TW202136461A - 防護薄膜及其製造方法 - Google Patents
防護薄膜及其製造方法 Download PDFInfo
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- TW202136461A TW202136461A TW110110858A TW110110858A TW202136461A TW 202136461 A TW202136461 A TW 202136461A TW 110110858 A TW110110858 A TW 110110858A TW 110110858 A TW110110858 A TW 110110858A TW 202136461 A TW202136461 A TW 202136461A
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- protective film
- curing agent
- meth
- pellicle
- curable polymer
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- YPVDWEHVCUBACK-UHFFFAOYSA-N propoxycarbonyloxy propyl carbonate Chemical compound CCCOC(=O)OOC(=O)OCCC YPVDWEHVCUBACK-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 230000001012 protector Effects 0.000 description 1
- 235000019423 pullulan Nutrition 0.000 description 1
- 238000005510 radiation hardening Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010421 standard material Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- WYKYCHHWIJXDAO-UHFFFAOYSA-N tert-butyl 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOC(C)(C)C WYKYCHHWIJXDAO-UHFFFAOYSA-N 0.000 description 1
- GJBRNHKUVLOCEB-UHFFFAOYSA-N tert-butyl benzenecarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1=CC=CC=C1 GJBRNHKUVLOCEB-UHFFFAOYSA-N 0.000 description 1
- JZFHXRUVMKEOFG-UHFFFAOYSA-N tert-butyl dodecaneperoxoate Chemical compound CCCCCCCCCCCC(=O)OOC(C)(C)C JZFHXRUVMKEOFG-UHFFFAOYSA-N 0.000 description 1
- SWAXTRYEYUTSAP-UHFFFAOYSA-N tert-butyl ethaneperoxoate Chemical compound CC(=O)OOC(C)(C)C SWAXTRYEYUTSAP-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YOEYNURYLFDCEV-UHFFFAOYSA-N tert-butyl hydroxy carbonate Chemical compound CC(C)(C)OC(=O)OO YOEYNURYLFDCEV-UHFFFAOYSA-N 0.000 description 1
- BWSZXUOMATYHHI-UHFFFAOYSA-N tert-butyl octaneperoxoate Chemical compound CCCCCCCC(=O)OOC(C)(C)C BWSZXUOMATYHHI-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/14—Peroxides
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09J133/08—Homopolymers or copolymers of acrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J175/00—Adhesives based on polyureas or polyurethanes; Adhesives based on derivatives of such polymers
- C09J175/04—Polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J183/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
- C09J183/04—Polysiloxanes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020-057395 | 2020-03-27 | ||
| JP2020057395 | 2020-03-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW202136461A true TW202136461A (zh) | 2021-10-01 |
Family
ID=77890691
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW110110858A TW202136461A (zh) | 2020-03-27 | 2021-03-25 | 防護薄膜及其製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20230080753A1 (https=) |
| JP (1) | JPWO2021193681A1 (https=) |
| KR (1) | KR20220130751A (https=) |
| CN (1) | CN115136072A (https=) |
| TW (1) | TW202136461A (https=) |
