반도체인 것을 특징으로 하는 반도체 집적회로 장치.
- 제4항에 있어서, 상기 화합물 반도체는 GaxIn1-xAsxP1-x, GaxAl1-xAsyP1-y, GaxAl1-xAsxSb1-x, InxGayAl1-xP, InxAl1-xPxAs1-x, InxAl1-xPxSb1-x, 및 GaxAl1-xPxSb1-x(여기서 0≤x≤1이고, 0≤y≤1))로 구성되는 그룹으로부터 선택된 재료인 것을 특징으로 하는 반도체 집적회로 장치.
- 제1항에 있어서, 상기 분리영역의 반절연 화합물 반도체는 진성 III-V족 화합물 반도체인 것을 특징으로 하는 반도체 집적회로 장치.
- 제6항에 있어서, 상기 진성 화합물 반도체는 GaxIn1-xAsxP1-x, GaxAl1-xAsyP1-y, GaxAl1-xAsxSb1-x, InxGayAl1-x-yP, InxAl1-xPxAs1-x, InxAl1-xPxSb1-x및 GaxAl1-xPxSb1-x(여기서 0≤x≤1이고, 0≤y≤1))로 구성되는 그룹으로부터 선택된 재료인 것을 특징으로 하는 반도체 집적회로 장치.
- 제1항에 있어서, 상기 능동소자 적층판은 p형 층과 n형층으로 이루어지는 것을 특징으로 하는 반도체 집적회로 장치.
- 제1항에 있어서, 상기 능동소자 적층판은 p형과 n형 도전형으로부터 선택된 1도전형을 가진 화합물 반도체층으로 이루어지는 것을 특징으로 하는 반도체 집적회로 장치.
- 발절연 화합물 반도체표면 영역을 갖춘 화합물 반도체 기판 : 상기 표면 영역위에 형성되며 제1도전형을 갖는 화합물 반도체층으로 구성되는 능동소자 적층판 : 상기 적층판을 통하여 상기 표면 영역으로 뻗어 있으며 상기 제1도전형과 반대인 제2도전형을 가진 화합물 반도체로 구성되어 능동소자 상호간을 분리시키기 위한 분리영역 ; 및 각각 상기 적층판의 분리된 영역에 의해 둘러 쌓인 능동소자로 구성되는 것을 특징으로 하는 반도체 집적회로 장치.
- 제10항에 있어서, 상기 표면영역, 상기 적층판 및 상기 분리영역의 화합물 반도체는 III-V족 화합물 반도체인 것을 특징으로 하는 반도체 집적회로 장치.
- 제11항에 있어서, 상기 화합물 반도체는 GaxIn1-xAsxP1-x, GaxAl1-xAsyP1-y, GaxAl1-xAsxSb1-x, InxGayAl1-x-yP, InxAl1-xPxAs1-x, InxAl1-xPxSb1-x, 및 GaxAl1-xPxSb1-x(여기서 0≤x≤1이고, 0≤y≤1))로 구성되는 그룹으로부터 선택된 재료인 것을 특징으로 하는 반도체 집적회로 장치.
- 반절연 화합물 반도체표면 영역을 갖춘 화합물 반도체 기판을 구비하고 ; 상기 표면 영역위에 화합물 반도체층으로 이루어지는 능동소자 적층판을 형성하고 ; 상기 적층판 부분과 표면영역을 에칭함에 의해 상기 표면 영역으로 뻗어 있는 홈을 형성하고 ; 능동소자 상호간을 분리시키기 위한 분리영역을 형성하기 위하여 반절연 화합물 반도체로 상기 홈을 채우고 ; 그리고 상기 적층판의 분리된 영역내에 능동소자를 형성하는 단계로 구성되는 것을 특징으로 하는 반도체 집적회로 장치를 제조하는 방법.
