JP2020122930A - 計測装置、露光装置及び物品の製造方法 - Google Patents

計測装置、露光装置及び物品の製造方法 Download PDF

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Publication number
JP2020122930A
JP2020122930A JP2019015987A JP2019015987A JP2020122930A JP 2020122930 A JP2020122930 A JP 2020122930A JP 2019015987 A JP2019015987 A JP 2019015987A JP 2019015987 A JP2019015987 A JP 2019015987A JP 2020122930 A JP2020122930 A JP 2020122930A
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JP
Japan
Prior art keywords
light
polarizer
polarized light
substrate
illumination
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2019015987A
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English (en)
Japanese (ja)
Other versions
JP2020122930A5 (enExample
Inventor
普教 前田
Hironori Maeda
普教 前田
賢 箕田
Masaru Minoda
賢 箕田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2019015987A priority Critical patent/JP2020122930A/ja
Priority to TW109101290A priority patent/TW202109215A/zh
Priority to US16/751,388 priority patent/US11169452B2/en
Priority to KR1020200009661A priority patent/KR20200095398A/ko
Priority to CN202010077600.3A priority patent/CN111505915A/zh
Publication of JP2020122930A publication Critical patent/JP2020122930A/ja
Publication of JP2020122930A5 publication Critical patent/JP2020122930A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G03B27/74—Positioning exposure meters in the apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7046—Strategy, e.g. mark, sensor or wavelength selection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7069—Alignment mark illumination, e.g. darkfield, dual focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7092—Signal processing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2019015987A 2019-01-31 2019-01-31 計測装置、露光装置及び物品の製造方法 Pending JP2020122930A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2019015987A JP2020122930A (ja) 2019-01-31 2019-01-31 計測装置、露光装置及び物品の製造方法
TW109101290A TW202109215A (zh) 2019-01-31 2020-01-15 測量設備、曝光設備、和製造物品的方法
US16/751,388 US11169452B2 (en) 2019-01-31 2020-01-24 Measurement apparatus, exposure apparatus, and method of manufacturing article
KR1020200009661A KR20200095398A (ko) 2019-01-31 2020-01-28 계측 장치, 노광 장치, 및 물품 제조 방법
CN202010077600.3A CN111505915A (zh) 2019-01-31 2020-01-31 测量装置、曝光装置和制造物品的方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019015987A JP2020122930A (ja) 2019-01-31 2019-01-31 計測装置、露光装置及び物品の製造方法

Publications (2)

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JP2020122930A true JP2020122930A (ja) 2020-08-13
JP2020122930A5 JP2020122930A5 (enExample) 2022-01-24

Family

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JP2019015987A Pending JP2020122930A (ja) 2019-01-31 2019-01-31 計測装置、露光装置及び物品の製造方法

Country Status (5)

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US (1) US11169452B2 (enExample)
JP (1) JP2020122930A (enExample)
KR (1) KR20200095398A (enExample)
CN (1) CN111505915A (enExample)
TW (1) TW202109215A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7328806B2 (ja) * 2019-06-25 2023-08-17 キヤノン株式会社 計測装置、リソグラフィ装置、および物品の製造方法
US11988574B2 (en) * 2020-11-24 2024-05-21 Applied Materials, Inc. Illumination system for AR metrology tool
EP4377492A1 (en) * 2021-07-30 2024-06-05 Carl Zeiss SMT GmbH Method and apparatus for determining optical properties of deposition materials used for lithographic masks

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62181431A (ja) * 1987-01-23 1987-08-08 Canon Inc 自動整合装置
JPH03290916A (ja) * 1990-04-06 1991-12-20 Canon Inc マーク検出装置及び露光装置
JPH05341234A (ja) * 1992-06-12 1993-12-24 Chinon Ind Inc 偏光光学系および液晶プロジェクタ装置
JP2004069398A (ja) * 2002-08-02 2004-03-04 Hitachi Electronics Eng Co Ltd アライメント検出方法、アライメント検出装置、デバイス製造方法及びデバイス製造装置
JP2009115515A (ja) * 2007-11-02 2009-05-28 Canon Inc 位置検出器、位置検出方法、露光装置及びデバイス製造方法
JP5036429B2 (ja) * 2007-07-09 2012-09-26 キヤノン株式会社 位置検出装置、露光装置、デバイス製造方法及び調整方法
JP2013105936A (ja) * 2011-11-15 2013-05-30 Canon Inc 位置検出装置および露光装置
JP2013187206A (ja) * 2012-03-05 2013-09-19 Canon Inc 検出装置、露光装置及びデバイスを製造する方法
JP2013219086A (ja) * 2012-04-04 2013-10-24 Canon Inc 検出装置、リソグラフィー装置、荷電粒子線装置、および物品製造方法
JP2014081452A (ja) * 2012-10-16 2014-05-08 Nikon Corp 露光装置、およびデバイス製造方法
JP2019507372A (ja) * 2015-12-30 2019-03-14 コーロン インダストリーズ インク ワイヤグリッド偏光板及びこれを含む光学部品

