KR20090035569A - 길이가 긴 가요성 회로 및 그 제조 방법 - Google Patents

길이가 긴 가요성 회로 및 그 제조 방법 Download PDF

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Publication number
KR20090035569A
KR20090035569A KR1020097002108A KR20097002108A KR20090035569A KR 20090035569 A KR20090035569 A KR 20090035569A KR 1020097002108 A KR1020097002108 A KR 1020097002108A KR 20097002108 A KR20097002108 A KR 20097002108A KR 20090035569 A KR20090035569 A KR 20090035569A
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KR
South Korea
Prior art keywords
circuit
photoresist
section
article
mask
Prior art date
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Ceased
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KR1020097002108A
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English (en)
Korean (ko)
Inventor
리차드 엘. 임켄
Original Assignee
쓰리엠 이노베이티브 프로퍼티즈 컴파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 쓰리엠 이노베이티브 프로퍼티즈 컴파니 filed Critical 쓰리엠 이노베이티브 프로퍼티즈 컴파니
Publication of KR20090035569A publication Critical patent/KR20090035569A/ko
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0393—Flexible materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70125—Use of illumination settings tailored to particular mask patterns
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0548—Masks
    • H05K2203/056—Using an artwork, i.e. a photomask for exposing photosensitive layers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/15—Position of the PCB during processing
    • H05K2203/1545—Continuous processing, i.e. involving rolls moving a band-like or solid carrier along a continuous production path

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020097002108A 2006-08-03 2007-07-30 길이가 긴 가요성 회로 및 그 제조 방법 Ceased KR20090035569A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US82136606P 2006-08-03 2006-08-03
US60/821,366 2006-08-03

Publications (1)

Publication Number Publication Date
KR20090035569A true KR20090035569A (ko) 2009-04-09

Family

ID=39033321

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020097002108A Ceased KR20090035569A (ko) 2006-08-03 2007-07-30 길이가 긴 가요성 회로 및 그 제조 방법

Country Status (7)

Country Link
US (1) US7947429B2 (https=)
EP (1) EP2052294A4 (https=)
JP (1) JP2009545774A (https=)
KR (1) KR20090035569A (https=)
CN (1) CN101501574B (https=)
TW (1) TWI415532B (https=)
WO (1) WO2008019249A1 (https=)

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JP2010016313A (ja) * 2008-07-07 2010-01-21 Hitachi Cable Ltd 配線基板の製造方法および配線基板
US8339573B2 (en) * 2009-05-27 2012-12-25 3M Innovative Properties Company Method and apparatus for photoimaging a substrate
JP2011205042A (ja) * 2010-03-26 2011-10-13 Panasonic Electric Works Co Ltd プリント配線板の製造方法
JP5598239B2 (ja) * 2010-10-08 2014-10-01 ウシオ電機株式会社 光照射装置
EP2950144B1 (en) * 2014-05-31 2016-12-14 Rohm and Haas Electronic Materials LLC Imaging process on substrates with aqueous alkaline soluble uv blocking compositions and aqueous soluble uv transparent films
US9622353B2 (en) * 2014-05-31 2017-04-11 Rohm And Haas Electronic Materials Llc Imaging on substrates with alkaline strippable UV blocking compositions and aqueous soluble UV transparent films
US12459200B2 (en) * 2017-05-11 2025-11-04 Seurat Technologies, Inc. Solid state routing of patterned light for additive manufacturing optimization
KR20170051695A (ko) * 2015-10-30 2017-05-12 주식회사 잉크테크 연성인쇄회로기판 제조방법 및 그 제조장치
CN105870319B (zh) * 2016-04-26 2019-03-05 贝骨新材料科技（上海）有限公司 一种长条状压电薄膜传感器卷对卷制造方法
JP6745712B2 (ja) 2016-11-30 2020-08-26 日東電工株式会社 配線回路基板およびその製造方法
CN106711085B (zh) * 2016-12-12 2019-02-19 东莞市广信知识产权服务有限公司 一种柔性互连金属的制备方法
CN106990600B (zh) * 2017-06-07 2019-12-06 京东方科技集团股份有限公司 彩膜基板及其制造方法、显示面板、显示装置
CN110595512B (zh) * 2019-09-24 2023-10-27 湖南科技大学 一种柔性压电传感器的制作方法
JP7441031B2 (ja) * 2019-11-11 2024-02-29 日東電工株式会社 配線回路基板の製造方法および配線回路基板集合体シート
JP7612327B2 (ja) * 2019-12-24 2025-01-14 日東電工株式会社 配線回路基板の製造方法、および、配線回路基板シート
CN111122712A (zh) * 2020-01-15 2020-05-08 深圳市中科传感技术有限公司 一种兰姆波传感器
CN117352585A (zh) * 2021-03-02 2024-01-05 苏州太阳井新能源有限公司 一种防止光伏电池边缘短路的电极制作方法及通过该方法形成的光伏电池

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JPH067817B2 (ja) 1986-02-27 1994-02-02 株式会社町田製作所 固体撮像素子を内蔵した内視鏡
US5437946A (en) * 1994-03-03 1995-08-01 Nikon Precision Inc. Multiple reticle stitching for scanning exposure system
JPH07295231A (ja) 1994-04-27 1995-11-10 Asahi Optical Co Ltd ステップアンドリピート露光方法及びそのマスク
US5652645A (en) * 1995-07-24 1997-07-29 Anvik Corporation High-throughput, high-resolution, projection patterning system for large, flexible, roll-fed, electronic-module substrates
US5914205A (en) * 1996-12-27 1999-06-22 U.S. Philips Corporation Method of manufacturing a semiconductor device whereby photomasks comprising partial patterns are projected onto a photoresist layer so as to merge into one another
JP4126096B2 (ja) * 1997-01-29 2008-07-30 マイクロニック レーザー システムズ アクチボラゲット 感光性被覆を有する基板上に集束レーザ放射により構造物を製作する方法と装置
TW449672B (en) * 1997-12-25 2001-08-11 Nippon Kogaku Kk Process and apparatus for manufacturing photomask and method of manufacturing the same
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KR100550560B1 (ko) * 2003-12-16 2006-02-10 전자부품연구원 패턴 제작 장치 및 그 방법
KR20050092848A (ko) * 2004-03-17 2005-09-23 주식회사 코오롱 포토마스크 이동방식 연속 노광 시스템 및 이 노광시스템을 이용한 프리즘 필름 제조방법
JP2006098718A (ja) * 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd 描画装置
KR100706233B1 (ko) * 2004-10-08 2007-04-11 삼성전자주식회사 반도체 기억 소자 및 그 제조방법
US7547936B2 (en) * 2004-10-08 2009-06-16 Samsung Electronics Co., Ltd. Semiconductor memory devices including offset active regions
KR100653991B1 (ko) * 2004-12-29 2006-12-05 주식회사 하이닉스반도체 노광 장치 및 이를 이용한 반도체 메모리 소자의 활성영역 제조 방법
JP2007310209A (ja) * 2006-05-19 2007-11-29 Nsk Ltd 露光装置

Also Published As

Publication number Publication date
EP2052294A1 (en) 2009-04-29
CN101501574A (zh) 2009-08-05
JP2009545774A (ja) 2009-12-24
WO2008019249A1 (en) 2008-02-14
EP2052294A4 (en) 2012-08-22
TWI415532B (zh) 2013-11-11
TW200814879A (en) 2008-03-16
US20080032209A1 (en) 2008-02-07
CN101501574B (zh) 2012-01-11
US7947429B2 (en) 2011-05-24

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