KR20220130751A - 펠리클 및 그 제조 방법 - Google Patents

펠리클 및 그 제조 방법 Download PDF

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Publication number
KR20220130751A
KR20220130751A KR1020227028579A KR20227028579A KR20220130751A KR 20220130751 A KR20220130751 A KR 20220130751A KR 1020227028579 A KR1020227028579 A KR 1020227028579A KR 20227028579 A KR20227028579 A KR 20227028579A KR 20220130751 A KR20220130751 A KR 20220130751A
Authority
KR
South Korea
Prior art keywords
pellicle
curing agent
meth
curable polymer
carbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020227028579A
Other languages
English (en)
Korean (ko)
Inventor
야스시 사토
가즈오 고무라
아키라 이시카와
다카시 우네자키
히사코 이시카와
다카시 고제키
켄 이토
Original Assignee
미쯔이가가꾸가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 미쯔이가가꾸가부시끼가이샤 filed Critical 미쯔이가가꾸가부시끼가이샤
Publication of KR20220130751A publication Critical patent/KR20220130751A/ko
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/14—Peroxides
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04—Homopolymers or copolymers of esters
    • C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09J133/08—Homopolymers or copolymers of acrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J175/00—Adhesives based on polyureas or polyurethanes; Adhesives based on derivatives of such polymers
    • C09J175/04—Polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J183/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
    • C09J183/04—Polysiloxanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
KR1020227028579A 2020-03-27 2021-03-24 펠리클 및 그 제조 방법 Withdrawn KR20220130751A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2020-057395 2020-03-27
JP2020057395 2020-03-27
PCT/JP2021/012118 WO2021193681A1 (ja) 2020-03-27 2021-03-24 ペリクル、およびその製造方法

Publications (1)

Publication Number Publication Date
KR20220130751A true KR20220130751A (ko) 2022-09-27

Family

ID=77890691

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020227028579A Withdrawn KR20220130751A (ko) 2020-03-27 2021-03-24 펠리클 및 그 제조 방법

Country Status (6)

Country Link
US (1) US20230080753A1 (https=)
JP (1) JPWO2021193681A1 (https=)
KR (1) KR20220130751A (https=)
CN (1) CN115136072A (https=)
TW (1) TW202136461A (https=)
WO (1) WO2021193681A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113677722A (zh) * 2019-03-28 2021-11-19 三井化学株式会社 防护膜组件

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05281711A (ja) 1992-04-01 1993-10-29 Shin Etsu Chem Co Ltd ペリクル
JP2006146085A (ja) 2004-11-24 2006-06-08 Shin Etsu Chem Co Ltd 大型ペリクル

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06148871A (ja) * 1992-10-30 1994-05-27 Tosoh Corp ペリクル及びペリクルの製造方法
JP3071348B2 (ja) * 1993-10-21 2000-07-31 信越化学工業株式会社 ペリクルおよびその剥離方法
JP3026750B2 (ja) * 1995-12-06 2000-03-27 旭化成工業株式会社 ペリクル
JPH10282640A (ja) * 1997-02-10 1998-10-23 Mitsui Chem Inc マスク等の基板へのペリクルの貼付方法及び該方法によって得られるペリクル貼付基板
JP4173239B2 (ja) * 1999-02-05 2008-10-29 信越化学工業株式会社 リソグラフィー用ペリクル
JP3091449B1 (ja) * 1999-03-17 2000-09-25 旭化成工業株式会社 耐紫外線性ペリクル
JP4007752B2 (ja) * 1999-07-30 2007-11-14 旭化成エレクトロニクス株式会社 大型ペリクル用枠体及び大型ペリクル
JP2001222100A (ja) * 1999-12-03 2001-08-17 Mitsui Chemicals Inc ペリクル
JPWO2006028227A1 (ja) * 2004-09-10 2008-05-08 三井化学株式会社 接着剤
JP5095926B2 (ja) * 2005-06-01 2012-12-12 三菱樹脂株式会社 粘着剤及びこれを用いた粘着体
TWI579354B (zh) * 2009-11-18 2017-04-21 旭化成電子材料股份有限公司 Mask mask
JP2012093518A (ja) * 2010-10-26 2012-05-17 Asahi Kasei E-Materials Corp ペリクル
KR101514591B1 (ko) * 2011-05-18 2015-04-22 아사히 가세이 이-매터리얼즈 가부시키가이샤 펠리클, 펠리클용 점착제, 펠리클 부착 포토마스크 및 반도체 소자의 제조 방법
JP6602547B2 (ja) * 2015-03-16 2019-11-06 旭化成株式会社 ペリクル
JP2017090719A (ja) * 2015-11-11 2017-05-25 旭化成株式会社 ペリクル
JP6567399B2 (ja) * 2015-12-02 2019-08-28 積水フーラー株式会社 紫外線硬化型粘着剤組成物
US10353283B2 (en) * 2016-07-11 2019-07-16 Shin-Etsu Chemical Co., Ltd. Adhesive for pellicle, pellicle, and method of selecting adhesive for pellicle
WO2018179382A1 (ja) * 2017-03-31 2018-10-04 日立化成デュポンマイクロシステムズ株式会社 感光性樹脂組成物、パターン硬化物の製造方法、硬化物、層間絶縁膜、カバーコート層、表面保護膜及び電子部品
CN113677722A (zh) * 2019-03-28 2021-11-19 三井化学株式会社 防护膜组件
JP7691508B2 (ja) * 2021-09-13 2025-06-11 三井化学株式会社 ペリクル
WO2023038139A1 (ja) * 2021-09-13 2023-03-16 三井化学株式会社 ペリクル、露光原版、露光装置、及びペリクルの製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05281711A (ja) 1992-04-01 1993-10-29 Shin Etsu Chem Co Ltd ペリクル
JP2006146085A (ja) 2004-11-24 2006-06-08 Shin Etsu Chem Co Ltd 大型ペリクル

Also Published As

Publication number Publication date
JPWO2021193681A1 (https=) 2021-09-30
WO2021193681A1 (ja) 2021-09-30
TW202136461A (zh) 2021-10-01
CN115136072A (zh) 2022-09-30
US20230080753A1 (en) 2023-03-16

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