TW200636385A - Photosensitive resin composition for display panel, its hardened material, and spacer for display panel - Google Patents
Photosensitive resin composition for display panel, its hardened material, and spacer for display panelInfo
- Publication number
- TW200636385A TW200636385A TW095101066A TW95101066A TW200636385A TW 200636385 A TW200636385 A TW 200636385A TW 095101066 A TW095101066 A TW 095101066A TW 95101066 A TW95101066 A TW 95101066A TW 200636385 A TW200636385 A TW 200636385A
- Authority
- TW
- Taiwan
- Prior art keywords
- display panel
- photosensitive resin
- resin composition
- spacer
- hardened material
- Prior art date
Links
Classifications
-
- E—FIXED CONSTRUCTIONS
- E02—HYDRAULIC ENGINEERING; FOUNDATIONS; SOIL SHIFTING
- E02F—DREDGING; SOIL-SHIFTING
- E02F7/00—Equipment for conveying or separating excavated material
- E02F7/06—Delivery chutes or screening plants or mixing plants mounted on dredgers or excavators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03B—SEPARATING SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS
- B03B5/00—Washing granular, powdered or lumpy materials; Wet separating
- B03B5/62—Washing granular, powdered or lumpy materials; Wet separating by hydraulic classifiers, e.g. of launder, tank, spiral or helical chute concentrator type
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F11/00—Treatment of sludge; Devices therefor
- C02F11/12—Treatment of sludge; Devices therefor by de-watering, drying or thickening
- C02F11/121—Treatment of sludge; Devices therefor by de-watering, drying or thickening by mechanical de-watering
- C02F11/125—Treatment of sludge; Devices therefor by de-watering, drying or thickening by mechanical de-watering using screw filters
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F11/00—Treatment of sludge; Devices therefor
- C02F11/12—Treatment of sludge; Devices therefor by de-watering, drying or thickening
- C02F11/121—Treatment of sludge; Devices therefor by de-watering, drying or thickening by mechanical de-watering
- C02F11/127—Treatment of sludge; Devices therefor by de-watering, drying or thickening by mechanical de-watering by centrifugation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/007—Contaminated open waterways, rivers, lakes or ponds
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/008—Mobile apparatus and plants, e.g. mounted on a vehicle
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Mining & Mineral Resources (AREA)
- Chemical & Material Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Hydrology & Water Resources (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Civil Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
The photosensitive resin composition for the display panel contains (A) an alkali-soluble, carboxyl group-containing photosensitive resin, (B) a polymerizable compound having an ethylenic unsaturated bond, (C) a photopolymerization initiator, and (D) a compound having a oxazin ring.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005032642A JP2006220790A (en) | 2005-02-09 | 2005-02-09 | Photosensitive resin composition for display panel, its hardened material, and spacer for display panel |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200636385A true TW200636385A (en) | 2006-10-16 |
TWI303354B TWI303354B (en) | 2008-11-21 |
Family
ID=36918838
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095101066A TW200636385A (en) | 2005-02-09 | 2006-01-11 | Photosensitive resin composition for display panel, its hardened material, and spacer for display panel |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2006220790A (en) |
KR (1) | KR100736295B1 (en) |
CN (1) | CN100582937C (en) |
TW (1) | TW200636385A (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100741297B1 (en) * | 2005-09-30 | 2007-07-20 | 주식회사 동진쎄미켐 | Photosensitive resin composition |
JP5002479B2 (en) * | 2007-02-16 | 2012-08-15 | 太陽ホールディングス株式会社 | Composition for forming cured film pattern and method for producing cured film pattern using the same |
JP5050693B2 (en) * | 2007-07-10 | 2012-10-17 | 日立化成工業株式会社 | Photosensitive resin composition, photosensitive film, permanent mask resist, and method for producing the same |
JP2010002886A (en) * | 2008-05-21 | 2010-01-07 | Sumitomo Chemical Co Ltd | Colored photosensitive resin composition |
KR101121038B1 (en) | 2008-07-01 | 2012-03-15 | 주식회사 엘지화학 | Photoresist resin composition containing a number of photo-initiators, transparent thin film layer and liquid crystal display using the same |
WO2010002129A2 (en) * | 2008-07-01 | 2010-01-07 | 주식회사 엘지화학 | Photosensitive resin composition containing a plurality of photoinitiators, and transparent thin film layer and liquid crystal display using the same |
CN102369481A (en) * | 2009-04-14 | 2012-03-07 | 住友电木株式会社 | Photosensitive resin composition, adhesive film, and light receiving device |
KR101495533B1 (en) * | 2010-12-21 | 2015-02-25 | 동우 화인켐 주식회사 | Photosensitive resin composition for spacer, spacer manufactured by the composition and display device including the spacer |
JP6084353B2 (en) * | 2010-12-28 | 2017-02-22 | 太陽インキ製造株式会社 | Photocurable resin composition manufacturing method, dry film manufacturing method, cured product manufacturing method, and printed wiring board manufacturing method |
JP5196063B2 (en) * | 2012-07-26 | 2013-05-15 | 日立化成株式会社 | Photosensitive resin composition, photosensitive film, permanent mask resist, and method for producing the same |
KR101992866B1 (en) * | 2013-02-06 | 2019-06-25 | 동우 화인켐 주식회사 | Colored photosensitive resin composition |
JP2013140379A (en) * | 2013-02-07 | 2013-07-18 | Hitachi Chemical Co Ltd | Photosensitive resin composition, photosensitive film, method of manufacturing permanent mask resist, and permanent mask resist |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05281728A (en) * | 1992-04-01 | 1993-10-29 | Fuji Photo Film Co Ltd | Photopolymerizable composition |
EP1478668B1 (en) * | 2002-02-28 | 2013-04-10 | Showa Denko K.K. | Thiol compound, photopolymerization initiator composition and photosensitive composition |
JP2003345015A (en) * | 2002-05-29 | 2003-12-03 | Sumitomo Chem Co Ltd | Photosensitive resin composition |
JP2004177498A (en) * | 2002-11-25 | 2004-06-24 | Nippon Shokubai Co Ltd | Photosetting resin composition and its use |
JP2004302049A (en) * | 2003-03-31 | 2004-10-28 | Hodogaya Chem Co Ltd | Photosensitive resin composition |
JP4345348B2 (en) * | 2003-05-09 | 2009-10-14 | Jsr株式会社 | Method for forming protrusion for vertical alignment type liquid crystal display element and spacer for vertical alignment type liquid crystal display element |
WO2004109403A1 (en) | 2003-06-02 | 2004-12-16 | Toray Industries, Inc. | Photosensitive resin composition, and electronic component and display using same |
-
2005
- 2005-02-09 JP JP2005032642A patent/JP2006220790A/en not_active Withdrawn
-
2006
- 2006-01-11 TW TW095101066A patent/TW200636385A/en unknown
- 2006-02-08 KR KR1020060011922A patent/KR100736295B1/en active IP Right Grant
- 2006-02-09 CN CN200610003542A patent/CN100582937C/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP2006220790A (en) | 2006-08-24 |
CN1818780A (en) | 2006-08-16 |
CN100582937C (en) | 2010-01-20 |
TWI303354B (en) | 2008-11-21 |
KR20060090605A (en) | 2006-08-14 |
KR100736295B1 (en) | 2007-07-06 |
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