JPWO2021193681A1 - - Google Patents

Info

Publication number
JPWO2021193681A1
JPWO2021193681A1 JP2022510580A JP2022510580A JPWO2021193681A1 JP WO2021193681 A1 JPWO2021193681 A1 JP WO2021193681A1 JP 2022510580 A JP2022510580 A JP 2022510580A JP 2022510580 A JP2022510580 A JP 2022510580A JP WO2021193681 A1 JPWO2021193681 A1 JP WO2021193681A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
JP2022510580A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021193681A1 publication Critical patent/JPWO2021193681A1/ja
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/14—Peroxides
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04—Homopolymers or copolymers of esters
    • C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09J133/08—Homopolymers or copolymers of acrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J175/00—Adhesives based on polyureas or polyurethanes; Adhesives based on derivatives of such polymers
    • C09J175/04—Polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J183/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
    • C09J183/04—Polysiloxanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2022510580A 2020-03-27 2021-03-24 Ceased JPWO2021193681A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020057395 2020-03-27
PCT/JP2021/012118 WO2021193681A1 (ja) 2020-03-27 2021-03-24 ペリクル、およびその製造方法

Publications (1)

Publication Number Publication Date
JPWO2021193681A1 true JPWO2021193681A1 (https=) 2021-09-30

Family

ID=77890691

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022510580A Ceased JPWO2021193681A1 (https=) 2020-03-27 2021-03-24

Country Status (6)

Country Link
US (1) US20230080753A1 (https=)
JP (1) JPWO2021193681A1 (https=)
KR (1) KR20220130751A (https=)
CN (1) CN115136072A (https=)
TW (1) TW202136461A (https=)
WO (1) WO2021193681A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113677722A (zh) * 2019-03-28 2021-11-19 三井化学株式会社 防护膜组件

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09160222A (ja) * 1995-12-06 1997-06-20 Asahi Chem Ind Co Ltd ペリクル
JPH10282640A (ja) * 1997-02-10 1998-10-23 Mitsui Chem Inc マスク等の基板へのペリクルの貼付方法及び該方法によって得られるペリクル貼付基板
JP2000267261A (ja) * 1999-03-17 2000-09-29 Asahi Chem Ind Co Ltd 耐紫外線性ペリクル
JP2001222100A (ja) * 1999-12-03 2001-08-17 Mitsui Chemicals Inc ペリクル
JP2006335840A (ja) * 2005-06-01 2006-12-14 Mitsubishi Plastics Ind Ltd アクリル系粘着剤及び粘着体
JP2012093518A (ja) * 2010-10-26 2012-05-17 Asahi Kasei E-Materials Corp ペリクル
JP2016173414A (ja) * 2015-03-16 2016-09-29 旭化成株式会社 ペリクル
JP2018021182A (ja) * 2016-07-11 2018-02-08 信越化学工業株式会社 ペリクル用粘着剤、ペリクル、ペリクル用粘着剤の選択方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2962447B2 (ja) 1992-04-01 1999-10-12 信越化学工業株式会社 耐紫外線性ペリクル
JPH06148871A (ja) * 1992-10-30 1994-05-27 Tosoh Corp ペリクル及びペリクルの製造方法
JP3071348B2 (ja) * 1993-10-21 2000-07-31 信越化学工業株式会社 ペリクルおよびその剥離方法
JP4173239B2 (ja) * 1999-02-05 2008-10-29 信越化学工業株式会社 リソグラフィー用ペリクル
JP4007752B2 (ja) * 1999-07-30 2007-11-14 旭化成エレクトロニクス株式会社 大型ペリクル用枠体及び大型ペリクル
JPWO2006028227A1 (ja) * 2004-09-10 2008-05-08 三井化学株式会社 接着剤
JP2006146085A (ja) 2004-11-24 2006-06-08 Shin Etsu Chem Co Ltd 大型ペリクル
TWI579354B (zh) * 2009-11-18 2017-04-21 旭化成電子材料股份有限公司 Mask mask
US9310673B2 (en) * 2011-05-18 2016-04-12 Asahi Kasei E-Materials Corporation Pellicle, pressure-sensitive adhesive for pellicle, photomask with pellicle, and method for manufacturing semiconductor device
JP2017090719A (ja) * 2015-11-11 2017-05-25 旭化成株式会社 ペリクル
JP6567399B2 (ja) * 2015-12-02 2019-08-28 積水フーラー株式会社 紫外線硬化型粘着剤組成物
WO2018179382A1 (ja) * 2017-03-31 2018-10-04 日立化成デュポンマイクロシステムズ株式会社 感光性樹脂組成物、パターン硬化物の製造方法、硬化物、層間絶縁膜、カバーコート層、表面保護膜及び電子部品
CN113677722A (zh) * 2019-03-28 2021-11-19 三井化学株式会社 防护膜组件
WO2023038139A1 (ja) * 2021-09-13 2023-03-16 三井化学株式会社 ペリクル、露光原版、露光装置、及びペリクルの製造方法
WO2023038140A1 (ja) * 2021-09-13 2023-03-16 三井化学株式会社 ペリクル

