KR850007510A - 자성박막 - Google Patents

자성박막 Download PDF

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Publication number
KR850007510A
KR850007510A KR1019850002585A KR850002585A KR850007510A KR 850007510 A KR850007510 A KR 850007510A KR 1019850002585 A KR1019850002585 A KR 1019850002585A KR 850002585 A KR850002585 A KR 850002585A KR 850007510 A KR850007510 A KR 850007510A
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KR
South Korea
Prior art keywords
thin film
magnetic thin
weight
pellicle
note
Prior art date
Application number
KR1019850002585A
Other languages
English (en)
Other versions
KR930002396B1 (ko
Inventor
우찌 가즈시(외 4) 야마
Original Assignee
오오가 노리오
소니 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 오오가 노리오, 소니 가부시끼가이샤 filed Critical 오오가 노리오
Publication of KR850007510A publication Critical patent/KR850007510A/ko
Application granted granted Critical
Publication of KR930002396B1 publication Critical patent/KR930002396B1/ko

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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/18—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0623—Sulfides, selenides or tellurides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/147—Structure or manufacture of heads, e.g. inductive with cores being composed of metal sheets, i.e. laminated cores with cores composed of isolated magnetic layers, e.g. sheets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/14—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing iron or nickel
    • H01F10/142—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing iron or nickel containing Si
    • H01F10/145—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing iron or nickel containing Si containing Al, e.g. SENDUST
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109—Details
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12431—Foil or filament smaller than 6 mils

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Thin Magnetic Films (AREA)
  • Magnetic Record Carriers (AREA)
  • Soft Magnetic Materials (AREA)

Abstract

내용 없음

Description

자성박막
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 Fe-Al-Si계합금 박막에 포함되는 O2의 비율과 비커즈 경도의 관계를 도시하는 특성도. 제2도는 Fe-Al-Si계합금박막에 포함되는 O2의 비율과 비저항(O2를 포함하지 않은 Fe-Al-Si계합금박막의 저항율을 1로서)의 관계를 도시하는 특성도. 제3도는 Fe-Al-Si계합금박막에 포함되는 O2의 비율과 1MHZ에 있어서의 투자율의 관계를 도시한 특성도.

Claims (1)

  1. Fe-Al-Si를 주성분으로 하고, 상기 Al 및 Si의 조성범위가 각각 2내지 10중량% Al, 4내지 15중량% Si이며, 더우기 0.005내지 5중량%의 산소를 함유하는 것을 특징으로 하는 자성박막.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019850002585A 1984-04-18 1985-04-17 자성박막 KR930002396B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP59076435A JPS60220914A (ja) 1984-04-18 1984-04-18 磁性薄膜
JP76435 1984-04-18

Publications (2)

Publication Number Publication Date
KR850007510A true KR850007510A (ko) 1985-12-04
KR930002396B1 KR930002396B1 (ko) 1993-03-30

Family

ID=13605069

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019850002585A KR930002396B1 (ko) 1984-04-18 1985-04-17 자성박막

Country Status (6)