- 제13항에 있어서, 상기 표면영역과 상기 적층판의 화합물 반도체는 III-V족 화합물 반도체인 것을 특징으로 하는 반도체 집적회로 장치를 제조하는 방법.
- 제14항에 있어서, 상기 화합물 반도체는 GaxIn1-xAsxP1-x, GaxAl1-xAsyP1-y, GaxAl1-xAsxSb1-x, InxGayAl1-x-yP, InxAl1-xPxAs1-x, InxAl1-xPxAs1-x, InxAl1-xPxSb1-x, 및 GaxAl1-xPxSb1-x(여기서 0≤x≤1이고, 0≤y≤1))로 구성되는 그룹으로부터 선택된 재료인 것을 특징으로 하는 반도체 집적회로 장치를 제조하는 방법.
- 제13항에 있어서, 상기 분리영역의 반절연 화합물 반도체는 진성 III-V족 화합물 반도체인 것을 특징으로 하는 반도체 집적회로 장치를 제조하는 방법.
- 제16항에 있어서, 상기 진성 화합물 반도체는 GaxIn1-xAsxP1-x, GaxAl1-xAsyP1-y, GaxAl1-xAsxSb1-x, InxGayAl1-x-yP, InxAl1-xPxAs1-x, InxAl1-xPxSb1-x, 및 GaxAl1-xPxSb1-x(여기서 0≤x≤1이고, 0≤y≤1))로 구성되는 그룹으로부터 선택된 재료인 것을 특징으로 하는 반도체 집적회로 장치를 제조하는 방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59-229181 | 1984-10-31 | ||
JP59229181A JPS61107758A (ja) | 1984-10-31 | 1984-10-31 | GaAs集積回路及びその製造方法 |
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Publication Number | Publication Date |
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KR860003666A true KR860003666A (ko) | 1986-05-28 |
KR900000585B1 KR900000585B1 (ko) | 1990-01-31 |
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Application Number | Title | Priority Date | Filing Date |
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KR1019850008056A KR900000585B1 (ko) | 1984-10-31 | 1985-10-30 | 반도체 집적회로 장치 및 그 제조 방법 |
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US (1) | US4837178A (ko) |
EP (1) | EP0180457B1 (ko) |
JP (1) | JPS61107758A (ko) |
KR (1) | KR900000585B1 (ko) |
DE (1) | DE3586525T2 (ko) |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4821082A (en) * | 1987-10-30 | 1989-04-11 | International Business Machines Corporation | Heterojunction bipolar transistor with substantially aligned energy levels |
JPH01238161A (ja) * | 1988-03-18 | 1989-09-22 | Fujitsu Ltd | 半導体装置及びその製造方法 |
US5041393A (en) * | 1988-12-28 | 1991-08-20 | At&T Bell Laboratories | Fabrication of GaAs integrated circuits |
JPH02237049A (ja) * | 1989-03-09 | 1990-09-19 | Nec Corp | 半導体集積装置及びその製造方法 |
EP0437702B1 (en) * | 1989-11-21 | 1998-08-12 | Fujitsu Limited | Semiconductor integrated circuit of compound semiconductor devices comprising isolation regions and method of making the same |
US5276340A (en) * | 1989-11-21 | 1994-01-04 | Fujitsu Limited | Semiconductor integrated circuit having a reduced side gate effect |
US5844303A (en) * | 1991-02-19 | 1998-12-01 | Fujitsu Limited | Semiconductor device having improved electronic isolation |
EP0526646B1 (en) * | 1991-02-19 | 1997-04-23 | Fujitsu Limited | Semiconductor device having an isolation region enriched in oxygen and a fabrication process thereof |
US5399900A (en) * | 1991-11-04 | 1995-03-21 | Eastman Kodak Company | Isolation region in a group III-V semiconductor device and method of making the same |
US5385853A (en) * | 1992-12-02 | 1995-01-31 | International Business Machines Corporation | Method of fabricating a metal oxide semiconductor heterojunction field effect transistor (MOSHFET) |
