TW200741340A - Resist material for sandblasting - Google Patents

Resist material for sandblasting

Info

Publication number
TW200741340A
TW200741340A TW096104614A TW96104614A TW200741340A TW 200741340 A TW200741340 A TW 200741340A TW 096104614 A TW096104614 A TW 096104614A TW 96104614 A TW96104614 A TW 96104614A TW 200741340 A TW200741340 A TW 200741340A
Authority
TW
Taiwan
Prior art keywords
sandblasting
resist material
resist
processing
jetted
Prior art date
Application number
TW096104614A
Other languages
Chinese (zh)
Inventor
Hiroaki Tomita
Shinji Arihisa
Naoto Inoue
Original Assignee
Asahi Kasei Emd Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei Emd Corp filed Critical Asahi Kasei Emd Corp
Publication of TW200741340A publication Critical patent/TW200741340A/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
    • B24C1/04—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods for treating only selected parts of a surface, e.g. for carving stone or glass

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

A resist material which is less apt to wear even when a high-hardness abrasive material is jetted with high-pressure air; and a method of the surface processing by sandblasting of a material whose surface is difficult to process with conventional resist materials for sandblasting or of a material requiring a processing depth. The resist material for sandblasting comprises (a) a thermoplastic elastomer. It may be a photosensitive resist material for sandblasting which further contains (b) a photopolymerizable unsaturated monomer and (c) a photopolymerization initiator. The sandblasting material may be in a solution state or may be in the form of a film superposed on a support.
TW096104614A 2006-02-09 2007-02-08 Resist material for sandblasting TW200741340A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006032584 2006-02-09
JP2006032582 2006-02-09

Publications (1)

Publication Number Publication Date
TW200741340A true TW200741340A (en) 2007-11-01

Family

ID=38345079

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096104614A TW200741340A (en) 2006-02-09 2007-02-08 Resist material for sandblasting

Country Status (4)

Country Link
JP (1) JPWO2007091476A1 (en)
KR (1) KR20080106895A (en)
TW (1) TW200741340A (en)
WO (1) WO2007091476A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113684437A (en) * 2021-09-06 2021-11-23 无锡鑫聚电子科技有限公司 Metal spraying process for thin film capacitor

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6756371B2 (en) * 2016-09-28 2020-09-16 新東工業株式会社 Drilling method, resist layer and fiber reinforced plastic
US11198640B2 (en) * 2018-06-10 2021-12-14 Dylan Kelley Systems, devices, and/or methods for images
KR102604665B1 (en) * 2019-09-27 2023-11-21 소마 가부시기가이샤 UV curable composition and UV curable sheet using the same

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5733966A (en) * 1980-08-07 1982-02-24 Hosono Metarikon Kogyosho:Kk Sandblast engraving method of ceramic ware
JPH02124270A (en) * 1988-10-29 1990-05-11 Dainippon Screen Mfg Co Ltd Carving method for surface of body to be worked by sand blast method
JP3678551B2 (en) * 1997-08-07 2005-08-03 日本エラストマー株式会社 Method for producing novel block copolymer
JPH11226874A (en) * 1998-02-16 1999-08-24 Murata Mfg Co Ltd Recessed groove work method
JP2000100327A (en) * 1998-09-25 2000-04-07 Dainippon Printing Co Ltd Manufacture of plasma display panel and plasma display panel
JP2000305267A (en) * 1999-04-22 2000-11-02 Jsr Corp Photosensitive resin composition
JP2002043601A (en) * 2000-07-25 2002-02-08 Sharp Corp Method for manufacturing solar battery
KR20040104144A (en) * 2003-06-03 2004-12-10 삼성전기주식회사 Method of forming solder resist pattern
JP2005215050A (en) * 2004-01-27 2005-08-11 Ba Techno Kk Method for manufacturing liquid crystal display device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113684437A (en) * 2021-09-06 2021-11-23 无锡鑫聚电子科技有限公司 Metal spraying process for thin film capacitor

Also Published As

Publication number Publication date
KR20080106895A (en) 2008-12-09
WO2007091476A1 (en) 2007-08-16
JPWO2007091476A1 (en) 2009-07-02

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