TW200722911A - Photosensitive resin composition - Google Patents
Photosensitive resin compositionInfo
- Publication number
- TW200722911A TW200722911A TW095126253A TW95126253A TW200722911A TW 200722911 A TW200722911 A TW 200722911A TW 095126253 A TW095126253 A TW 095126253A TW 95126253 A TW95126253 A TW 95126253A TW 200722911 A TW200722911 A TW 200722911A
- Authority
- TW
- Taiwan
- Prior art keywords
- structural unit
- derived
- resin composition
- photosensitive resin
- group
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
Abstract
The photosensitive resin composition contains a binder resin (A), a photopolymerizable compound (B), a photopolymerization initiator (C) and a solvent (D), wherein the binder resin (A) comprises a polymer (AA) containing a structural unit (A1) derived from at least one kind of compound selected from a group consisting of unsaturated carboxylic acids and unsaturated carboxylic acid anhydrides, a structural unit (A2) derived from an unsaturated compound having at least one kind of group selected from a group consisting of active methylene groups and active methine groups, and a structural unit (A3) derived from a monomer copolymerizable with the structural unit (A1) and the structural unit (A2), however, (A3) excluding the structural unit (A1) and the structural unit (A2).
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005220344A JP4645346B2 (en) | 2005-07-29 | 2005-07-29 | Photosensitive resin composition |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200722911A true TW200722911A (en) | 2007-06-16 |
Family
ID=37793442
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095126253A TW200722911A (en) | 2005-07-29 | 2006-07-18 | Photosensitive resin composition |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4645346B2 (en) |
KR (1) | KR20070014998A (en) |
CN (1) | CN1940720B (en) |
TW (1) | TW200722911A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI670570B (en) * | 2014-07-18 | 2019-09-01 | 日商日本觸媒股份有限公司 | Curable resin composition and its use |
TWI805554B (en) * | 2016-07-28 | 2023-06-21 | 日商住友化學股份有限公司 | Resin, curable resin composition and cured film |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100849360B1 (en) * | 2007-02-13 | 2008-07-29 | 동우 화인켐 주식회사 | A colored photosensitive resin composition, patterning method thereof, color filter, liquid crystal display device and imaging device having the same |
JP4952467B2 (en) * | 2007-09-14 | 2012-06-13 | 東洋インキScホールディングス株式会社 | Coloring composition for color filter and color filter using the same |
KR20110126046A (en) * | 2010-05-14 | 2011-11-22 | 제이에스알 가부시끼가이샤 | Liquid crystal display device, positive radiation-sensitive composition, interlayer insulating film for liquid crystal display device and method for forming the same |
JP6094050B2 (en) * | 2011-04-15 | 2017-03-15 | 住友化学株式会社 | Colored photosensitive resin composition |
JP5810659B2 (en) | 2011-06-17 | 2015-11-11 | リコーイメージング株式会社 | Camera body, lens barrel, and interchangeable lens camera |
JP6060539B2 (en) * | 2011-07-08 | 2017-01-18 | 住友化学株式会社 | Photosensitive resin composition |
JP5692655B2 (en) | 2011-11-17 | 2015-04-01 | 株式会社リコー | Image projection device |
KR102235156B1 (en) * | 2013-12-09 | 2021-04-05 | 롬엔드하스전자재료코리아유한회사 | Negative-type photosensitive resin composition |
JP6751611B2 (en) * | 2016-07-11 | 2020-09-09 | 株式会社日本触媒 | Curable resin composition and its use |
CN108693708A (en) * | 2017-04-12 | 2018-10-23 | 住友化学株式会社 | Hardening resin composition and cured film |
WO2023119900A1 (en) * | 2021-12-21 | 2023-06-29 | 株式会社レゾナック | Photosensitive resin composition and color filter |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2662673B2 (en) * | 1988-03-09 | 1997-10-15 | 日本合成化学工業株式会社 | Photosensitive resin composition |
JPH03122647A (en) * | 1989-10-05 | 1991-05-24 | Hitachi Chem Co Ltd | Photosensitive resin composition and photosensitive film using this composition |
JP2003066592A (en) * | 2001-08-27 | 2003-03-05 | Konica Corp | Photosensitive planographic printing plate |
JP4317682B2 (en) * | 2002-07-10 | 2009-08-19 | 富士フイルム株式会社 | Image recording material |
TWI281095B (en) * | 2002-11-01 | 2007-05-11 | Sumitomo Chemical Co | Radiation sensitive resin composition |
-
2005
- 2005-07-29 JP JP2005220344A patent/JP4645346B2/en active Active
-
2006
- 2006-07-18 TW TW095126253A patent/TW200722911A/en unknown
- 2006-07-25 CN CN2006101431753A patent/CN1940720B/en not_active Expired - Fee Related
- 2006-07-26 KR KR1020060070171A patent/KR20070014998A/en not_active Application Discontinuation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI670570B (en) * | 2014-07-18 | 2019-09-01 | 日商日本觸媒股份有限公司 | Curable resin composition and its use |
TWI805554B (en) * | 2016-07-28 | 2023-06-21 | 日商住友化學股份有限公司 | Resin, curable resin composition and cured film |
Also Published As
Publication number | Publication date |
---|---|
CN1940720B (en) | 2011-02-16 |
CN1940720A (en) | 2007-04-04 |
JP4645346B2 (en) | 2011-03-09 |
KR20070014998A (en) | 2007-02-01 |
JP2007034134A (en) | 2007-02-08 |
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