US5376229A (en) * | 1993-10-05 | 1994-12-27 | Miller; Jeffrey N. | Method of fabrication of adjacent coplanar semiconductor devices |
US6087677A (en) * | 1997-11-10 | 2000-07-11 | Integrated Silicon Solutions Inc. | High density self-aligned antifuse |
US20050205963A1 (en) * | 2004-03-16 | 2005-09-22 | Johnson David A | Integrated anneal cap/ ion implant mask/ trench isolation structure for III-V devices |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
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US4028147A (en) * | 1974-12-06 | 1977-06-07 | Hughes Aircraft Company | Liquid phase epitaxial process for growing semi-insulating GaAs layers |
NL7609607A (nl) * | 1976-08-30 | 1978-03-02 | Philips Nv | Werkwijze voor het vervaardigen van een half- geleiderinrichting en halfgeleiderinrichting vervaardigd met behulp van de werkwijze. |
JPS5728322A (en) * | 1980-07-28 | 1982-02-16 | Fujitsu Ltd | Formation of semiconductor single crystal layer |
FR2492167A1 (fr) * | 1980-10-14 | 1982-04-16 | Thomson Csf | Transistor a effet de champ a frequence de coupure elevee |
US4573064A (en) * | 1981-11-02 | 1986-02-25 | Texas Instruments Incorporated | GaAs/GaAlAs Heterojunction bipolar integrated circuit devices |
JPS594071A (ja) * | 1982-06-30 | 1984-01-10 | Fujitsu Ltd | 半導体装置 |
JPS5944817A (ja) * | 1982-09-07 | 1984-03-13 | Fujitsu Ltd | 半導体装置の製造方法 |
JPS5954271A (ja) * | 1982-09-21 | 1984-03-29 | Agency Of Ind Science & Technol | 半導体集積回路装置 |
JPS5984467A (ja) * | 1982-11-06 | 1984-05-16 | Mitsubishi Electric Corp | モノリシツク赤外線電荷転送素子 |
JPS59168677A (ja) * | 1983-03-14 | 1984-09-22 | Fujitsu Ltd | 半導体装置及びその製造方法 |
US4608696A (en) * | 1983-06-08 | 1986-08-26 | Trw Inc. | Integrated laser and field effect transistor |
DE3476841D1 (en) * | 1983-11-29 | 1989-03-30 | Fujitsu Ltd | Compound semiconductor device and method of producing it |
US4534824A (en) * | 1984-04-16 | 1985-08-13 | Advanced Micro Devices, Inc. | Process for forming isolation slots having immunity to surface inversion |
US4575924A (en) * | 1984-07-02 | 1986-03-18 | Texas Instruments Incorporated | Process for fabricating quantum-well devices utilizing etch and refill techniques |
US4649411A (en) * | 1984-12-17 | 1987-03-10 | Motorola, Inc. | Gallium arsenide bipolar ECL circuit structure |
-
1984
- 1984-10-31 JP JP59229181A patent/JPS61107758A/ja active Pending
-
1985
- 1985-10-29 DE DE8585307819T patent/DE3586525T2/de not_active Expired - Fee Related
- 1985-10-29 EP EP85307819A patent/EP0180457B1/en not_active Expired - Lifetime
- 1985-10-30 KR KR1019850008056A patent/KR900000585B1/ko not_active IP Right Cessation
-
1987
- 1987-09-04 US US07/094,091 patent/US4837178A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPS61107758A (ja) | 1986-05-26 |
EP0180457A2 (en) | 1986-05-07 |
EP0180457A3 (en) | 1989-06-07 |
KR900000585B1 (ko) | 1990-01-31 |
DE3586525T2 (de) | 1993-01-14 |
DE3586525D1 (de) | 1992-09-24 |
EP0180457B1 (en) | 1992-08-19 |
US4837178A (en) | 1989-06-06 |
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