KR940007778A - 자기헤드 - Google Patents

자기헤드 Download PDF

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Publication number
KR940007778A
KR940007778A KR1019920016740A KR920016740A KR940007778A KR 940007778 A KR940007778 A KR 940007778A KR 1019920016740 A KR1019920016740 A KR 1019920016740A KR 920016740 A KR920016740 A KR 920016740A KR 940007778 A KR940007778 A KR 940007778A
Authority
KR
South Korea
Prior art keywords
magnetic head
magnetic
thin film
ferrite core
present
Prior art date
Application number
KR1019920016740A
Other languages
English (en)
Other versions
KR100226845B1 (ko
Inventor
안동훈
Original Assignee
이헌조
주식회사 금성사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 이헌조, 주식회사 금성사 filed Critical 이헌조
Priority to KR1019920016740A priority Critical patent/KR100226845B1/ko
Publication of KR940007778A publication Critical patent/KR940007778A/ko
Application granted granted Critical
Publication of KR100226845B1 publication Critical patent/KR100226845B1/ko

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Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Abstract

본 발명은 베리어(Barrier)층인 확산 방지막의 조성을 의사갭 효과를 줄이는데 적합한 것으로한 자기헤드에 관한 것으로, 페라이트 코어에 자성박막이 성막된 자기헤드에 있어서, 페라이트 코어와 자성박막사이에 (FeaAlbSic)x My 합급으로 조성하되 중량%로서 80〈a〉90, 3〈b〈8, 7〈c〈13, 80〈X〈99.9, 0.1〈Y〈20이고, M이 cr 또는 Ti으로 이루어진 확산 방지 막이 형성됨을 특징으로 하는 자기헤드에 관한 기술임.

Description

자기헤드
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제4도는 본 발명의 헤드 재생출력 그래프.

Claims (1)

  1. 페라이트 코어에 자성박막이 성막된 자기헤드에 있어서, 페라이트 코어와 자성박막 사이에 (FeaAlbSic)x Cry또는 Tiy산식으로 하되 80〈a〉90, 3〈b〈8, 7〈c〈13, 80〈X〈99.9, 0.1〈Y〈20중량%로 조성된 확산 방지 막이 형성됨을 특징으로 하는 자기헤드.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019920016740A 1992-09-15 1992-09-15 자기헤드 KR100226845B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019920016740A KR100226845B1 (ko) 1992-09-15 1992-09-15 자기헤드

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019920016740A KR100226845B1 (ko) 1992-09-15 1992-09-15 자기헤드

Publications (2)

Publication Number Publication Date
KR940007778A true KR940007778A (ko) 1994-04-28
KR100226845B1 KR100226845B1 (ko) 1999-10-15

Family

ID=19339530

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019920016740A KR100226845B1 (ko) 1992-09-15 1992-09-15 자기헤드

Country Status (1)

Country Link
KR (1) KR100226845B1 (ko)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8216770B2 (en) 2006-10-16 2012-07-10 Cheil Industries Inc. Resin composition comprising cardo resin, method for forming pattern using the resin composition and color filter using pattern formed by the method
US8273270B2 (en) 2010-10-13 2012-09-25 Cheil Industries Inc. Photosensitive resin composition and light blocking layer using the same
US8298454B2 (en) 2010-12-10 2012-10-30 Cheil Industries Inc. Photosensitive resin composition and light blocking layer using the same
US8318053B2 (en) 2010-12-24 2012-11-27 Cheil Industries Inc. Photosensitive resin composition and color filter using the same
US8486591B2 (en) 2008-10-24 2013-07-16 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter prepared using the same
US8530537B2 (en) 2010-09-29 2013-09-10 Cheil Industries Inc. Black photosensitive resin composition and light blocking layer using the same
US8735025B2 (en) 2007-01-17 2014-05-27 Cheil Industries Inc. Photosensitive resin composition for producing color filter and color filter for image sensor produced using the composition
US8822110B2 (en) 2011-12-02 2014-09-02 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter including the same
US9069132B2 (en) 2012-12-26 2015-06-30 Cheil Industries Inc. Photosensitive resin composition for light blocking layer and light blocking layer using the same
US9841675B2 (en) 2012-12-07 2017-12-12 Samsung Sdi Co., Ltd. Photosensitive resin composition for color filter and color filter using the same

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8216770B2 (en) 2006-10-16 2012-07-10 Cheil Industries Inc. Resin composition comprising cardo resin, method for forming pattern using the resin composition and color filter using pattern formed by the method
US8735025B2 (en) 2007-01-17 2014-05-27 Cheil Industries Inc. Photosensitive resin composition for producing color filter and color filter for image sensor produced using the composition
US8486591B2 (en) 2008-10-24 2013-07-16 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter prepared using the same
US8530537B2 (en) 2010-09-29 2013-09-10 Cheil Industries Inc. Black photosensitive resin composition and light blocking layer using the same
US8273270B2 (en) 2010-10-13 2012-09-25 Cheil Industries Inc. Photosensitive resin composition and light blocking layer using the same
US8298454B2 (en) 2010-12-10 2012-10-30 Cheil Industries Inc. Photosensitive resin composition and light blocking layer using the same
US8318053B2 (en) 2010-12-24 2012-11-27 Cheil Industries Inc. Photosensitive resin composition and color filter using the same
US8822110B2 (en) 2011-12-02 2014-09-02 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter including the same
US9841675B2 (en) 2012-12-07 2017-12-12 Samsung Sdi Co., Ltd. Photosensitive resin composition for color filter and color filter using the same
US9069132B2 (en) 2012-12-26 2015-06-30 Cheil Industries Inc. Photosensitive resin composition for light blocking layer and light blocking layer using the same

Also Published As

Publication number Publication date
KR100226845B1 (ko) 1999-10-15

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