KR850007509A - 자성박막 - Google Patents
자성박막 Download PDFInfo
- Publication number
- KR850007509A KR850007509A KR1019850002584A KR850002584A KR850007509A KR 850007509 A KR850007509 A KR 850007509A KR 1019850002584 A KR1019850002584 A KR 1019850002584A KR 850002584 A KR850002584 A KR 850002584A KR 850007509 A KR850007509 A KR 850007509A
- Authority
- KR
- South Korea
- Prior art keywords
- thin film
- magnetic thin
- weight
- magnetic
- pellicle
- Prior art date
Links
- 239000010409 thin film Substances 0.000 title description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- 229910018125 Al-Si Inorganic materials 0.000 claims 1
- 229910018520 Al—Si Inorganic materials 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 229910021364 Al-Si alloy Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- UAEPNZWRGJTJPN-UHFFFAOYSA-N CC1CCCCC1 Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
- H01F10/14—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing iron or nickel
- H01F10/147—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing iron or nickel with lattice under strain, e.g. expanded by interstitial nitrogen
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/147—Structure or manufacture of heads, e.g. inductive with cores being composed of metal sheets, i.e. laminated cores with cores composed of isolated magnetic layers, e.g. sheets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/20—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by evaporation
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12431—Foil or filament smaller than 6 mils
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Thin Magnetic Films (AREA)
- Physical Vapour Deposition (AREA)
- Soft Magnetic Materials (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 Fe-Al-Si계합금 박막에 포함되는 N2의 비율과 비커즈 경도의 관계를 도시하는 특성도. 제2도는 Fe-Al-Si계합금박막에 포함되는 N2의 비율과 비저항(N2를 포함하지 않은 Fe-Al-Si계합금 방막의 저항율을 1로서)의 관계를 도시하는 특성도. 제3도는 Fe-Al-Si계합금 박막에 포함되는 N2의 비율과 1MHZ에 있어서의 투자율의 관계를 도시한 특성도.
Claims (1)
- Fe-Al-Si를 주성분으로 하고, 상기 Al 및 Si의 조성범위가 각각 2내지 10중량% Al, 4내지 15중량% Si이며, 더우기 0.005내지 4중량%의 질소를 함유하는 것을 특징으로 하는 자성박막.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59076434A JPS60220913A (ja) | 1984-04-18 | 1984-04-18 | 磁性薄膜 |
JP76434 | 1984-04-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR850007509A true KR850007509A (ko) | 1985-12-04 |
KR930002395B1 KR930002395B1 (ko) | 1993-03-30 |
Family
ID=13605044
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019850002584A KR930002395B1 (ko) | 1984-04-18 | 1985-04-17 | 자성 박막 |
Country Status (6)
Country | Link |
---|---|
US (1) | US4683012A (ko) |
EP (1) | EP0159027B1 (ko) |
JP (1) | JPS60220913A (ko) |
KR (1) | KR930002395B1 (ko) |
CA (1) | CA1272591A (ko) |
DE (1) | DE3581950D1 (ko) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR940004986B1 (ko) * | 1984-08-27 | 1994-06-09 | 가부시기가이샤 히다찌세이사꾸쇼 | 자성막의 제조방법 및 그것을 사용한 자기헤드 |
US4735865A (en) * | 1985-06-10 | 1988-04-05 | Sharp Kabushiki Kaisha | Magnetic head core |
US4894742A (en) * | 1985-10-07 | 1990-01-16 | Nippon Mining Company, Limited | Thin-film laminated magnetic heads of Fe-Si-Al alloy |
JPS62158306A (ja) * | 1986-01-07 | 1987-07-14 | Hitachi Ltd | 高密度鉄系磁性体膜およびその製造方法 |
JPS62210607A (ja) * | 1986-03-12 | 1987-09-16 | Matsushita Electric Ind Co Ltd | 軟磁性合金膜及びその形成法 |
JPS6364313A (ja) * | 1986-09-04 | 1988-03-22 | Sony Corp | 軟磁性薄膜 |
US5038242A (en) * | 1988-05-13 | 1991-08-06 | Citizen Watch Co., Ltd. | Magnetic head containing a barrier layer |
US5225006A (en) * | 1988-05-17 | 1993-07-06 | Kabushiki Kaisha Toshiba | Fe-based soft magnetic alloy |
JP2698813B2 (ja) * | 1989-04-03 | 1998-01-19 | 富士写真フイルム株式会社 | 軟磁性薄膜 |
JPH03111528A (ja) * | 1989-09-26 | 1991-05-13 | Toshiba Corp | 磁性合金 |
US5154983A (en) * | 1989-10-18 | 1992-10-13 | Victor Company Of Japan, Ltd. | Magnetic alloy |
US5262915A (en) * | 1990-08-23 | 1993-11-16 | Tdk Corporation | Magnetic head comprising a soft magnetic thin film of FeNiZrN having enhanced (100) orientation |