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JP3350918B2 (ja) 1996-03-26 2002-11-25 株式会社高岳製作所 ２次元配列型共焦点光学装置
JP2002022410A (ja) 2000-07-04 2002-01-23 Canon Inc 位置検出方法及び装置
US7136159B2 (en) * 2000-09-12 2006-11-14 Kla-Tencor Technologies Corporation Excimer laser inspection system
US6917421B1 (en) * 2001-10-12 2005-07-12 Kla-Tencor Technologies Corp. Systems and methods for multi-dimensional inspection and/or metrology of a specimen
JP3878107B2 (ja) * 2002-11-06 2007-02-07 株式会社日立ハイテクノロジーズ 欠陥検査方法及びその装置
JP3971363B2 (ja) * 2003-10-07 2007-09-05 株式会社東芝 露光装置及び露光装置の光学系のミュラー行列を測定する方法
DE102005030543A1 (de) * 2004-07-08 2006-02-02 Carl Zeiss Smt Ag Polarisatoreinrichtung zur Erzeugung einer definierten Ortsverteilung von Polarisationszuständen
US7446882B2 (en) * 2005-01-20 2008-11-04 Zygo Corporation Interferometer for determining characteristics of an object surface
JP4723362B2 (ja) * 2005-11-29 2011-07-13 株式会社日立ハイテクノロジーズ 光学式検査装置及びその方法
JP2010133840A (ja) 2008-12-05 2010-06-17 Nokodai Tlo Kk 形状測定装置及び形状測定方法
JP6066627B2 (ja) * 2012-08-23 2017-01-25 キヤノン株式会社 位置検出装置、およびそれを用いたリソグラフィー装置並びにデバイスの製造方法
WO2018210505A1 (en) * 2017-05-15 2018-11-22 Asml Netherlands B.V. Metrology sensor, lithographic apparatus and method for manufacturing devices

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62181431A (ja) * 1987-01-23 1987-08-08 Canon Inc 自動整合装置
JPH03290916A (ja) * 1990-04-06 1991-12-20 Canon Inc マーク検出装置及び露光装置
JPH05341234A (ja) * 1992-06-12 1993-12-24 Chinon Ind Inc 偏光光学系および液晶プロジェクタ装置
JP2004069398A (ja) * 2002-08-02 2004-03-04 Hitachi Electronics Eng Co Ltd アライメント検出方法、アライメント検出装置、デバイス製造方法及びデバイス製造装置
JP5036429B2 (ja) * 2007-07-09 2012-09-26 キヤノン株式会社 位置検出装置、露光装置、デバイス製造方法及び調整方法
JP2009115515A (ja) * 2007-11-02 2009-05-28 Canon Inc 位置検出器、位置検出方法、露光装置及びデバイス製造方法
JP2013105936A (ja) * 2011-11-15 2013-05-30 Canon Inc 位置検出装置および露光装置
JP2013187206A (ja) * 2012-03-05 2013-09-19 Canon Inc 検出装置、露光装置及びデバイスを製造する方法
JP2013219086A (ja) * 2012-04-04 2013-10-24 Canon Inc 検出装置、リソグラフィー装置、荷電粒子線装置、および物品製造方法
JP2014081452A (ja) * 2012-10-16 2014-05-08 Nikon Corp 露光装置、およびデバイス製造方法
JP2019507372A (ja) * 2015-12-30 2019-03-14 コーロン インダストリーズ インク ワイヤグリッド偏光板及びこれを含む光学部品

Also Published As

Publication number Publication date
US11169452B2 (en) 2021-11-09
KR20200095398A (ko) 2020-08-10
CN111505915A (zh) 2020-08-07
US20200249589A1 (en) 2020-08-06
TW202109215A (zh) 2021-03-01

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