KR20110103854A - 도포액 공급 장치, 도포액 공급 방법 및 버퍼 탱크 - Google Patents

도포액 공급 장치, 도포액 공급 방법 및 버퍼 탱크 Download PDF

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Publication number
KR20110103854A
KR20110103854A KR1020110013550A KR20110013550A KR20110103854A KR 20110103854 A KR20110103854 A KR 20110103854A KR 1020110013550 A KR1020110013550 A KR 1020110013550A KR 20110013550 A KR20110013550 A KR 20110013550A KR 20110103854 A KR20110103854 A KR 20110103854A
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KR
South Korea
Prior art keywords
coating liquid
tank
liquid
buffer tank
coating
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KR1020110013550A
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English (en)
Korean (ko)
Inventor
민 린
토모오 우치카타
히로카즈 칸바야시
사다히코 이토
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도레 엔지니아린구 가부시키가이샤
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Application filed by 도레 엔지니아린구 가부시키가이샤 filed Critical 도레 엔지니아린구 가부시키가이샤
Publication of KR20110103854A publication Critical patent/KR20110103854A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
KR1020110013550A 2010-03-15 2011-02-16 도포액 공급 장치, 도포액 공급 방법 및 버퍼 탱크 KR20110103854A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2010058461A JP5534591B2 (ja) 2010-03-15 2010-03-15 塗布液供給装置、及び、塗布液供給方法
JPJP-P-2010-058461 2010-03-15

Publications (1)

Publication Number Publication Date
KR20110103854A true KR20110103854A (ko) 2011-09-21

Family

ID=44598456

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110013550A KR20110103854A (ko) 2010-03-15 2011-02-16 도포액 공급 장치, 도포액 공급 방법 및 버퍼 탱크

Country Status (4)

Country Link
JP (1) JP5534591B2 (ja)
KR (1) KR20110103854A (ja)
CN (1) CN102189064B (ja)
TW (1) TWI498170B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210064556A (ko) * 2019-11-26 2021-06-03 세메스 주식회사 약액 토출 장치

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011118354A1 (de) * 2011-11-14 2013-05-16 Focke & Co. (Gmbh & Co. Kg) Vorrichtung zum Aufbringen von Aromastoffen auf ein Medium
CN102650774A (zh) * 2012-05-18 2012-08-29 深圳市华星光电技术有限公司 液晶吸取装置和液晶涂布设备
JP6454597B2 (ja) * 2015-05-13 2019-01-16 東京応化工業株式会社 塗布装置、塗布システム及び塗布方法
JP6257740B1 (ja) * 2016-12-09 2018-01-10 中外炉工業株式会社 塗工液供給装置
CN106938239B (zh) * 2017-04-24 2019-07-16 武汉华星光电技术有限公司 一种涂布头及涂布机
CN108897154A (zh) * 2018-08-15 2018-11-27 张家港康得新光电材料有限公司 一种涂布设备
CN109976098B (zh) * 2019-03-22 2024-04-12 福建华佳彩有限公司 一种光阻刀头
CN113646543B (zh) 2019-04-24 2024-04-30 富士胶片株式会社 带消音器的送风机
JP2021178312A (ja) * 2020-05-08 2021-11-18 兵神装備株式会社 流動物吐出システム
CN112892927A (zh) * 2021-01-20 2021-06-04 程建国 一种半导体表面绝缘薄膜加工装置
CN114669447A (zh) * 2022-04-25 2022-06-28 京东方科技集团股份有限公司 涂布设备的缓冲装置和涂布设备

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0433440Y2 (ja) * 1984-12-04 1992-08-11
JPH02190700A (ja) * 1989-01-19 1990-07-26 Sigma Gijutsu Kogyo Kk 液体圧送装置
JP2000189880A (ja) * 1998-12-28 2000-07-11 Canon Inc 塗布方法および装置ならびにカラ―フィルタの製造方法
JP2002136912A (ja) * 2000-10-31 2002-05-14 Dainippon Printing Co Ltd 溶液の供給装置
CN1296144C (zh) * 2003-07-28 2007-01-24 中华映管股份有限公司 用以吹附阴极材料药液的多喷头涂布装置
KR100610023B1 (ko) * 2005-07-19 2006-08-08 삼성전자주식회사 포토스피너설비의 분사불량 제어장치
JP4871541B2 (ja) * 2005-07-26 2012-02-08 東レ株式会社 塗布方法および塗布装置、ディスプレイ用部材の製造方法
CN101003039A (zh) * 2006-01-20 2007-07-25 达信科技股份有限公司 省空间的涂料供应系统
TWI396593B (zh) * 2006-03-31 2013-05-21 Toray Industries 塗布方法與塗布裝置以及顯示用構件之製造方法與製造裝置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210064556A (ko) * 2019-11-26 2021-06-03 세메스 주식회사 약액 토출 장치

Also Published As

Publication number Publication date
JP2011189295A (ja) 2011-09-29
JP5534591B2 (ja) 2014-07-02
TW201130573A (en) 2011-09-16
CN102189064B (zh) 2014-12-10
CN102189064A (zh) 2011-09-21
TWI498170B (zh) 2015-09-01

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