WO1992016934A1 (en) * | 1991-03-25 | 1992-10-01 | Eastman Kodak Company | A magnetic head for high-frequency, high-density recording |
US5230818A (en) * | 1991-12-20 | 1993-07-27 | Eastman Kodak Company | Coating compositions for master media for anhysteretic recording |
KR0160751B1 (ko) * | 1993-01-15 | 1999-01-15 | 제프리 엘.포먼 | 자성적층 구조체 및 그 제조방법 |
JPH06259729A (ja) * | 1993-03-03 | 1994-09-16 | Tdk Corp | 磁気ヘッド |
US5411813A (en) * | 1993-04-08 | 1995-05-02 | Eastman Kodak Company | Ferhgasi soft magnetic materials for inductive magnetic heads |
JPH07210856A (ja) * | 1994-01-19 | 1995-08-11 | Tdk Corp | 磁気記録媒体 |
JP2778494B2 (ja) * | 1994-12-26 | 1998-07-23 | 日本電気株式会社 | 電極薄膜およびその電極薄膜を用いた磁気抵抗効果型ヘッド |
US5515221A (en) * | 1994-12-30 | 1996-05-07 | International Business Machines Corporation | Magnetically stable shields for MR head |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3089795A (en) * | 1959-11-18 | 1963-05-14 | Westinghouse Electric Corp | Method for producing fiber texture and cube-texture sheets of iron-base alloys |
US3965463A (en) * | 1972-08-29 | 1976-06-22 | International Business Machines Corporation | Apparatus using amorphous magnetic compositions |
US4065330A (en) * | 1974-09-26 | 1977-12-27 | The Foundation: The Research Institute Of Electric And Magnetic Alloys | Wear-resistant high-permeability alloy |
US4177089A (en) * | 1976-04-27 | 1979-12-04 | The Arnold Engineering Company | Magnetic particles and compacts thereof |
JPS53119723A (en) * | 1977-03-30 | 1978-10-19 | Hitachi Metals Ltd | Method of making abrassionnresistant high permeability alloy |
US4231816A (en) * | 1977-12-30 | 1980-11-04 | International Business Machines Corporation | Amorphous metallic and nitrogen containing alloy films |
JPS5562145A (en) * | 1978-10-31 | 1980-05-10 | Hitachi Metals Ltd | Corrosion resistant, high permeability alloy |
JPS5585656A (en) * | 1978-12-22 | 1980-06-27 | Hitachi Denshi Ltd | Wear-resistant high-permeability alloy, heat treating method therefor and magnetic head using said alloy |
JPS55125258A (en) * | 1979-03-22 | 1980-09-26 | Kobe Steel Ltd | High permeability alloy with superior workability |
JPS55152155A (en) * | 1979-05-16 | 1980-11-27 | Sumitomo Special Metals Co Ltd | Fine crystalline strip material for high permeability magnetic material, preparation and product thereof |
JPS597334B2 (ja) * | 1979-09-03 | 1984-02-17 | 株式会社神戸製鋼所 | 耐食性にすぐれたセンダスト系合金の製造法 |
JPS5644755A (en) * | 1979-09-20 | 1981-04-24 | Hitachi Metals Ltd | Alloy of high magnetic permeability |
JPS5882507A (ja) * | 1981-11-12 | 1983-05-18 | Hitachi Metals Ltd | 磁性薄膜材料 |
JPS5882506A (ja) * | 1981-11-12 | 1983-05-18 | Hitachi Metals Ltd | 磁性薄膜材料 |
JPS58100412A (ja) * | 1981-12-10 | 1983-06-15 | Sony Corp | 軟質磁性材料の製法 |
JPS58188318A (ja) * | 1982-04-24 | 1983-11-02 | Tohoku Metal Ind Ltd | 磁気ヘツド |
JPS60218820A (ja) * | 1984-04-14 | 1985-11-01 | Sony Corp | Fe−Al−Si系合金薄膜の製造方法 |
-
1984
- 1984-04-18 JP JP59076434A patent/JPS60220913A/ja not_active Expired - Lifetime
-
1985
- 1985-04-03 CA CA000478277A patent/CA1272591A/en not_active Expired - Lifetime
- 1985-04-05 US US06/720,342 patent/US4683012A/en not_active Expired - Lifetime
- 1985-04-17 DE DE8585104636T patent/DE3581950D1/de not_active Expired - Lifetime
- 1985-04-17 EP EP85104636A patent/EP0159027B1/en not_active Expired - Lifetime
- 1985-04-17 KR KR1019850002584A patent/KR930002395B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CA1272591A (en) | 1990-08-14 |
JPS60220913A (ja) | 1985-11-05 |
KR930002395B1 (ko) | 1993-03-30 |
EP0159027B1 (en) | 1991-03-06 |
DE3581950D1 (de) | 1991-04-11 |
EP0159027A3 (en) | 1986-12-10 |
EP0159027A2 (en) | 1985-10-23 |
US4683012A (en) | 1987-07-28 |
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Legal Events
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A201 | Request for examination | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20020222 Year of fee payment: 10 |
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LAPS | Lapse due to unpaid annual fee |