KR20080106895A - 샌드블라스트용 레지스트 재료 - Google Patents

샌드블라스트용 레지스트 재료 Download PDF

Info

Publication number
KR20080106895A
KR20080106895A KR1020087019492A KR20087019492A KR20080106895A KR 20080106895 A KR20080106895 A KR 20080106895A KR 1020087019492 A KR1020087019492 A KR 1020087019492A KR 20087019492 A KR20087019492 A KR 20087019492A KR 20080106895 A KR20080106895 A KR 20080106895A
Authority
KR
South Korea
Prior art keywords
resist material
sandblasting
resist
sandblast
resist pattern
Prior art date
Application number
KR1020087019492A
Other languages
English (en)
Korean (ko)
Inventor
히로아키 도미타
신지 아리히사
나오토 이노우에
Original Assignee
아사히 가세이 일렉트로닉스 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 아사히 가세이 일렉트로닉스 가부시끼가이샤 filed Critical 아사히 가세이 일렉트로닉스 가부시끼가이샤
Publication of KR20080106895A publication Critical patent/KR20080106895A/ko

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
    • B24C1/04—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods for treating only selected parts of a surface, e.g. for carving stone or glass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C11/00—Selection of abrasive materials or additives for abrasive blasts
    • B24C11/005—Selection of abrasive materials or additives for abrasive blasts of additives, e.g. anti-corrosive or disinfecting agents in solid, liquid or gaseous form

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
KR1020087019492A 2006-02-09 2007-02-01 샌드블라스트용 레지스트 재료 KR20080106895A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2006032584 2006-02-09
JP2006032582 2006-02-09
JPJP-P-2006-00032582 2006-02-09
JPJP-P-2006-00032584 2006-02-09

Publications (1)

Publication Number Publication Date
KR20080106895A true KR20080106895A (ko) 2008-12-09

Family

ID=38345079

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087019492A KR20080106895A (ko) 2006-02-09 2007-02-01 샌드블라스트용 레지스트 재료

Country Status (4)

Country Link
JP (1) JPWO2007091476A1 (ja)
KR (1) KR20080106895A (ja)
TW (1) TW200741340A (ja)
WO (1) WO2007091476A1 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6756371B2 (ja) * 2016-09-28 2020-09-16 新東工業株式会社 孔あけ加工方法、レジスト層及び繊維強化プラスチック
US11198640B2 (en) * 2018-06-10 2021-12-14 Dylan Kelley Systems, devices, and/or methods for images
KR102604665B1 (ko) * 2019-09-27 2023-11-21 소마 가부시기가이샤 Uv경화형 조성물 및 그것을 이용한 uv경화형 시트
CN113684437A (zh) * 2021-09-06 2021-11-23 无锡鑫聚电子科技有限公司 一种薄膜电容器喷金工艺

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5733966A (en) * 1980-08-07 1982-02-24 Hosono Metarikon Kogyosho:Kk Sandblast engraving method of ceramic ware
JPH02124270A (ja) * 1988-10-29 1990-05-11 Dainippon Screen Mfg Co Ltd サンドブラスト法による被加工物表面の彫り加工方法
JP3678551B2 (ja) * 1997-08-07 2005-08-03 日本エラストマー株式会社 新規なブロック共重合体の製造方法
JPH11226874A (ja) * 1998-02-16 1999-08-24 Murata Mfg Co Ltd 凹溝加工方法
JP2000100327A (ja) * 1998-09-25 2000-04-07 Dainippon Printing Co Ltd プラズマディスプレイパネルの製造方法とプラズマディスプレイパネル
JP2000305267A (ja) * 1999-04-22 2000-11-02 Jsr Corp 感光性樹脂組成物
JP2002043601A (ja) * 2000-07-25 2002-02-08 Sharp Corp 太陽電池の製造方法
KR20040104144A (ko) * 2003-06-03 2004-12-10 삼성전기주식회사 솔더 레지스트 패턴 형성 방법
JP2005215050A (ja) * 2004-01-27 2005-08-11 Ba Techno Kk 液晶表示装置の製法

Also Published As

Publication number Publication date
WO2007091476A1 (ja) 2007-08-16
JPWO2007091476A1 (ja) 2009-07-02
TW200741340A (en) 2007-11-01

Similar Documents

Publication Publication Date Title
KR101427685B1 (ko) 광경화성 조성물 및 그것을 사용한 패턴형성방법
KR100883254B1 (ko) 플렉소 인쇄용 감광성 수지 조성물
CN1690853B (zh) 光敏性树脂组合物和含有该组合物的光敏性干膜
US4468453A (en) Dry process for forming an image
WO2014200028A1 (ja) 感光性樹脂組成物、感光性エレメント、サンドブラスト用マスク材、及び被処理体の表面加工方法
JP5650945B2 (ja) サンドブラスト用感光性フィルム
KR20150075375A (ko) 감광성 수지 조성물, 감광성 엘리먼트, 샌드 블라스트용 마스크재, 및 피처리체의 표면 가공 방법
KR20080106895A (ko) 샌드블라스트용 레지스트 재료
JP6684147B2 (ja) サンドブラスト用感光性樹脂組成物及びサンドブラスト処理方法
CN111316164B (zh) 感光性树脂层叠体及抗蚀图案的制造方法
TW557411B (en) Photosensitive composition for sandblasting and photosensitive film comprising the same
WO2016152852A1 (ja) 感光性樹脂組成物、感光性エレメント、サンドブラスト用マスク材、及び被処理体の表面加工方法
KR100702880B1 (ko) 감광성 배향막 인쇄용 오목판 인쇄판 및 이것에 사용되는배향막 인쇄용 오목판 인쇄판 제조용 감광성 조성물,감광성 배향막 인쇄용 오목판 인쇄 원판 적층체
WO2014119562A1 (ja) 感光性樹脂組成物、感光性エレメント、サンドブラスト用マスク材、及び被処理体の表面加工方法
JP4459751B2 (ja) サンドブラスト用感光性樹脂組成物およびこれを用いたサンドブラスト用感光性ドライフィルム
JP2015001591A (ja) 感光性樹脂組成物、感光性エレメント、サンドブラスト用マスク材、及び被処理体の表面加工方法
JP5782162B2 (ja) サンドブラスト用感光性フィルム
JP3236461U (ja) サンドブラスト用感光性樹脂構成体
CN101378880A (zh) 喷砂用抗蚀材料
WO2021246382A1 (ja) サンドブラスト用感光性樹脂組成物及びサンドブラスト用感光性フィルム
JP6018664B2 (ja) サンドブラスト用感光性フィルム
JP3410729B2 (ja) 感光性樹脂組成物
JP2001233911A (ja) 重合性組成物
JPH11188631A (ja) サンドブラスト用感光性樹脂組成物及びその用途
JP2001048656A (ja) セラミックスパターン形成用組成物及びそれを用いたセラミックスパターン形成方法

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application