Country Link
US (1) US4671828A (ko)
EP (1) EP0159028B1 (ko)
JP (1) JPS60220914A (ko)
KR (1) KR930002396B1 (ko)
CA (1) CA1255890A (ko)
DE (1) DE3586404T2 (ko)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4762755A (en) * 1983-11-02 1988-08-09 Hitachi, Ltd. Ferromagnetic material and a magnetic head using the same material
US4735865A (en) * 1985-06-10 1988-04-05 Sharp Kabushiki Kaisha Magnetic head core
JPH0777008B2 (ja) * 1985-06-21 1995-08-16 株式会社日立製作所 非晶質合金膜を用いた磁気ヘツド
JPS62188206A (ja) * 1985-10-07 1987-08-17 Nippon Mining Co Ltd Ｆｅ−Ｓｉ−Ａｌ合金磁性膜及びその製造方法並びに薄膜積層磁気ヘツド
JPS6285413A (ja) * 1985-10-11 1987-04-18 Hitachi Ltd 強磁性多層膜及びその製造法
US5038242A (en) * 1988-05-13 1991-08-06 Citizen Watch Co., Ltd. Magnetic head containing a barrier layer
JPH088169B2 (ja) * 1989-09-12 1996-01-29 株式会社ジャパンエナジー Ｆｅ―Ｓｉ―Ａｌ合金磁性薄膜の製造方法
JPH03111528A (ja) * 1989-09-26 1991-05-13 Toshiba Corp 磁性合金
EP0531514B1 (en) * 1991-03-25 1996-08-28 Eastman Kodak Company A magnetic head for high-frequency, high-density recording
US5230818A (en) 1991-12-20 1993-07-27 Eastman Kodak Company Coating compositions for master media for anhysteretic recording
JP2603433B2 (ja) * 1993-01-15 1997-04-23 インターナショナル・ビジネス・マシーンズ・コーポレイション 磁性積層構造体及びその製造方法
JPH07210856A (ja) * 1994-01-19 1995-08-11 Tdk Corp 磁気記録媒体
JP2005223177A (ja) * 2004-02-06 2005-08-18 Tdk Corp 磁性膜の形成方法、磁性パターンの形成方法及び磁気記録媒体の製造方法
JP4319060B2 (ja) * 2004-02-13 2009-08-26 Ｔｄｋ株式会社 磁性膜の形成方法、磁性パターンの形成方法及び磁気記録媒体の製造方法
JP4319059B2 (ja) * 2004-02-13 2009-08-26 Ｔｄｋ株式会社 磁性膜の形成方法、磁性パターンの形成方法及び磁気記録媒体の製造方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3089795A (en) * 1959-11-18 1963-05-14 Westinghouse Electric Corp Method for producing fiber texture and cube-texture sheets of iron-base alloys
US3965463A (en) * 1972-08-29 1976-06-22 International Business Machines Corporation Apparatus using amorphous magnetic compositions
US4065330A (en) * 1974-09-26 1977-12-27 The Foundation: The Research Institute Of Electric And Magnetic Alloys Wear-resistant high-permeability alloy
US4177089A (en) * 1976-04-27 1979-12-04 The Arnold Engineering Company Magnetic particles and compacts thereof
JPS53119723A (en) * 1977-03-30 1978-10-19 Hitachi Metals Ltd Method of making abrassionnresistant high permeability alloy
JPS5562145A (en) * 1978-10-31 1980-05-10 Hitachi Metals Ltd Corrosion resistant, high permeability alloy
JPS5585656A (en) * 1978-12-22 1980-06-27 Hitachi Denshi Ltd Wear-resistant high-permeability alloy, heat treating method therefor and magnetic head using said alloy
JPS55125258A (en) * 1979-03-22 1980-09-26 Kobe Steel Ltd High permeability alloy with superior workability
JPS55152155A (en) * 1979-05-16 1980-11-27 Sumitomo Special Metals Co Ltd Fine crystalline strip material for high permeability magnetic material, preparation and product thereof
JPS597334B2 (ja) * 1979-09-03 1984-02-17 株式会社神戸製鋼所 耐食性にすぐれたセンダスト系合金の製造法
JPS5644755A (en) * 1979-09-20 1981-04-24 Hitachi Metals Ltd Alloy of high magnetic permeability
JPS5882506A (ja) * 1981-11-12 1983-05-18 Hitachi Metals Ltd 磁性薄膜材料
JPS5882507A (ja) * 1981-11-12 1983-05-18 Hitachi Metals Ltd 磁性薄膜材料
JPS60218821A (ja) * 1984-04-14 1985-11-01 Sony Corp Ｆｅ−Ａｌ−Ｓｉ系合金薄膜の製造方法

Also Published As

Publication number Publication date
DE3586404T2 (de) 1993-03-11
CA1255890A (en) 1989-06-20
DE3586404D1 (de) 1992-09-03
US4671828A (en) 1987-06-09
JPS60220914A (ja) 1985-11-05
KR930002396B1 (ko) 1993-03-30
EP0159028B1 (en) 1992-07-29
EP0159028A2 (en) 1985-10-23
EP0159028A3 (en) 1986-11-20

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