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09160222A (ja) * 1995-12-06 1997-06-20 Asahi Chem Ind Co Ltd ペリクル
JPH10282640A (ja) * 1997-02-10 1998-10-23 Mitsui Chem Inc マスク等の基板へのペリクルの貼付方法及び該方法によって得られるペリクル貼付基板
JP2000267261A (ja) * 1999-03-17 2000-09-29 Asahi Chem Ind Co Ltd 耐紫外線性ペリクル
JP2001222100A (ja) * 1999-12-03 2001-08-17 Mitsui Chemicals Inc ペリクル
JP2006335840A (ja) * 2005-06-01 2006-12-14 Mitsubishi Plastics Ind Ltd アクリル系粘着剤及び粘着体
JP2012093518A (ja) * 2010-10-26 2012-05-17 Asahi Kasei E-Materials Corp ペリクル
JP2016173414A (ja) * 2015-03-16 2016-09-29 旭化成株式会社 ペリクル
JP2018021182A (ja) * 2016-07-11 2018-02-08 信越化学工業株式会社 ペリクル用粘着剤、ペリクル、ペリクル用粘着剤の選択方法

Also Published As

Publication number Publication date
CN115136072A (zh) 2022-09-30
TW202136461A (zh) 2021-10-01
KR20220130751A (ko) 2022-09-27
US20230080753A1 (en) 2023-03-16
WO2021193681A1 (ja) 2021-09-30

Similar Documents

Publication Publication Date Title
BR112023005462A2 (https=)
BR112023012656A2 (https=)
CL2026000307A1 (es) Conjugado de anticuerpo bispecífico-fármaco de camptotecina y uso farmacéutico de este.
BR112021014123A2 (https=)
BR112023009656A2 (https=)
BR112022009896A2 (https=)
BR112021017747A2 (https=)
BR112022024743A2 (https=)
BR112022026905A2 (https=)
BR112023011738A2 (https=)
BR112023004146A2 (https=)
BR112023006729A2 (https=)
BR102021015500A2 (https=)
JPWO2021193681A1 (https=)
BR112023016292A2 (https=)
BR112023011539A2 (https=)
BR112023011610A2 (https=)
BR112023008976A2 (https=)
BR102021020147A2 (https=)
BR102021015566A2 (https=)
BR102021015450A8 (https=)
BR102021015247A2 (https=)
BR102021015220A2 (https=)
BR102021014044A2 (https=)
BR102021014056A2 (https=)

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20220901

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20230725

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20231128

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20240319

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240513

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20240723

A045 Written measure of dismissal of application [lapsed due to lack of payment]

Free format text: JAPANESE INTERMEDIATE CODE: A045

Effective date: 20241126