KR20130097116A - 게이트 스페이서를 포함하는 증가형 갈륨 나이트라이드 고전자이동 트랜지스터 소자 및 이를 제조하는 방법 - Google Patents

게이트 스페이서를 포함하는 증가형 갈륨 나이트라이드 고전자이동 트랜지스터 소자 및 이를 제조하는 방법 Download PDF

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KR20130097116A
KR20130097116A KR1020130019047A KR20130019047A KR20130097116A KR 20130097116 A KR20130097116 A KR 20130097116A KR 1020130019047 A KR1020130019047 A KR 1020130019047A KR 20130019047 A KR20130019047 A KR 20130019047A KR 20130097116 A KR20130097116 A KR 20130097116A
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South Korea
Prior art keywords
gate
compound
gate metal
metal
spacer
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KR1020130019047A
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English (en)
Korean (ko)
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알렉산더 리도우
로버트 비치
아라나 나카타
지안준 카오
광 유안 쟈오
로버트 스트리트마터
팡 창 루이
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이피션트 파워 컨버젼 코퍼레이션
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Priority claimed from US13/403,400 external-priority patent/US8823012B2/en
Application filed by 이피션트 파워 컨버젼 코퍼레이션 filed Critical 이피션트 파워 컨버젼 코퍼레이션
Publication of KR20130097116A publication Critical patent/KR20130097116A/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66409—Unipolar field-effect transistors
    • H01L29/66446—Unipolar field-effect transistors with an active layer made of a group 13/15 material, e.g. group 13/15 velocity modulation transistor [VMT], group 13/15 negative resistance FET [NERFET]
    • H01L29/66462—Unipolar field-effect transistors with an active layer made of a group 13/15 material, e.g. group 13/15 velocity modulation transistor [VMT], group 13/15 negative resistance FET [NERFET] with a heterojunction interface channel or gate, e.g. HFET, HIGFET, SISFET, HJFET, HEMT
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/778—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/778—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
    • H01L29/7786—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with direct single heterostructure, i.e. with wide bandgap layer formed on top of active layer, e.g. direct single heterostructure MIS-like HEMT
    • H01L29/7787—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with direct single heterostructure, i.e. with wide bandgap layer formed on top of active layer, e.g. direct single heterostructure MIS-like HEMT with wide bandgap charge-carrier supplying layer, e.g. direct single heterostructure MODFET
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/1066—Gate region of field-effect devices with PN junction gate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/20—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
    • H01L29/2003—Nitride compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/402—Field plates

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Electrodes Of Semiconductors (AREA)
KR1020130019047A 2012-02-23 2013-02-22 게이트 스페이서를 포함하는 증가형 갈륨 나이트라이드 고전자이동 트랜지스터 소자 및 이를 제조하는 방법 KR20130097116A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/403,400 US8823012B2 (en) 2009-04-08 2012-02-23 Enhancement mode GaN HEMT device with gate spacer and method for fabricating the same
US13/403,400 2012-02-23

Publications (1)

Publication Number Publication Date
KR20130097116A true KR20130097116A (ko) 2013-09-02

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KR1020130019047A KR20130097116A (ko) 2012-02-23 2013-02-22 게이트 스페이서를 포함하는 증가형 갈륨 나이트라이드 고전자이동 트랜지스터 소자 및 이를 제조하는 방법

Country Status (5)

Country Link
JP (1) JP6147018B2 (zh)
KR (1) KR20130097116A (zh)
CN (1) CN103296078B (zh)
DE (1) DE102013202972B4 (zh)
TW (1) TWI566402B (zh)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016017127A1 (ja) * 2014-07-29 2016-02-04 パナソニックＩｐマネジメント株式会社 窒化物半導体装置
CN104465746B (zh) * 2014-09-28 2018-08-10 苏州能讯高能半导体有限公司 一种hemt器件及其制造方法
US9580304B2 (en) * 2015-05-07 2017-02-28 Texas Instruments Incorporated Low-stress low-hydrogen LPCVD silicon nitride
TWI802096B (zh) * 2021-11-23 2023-05-11 新唐科技股份有限公司 電晶體元件
CN116613192B (zh) * 2023-07-17 2023-10-03 成都氮矽科技有限公司 一种常关型GaN HEMT及制造方法

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JPH04101435A (ja) * 1990-08-21 1992-04-02 Sumitomo Electric Ind Ltd 電界効果トランジスタの製造方法
US6638871B2 (en) * 2002-01-10 2003-10-28 United Microlectronics Corp. Method for forming openings in low dielectric constant material layer
US7501669B2 (en) * 2003-09-09 2009-03-10 Cree, Inc. Wide bandgap transistor devices with field plates
JP4705412B2 (ja) 2005-06-06 2011-06-22 パナソニック株式会社 電界効果トランジスタ及びその製造方法
JP2009509343A (ja) * 2005-09-16 2009-03-05 ザ リージェンツ オブ ザ ユニバーシティ オブ カリフォルニア Ｎ極窒化アルミニウムガリウム／窒化ガリウムエンハンスメントモード電界効果トランジスタ
JP2008010461A (ja) * 2006-06-27 2008-01-17 Sharp Corp ヘテロ接合電界効果型トランジスタおよびヘテロ接合電界効果型トランジスタの製造方法
JP4755961B2 (ja) * 2006-09-29 2011-08-24 パナソニック株式会社 窒化物半導体装置及びその製造方法
JP5442272B2 (ja) * 2009-02-19 2014-03-12 日本電信電話株式会社 電界効果トランジスタおよび電界効果トランジスタ製造方法
DE112010001556B4 (de) * 2009-04-08 2022-01-27 Efficient Power Conversion Corporation Rückdiffusionsunterdrückende Strukturen
WO2010118100A1 (en) * 2009-04-08 2010-10-14 Efficient Power Conversion Corporation Compensated gate misfet and method for fabricating the same
CN102388441B (zh) * 2009-04-08 2014-05-07 宜普电源转换公司 增强型GaN高电子迁移率晶体管器件及其制备方法
KR101172857B1 (ko) * 2009-12-14 2012-08-09 경북대학교 산학협력단 인헨스먼트 노멀리 오프 질화물 반도체 소자 및 그 제조방법
JP5604147B2 (ja) * 2010-03-25 2014-10-08 パナソニック株式会社 トランジスタ及びその製造方法
JP5666157B2 (ja) * 2010-03-26 2015-02-12 パナソニック株式会社 双方向スイッチ素子及びそれを用いた双方向スイッチ回路

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Publication number Publication date
DE102013202972A1 (de) 2013-09-05
JP6147018B2 (ja) 2017-06-14
CN103296078B (zh) 2017-01-18
JP2013175726A (ja) 2013-09-05
DE102013202972B4 (de) 2020-07-30
TWI566402B (zh) 2017-01-11
TW201347177A (zh) 2013-11-16
CN103296078A (zh) 2013-09-11

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