| WO (1) | WO2021193681A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113677722A (zh) * | 2019-03-28 | 2021-11-19 | 三井化学株式会社 | 防护膜组件 |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2962447B2 (ja) | 1992-04-01 | 1999-10-12 | 信越化学工業株式会社 | 耐紫外線性ペリクル |
| JPH06148871A (ja) * | 1992-10-30 | 1994-05-27 | Tosoh Corp | ペリクル及びペリクルの製造方法 |
| JP3071348B2 (ja) * | 1993-10-21 | 2000-07-31 | 信越化学工業株式会社 | ペリクルおよびその剥離方法 |
| JP3026750B2 (ja) * | 1995-12-06 | 2000-03-27 | 旭化成工業株式会社 | ペリクル |
| JPH10282640A (ja) * | 1997-02-10 | 1998-10-23 | Mitsui Chem Inc | マスク等の基板へのペリクルの貼付方法及び該方法によって得られるペリクル貼付基板 |
| JP4173239B2 (ja) * | 1999-02-05 | 2008-10-29 | 信越化学工業株式会社 | リソグラフィー用ペリクル |
| JP3091449B1 (ja) * | 1999-03-17 | 2000-09-25 | 旭化成工業株式会社 | 耐紫外線性ペリクル |
| JP4007752B2 (ja) * | 1999-07-30 | 2007-11-14 | 旭化成エレクトロニクス株式会社 | 大型ペリクル用枠体及び大型ペリクル |
| JP2001222100A (ja) * | 1999-12-03 | 2001-08-17 | Mitsui Chemicals Inc | ペリクル |
| JPWO2006028227A1 (ja) * | 2004-09-10 | 2008-05-08 | 三井化学株式会社 | 接着剤 |
| JP2006146085A (ja) | 2004-11-24 | 2006-06-08 | Shin Etsu Chem Co Ltd | 大型ペリクル |
| JP5095926B2 (ja) * | 2005-06-01 | 2012-12-12 | 三菱樹脂株式会社 | 粘着剤及びこれを用いた粘着体 |
| TWI579354B (zh) * | 2009-11-18 | 2017-04-21 | 旭化成電子材料股份有限公司 | Mask mask |
| JP2012093518A (ja) * | 2010-10-26 | 2012-05-17 | Asahi Kasei E-Materials Corp | ペリクル |
| US9310673B2 (en) * | 2011-05-18 | 2016-04-12 | Asahi Kasei E-Materials Corporation | Pellicle, pressure-sensitive adhesive for pellicle, photomask with pellicle, and method for manufacturing semiconductor device |
| JP6602547B2 (ja) * | 2015-03-16 | 2019-11-06 | 旭化成株式会社 | ペリクル |
| JP2017090719A (ja) * | 2015-11-11 | 2017-05-25 | 旭化成株式会社 | ペリクル |
| JP6567399B2 (ja) * | 2015-12-02 | 2019-08-28 | 積水フーラー株式会社 | 紫外線硬化型粘着剤組成物 |
| US10353283B2 (en) * | 2016-07-11 | 2019-07-16 | Shin-Etsu Chemical Co., Ltd. | Adhesive for pellicle, pellicle, and method of selecting adhesive for pellicle |
| WO2018179382A1 (ja) * | 2017-03-31 | 2018-10-04 | 日立化成デュポンマイクロシステムズ株式会社 | 感光性樹脂組成物、パターン硬化物の製造方法、硬化物、層間絶縁膜、カバーコート層、表面保護膜及び電子部品 |
| CN113677722A (zh) * | 2019-03-28 | 2021-11-19 | 三井化学株式会社 | 防护膜组件 |
| WO2023038139A1 (ja) * | 2021-09-13 | 2023-03-16 | 三井化学株式会社 | ペリクル、露光原版、露光装置、及びペリクルの製造方法 |
| WO2023038140A1 (ja) * | 2021-09-13 | 2023-03-16 | 三井化学株式会社 | ペリクル |
-
2021
- 2021-03-24 WO PCT/JP2021/012118 patent/WO2021193681A1/ja not_active Ceased
- 2021-03-24 JP JP2022510580A patent/JPWO2021193681A1/ja not_active Ceased
- 2021-03-24 US US17/801,430 patent/US20230080753A1/en not_active Abandoned
- 2021-03-24 KR KR1020227028579A patent/KR20220130751A/ko not_active Withdrawn
- 2021-03-24 CN CN202180015498.7A patent/CN115136072A/zh not_active Withdrawn
- 2021-03-25 TW TW110110858A patent/TW202136461A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2021193681A1 (https=) | 2021-09-30 |
| CN115136072A (zh) | 2022-09-30 |
| KR20220130751A (ko) | 2022-09-27 |
| US20230080753A1 (en) | 2023-03-16 |
| WO2021193681A1 (ja) | 2021-09-30 |
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