TW202109215A - 測量設備、曝光設備、和製造物品的方法 - Google Patents

測量設備、曝光設備、和製造物品的方法 Download PDF

Info

Publication number
TW202109215A
TW202109215A TW109101290A TW109101290A TW202109215A TW 202109215 A TW202109215 A TW 202109215A TW 109101290 A TW109101290 A TW 109101290A TW 109101290 A TW109101290 A TW 109101290A TW 202109215 A TW202109215 A TW 202109215A
Authority
TW
Taiwan
Prior art keywords
light
illumination
polarizer
polarized light
image forming
Prior art date
Application number
TW109101290A
Other languages
English (en)
Chinese (zh)
Inventor
前田普教
箕田賢
Original Assignee
日商佳能股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商佳能股份有限公司 filed Critical 日商佳能股份有限公司
Publication of TW202109215A publication Critical patent/TW202109215A/zh

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G03B27/74—Positioning exposure meters in the apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7046—Strategy, e.g. mark, sensor or wavelength selection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7069—Alignment mark illumination, e.g. darkfield, dual focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7092—Signal processing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
TW109101290A 2019-01-31 2020-01-15 測量設備、曝光設備、和製造物品的方法 TW202109215A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019015987A JP2020122930A (ja) 2019-01-31 2019-01-31 計測装置、露光装置及び物品の製造方法
JP2019-015987 2019-01-31

Publications (1)

Publication Number Publication Date
TW202109215A true TW202109215A (zh) 2021-03-01

Family

ID=71836385

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109101290A TW202109215A (zh) 2019-01-31 2020-01-15 測量設備、曝光設備、和製造物品的方法

Country Status (5)

Country Link
US (1) US11169452B2 (enExample)
JP (1) JP2020122930A (enExample)
KR (1) KR20200095398A (enExample)
CN (1) CN111505915A (enExample)
TW (1) TW202109215A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7328806B2 (ja) * 2019-06-25 2023-08-17 キヤノン株式会社 計測装置、リソグラフィ装置、および物品の製造方法
US11988574B2 (en) * 2020-11-24 2024-05-21 Applied Materials, Inc. Illumination system for AR metrology tool
EP4377492A1 (en) * 2021-07-30 2024-06-05 Carl Zeiss SMT GmbH Method and apparatus for determining optical properties of deposition materials used for lithographic masks

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62181431A (ja) * 1987-01-23 1987-08-08 Canon Inc 自動整合装置
JP2897330B2 (ja) * 1990-04-06 1999-05-31 キヤノン株式会社 マーク検出装置及び露光装置
JP3246676B2 (ja) * 1992-06-12 2002-01-15 チノン株式会社 液晶プロジェクタ装置
JP3350918B2 (ja) 1996-03-26 2002-11-25 株式会社高岳製作所 ２次元配列型共焦点光学装置
JP2002022410A (ja) 2000-07-04 2002-01-23 Canon Inc 位置検出方法及び装置
US7136159B2 (en) * 2000-09-12 2006-11-14 Kla-Tencor Technologies Corporation Excimer laser inspection system
US6917421B1 (en) * 2001-10-12 2005-07-12 Kla-Tencor Technologies Corp. Systems and methods for multi-dimensional inspection and/or metrology of a specimen
JP3880904B2 (ja) * 2002-08-02 2007-02-14 株式会社日立ハイテクノロジーズ アライメント検出方法、アライメント検出装置、デバイス製造方法及びデバイス製造装置
JP3878107B2 (ja) * 2002-11-06 2007-02-07 株式会社日立ハイテクノロジーズ 欠陥検査方法及びその装置
JP3971363B2 (ja) * 2003-10-07 2007-09-05 株式会社東芝 露光装置及び露光装置の光学系のミュラー行列を測定する方法
DE102005030543A1 (de) * 2004-07-08 2006-02-02 Carl Zeiss Smt Ag Polarisatoreinrichtung zur Erzeugung einer definierten Ortsverteilung von Polarisationszuständen
US7446882B2 (en) * 2005-01-20 2008-11-04 Zygo Corporation Interferometer for determining characteristics of an object surface
JP4723362B2 (ja) * 2005-11-29 2011-07-13 株式会社日立ハイテクノロジーズ 光学式検査装置及びその方法
JP5036429B2 (ja) 2007-07-09 2012-09-26 キヤノン株式会社 位置検出装置、露光装置、デバイス製造方法及び調整方法
JP5203675B2 (ja) * 2007-11-02 2013-06-05 キヤノン株式会社 位置検出器、位置検出方法、露光装置及びデバイス製造方法
JP2010133840A (ja) 2008-12-05 2010-06-17 Nokodai Tlo Kk 形状測定装置及び形状測定方法
JP5875335B2 (ja) * 2011-11-15 2016-03-02 キヤノン株式会社 位置検出装置および露光装置
JP6025346B2 (ja) * 2012-03-05 2016-11-16 キヤノン株式会社 検出装置、露光装置及びデバイスを製造する方法
JP2013219086A (ja) * 2012-04-04 2013-10-24 Canon Inc 検出装置、リソグラフィー装置、荷電粒子線装置、および物品製造方法
JP6066627B2 (ja) * 2012-08-23 2017-01-25 キヤノン株式会社 位置検出装置、およびそれを用いたリソグラフィー装置並びにデバイスの製造方法
JP2014081452A (ja) * 2012-10-16 2014-05-08 Nikon Corp 露光装置、およびデバイス製造方法
KR20170079671A (ko) * 2015-12-30 2017-07-10 코오롱인더스트리 주식회사 와이어 그리드 편광판 및 이를 포함한 액정표시장치
WO2018210505A1 (en) * 2017-05-15 2018-11-22 Asml Netherlands B.V. Metrology sensor, lithographic apparatus and method for manufacturing devices

Also Published As

Publication number Publication date
US11169452B2 (en) 2021-11-09
KR20200095398A (ko) 2020-08-10
CN111505915A (zh) 2020-08-07
US20200249589A1 (en) 2020-08-06
JP2020122930A (ja) 2020-08-13

Similar Documents

Publication Publication Date Title
US10656541B2 (en) Measurement apparatus, exposure apparatus, and method of manufacturing article
JP5162006B2 (ja) 検出装置、露光装置、および、デバイスの製造方法
JP5743958B2 (ja) 計測方法、露光方法および装置
US8810772B2 (en) Position detector, position detection method, exposure apparatus, and method of manufacturing device to align wafer by adjusting optical member
EP0999475B1 (en) Position detecting system and exposure apparatus using the same
US11231573B2 (en) Position detection apparatus, exposure apparatus, and article manufacturing method
US9939741B2 (en) Lithography apparatus, and method of manufacturing article
US11169452B2 (en) Measurement apparatus, exposure apparatus, and method of manufacturing article
TWI722394B (zh) 圖案形成裝置及物品製造方法
US20090231569A1 (en) Exposure method, exposure apparatus, and method of manufacturing device
US12366812B2 (en) Detection apparatus, detection method, exposure apparatus and article manufacturing method
JP2023160136A (ja) 校正方法、検出系、露光装置、物品の製造方法及びプログラム
JP2004279166A (ja) 位置検出装置
JP7446131B2 (ja) 検出装置、露光装置および物品製造方法
JP6061912B2 (ja) 計測方法、露光方法および装置