KR20200095398A - 계측 장치, 노광 장치, 및 물품 제조 방법 - Google Patents

계측 장치, 노광 장치, 및 물품 제조 방법 Download PDF

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Publication number
KR20200095398A
KR20200095398A KR1020200009661A KR20200009661A KR20200095398A KR 20200095398 A KR20200095398 A KR 20200095398A KR 1020200009661 A KR1020200009661 A KR 1020200009661A KR 20200009661 A KR20200009661 A KR 20200009661A KR 20200095398 A KR20200095398 A KR 20200095398A
Authority
KR
South Korea
Prior art keywords
light
illumination
polarizer
substrate
imaging system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020200009661A
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English (en)
Korean (ko)
Inventor
히로노리 마에다
겐 미노다
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20200095398A publication Critical patent/KR20200095398A/ko
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G03B27/74—Positioning exposure meters in the apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7046—Strategy, e.g. mark, sensor or wavelength selection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7069—Alignment mark illumination, e.g. darkfield, dual focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7092—Signal processing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
KR1020200009661A 2019-01-31 2020-01-28 계측 장치, 노광 장치, 및 물품 제조 방법 Withdrawn KR20200095398A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019015987A JP2020122930A (ja) 2019-01-31 2019-01-31 計測装置、露光装置及び物品の製造方法
JPJP-P-2019-015987 2019-01-31

Publications (1)

Publication Number Publication Date
KR20200095398A true KR20200095398A (ko) 2020-08-10

Family

ID=71836385

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020200009661A Withdrawn KR20200095398A (ko) 2019-01-31 2020-01-28 계측 장치, 노광 장치, 및 물품 제조 방법

Country Status (5)

Country Link
US (1) US11169452B2 (enExample)
JP (1) JP2020122930A (enExample)
KR (1) KR20200095398A (enExample)
CN (1) CN111505915A (enExample)
TW (1) TW202109215A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7328806B2 (ja) * 2019-06-25 2023-08-17 キヤノン株式会社 計測装置、リソグラフィ装置、および物品の製造方法
US11988574B2 (en) * 2020-11-24 2024-05-21 Applied Materials, Inc. Illumination system for AR metrology tool
EP4377492A1 (en) * 2021-07-30 2024-06-05 Carl Zeiss SMT GmbH Method and apparatus for determining optical properties of deposition materials used for lithographic masks

Family Cites Families (23)

* Cited by examiner, † Cited by third party
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JPS62181431A (ja) * 1987-01-23 1987-08-08 Canon Inc 自動整合装置
JP2897330B2 (ja) * 1990-04-06 1999-05-31 キヤノン株式会社 マーク検出装置及び露光装置
JP3246676B2 (ja) * 1992-06-12 2002-01-15 チノン株式会社 液晶プロジェクタ装置
JP3350918B2 (ja) 1996-03-26 2002-11-25 株式会社高岳製作所 ２次元配列型共焦点光学装置
JP2002022410A (ja) 2000-07-04 2002-01-23 Canon Inc 位置検出方法及び装置
US7136159B2 (en) * 2000-09-12 2006-11-14 Kla-Tencor Technologies Corporation Excimer laser inspection system
US6917421B1 (en) * 2001-10-12 2005-07-12 Kla-Tencor Technologies Corp. Systems and methods for multi-dimensional inspection and/or metrology of a specimen
JP3880904B2 (ja) * 2002-08-02 2007-02-14 株式会社日立ハイテクノロジーズ アライメント検出方法、アライメント検出装置、デバイス製造方法及びデバイス製造装置
JP3878107B2 (ja) * 2002-11-06 2007-02-07 株式会社日立ハイテクノロジーズ 欠陥検査方法及びその装置
JP3971363B2 (ja) * 2003-10-07 2007-09-05 株式会社東芝 露光装置及び露光装置の光学系のミュラー行列を測定する方法
DE102005030543A1 (de) * 2004-07-08 2006-02-02 Carl Zeiss Smt Ag Polarisatoreinrichtung zur Erzeugung einer definierten Ortsverteilung von Polarisationszuständen
US7446882B2 (en) * 2005-01-20 2008-11-04 Zygo Corporation Interferometer for determining characteristics of an object surface
JP4723362B2 (ja) * 2005-11-29 2011-07-13 株式会社日立ハイテクノロジーズ 光学式検査装置及びその方法
JP5036429B2 (ja) 2007-07-09 2012-09-26 キヤノン株式会社 位置検出装置、露光装置、デバイス製造方法及び調整方法
JP5203675B2 (ja) * 2007-11-02 2013-06-05 キヤノン株式会社 位置検出器、位置検出方法、露光装置及びデバイス製造方法
JP2010133840A (ja) 2008-12-05 2010-06-17 Nokodai Tlo Kk 形状測定装置及び形状測定方法
JP5875335B2 (ja) * 2011-11-15 2016-03-02 キヤノン株式会社 位置検出装置および露光装置
JP6025346B2 (ja) * 2012-03-05 2016-11-16 キヤノン株式会社 検出装置、露光装置及びデバイスを製造する方法
JP2013219086A (ja) * 2012-04-04 2013-10-24 Canon Inc 検出装置、リソグラフィー装置、荷電粒子線装置、および物品製造方法
JP6066627B2 (ja) * 2012-08-23 2017-01-25 キヤノン株式会社 位置検出装置、およびそれを用いたリソグラフィー装置並びにデバイスの製造方法
JP2014081452A (ja) * 2012-10-16 2014-05-08 Nikon Corp 露光装置、およびデバイス製造方法
KR20170079671A (ko) * 2015-12-30 2017-07-10 코오롱인더스트리 주식회사 와이어 그리드 편광판 및 이를 포함한 액정표시장치
WO2018210505A1 (en) * 2017-05-15 2018-11-22 Asml Netherlands B.V. Metrology sensor, lithographic apparatus and method for manufacturing devices

Also Published As

Publication number Publication date
US11169452B2 (en) 2021-11-09
CN111505915A (zh) 2020-08-07
US20200249589A1 (en) 2020-08-06
JP2020122930A (ja) 2020-08-13
TW202109215A (zh) 2021-03-01

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