TW200741340A - Resist material for sandblasting - Google Patents
Resist material for sandblastingInfo
- Publication number
- TW200741340A TW200741340A TW096104614A TW96104614A TW200741340A TW 200741340 A TW200741340 A TW 200741340A TW 096104614 A TW096104614 A TW 096104614A TW 96104614 A TW96104614 A TW 96104614A TW 200741340 A TW200741340 A TW 200741340A
- Authority
- TW
- Taiwan
- Prior art keywords
- sandblasting
- resist material
- resist
- processing
- jetted
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
- B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
- B24C1/04—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods for treating only selected parts of a surface, e.g. for carving stone or glass
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Polymerisation Methods In General (AREA)
Abstract
A resist material which is less apt to wear even when a high-hardness abrasive material is jetted with high-pressure air; and a method of the surface processing by sandblasting of a material whose surface is difficult to process with conventional resist materials for sandblasting or of a material requiring a processing depth. The resist material for sandblasting comprises (a) a thermoplastic elastomer. It may be a photosensitive resist material for sandblasting which further contains (b) a photopolymerizable unsaturated monomer and (c) a photopolymerization initiator. The sandblasting material may be in a solution state or may be in the form of a film superposed on a support.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006032582 | 2006-02-09 | ||
JP2006032584 | 2006-02-09 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200741340A true TW200741340A (en) | 2007-11-01 |
Family
ID=38345079
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096104614A TW200741340A (en) | 2006-02-09 | 2007-02-08 | Resist material for sandblasting |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPWO2007091476A1 (en) |
KR (1) | KR20080106895A (en) |
TW (1) | TW200741340A (en) |
WO (1) | WO2007091476A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113684437A (en) * | 2021-09-06 | 2021-11-23 | 无锡鑫聚电子科技有限公司 | Metal spraying process for thin film capacitor |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2018062101A1 (en) * | 2016-09-28 | 2018-04-05 | 新東工業株式会社 | Drilling method, resist layer, and fiber-reinforced plastic |
US11198640B2 (en) * | 2018-06-10 | 2021-12-14 | Dylan Kelley | Systems, devices, and/or methods for images |
CN114450373B (en) * | 2019-09-27 | 2024-06-21 | 索马龙株式会社 | UV curable composition and UV curable sheet using same |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5733966A (en) * | 1980-08-07 | 1982-02-24 | Hosono Metarikon Kogyosho:Kk | Sandblast engraving method of ceramic ware |
JPH02124270A (en) * | 1988-10-29 | 1990-05-11 | Dainippon Screen Mfg Co Ltd | Carving method for surface of body to be worked by sand blast method |
JP3678551B2 (en) * | 1997-08-07 | 2005-08-03 | 日本エラストマー株式会社 | Method for producing novel block copolymer |
JPH11226874A (en) * | 1998-02-16 | 1999-08-24 | Murata Mfg Co Ltd | Recessed groove work method |
JP2000100327A (en) * | 1998-09-25 | 2000-04-07 | Dainippon Printing Co Ltd | Manufacture of plasma display panel and plasma display panel |
JP2000305267A (en) * | 1999-04-22 | 2000-11-02 | Jsr Corp | Photosensitive resin composition |
JP2002043601A (en) * | 2000-07-25 | 2002-02-08 | Sharp Corp | Method for manufacturing solar battery |
KR20040104144A (en) * | 2003-06-03 | 2004-12-10 | 삼성전기주식회사 | Method of forming solder resist pattern |
JP2005215050A (en) * | 2004-01-27 | 2005-08-11 | Ba Techno Kk | Method for manufacturing liquid crystal display device |
-
2007
- 2007-02-01 KR KR1020087019492A patent/KR20080106895A/en not_active Application Discontinuation
- 2007-02-01 JP JP2007557806A patent/JPWO2007091476A1/en not_active Withdrawn
- 2007-02-01 WO PCT/JP2007/051673 patent/WO2007091476A1/en active Application Filing
- 2007-02-08 TW TW096104614A patent/TW200741340A/en unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113684437A (en) * | 2021-09-06 | 2021-11-23 | 无锡鑫聚电子科技有限公司 | Metal spraying process for thin film capacitor |
Also Published As
Publication number | Publication date |
---|---|
JPWO2007091476A1 (en) | 2009-07-02 |
KR20080106895A (en) | 2008-12-09 |
WO2007091476A1 (en) | 2007-08-16 |
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